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31. 发明申请

US20060210886A1 Method for making grayscale photo masks and optical grayscale elements 审中-公开
标题翻译：制作灰度光罩和光学灰阶元件的方法
公开(公告)号：US20060210886A1
公开(公告)日：2006-09-21
申请号：US11083324
申请日：2005-03-18
申请人： Yosuke Mizuyama , Xinbing Liu
发明人： Yosuke Mizuyama , Xinbing Liu
IPC分类号： G09B7/00 , G03C5/00 , G03F1/00
CPC分类号： G03F1/50
摘要： A positive photo resist is provided on a surface of a photo mask blank. Light is then exposed onto the photo resist to form a predetermined pattern of unexposed and exposed portions in the photo-resist. After development, the exposed portions are removed and ions are implanted to obtain a modulated ion density in the photo mask blank. The implanted ions become color centers which absorb a specific wavelength of light and the modulated distribution of the color substrates create the grayscale photo mask. The photo resist structure is finally removed to produce a grayscale photo mask.
摘要翻译：在光掩模板的表面上设置正型光致抗蚀剂。然后将光暴露在光致抗蚀剂上，以在光致抗蚀剂中形成未曝光和曝光部分的预定图案。显影后，去除曝光部分，并注入离子以获得光掩模板坯中调制的离子密度。注入的离子成为吸收特定波长的光的色心，并且彩色底物的调制分布产生灰度光掩模。最后去除光致抗蚀剂结构以产生灰度光掩模。

32. 发明申请

US20050230368A1 System for and method of manufacturing gravure printing plates 审中-公开
公开(公告)号：US20050230368A1
公开(公告)日：2005-10-20
申请号：US11062342
申请日：2005-02-18
申请人： Chen-Hsiung Cheng , Xinbing Liu
发明人： Chen-Hsiung Cheng , Xinbing Liu
IPC分类号： B23K26/00 , B23K26/38 , B41C1/05 , B41N1/06 , B41N6/00 , G03F7/00
CPC分类号： B41C1/05
摘要： A method of operating a laser drilling system to manufacture gravure printing plates without etching or the use of hazardous chemicals includes activating a laser drilling system, including a picosecond laser, light valves, and a mechanism adapted to rotate a gravure cylinder blank. Operation of the light valves, includes setting the light valves to block and/or allow pulses of laser energy propagating from the laser drilling system that can ablate a linear pattern of cells along a substantially entire length of the gravure cylinder blank. Drilling of cells includes targeting the laser drilling system on the gravure cylinder blank, such that ablation of materials occurs as sub-beams propagate along an optical path to the target area and impinge upon the gravure cylinder blank, wherein specific cells within the target area of the gravure cylinder blank are drilled or not drilled according to settings of the light valves.

33. 发明申请

US20050211748A1 Laser processing method and laser processing apparatus using ultra-short pulse laser 审中-公开
标题翻译：激光加工方法和使用超短脉冲激光的激光加工设备
公开(公告)号：US20050211748A1
公开(公告)日：2005-09-29
申请号：US11120091
申请日：2005-05-02
申请人： Yosuke Mizuyama , Yosuke Toyofuku , Xinbing Liu , Chen-Hsiung Cheng
发明人： Yosuke Mizuyama , Yosuke Toyofuku , Xinbing Liu , Chen-Hsiung Cheng
IPC分类号： B23K26/00 , B23K26/06 , B23K26/38 , B41J2/16 , H01S3/107 , H01S3/098
CPC分类号： B41J2/1634 , B23K26/064 , B23K26/0643 , B23K26/0648 , B41J2/162
摘要： A laser processing apparatus includes a laser generation apparatus for outputting an ultra-short pulse laser beam, a laser control apparatus for controlling the laser generation apparatus, an optical system, an optical system control apparatus for measuring the optical system, and a measurement apparatus for measuring the ultra-short pulse laser beam. The intensity of the largest noise component pulse in the ultra-short pulse laser beam is controlled to be 2.5% or less of the intensity of the primary pulse in the ultra-short pulse laser beam.
摘要翻译：一种激光加工装置，包括用于输出超短脉冲激光束的激光产生装置，用于控制激光产生装置的激光控制装置，光学系统，用于测量光学系统的光学系统控制装置，以及用于测量超短脉冲激光束。超短脉冲激光束中的最大噪声分量脉冲的强度被控制在超短脉冲激光束的初级脉冲强度的2.5％以下。

34. 发明申请

US20050205011A1 Process and apparatus for forming discrete microcavities in a filament wire using a polymer etching mask 有权
标题翻译：使用聚合物蚀刻掩模在丝线中形成离散微腔的方法和装置
公开(公告)号：US20050205011A1
公开(公告)日：2005-09-22
申请号：US10804431
申请日：2004-03-19
申请人： Xinbing Liu
发明人： Xinbing Liu
IPC分类号： H01K3/04 , C23C16/00 , C23F1/02 , C23F1/26 , H01K3/02
CPC分类号： H01K3/02 , C23F1/02 , C23F1/26
摘要： A microcavity-forming system for making microcavities in a wire (especially a tungsten filament wire). The system has a coating station receiving the wire and applying a polymer coating to the wire. A mask-forming station receives the polymer-coated wire and blows moist air over it to form air bubbles which result in holes in the polymer coating, thereby creating a mask. An etching station receives the wire, as coated with the polymer mask, from the mask-forming station and etches the wire through the holes in the polymer mask to form microcavities in the wire. A stripping station receives the wire from the etching station and removes the polymer mask from the wire, leaving the wire with microcavities. Processes of forming microcavities in a wire and, more generally, of making an etching mask having arrays of holes and conforming to substantially any surface, including an arbitrary curved surface, are provided.
摘要翻译：用于在线材（特别是钨丝线）中制造微腔的微腔形成系统。该系统具有接收线的涂布站，并将聚合物涂层施加到导线上。掩模形成站接收聚合物涂覆的电线并在其上吹湿空气以形成气泡，导致聚合物涂层中的孔，从而形成掩模。蚀刻站从掩模形成站接收涂覆有聚合物掩模的金属线，并通过聚合物掩模中的孔蚀刻电线，以形成电线中的微腔。剥离站从蚀刻站接收电线，并从电线中除去聚合物掩模，使电线具有微腔。提供了在线中形成微腔的方法，更一般地，制造具有孔阵列并且基本上包括任意曲面的任何表面的蚀刻掩模。

35. 发明授权

US06803539B2 System and method of aligning a microfilter in a laser drilling system using a CCD camera 失效
标题翻译：使用CCD照相机在激光钻孔系统中对准微型过滤器的系统和方法
公开(公告)号：US06803539B2
公开(公告)日：2004-10-12
申请号：US10267021
申请日：2002-10-08
申请人： Xinbing Liu , Chen-Hsiung Cheng
发明人： Xinbing Liu , Chen-Hsiung Cheng
IPC分类号： B23K2600
CPC分类号： B23K26/0608 , B23K26/0624 , B23K26/066 , B23K26/0676 , B23K26/382 , B23K26/389 , B23K26/40 , B23K2103/02 , B23K2103/42 , B23K2103/50 , B23K2103/52 , B41J2/162 , B41J2/1634
摘要： A system and method for aligning a microfilter in an optical circuit and thereby providing sub-beam impingement intensity control from a set of highly proximate sub-beams generated from a parallel process laser system removing a portion from a workpiece (exit holes in inkjet nozzle plates). The energy of laser-generated sub-beams to the target (cutting) point is attenuated to a level sufficient for maintaining operation of a charge-coupled-device camera below saturation when the sub-beams are incident on the camera, the CCD camera monitors the sub-beams and directs output to either a monitor or control computer. The microfilter is then adjusted to provide an optimal sub-beam pattern.
摘要翻译：一种用于对准光电路中的微过滤器的系统和方法，从而从平行过程激光系统产生的一组高度近似的子光束提供子束冲击强度控制，从工件中移除部分（喷墨喷嘴板中的出口孔）。激光产生的子光束到目标（切割）点的能量被衰减到足以在电子束入射到相机上时将电荷耦合器件照相机的操作保持在饱和状态的水平，CCD照相机监视器子光束并将其输出到监视器或控制计算机。然后调整微过滤器以提供最佳的子束图案。

36. 发明授权

US06433303B1 Method and apparatus using laser pulses to make an array of microcavity holes 有权
标题翻译：使用激光脉冲制作微腔阵列的方法和装置
公开(公告)号：US06433303B1
公开(公告)日：2002-08-13
申请号：US09541640
申请日：2000-03-31
申请人： Xinbing Liu , Mamoru Takeda , Hisahito Ogawa
发明人： Xinbing Liu , Mamoru Takeda , Hisahito Ogawa
IPC分类号： B23K26067
CPC分类号： B23K26/0861 , B23K26/0624 , B23K26/066 , B23K26/067 , B23K26/0676 , B23K26/389
摘要： A method and apparatus for forming an array of microcavities in the surface of a metal film uses an excimer laser or an ultrashort laser which to produce a beam of laser light pulses. An optical mask divides the beam into multiple beams and a lens system focuses the multiple beams onto the metal film. The device operates by generating multiple beams of laser pulses of a first diameter and then magnifying the pulses by a magnification factor less than 1 to produce multiple beams of pulses having a second diameter, less than the first diameter, which are applied to the metal film. The magnification factor and the intensity of the laser is such that the fluence of the laser on the optical mask is not sufficient to cause ablation while the fluence on the metal film is sufficient to cause ablation. A diffractive optical element may be used in the device in place of the optical mask. The apparatus includes a quarter wave plate that converts the beam of laser light pulses into a beam of circularly polarized pulses. The apparatus also includes a device that homogenizes the intensity of the laser light pulses before they are applied to the optical mask.
摘要翻译：用于在金属膜的表面形成微腔阵列的方法和装置使用准分子激光器或产生激光束脉冲的超短激光器。光学掩模将光束分成多个光束，并且透镜系统将多个光束聚焦到金属膜上。该装置通过产生具有第一直径的多束激光脉冲进行操作，然后以小于1的放大系数放大脉冲以产生具有小于第一直径的第二直径的多束脉冲，该第二直径施加到金属膜。激光的放大系数和强度使得激光对光学掩模的注量不足以引起消融，而金属膜上的注量足以引起消融。衍射光学元件可以用在器件中而不是光学掩模。该装置包括将激光束脉冲转换为圆偏振脉冲束的四分之一波片。该装置还包括在将激光脉冲施加到光学掩模之前均匀化激光光脉冲的强度的装置。

37. 发明授权

US07265057B2 3D lithography with laser beam writer for making hybrid surfaces 有权
标题翻译：使用激光束写入器制作混合曲面的3D光刻
公开(公告)号：US07265057B2
公开(公告)日：2007-09-04
申请号：US11282884
申请日：2005-11-18
申请人： Xinbing Liu
发明人： Xinbing Liu
IPC分类号： H01L21/302
CPC分类号： H01L21/0275 , G02B5/1852 , G02B5/1895 , G03F7/0005 , G03F7/0017 , G03F7/24 , H01L21/308
摘要： A method of etching a feature in a surface of a substrate. The substrate is provided. A photoresist layer is formed on the surface of the substrate. A thickness profile of the formed photoresist layer is determined. A grayscale scanning pattern is determined based on the feature and the thickness profile of the photoresist layer. The determined grayscale scanning pattern is laser written on the photoresist layer to expose a portion of the photoresist layer. The exposed portion of the photoresist layer is removed to form a grayscale pattern in the photoresist layer. The photoresist layer and the surface of the substrate are etched to form the feature in the surface of the substrate.
摘要翻译：蚀刻衬底表面中的特征的方法。提供基板。在基板的表面上形成光致抗蚀剂层。确定所形成的光致抗蚀剂层的厚度分布。基于光致抗蚀剂层的特征和厚度分布来确定灰度扫描图案。确定的灰度扫描图案被激光写在光致抗蚀剂层上以暴露光致抗蚀剂层的一部分。去除光致抗蚀剂层的暴露部分以在光致抗蚀剂层中形成灰度图案。蚀刻光致抗蚀剂层和基板的表面以在基板的表面中形成特征。

38. 发明申请

US20070188869A1 Oblique parallelogram pattern diffractive optical element 审中-公开
$Oblique parallelogram pattern diffractive optical element$
标题翻译：斜平行四边形图案衍射光学元件
公开(公告)号：US20070188869A1
公开(公告)日：2007-08-16
申请号：US11351972
申请日：2006-02-10
申请人： Craig First , Xinbing Liu
发明人： Craig First , Xinbing Liu
IPC分类号： G02B5/18 , B23K26/38
CPC分类号： G02B5/1871 , B23K26/0626 , B23K26/082 , B23K26/0853 , G02B5/1857 , G02B5/32
摘要： A diffractive optical element (DOE), including a substrate formed of a substantially transparent material having a substrate index of refraction. The substrate includes a first transmission face that is substantially planar and a second transmission face that is substantially parallel to the first transmission face. The second transmission face includes an array of non-rectangular pixels that form a complete tiling over the functional area of this face. For each of the non-rectangular pixels of the array, the phase shift of light transmitted through the substrate between the transmission faces is approximately equal to one of a set of predetermined phase shifts.
摘要翻译：一种衍射光学元件（DOE），包括由具有基板折射率的基本上透明的材料形成的基板。基板包括基本平坦的第一传动面和基本上平行于第一传动面的第二传动面。第二透射面包括在该面的功能区域上形成完全平铺的非矩形像素阵列。对于阵列的每个非矩形像素，在透射面之间透射通过衬底的光的相移近似等于一组预定相移中的一个。

39. 发明授权

US07204911B2 Process and apparatus for forming discrete microcavities in a filament wire using a polymer etching mask 有权
标题翻译：使用聚合物蚀刻掩模在丝线中形成离散微腔的方法和装置
公开(公告)号：US07204911B2
公开(公告)日：2007-04-17
申请号：US10804431
申请日：2004-03-19
申请人： Xinbing Liu
发明人： Xinbing Liu
IPC分类号： C23C1/00 , B05C3/00
CPC分类号： H01K3/02 , C23F1/02 , C23F1/26
摘要： A microcavity-forming system for making microcavities in a wire (especially a tungsten filament wire). The system has a coating station receiving the wire and applying a polymer coating to the wire. A mask-forming station receives the polymer-coated wire and blows moist air over it to form air bubbles which result in holes in the polymer coating, thereby creating a mask. An etching station receives the wire, as coated with the polymer mask, from the mask-forming station and etches the wire through the holes in the polymer mask to form microcavities in the wire. A stripping station receives the wire from the etching station and removes the polymer mask from the wire, leaving the wire with microcavities. Processes of forming microcavities in a wire and, more generally, of making an etching mask having arrays of holes and conforming to substantially any surface, including an arbitrary curved surface, are provided.
摘要翻译：用于在线材（特别是钨丝线）中制造微腔的微腔形成系统。该系统具有接收线的涂布站，并将聚合物涂层施加到导线上。掩模形成站接收聚合物涂覆的电线并在其上吹湿空气以形成气泡，导致聚合物涂层中的孔，从而形成掩模。蚀刻站从掩模形成站接收涂覆有聚合物掩模的金属线，并通过聚合物掩模中的孔蚀刻电线，以形成电线中的微腔。剥离站从蚀刻站接收电线，并从电线中除去聚合物掩模，使电线具有微腔。提供了在线中形成微腔的方法，更一般地，制造具有孔阵列并且基本上包括任意曲面的任何表面的蚀刻掩模。

40. 发明申请

US20060126685A1 Slab laser amplifier with parasitic oscillation suppression 有权
公开(公告)号：US20060126685A1
公开(公告)日：2006-06-15
申请号：US11013203
申请日：2004-12-15
申请人： Craig First , Xinbing Liu
发明人： Craig First , Xinbing Liu
IPC分类号： H01S3/14
CPC分类号： H01S3/0606 , H01S3/0615 , H01S3/063 , H01S3/08095 , H01S3/0941 , H01S3/2333
摘要： A slab laser amplifier with parasitic oscillation suppression has a plurality of angled pump faces related to one another in order to decrease likelihood of parasitic oscillations, with internal beam incidence angles at total internal reflection that alleviate need for reflective coatings. No polished surfaces of gain material comprising the amplifier are parallel to one another. A beam path within the gain material is such that all incident angles of the beam path upon the two main faces and the common end face are greater than a critical angle required for total internal reflection, thereby alleviating need for reflective coatings. Based on an index of refraction of the gain material, and based on a diameter of the laser beam, dimensions of the gain material are selected to maximize beam overlap in a pumped volume of the gain material.

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