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31. 发明授权

US07663741B2 Lithographic apparatus, device manufacturing method, calibration method and computer program product 失效
标题翻译：光刻设备，器件制造方法，校准方法和计算机程序产品
公开(公告)号：US07663741B2
公开(公告)日：2010-02-16
申请号：US10929882
申请日：2004-08-31
申请人： Hans Van Der Laan , Christian Wagner
发明人： Hans Van Der Laan , Christian Wagner
IPC分类号： G01B9/00 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70666 , G03F7/70516
摘要： To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
摘要翻译：为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。操纵器的适当设置被确定为给出最大对比度值的那些。

32. 发明申请

US20080055740A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTION EXPOSURE METHOD 审中-公开
标题翻译：具有自适应镜像和投射曝光方法的目标投影目标
公开(公告)号：US20080055740A1
公开(公告)日：2008-03-06
申请号：US11925359
申请日：2007-10-26
申请人： Christian Wagner , Michael Gerhard , Gerald Richter
发明人： Christian Wagner , Michael Gerhard , Gerald Richter
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/08 , G02B26/06 , G02B26/0825 , G02B27/0025 , G02B27/0043 , G03F7/70225 , G03F7/70266
摘要： A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are mated to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.
摘要翻译：用于微光刻的反射折射投射物镜具有至少一个可变形的弯曲镜，并且可调节可变形反射镜的元件。调整元件与给定的图像错误及其校正相匹配。本发明适用于散光，由于透镜加热，压实等引起的四重波前变形。

33. 发明申请

US20070266882A1 Active body 有权
标题翻译：活体
公开(公告)号：US20070266882A1
公开(公告)日：2007-11-22
申请号：US11727869
申请日：2007-03-28
申请人： Rainer Gaisbauer , Heinz Bannach , Vikron Kadavanich , Martin Fegg , Christian Wagner
发明人： Rainer Gaisbauer , Heinz Bannach , Vikron Kadavanich , Martin Fegg , Christian Wagner
IPC分类号： F42B4/26
CPC分类号： F42B5/16 , C06B45/00 , C06C15/00 , F42B4/26
摘要： An active body is provided that includes at least one active mass block made of monobasic or polybasic high-energy materials such as a nitrocellulose mixture, for example, comprising approximately 60 percent nitroglycerin and 40 percent diethylene glycol dinitrate, which is provided with structures both on a surface and on an interior. In addition, the inner structures can be filled with an active mass substance. The ignition is triggered by a pyrotechnical primer composition, which initiates the active body, preferably from the inside.
摘要翻译：提供了一种活性物质，其包含至少一种由一元或多碱性高能材料如硝酸纤维素混合物制成的至少一种活性质量块，例如包含约60％硝酸甘油和40％二甘醇二硝酸酯，其具有两者结构表面和内部。此外，内部结构可以填充有活性物质。点火是由烟火底漆组合物触发的，其引发活性体，优选从内部引发。

34. 发明申请

US20060171020A1 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US20060171020A1
公开(公告)日：2006-08-03
申请号：US11392027
申请日：2006-03-29
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
IPC分类号： G02B13/14 , G02B3/00
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

35. 发明申请

US20060046165A1 Lithographic apparatus, device manufacturing method, calibration method and computer program product 失效
标题翻译：光刻设备，器件制造方法，校准方法和计算机程序产品
公开(公告)号：US20060046165A1
公开(公告)日：2006-03-02
申请号：US10929882
申请日：2004-08-31
申请人： Hans Laan , Christian Wagner
发明人： Hans Laan , Christian Wagner
IPC分类号： G03C5/00 , G03B27/42
CPC分类号： G03F7/70666 , G03F7/70516
摘要： To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
摘要翻译：为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。操纵器的适当设置被确定为给出最大对比度值的那些。

36. 发明授权

US06950174B2 Projection exposure system for microlithography and method for generating microlithographic images 失效
标题翻译：用于微光刻的投影曝光系统和用于产生微光刻图像的方法
公开(公告)号：US06950174B2
公开(公告)日：2005-09-27
申请号：US10984161
申请日：2004-11-09
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54 , G03B27/42
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
摘要翻译：用于在高孔径处的微光刻投影曝光的方法和装置通过垂直于抗蚀剂入射平面的光的偏振来实现对比度增加。提供了影响在照明系统和还原目标中适应于偶极子照明的切向偏振或线偏振的布置。

37. 发明授权

US06822729B2 Projection exposure system for microlithography and method for generating microlithographic images 失效
标题翻译：用于微光刻的投影曝光系统和用于产生微光刻图像的方法
公开(公告)号：US06822729B2
公开(公告)日：2004-11-23
申请号：US09797961
申请日：2001-03-05
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
摘要翻译：用于在高孔径处的微光刻投影曝光的方法和装置通过垂直于抗蚀剂入射平面的光的偏振来实现对比度增加。提供了影响在照明系统和还原目标中适应于偶极子照明的切向偏振或线偏振的布置。

38. 发明授权

US09516732B2 Radiation source 有权
标题翻译：辐射源
公开(公告)号：US09516732B2
公开(公告)日：2016-12-06
申请号：US14241986
申请日：2012-07-27
申请人： Christian Wagner , Erik Roelof Loopstra
发明人： Christian Wagner , Erik Roelof Loopstra
IPC分类号： H05G2/00 , G03F7/20 , H01S3/23 , H01S3/00 , G02B27/28
CPC分类号： H05G2/008 , G02B27/283 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/0064 , H01S3/2316 , H01S3/2333 , H05G2/003 , H05G2/005
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.
摘要翻译：根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58）位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

39. 发明授权

US09296138B2 Injection-moulding machine 有权
标题翻译：注塑机
公开(公告)号：US09296138B2
公开(公告)日：2016-03-29
申请号：US13978783
申请日：2012-01-02
申请人： Stefan Schweininger , Christian Wagner
发明人： Stefan Schweininger , Christian Wagner
IPC分类号： B29C45/17 , B29C45/03 , B29C45/28
CPC分类号： B29C45/17 , B29C45/03 , B29C45/281
摘要： An injection-molding machine comprising a hot runner, arranged in a manifold, for feeding a melt into a mold, a shut-off needle for optionally closing or opening the hot runner, a piston connected to the needle, is arranged in a housing with an opening and to which a fluid can be applied from both sides, and a covering plate having two fluid feeds, into the opening wherein the covering plate, the hot runner manifold and the housing are arranged in such a way that, at a first temperature of the manifold, a distance remains between the housing and the covering plate and, at a second higher temperature the thermal expansion of the manifold and/or housing causes the housing to come into contact with the covering plate, closing the opening. In a further embodiment, a flexible seal is provided between the housing and the covering plate.
摘要翻译：一种注射成型机，包括设置在歧管中的热流道，用于将熔体输送到模具中，用于可选地关闭或打开热流道的关闭针，连接到针的活塞，布置在具有开口，并且可以从两侧施加流体，以及具有两个流体进料的盖板进入开口，其中所述盖板，热流道歧管和壳体以这样的方式布置，使得在第一温度在第二较高温度下，歧管和/或壳体的热膨胀导致壳体与盖板接触，从而封闭开口。在另一个实施例中，在壳体和覆盖板之间提供柔性密封。

40. 发明申请

US20140160453A1 RADIATION SOURCE 有权
标题翻译：辐射源
公开(公告)号：US20140160453A1
公开(公告)日：2014-06-12
申请号：US14234982
申请日：2011-12-13
申请人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
发明人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
摘要翻译：辐射源包括：喷嘴，其构造成沿着等离子体形成位置的轨迹引导燃料液滴流; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块。捕获器包括构造成容纳流体的容器; 驱动器，配置成驱动流体，使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。

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