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31. 发明申请

US20080014333A1 COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM 有权
标题翻译：涂料和开发设备，基板加工方法和储存介质
公开(公告)号：US20080014333A1
公开(公告)日：2008-01-17
申请号：US11733441
申请日：2007-04-10
申请人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： B05C11/00 , B05D1/00
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A 3和A 4的涂膜形成部分B 3和包括多个处理单元31和转印机构A 1的显影部分B 1垂直地布置在处理块S2中在载体块S1的一侧设置有处理块S2中的多个垂直设置的传送单元TRS，用于在相同部件之间传送基板W和用于各个部件的传送机构，以及可升降的传送机构D 1用于用于在这些转印单元之间转印衬底的转印单元。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

32. 发明申请

US20060213052A1 Apparatus and method of application and development 失效
标题翻译：仪器和应用与开发方法
公开(公告)号：US20060213052A1
公开(公告)日：2006-09-28
申请号：US11384323
申请日：2006-03-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： H05K3/06 , G01R31/28
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
摘要翻译：层叠用于涂膜成膜的块和显影处理用块。针对载体块侧的每个处理块提供了用于在块中使用的运输单元实现基板输送的输送阶段，以构成货架式输送阶段组。提供垂直运输单元以在输送台组中的输送台之间输送基底。衬底检查单元设置在承载块的上空空间。基板由垂直运输单元直接输送到基板检查单元，或通过输送台组中的输送台输入。基板检查单元可以设置在输送台组中。

33. 发明申请

US20060183340A1 Coating and developing apparatus and coating and developing method 有权
标题翻译：涂装开发设备及涂层开发方法
公开(公告)号：US20060183340A1
公开(公告)日：2006-08-17
申请号：US11239386
申请日：2005-09-30
申请人： Yasushi Hayashida , Yoshitaka Hara
发明人： Yasushi Hayashida , Yoshitaka Hara
IPC分类号： G03G21/00 , C23C16/00 , H01L21/31
CPC分类号： H01L21/67276 , G03F7/70533 , H01L21/67173 , H01L21/67178 , H01L21/67184
摘要： A coating and developing apparatus comprises a process block which includes a unit block for coating-film formation which applies a resist, and a unit block for development which performs a developing process, and is separately provided with a coating-film-formation-unit-block transfer mechanism and a developing-process-unit-block transfer mechanism. After a substrate after exposure is transferred to a transfer stage from the interface-block transfer mechanism, the timing for the developing-process-unit-block transfer mechanism to receive the substrate is adjusted in such a way that the time from exposure of the substrate to transfer of the substrate to a heating unit becomes a preset time.
摘要翻译：涂料和显影装置包括一个工艺块，该工艺块包括一个施加抗蚀剂的涂膜形成单元块和一个进行显影过程的用于显影的单元块，并且分开设置一个涂膜形成单元 - 块传送机制和显影处理单元块传送机制。曝光后的基板从界面块转印机构转印到转印台上时，调整用于接收基板的显影处理单位块转印机构的定时，使得从基板曝光的时间将基板转移到加热单元成为预设时间。

34. 发明授权

US08377501B2 Coating and developing system control method of controlling coating and developing system 有权
标题翻译：涂料开发系统控制方法
公开(公告)号：US08377501B2
公开(公告)日：2013-02-19
申请号：US12438031
申请日：2007-09-11
申请人： Yasushi Hayashida , Yoshitaka Hara , Tomohiro Kaneko
发明人： Yasushi Hayashida , Yoshitaka Hara , Tomohiro Kaneko
IPC分类号： C23C16/52 , C23C14/54
CPC分类号： H01L21/67745 , H01L21/67178 , H01L21/67276
摘要： A coating and developing system and control method is provided. The system and control method curtails the amount of time for which a substrate is held with no purpose while improving the throughput of the coating and developing system. An inspection station through which a substrate processed in a processing station is transferred to a carrier station includes a plurality of different inspection modules respectively taking different inspection times, a buffer unit for temporarily holding a substrate and a substrate carrying means controlled by a controller. When the inspection module is engaged in inspecting a substrate, the substrate carrying means carries another substrate to be inspected by the same inspection module to the buffer unit and the substrate is held in the buffer unit. Thus, the holding of wafers in the inspection modules can be suppressed and the throughput can be improved.
摘要翻译：提供涂层和显影系统和控制方法。该系统和控制方法在提高涂层和显影系统的生产量的同时，无需目的地限制基材保持的时间。将在处理站中处理的基板通过其传送到承载站的检查站包括分别采取不同检查时间的多个不同检查模块，用于临时保持基板的缓冲单元和由控制器控制的基板承载装置。当检查模块接合检查基板时，基板承载装置将待检查的另一基板由相同的检查模块携带到缓冲单元，并且基板保持在缓冲单元中。因此，可以抑制检查模块中的晶片的保持，并且可以提高生产量。

35. 发明授权

US08206076B2 Substrate processing system 有权
标题翻译：基板加工系统
公开(公告)号：US08206076B2
公开(公告)日：2012-06-26
申请号：US12137076
申请日：2008-06-11
申请人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
发明人： Issei Ueda , Yasushi Hayashida , Akira Miyata , Kensei Yamamoto , Yuichi Yamamoto , Michiaki Matsushita
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , Y10S414/139
摘要： A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette.
摘要翻译：盒式等待块连接到涂覆和显影处理系统的转移输入/输出块，并且在盒式等待块中，盒式磁带传送入/出单元，盒式磁带等待单元，盒传送单元和基板处理提供单位。在盒式磁带等待块中，用于在磁带盒输入/输出单元，磁带盒等待单元和磁带盒传送单元之间传送磁带的盒式磁带传送单元，以及用于在盒式磁带等待单元中的盒之间传送基板的传送单元并提供基板处理单元。每个盒式待机单元具有用于打开盒的端口的打开机构。

36. 发明授权

US08025023B2 Coating and developing system, coating and developing method and storage medium 有权
标题翻译：涂层和显影系统，涂层和显影方法和存储介质
公开(公告)号：US08025023B2
公开(公告)日：2011-09-27
申请号：US11826438
申请日：2007-07-16
申请人： Yasushi Hayashida , Yoshitaka Hara
发明人： Yasushi Hayashida , Yoshitaka Hara
IPC分类号： B05B7/00
CPC分类号： H01L21/67276 , G02F1/1303 , G05B19/41865 , G05B2219/31428 , G05B2219/32097 , G05B2219/45031 , H01L21/67745 , Y02P90/20
摘要： Wafers A1 to A10 of a first lot A and wafers B1 to B10 of a second lot B are processed by a second heating unit at different temperatures, respectively. A wafer W is carried in a processing block included in coating and developing system along a route passing a temperature control unit CPL2, a coating unit BCT, a heating unit LHP2, a temperature control unit CPL3, a coating unit COT, a heating unit LHP3, and a cooling unit COL in that order. The process temperature of the heating unit LHP3 is changed after the last wafer A10 of the first lot A has been processed by the heating unit LHP3. The wafers of the second lot B are carried according to a carrying schedule such that carrying cycles succeeding a carrying cycle in which the first substrate B1 of the second lot B is carried to the second temperature conditioning unit CPL3 carry the substrates B of the second lot B succeeding the first substrate B1 and processed by a heating process by the heating unit LHP2 in due order to a buffer unit BF2, and the wafers B held in the buffer unit BF2 are carried in due order to the downstream modules after the process temperature of the heating unit LHP3 has been changed.
摘要翻译：第一批次A的晶片A1至A10和第二批次B的晶片B1至B10分别由不同温度的第二加热单元处理。沿着通过温度控制单元CPL2，涂布单元BCT，加热单元LHP2，温度控制单元CPL3，涂布单元COT，加热单元LHP3的路线，在包括在涂布显影系统中的处理块中承载晶片W. ，以及冷却单元COL。在第一批次A的最后一个晶片A10已被加热单元LHP3处理之后，加热单元LHP3的处理温度改变。第二批次B的晶片根据携带时间表进行，使得在第二批次B的第一基板B1被承载到第二温度调节单元CPL3的承载循环之后的承载循环携带第二批次的基板B B在第一衬底B1之后，并且通过加热单元LHP2按照缓冲单元BF2进行加热处理，并且保持在缓冲单元BF2中的晶片B在处理温度为加热单元LHP3已被改变。

37. 发明授权

US07955011B2 Coating and developing apparatus, substrate processing method, and storage medium 有权
标题翻译：涂布显影装置，基板处理方法和存储介质
公开(公告)号：US07955011B2
公开(公告)日：2011-06-07
申请号：US11733441
申请日：2007-04-10
申请人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。在载体块S1的一侧设置有处理块S2，多个垂直设置的传送单元TRS，用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间，转印单元，用于在这些转印单元之间转印衬底。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

38. 发明申请

US20110032494A1 APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT 有权
标题翻译：装置和应用与开发方法
公开(公告)号：US20110032494A1
公开(公告)日：2011-02-10
申请号：US12909191
申请日：2010-10-21
申请人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： G03B27/32
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
摘要翻译：层叠用于涂膜成膜的块和显影处理用块。针对载体块侧的每个处理块提供了用于在块中使用的运输单元实现基板输送的输送阶段，以构成货架式输送阶段组。提供垂直运输单元以在输送台组中的输送台之间输送基底。衬底检查单元设置在承载块的上空空间。基板由垂直运输单元直接输送到基板检查单元，或通过输送台组中的输送台输入。基板检查单元可以设置在输送台组中。

39. 发明授权

US07880859B2 Substrate processing system and substrate processing method 有权
标题翻译：基板加工系统和基板加工方法
公开(公告)号：US07880859B2
公开(公告)日：2011-02-01
申请号：US12621252
申请日：2009-11-18
申请人： Yasushi Hayashida , Shinichi Hayashi , Yoshitaka Hara
发明人： Yasushi Hayashida , Shinichi Hayashi , Yoshitaka Hara
IPC分类号： H01L21/20
CPC分类号： H01L21/67276 , H01L21/67288 , Y10S414/135
摘要： A substrate processing system processes a plurality of substrates in a single-substrate processing mode by a plurality of processes and provided with a plurality of modules respectively for carrying out processes. When a defect is found in a substrate, a defective processing unit that caused the defect can be easily found out. The substrate processing system and a substrate processing method to be carried out by the substrate processing system can suppress the reduction of throughput when a large number of substrates are to be processed. The substrate processing system is provided with a plurality of modules for processing a plurality of substrates (W) in a single-substrate processing mode by a plurality of processes and includes a substrate carrying means (A4) for carrying a substrate (W) from a sending module to a receiving module, and a control means (6) for controlling the substrate carrying means (A4) on the basis of one of at least two carrying modes each assigning receiving modules to sending modules. The control means (6) changes the carrying mode in effect for the other carrying mode upon the reception of a carrying mode change command while substrates are being processed and makes the substrate carrying means (A4) carry substrates in the carrying mode newly brought into effect.
摘要翻译：基板处理系统通过多个处理以单基板处理模式处理多个基板，并且分别具有用于执行处理的多个模块。当在基板中发现缺陷时，可以容易地发现引起缺陷的缺陷处理单元。基板处理系统和由基板处理系统执行的基板处理方法可以抑制当要处理大量基板时的吞吐量的降低。基板处理系统设置有多个模块，用于通过多个处理以单基板处理模式来处理多个基板（W），并且包括用于承载基板（W）的基板承载装置（A4）发送模块到接收模块，以及控制装置（6），用于基于至少两种携带模式中的一种来控制基板承载装置（A4），每个模式分配接收模块到发送模块。控制装置（6）在基板被处理时接收到承载模式改变命令时改变其他承载模式的承载模式，并使基板承载装置（A4）在新生效的承载模式中承载基板。

40. 发明授权

US07591601B2 Coater/developer, coating/developing method, and storage medium 失效
标题翻译：涂布机/显影剂，涂布/显影方法和存储介质
公开(公告)号：US07591601B2
公开(公告)日：2009-09-22
申请号：US12107496
申请日：2008-04-22
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/00 , G03B27/32 , G03F7/00
CPC分类号： G03B27/32 , G03F7/162 , G03F7/3021
摘要： A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each other in a direction along the conveyance path of a substrate so that the rotational axles thereof are parallel to each other; a conveyance path member engaged with and extended between the rotary bodies so as to move along an orbit, the conveyance path member forming a part of the conveyance path of the substrate placed on the conveyance path member; a first transfer part provided at the upstream end of the conveyance path; a second transfer part provided at the downstream end of the conveyance path; and a heating part provided between the upstream end and the downstream end of the conveyance path and configured to heat the substrate.
摘要翻译：公开了一种涂布机/显影剂，其包括具有一对旋转体的加热模块，所述一对旋转体构造成围绕各自的水平轴旋转，所述旋转体在沿着基板的传送路径的方向上彼此间隔开，使得其旋转轴彼此平行; 输送路径构件，其与所述旋转体接合并在所述旋转体之间延伸以沿着轨道移动，所述输送路径构件形成放置在所述输送路径构件上的所述基板的输送路径的一部分; 设置在所述输送路径的上游端的第一转印部; 设置在所述输送路径的下游端的第二输送部; 以及加热部，其设置在所述输送路径的上游端和下游端之间，并且构造成加热所述基板。

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