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31. 发明申请

US20080268383A1 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：涂料与开发系统，涂料和开发方法和储存介质
公开(公告)号：US20080268383A1
公开(公告)日：2008-10-30
申请号：US12103884
申请日：2008-04-16
申请人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03F7/20 , G03G15/08
CPC分类号： H01L21/67178 , H01L21/67028 , H01L21/6715 , H01L21/67173 , H01L21/67709 , H01L21/6776
摘要： A coating and developing system includes two rotating members 131 and 132 respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism 130 extended between the rotating members 131 and 132 to form a carrying passage, and capable of moving along an orbital path to carry a wafer W supported thereon along the carrying passage, a sending-in transfer unit 110 disposed at the upstream end of the carrying passage, a sending-out transfer unit 111 disposed at the downstream end of the carrying passage, a developer pouring nozzle 151 for pouring a developer onto the wafer W, a cleaning nozzle 152 for pouring a cleaning liquid onto the wafer W, and a gas nozzle 154 for blowing a gas against the wafer W. The developer pouring nozzle 151, the cleaning nozzle 152 and the gas nozzle 154 are arranged in that order in a direction in which the wafer W is carried along the carrying passage between the upstream and the downstream end of the carrying passage.
摘要翻译：涂层显影系统包括分别具有平行的水平旋转轴线和彼此纵向相对设置的两个旋转构件131和132，在旋转构件131和132之间延伸的承载通道形成机构130，以形成承载通道，并且能够沿着轨道路径移动以承载沿着运送通道支撑在其上的晶片W;设置在运送通道的上游端的送入传送单元110，设置在运送通道的下游端的送出传送单元111 用于将显影剂倾倒到晶片W上的显影剂倾倒嘴151，用于将清洗液注入晶片W的清洗喷嘴152以及用于将气体吹向晶片W的气体喷嘴15.显影剂倾倒喷嘴151 清洁喷嘴152和气体喷嘴154沿着沿着上游和d之间的输送通道承载晶片W的方向依次排列承载通道的自身端。

32. 发明授权

US07322756B2 Coating and developing apparatus and coating and developing method 有权
标题翻译：涂装开发设备及涂层开发方法
公开(公告)号：US07322756B2
公开(公告)日：2008-01-29
申请号：US11239403
申请日：2005-09-30
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka
IPC分类号： G03D5/00
CPC分类号： H01L21/67276 , H01L21/67173 , H01L21/67178 , H01L21/67754
摘要： A coating and developing apparatus comprises a process block which forms a resist film on a wafer, then transfers the wafer to an exposure apparatus, and performs a developing process on the wafer after exposure, and an interface transfer mechanism provided between the process block and the exposure apparatus. The process block includes unit blocks for coating-film formation and unit blocks for development laid out in a stacked manner. When an abnormality occurs in the interface transfer mechanism, an ordinary process in the unit block for coating-film formation is performed on those substrates which are present in that unit block for coating-film formation, after which processed wafers are retreated to a retaining unit and transfer of any wafer into the unit block for coating-film formation is inhibited.
摘要翻译：涂层显影装置包括在晶片上形成抗蚀剂膜的处理块，然后将晶片转移到曝光装置，并且在曝光后对晶片进行显影处理，以及设置在处理块和曝光装置处理块包括用于涂膜形成的单元块和以堆叠方式布置的用于显影的单元块。当在界面转移机构发生异常时，在用于涂膜形成的单元块中存在的那些基板上进行用于涂膜形成的单元块中的常规工艺，之后将处理的晶片退回到保持单元并且将任何晶片转移到用于涂膜形成的单元块中被抑制。

33. 发明申请

US20080014333A1 COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM 有权
标题翻译：涂料和开发设备，基板加工方法和储存介质
公开(公告)号：US20080014333A1
公开(公告)日：2008-01-17
申请号：US11733441
申请日：2007-04-10
申请人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： B05C11/00 , B05D1/00
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A 3和A 4的涂膜形成部分B 3和包括多个处理单元31和转印机构A 1的显影部分B 1垂直地布置在处理块S2中在载体块S1的一侧设置有处理块S2中的多个垂直设置的传送单元TRS，用于在相同部件之间传送基板W和用于各个部件的传送机构，以及可升降的传送机构D 1用于用于在这些转印单元之间转印衬底的转印单元。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

34. 发明授权

US07267497B2 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US07267497B2
公开(公告)日：2007-09-11
申请号：US11117552
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03D5/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks: DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.
摘要翻译：涂布显影系统包括：抗蚀剂膜形成单元块和抗反射膜形成单元块，其层叠以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂覆和显影系统可以应对形成防反射膜的情况和其中没有形成任何抗反射膜的情况。成膜单元块：TCT层B 3，COT层B 4和BCT层B 5以及显影单元块DEV层B 1和B 2在处理块S2中层叠。选择性地使用TCT层B 3，COT层B 4和BCT层B 5，其中形成防反射膜并且不形成任何抗反射膜。涂层和显影系统由携带程序和软件控制。

35. 发明申请

US20060201423A1 COATING/DEVELOPING DEVICE AND METHOD 有权
标题翻译：涂料/开发装置和方法
公开(公告)号：US20060201423A1
公开(公告)日：2006-09-14
申请号：US11276662
申请日：2006-03-09
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C13/02 , B05C11/00
CPC分类号： H01L21/67742 , G03F7/162 , H01L21/6715 , H01L21/67173 , H01L21/67178
摘要： A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.
摘要翻译：涂覆/显影装置包括具有堆叠的多个涂布单元块的处理块和堆叠在涂布单元块上的显影单元块。每个单元块设置有用于在基板上涂覆液体化学品的液体处理单元，用于加热基板的加热单元，用于冷却基板的冷却单元和用于在单元之间转移基板的转移单元。液体处理单元设置有用于在基板上涂覆抗蚀剂液体的涂布单元，在其上涂覆抗蚀剂液体之前，在基板上涂布用于BARC的液体化学品的第一底部抗反射涂层（BARC）形成单元，以及第二BARC形成单元，用于在其上涂覆抗蚀剂液体之后，在基板上涂覆用于BARC的液体化学品。

36. 发明授权

US08206076B2 Substrate processing system 有权
标题翻译：基板加工系统
公开(公告)号：US08206076B2
公开(公告)日：2012-06-26
申请号：US12137076
申请日：2008-06-11
申请人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
发明人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , Y10S414/139
摘要： A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette.
摘要翻译：盒式等待块连接到涂覆和显影处理系统的转移输入/输出块，并且在盒式等待块中，盒式磁带传送入/出单元，盒式磁带等待单元，盒传送单元和基板处理提供单位。在盒式磁带等待块中，用于在磁带盒输入/输出单元，磁带盒等待单元和磁带盒传送单元之间传送磁带的盒式磁带传送单元，以及用于在盒式磁带等待单元中的盒之间传送基板的传送单元并提供基板处理单元。每个盒式待机单元具有用于打开盒的端口的打开机构。

37. 发明授权

US07955011B2 Coating and developing apparatus, substrate processing method, and storage medium 有权
标题翻译：涂布显影装置，基板处理方法和存储介质
公开(公告)号：US07955011B2
公开(公告)日：2011-06-07
申请号：US11733441
申请日：2007-04-10
申请人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。在载体块S1的一侧设置有处理块S2，多个垂直设置的传送单元TRS，用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间，转印单元，用于在这些转印单元之间转印衬底。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

38. 发明授权

US07591601B2 Coater/developer, coating/developing method, and storage medium 失效
标题翻译：涂布机/显影剂，涂布/显影方法和存储介质
公开(公告)号：US07591601B2
公开(公告)日：2009-09-22
申请号：US12107496
申请日：2008-04-22
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/00 , G03B27/32 , G03F7/00
CPC分类号： G03B27/32 , G03F7/162 , G03F7/3021
摘要： A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each other in a direction along the conveyance path of a substrate so that the rotational axles thereof are parallel to each other; a conveyance path member engaged with and extended between the rotary bodies so as to move along an orbit, the conveyance path member forming a part of the conveyance path of the substrate placed on the conveyance path member; a first transfer part provided at the upstream end of the conveyance path; a second transfer part provided at the downstream end of the conveyance path; and a heating part provided between the upstream end and the downstream end of the conveyance path and configured to heat the substrate.
摘要翻译：公开了一种涂布机/显影剂，其包括具有一对旋转体的加热模块，所述一对旋转体构造成围绕各自的水平轴旋转，所述旋转体在沿着基板的传送路径的方向上彼此间隔开，使得其旋转轴彼此平行; 输送路径构件，其与所述旋转体接合并在所述旋转体之间延伸以沿着轨道移动，所述输送路径构件形成放置在所述输送路径构件上的所述基板的输送路径的一部分; 设置在所述输送路径的上游端的第一转印部; 设置在所述输送路径的下游端的第二输送部; 以及加热部，其设置在所述输送路径的上游端和下游端之间，并且构造成加热所述基板。

39. 发明授权

US07245348B2 Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning 有权
标题翻译：涂层和显影系统以及具有防反射膜和辅助块的检测和清洁的涂层和显影方法
公开(公告)号：US07245348B2
公开(公告)日：2007-07-17
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/52
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.
摘要翻译：涂覆显影系统包括辅助块，抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗蚀剂膜下面的抗反射膜，以及抗反射膜，覆盖抗蚀剂膜空间。涂覆和显影系统可以应对形成防反射膜的情况或不形成抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块S2中层叠。在形成防反射膜的情况下选择性地使用TCT层，COT层和BCT层以及未形成任何抗反射膜的情况。涂层和显影系统由携带程序控制。

40. 发明申请

US20070056514A1 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US20070056514A1
公开(公告)日：2007-03-15
申请号：US11342616
申请日：2006-01-31
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： C23C16/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

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