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31. 发明授权

US5439774A Positive-type photosensitive electrodeposition coating composition containing resin having ionic group and modified quinonediazidesulfone unit 失效
标题翻译：含有具有离子性基团的树脂和改性醌二叠氮化物单元的正型光敏电沉积涂料组合物
公开(公告)号：US5439774A
公开(公告)日：1995-08-08
申请号：US314438
申请日：1994-09-28
申请人： Naozumi Iwasawa , Junichi Higashi
发明人： Naozumi Iwasawa , Junichi Higashi
IPC分类号： G03F7/023 , C09D5/44 , G03F7/16
CPC分类号： G03F7/023 , G03F7/164
摘要： A positive-type photosensitive electrodeposition coating composition comprising a water-soluble or water-dispersible resin having an ionic group and containing at least one modified quinonediazidesulfone unit represented by the following formula (I) or (II) ##STR1## wherein R.sub.1 represents ##STR2## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group, an alkylene ether group,a phenylene group which may optionally be substituted with an alkyl group having 1 to 20 carbon atoms, or an alkylene, cycloalkylene or alkylene ether group containing in its chain a phenylene group which may optionally be substituted with an alkyl group having 1 to 20 carbon atoms, in the molecule.
摘要翻译：一种正型光敏电沉积涂料组合物，其包含具有离子性基团的水溶性或水分散性树脂，并含有由下式（I）或（II）表示的至少一种改性的醌二叠氮化物单元。 >（II）其中R 1表示R 2表示氢原子，烷基，环烷基或烷基醚基，R 3表示亚烷基，亚环烷基，亚烷基醚基，亚苯基，或者可以被分子内被碳原子数为1〜20的烷基取代的亚烷基，亚环烷基或亚烷基醚基在其链中含有可以被碳原子数1〜20的烷基取代的亚苯基。

32. 发明授权

US4927884A Curable composition 失效
标题翻译：可固化组合物
公开(公告)号：US4927884A
公开(公告)日：1990-05-22
申请号：US269084
申请日：1988-11-09
申请人： Naozumi Iwasawa , Osamu Isozaki , Noboru Nakai
发明人： Naozumi Iwasawa , Osamu Isozaki , Noboru Nakai
IPC分类号： C08K5/00 , C08L83/06 , C08L83/07 , C08L83/10 , C09D183/07
CPC分类号： C08L83/06 , C08K5/0091 , C08L83/10
摘要： Disclosed is a curable composition characterized in that the composition comprises:(i) 100 parts by weight of a polymer mixture of(a) about 5 to about 95% by weight of a polymer (X) containing a specific polysiloxane macromonomer as an essential monomer or a polymer (Y) containing a specific alkoxysilane-containing vinyl monomer as an essential monomer, and(b) about 95 to about 5% by weight of a polymer (Z) containing an epoxy-containing vinyl monomer as an essential monomer; and(ii) about 0.01 to about 30 parts by weight of at least one chelate compound selected from the group consisting of aluminum chelate compound, titanium chelate compound and zirconium chelate compound.
摘要翻译：公开了一种可固化组合物，其特征在于所述组合物包含：（i）100重量份的（a）约5至约95重量％的含有特定聚硅氧烷大分子单体作为必需单体的聚合物（X）的聚合物混合物或含有特定烷氧基硅烷的乙烯基单体作为必需单体的聚合物（Y），和（b）含有含环氧基乙烯基单体作为必需单体的聚合物（Z）约95〜约5重量％和（ii）约0.01至约30重量份的选自铝螯合化合物，钛螯合物和锆螯合物的至少一种螯合化合物。

33. 发明授权

US4904504A Method of preventing adhesion of organisms 失效
标题翻译：防止生物粘连的方法
公开(公告)号：US4904504A
公开(公告)日：1990-02-27
申请号：US240657
申请日：1988-09-06
申请人： Osamu Isozaki , Naozumi Iwasawa
发明人： Osamu Isozaki , Naozumi Iwasawa
IPC分类号： C09D5/14 , C09D5/16 , C09D183/00 , C09D183/14
CPC分类号： C09D183/14 , C09D5/1675 , Y10T428/31663
摘要： Disclosed is a method of preventing adhesion of organisms characterized by coating a substrate with a coating composition comprising as its vehicle component a reaction product of a silane compound and/or a low condensation product thereof and an organic compound having at least two hydroxyl groups per molecule, the silane compound being represented by the formula(R.sup.1).sub.n Si--(OR.sup.2).sub.4-nwherein R.sup.1 is alkyl having 1 to 20 carbon atoms, haloalkyl having 1 to 12 carbon atoms, cycloalkyl having 3 to 7 carbon atoms, aryl or aralkyl having an alkyl portion with 1 to 12 carbon atoms, R.sup.2 is a hydrogen atom, alkyl having 1 to 8 carbon atoms, cycloalkyl having 3 to 7 carbon atoms or haloalkyl having 1 to 8 carbon atoms and n is an integer of 0 to 3.
摘要翻译：公开了一种防止生物体粘附的方法，其特征在于用涂料组合物涂布基材，该涂料组合物包含作为其载体组分的硅烷化合物和/或其低缩合产物和每分子具有至少两个羟基的有机化合物的反应产物硅烷化合物由式（R 1）n -Si-（OR 2）4-n表示，其中R 1是具有1至20个碳原子的烷基，具有1至12个碳原子的卤代烷基，具有3至7个碳原子的环烷基，芳基或芳烷基具有1至12个碳原子的烷基部分，R 2是氢原子，具有1至8个碳原子的烷基，具有3至7个碳原子的环烷基或具有1至8个碳原子的卤代烷基，n是0至3的整数。

34. 发明授权

US4069274A Thermosetting acrylic powder coating compositions 失效
标题翻译：热固性丙烯酸粉末涂料组合物
公开(公告)号：US4069274A
公开(公告)日：1978-01-17
申请号：US598946
申请日：1975-07-25
申请人： Minoru Shibata , Naozumi Iwasawa , Tadashi Watanabe , Ichiro Yoshihara
发明人： Minoru Shibata , Naozumi Iwasawa , Tadashi Watanabe , Ichiro Yoshihara
IPC分类号： C09D5/03 , C08G81/00 , C08G81/02 , C08J3/20 , C09D5/46 , C08L63/00
CPC分类号： C08G81/027
摘要： A thermosetting powder coating composition comprising:A. a functional glycidyl group-containing graft copolymer ofI. 10 to 40 percent of a linear polyester having a number average molecular weight of 600 to 3,000 and containing one terminal carboxyl group andIi. 60 to 90 percent of acrylic copolymer of ii-a) 6.5 to 60 percent of at least one of glycidyl esters having the formula ##STR1## wherein R.sub.1 is hydrogen or methyl, ii-b) 10 to 93.5 percent of at least one of acrylic monomers having the formula CH.sub.2 .dbd.C(R.sub.2)COOR.sub.3 wherein R.sub.2 is hydrogen or methyl and R.sub.3 is alkyl having 1 to 14 carbon atoms, cyclohexyl or hydroxyalkyl having 1 to 4 carbon atoms, and ii-c) 0 to 65 percent of additional monomers selected from the group consisting of acrylonitrile, methacrylonitrile and styrenes having the formula ##STR2## wherein R.sub.4 is hydrogen or alkyl having 1 to 4 carbon atoms, said graft copolymer having a softening point of 70.degree. to 110.degree. C and a number average molecular weight of 2,000 to 30,000 and containing glycidyl group in an amount of 0.35 to 2.35 moles per kilogram of the graft copolymer; andB. at least one of polycarboxylic acids and anhydrides thereof in an amount of 0.6 to 1.2 moles in terms of carboxyl group per mole of the glycidyl group contained in the graft copolymer.
摘要翻译：一种热固性粉末涂料组合物，其包含：

35. 发明授权

US4038225A Thermosetting high solid coating composition 失效
标题翻译：热固化高固体涂料组合物
公开(公告)号：US4038225A
公开(公告)日：1977-07-26
申请号：US582700
申请日：1975-06-02
申请人： Yasuo Takaya , Tadashi Watanabe , Naozumi Iwasawa
发明人： Yasuo Takaya , Tadashi Watanabe , Naozumi Iwasawa
IPC分类号： C08L67/00 , C08G63/00 , C08G63/46 , C08L67/08 , C09D5/46 , C09D167/00 , C09D167/08 , C09D3/52
CPC分类号： C09D167/08 , Y10T428/31522
摘要： A thermosetting high solid coating composition which is characterized in that said composition consumes less solvents in production, evolves less solvent vapor in use, and consists of: (a) 80 to 60 parts by weight of alkyd resin having a fatty acid content of 10 to 20% by weight, a phenyl group content of 10 to 25% by weight and a dibasic acid ratio and a hydroxyl group equivalent within certain ranges, (b) 20 to 40 parts by weight of melamine resin mainly comprising hexakisalkoxymethylmelamine, (c) if desired, alcohol modified melamine resin replacing not more than one half of said melamine resin (b), (d) 0.05 to 1.00 part by weight of aliphatic or aromatic sulfonic acid or their amine salts, and (e) 70 to 20 parts by weight of solvents at the time of spray coating.

36. 发明授权

US5576148A Process for production of printed circuit board 失效
标题翻译：印刷电路板生产工艺
公开(公告)号：US5576148A
公开(公告)日：1996-11-19
申请号：US382155
申请日：1995-02-01
申请人： Genji Imai , Yukari Takeda , Hideo Kogure , Naozumi Iwasawa
发明人： Genji Imai , Yukari Takeda , Hideo Kogure , Naozumi Iwasawa
IPC分类号： H05K3/42 , H05K3/00 , H05K3/06 , H05K3/46 , G03F7/00
CPC分类号： H05K3/0094 , H05K2201/09581 , H05K2203/0582 , H05K2203/107 , H05K2203/135 , H05K3/0082 , H05K3/064
摘要： The present invention provides a process for producing a high-density printed wiring board with plated throughholes, at high productivity and reliability by a direct drawing method. The process comprises making throughholes in a substrate having an electro-conductive layer on each side; conducting plating on at least the walls of the substrate throughholes; forming a photosensitive resist film on each side of the substrate; applying an actinic radiation onto the resist film by a direct drawing method in the shape of a pattern to be obtained when the resist film is a negative type, or in the shape of a pattern reverse to a pattern to be obtained when the resist film is a positive type; forming, on the uncoated portion inside the throughholes by electrodeposition, an electrodeposition film which is insoluble in a developing solution used later and an etching solution used later but is removable with a peeling solution used later; conducting development with an appropriate developing solution to remove the resist film; removing the exposed plating layer portion and the electro-conductive layer portion present therebeneath, by etching; and then peeling the remaining resist film and the electrodeposition film inside the throughholes, with an appropriate peeling solution.
摘要翻译：本发明提供一种通过直接拉伸法以高生产率和可靠性制造具有电镀通孔的高密度印刷线路板的方法。该方法包括在每个侧面上具有导电层的基板中形成通孔; 至少在基板通孔的壁上进行电镀; 在基板的每一侧上形成光敏抗蚀剂膜; 通过直接拉伸法将光化辐射施加到抗蚀剂膜为负型时获得的图案的形状，或者与抗蚀剂膜为积极的类型通过电沉积在通孔内的未涂覆部分上形成不溶于稍后使用的显影液的电沉积膜和稍后使用的可用随后使用的剥离溶液除去的蚀刻溶液; 用合适的显影液进行显影以除去抗蚀剂膜; 通过蚀刻去除暴露的镀层部分和存在于其中的导电层部分; 然后用适当的剥离溶液将剩余的抗蚀剂膜和电沉积膜剥离到通孔内。

37. 发明授权

US5496678A Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator 失效
标题翻译：含有具有羧基和羟基苯基的聚合物的光敏组合物，具有多个烯属不饱和键的化合物和光酸发生剂
公开(公告)号：US5496678A
公开(公告)日：1996-03-05
申请号：US227346
申请日：1994-04-14
申请人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
发明人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/027 , G03F7/021 , G03F7/029 , G03F7/032
CPC分类号： G03F7/0045 , G03F7/027
摘要： A photosensitive composition which comprises, as essential components:(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxyl group(s) and (A") a polymer having hydroxyphenyl group(s),(B) a compound having at least two vinyl ether groups in the molecule, and(C) a compound which generates an acid when irradiated with an actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.
摘要翻译：作为必要成分的感光性组合物：（A）具有羧基和羟基苯基的聚合物，或（A'）具有羧基的聚合物和（A“）具有羟基苯基，（B）分子中具有至少两个乙烯基醚基的化合物，（C）当用光化射线照射时产生酸的化合物，其可用作具有高分子量的正型光致抗蚀剂精细图像图案的分辨率和优异的成形性，印刷材料等; 以及使用所述组合物的图案形成方法。

38. 发明授权

US5492968A Resin compositions and a method of curing the same 失效
标题翻译：树脂组合物及其固化方法
公开(公告)号：US5492968A
公开(公告)日：1996-02-20
申请号：US335379
申请日：1994-11-03
申请人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
发明人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
IPC分类号： C08G59/40 , C07F7/08 , C07F7/18 , C08G59/00 , C08G59/02 , C08G59/04 , C08G59/30 , C08G59/32 , C08G59/70 , C08K5/00 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L33/06 , C08L43/04 , C08L63/00 , C08L75/04 , C08L101/06 , C09D133/06 , C09D133/14 , C09D143/04 , C09D163/00 , C08F8/00
CPC分类号： C08L63/00 , C07F7/0836 , C07F7/0858 , C07F7/0859 , C07F7/182 , C07F7/1836 , C07F7/1844 , C07F7/1896 , C08G59/02 , C08G59/04 , C08G59/306 , C08G59/3254 , C08G59/70 , C08K5/00 , C08K5/0091 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L101/06 , C08L75/04 , C09D133/064 , C09D133/068 , C09D143/04 , C09D163/00 , C08L33/068 , C08L43/04
摘要： A resin composition comprising a) a high molecular weight compound containing an average of 2 or more hydroxyl groups and an average of 2 or more epoxy groups per molecule and having a number average molecular weight of 3,000 to 200,000; b) a silane compound having an average of 1 or more alkoxysilane, silanol and acyloxysilane groups per molecule and having a number average molecular weight of 104 to 200,000; and c) a metal chelate compound, is curable at a relatively low temperature to yield a film having excellent resistance to weathering.
摘要翻译：一种树脂组合物，其包含a）每分子平均含有2个或更多个羟基并且平均具有2个或更多个环氧基并且数均分子量为3,000至200,000的高分子量化合物; b）每分子平均具有1个或更多个烷氧基硅烷，硅烷醇和酰氧基硅烷基团并且数均分子量为104至200,000的硅烷化合物; 和c）金属螯合化合物在相对低的温度下可固化，得到具有优异耐候性的膜。

39. 发明授权

US5455117A Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method 失效
标题翻译：电磁波防反射材料和电磁波反射防止方法
公开(公告)号：US5455117A
公开(公告)日：1995-10-03
申请号：US140564
申请日：1993-10-25
申请人： Toshiaki Nagano , Hideo Kogure , Naozumi Iwasawa , Tetsu Maki
发明人： Toshiaki Nagano , Hideo Kogure , Naozumi Iwasawa , Tetsu Maki
IPC分类号： G21F1/12 , H05K9/00 , B32B9/00
CPC分类号： G21F1/125 , H05K9/0088 , G21Y2002/301 , G21Y2004/10 , G21Y2004/30 , Y10T428/12007 , Y10T428/12014 , Y10T428/12035
摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic have reflecting metallic material layer, if needed, (B) a substrate layer, (C) a resin layer containing a powder of at least one selected from ferrite, carbon, metal powder and an electrically conductive metallic oxide, and, if needed, a good dielectric material, if needed, (D) a supporting film layer, and (E) a pattern coating layer prepared in the form of a geometrical pattern, containing a metal powder and having a volume resistivity of 10.sup.-3 to 10.sup.10 .OMEGA..multidot.cm, preferably further laminating (F) a clear or colored coating layer; and an electromagnetic wave reflection-preventing material which is obtained by substituting (G) a molded sheet layer formed by coating a coating composition prepared by dispersing the above powder into a binder onto a substrate having void, and molding under pressure for (C) a resin layer; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying a laminate obtained by removing the electromagnetic wave reflecting metallic material layer (A) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.
摘要翻译：具有通过依次层叠（A）电磁体形成的结构的电磁波反射防止材料具有反射金属材料层，如果需要，（B）基底层，（C）含有选自以下的至少一种的粉末的树脂层铁素体，碳，金属粉末和导电金属氧化物，如果需要，如果需要，可以使用良好的介电材料（D）支撑膜层，和（E）以几何图案形式制备的图案涂层，含有金属粉末，体积电阻率为10-3至1010欧米加×厘米，优选进一步层压（F）透明或有色涂层; 和（G）通过将（G）通过将通过将上述粉末分散在粘合剂中而制备的涂料组合物形成的模塑片层而获得的模塑片层而获得，并且在压力下成型（C）树脂层; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括将从电磁波反射防止材料除去电磁波反射金属材料层（A）获得的层压体施加到具有金属表面的电磁波反射结构。

40. 发明授权

US5453328A Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method 失效
标题翻译：电磁波防反射材料和电磁波反射防止方法
公开(公告)号：US5453328A
公开(公告)日：1995-09-26
申请号：US183763
申请日：1994-01-21
申请人： Toshiaki Nagano , Hideo Kogure , Naozumi Iwasawa , Tetsu Maki
发明人： Toshiaki Nagano , Hideo Kogure , Naozumi Iwasawa , Tetsu Maki
IPC分类号： H05K9/00 , B32B9/00
CPC分类号： H05K9/0086 , Y10T428/12007 , Y10T428/12014 , Y10T428/12035
摘要： An electromagnetic wave reflection-preventing material having a structure formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern having a volume resistivity of 10.sup.3 .OMEGA. . cm or less, if needed, (B) a supporting layer, (C) a resin layer, and, if needed, (D) a supporting layer, to form a laminate unit, laminating a pluralitry of the laminate unit so that the layer (A) may face on the layer (C) or (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer so that the layer (C) or (D) of the multiple laminate unit structure may face on the layer (E), preferably further laminating a clear or colored coating layer onto the uppermost metallic pattern layer of the electromagnetic wave, reflection-preventing material; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying the multiple laminate unit structure obtained by removing the electromagnetic wave reflecting material layer (E) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.
摘要翻译：一种电磁波反射防止材料，其具有通过以下工序形成的结构形成的工艺：连续地层叠（A）形成为体积电阻率为103欧姆时的几何图案形式的图案层。 cm以下，如果需要，（B）支撑层，（C）树脂层，如果需要，（D）支撑层，形成层叠单元，层叠多层叠单元，使层（A）可以在层（C）或（D）上面对以形成多层压单元结构，并将多层压单元结构层压到（E）电磁波反射材料层上，使得层（C）或（D 多层压单元结构可以在层（E）上面对，优选将透明或着色的涂层进一步层叠到电磁波的最上层的金属图案层上，防反射材料; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括施加通过从电磁波反射防止中除去电磁波反射材料层（E）而获得的多层叠单元结构材料到具有金属表面的电磁波反射结构。

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