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31. 发明授权

US08806892B2 Method of manufacturing vitreous silica crucible 有权
标题翻译：石英玻璃坩埚的制造方法
公开(公告)号：US08806892B2
公开(公告)日：2014-08-19
申请号：US13337845
申请日：2011-12-27
申请人： Toshiaki Sudo , Eriko Suzuki
发明人： Toshiaki Sudo , Eriko Suzuki
IPC分类号： C03B19/09 , C03B20/00
CPC分类号： C03B19/095 , Y02P40/57
摘要： The present invention provides a method of manufacturing a vitreous silica crucible including: a silica powder supplying process of supplying a material silica powder into a mold for molding a crucible, to form a silica powder layer, and an arc fusing process of arc fusing the silica powder layer by arc discharge generated by carbon electrodes, wherein the arc fusing process includes processes of measuring a temperature of the silica powder layer, and controlling a vitreous silica fused state based on a reference temperature which is a temperature at a local maximum point which appears first in the arc fusing process.
摘要翻译：本发明提供一种石英玻璃坩埚的制造方法，其特征在于，包括：二氧化硅粉末供给工序，将二氧化硅粉末供给到用于成型坩埚的模具中，形成二氧化硅粉末层，以及电弧熔合二氧化硅由碳电极产生的电弧放电的粉末层，其中电弧熔合工艺包括测量二氧化硅粉末层的温度和基于作为出现的局部最大点处的温度的参考温度来控制氧化硅熔融状态的过程首先在电弧定影过程中。

32. 发明申请

US20120137965A1 VITREOUS SILICA CRUCIBLE FOR PULLING SILICON SINGLE CRYSTAL 有权
标题翻译：用于拉丝硅单晶的耐腐蚀二氧化硅
公开(公告)号：US20120137965A1
公开(公告)日：2012-06-07
申请号：US13387384
申请日：2010-07-28
申请人： Toshiaki Sudo , Masaru Sato
发明人： Toshiaki Sudo , Masaru Sato
IPC分类号： C30B15/10
CPC分类号： C03B19/095 , C30B15/10 , C30B29/06 , C30B35/002 , Y02P40/57 , Y10T117/1032
摘要： There is provided a vitreous silica crucible whose strength at high temperature is high, and which allows easy taking-out from a susceptor after completion of pulling. The vitreous silica crucible 10 includes a vitreous silica outer layer 13a provided on the outer surface side of the crucible, a vitreous silica inner layer 13c provided on the inner surface side of the crucible, and an vitreous silica intermediate layer 13b provided between the vitreous silica outer layer 13a and the vitreous silica inner layer 13c. The vitreous silica outer layer 13a has a mineralizer concentration of 100 ppm or more, and the vitreous silica intermediate layer 13b and the vitreous silica inner layer 13c has a mineralizer concentration of 50 ppm or less. It is preferred that the vitreous silica outer layer 13a and the vitreous silica intermediate layer 13b are made of natural silica, and the vitreous silica inner layer 13c is made of high-purity natural silica or synthetic silica. The thickness of the vitreous silica outer layer 13a is 0.5 mm to 2.0 mm on the bottom portion 10B, and the thickness on the sidewall portion 10A of the vitreous silica outer layer 13a is larger than that on the bottom portion 10B.
摘要翻译：本发明提供一种高温高强度的石英玻璃坩埚，能够在拉伸完成后从基座容易地取出。石英玻璃坩埚10包括设置在坩埚的外表面侧的玻璃态石英外层13a，设置在坩埚的内表面侧的玻璃态二氧化硅内层13c和设置在玻璃状二氧化硅外层13a和二氧化硅内层13c。氧化硅外层13a的矿化剂浓度为100ppm以上，玻璃状二氧化硅中间层13b和玻璃状内壁层13c的矿化剂浓度为50ppm以下。玻璃状二氧化硅外层13a和玻璃态二氧化硅中间层13b优选由天然二氧化硅制成，玻璃状内壁层13c由高纯度天然二氧化硅或合成二氧化硅制成。玻璃状二氧化硅外层13a的厚度在底部10B上为0.5mm〜2.0mm，玻璃状石英外层13a的侧壁部10A的厚度大于底部10B的厚度。

33. 发明授权

US09469560B2 Method of manufacturing vitreous silica crucible, vitreous silica crucible 有权
标题翻译：玻璃石坩埚，石英玻璃坩埚的制造方法
公开(公告)号：US09469560B2
公开(公告)日：2016-10-18
申请号：US13307316
申请日：2011-11-30
申请人： Toshiaki Sudo , Takuma Yoshioka , Koichi Suzuki , Shinsuke Yamazaki
发明人： Toshiaki Sudo , Takuma Yoshioka , Koichi Suzuki , Shinsuke Yamazaki
IPC分类号： C03B19/09 , C03B19/06 , C30B11/00 , C30B15/10
CPC分类号： C03B19/095 , C03B19/066 , C30B11/002 , C30B15/10 , Y10T428/131 , Y10T428/1314 , Y10T428/1317
摘要： The present invention provides a method of manufacturing a vitreous silica crucible having a transparent layer by use of waste vitreous silica. According to the present invention, there is provided a method of manufacturing a vitreous silica crucible for manufacturing a monocrystalline or polycrystalline silicon ingot, including a process of vitrifying a silica powder sintered body having a crucible shape in the whole or part of the thickness direction by arc fusing the silica powder sintered body from the inner surface side, wherein the method further includes at least one means of (1) depressurizing the silica powder sintered body from the outer surface side during the arc fusing, and (2) forming a synthetic vitreous silica layer on the inner surface by spraying synthetic silica powder onto the inner surface of the silica powder sintered body during the arc fusing.
摘要翻译：本发明提供一种通过使用废二氧化硅二氧化硅制造具有透明层的石英玻璃坩埚的方法。根据本发明，提供了一种制造用于制造单晶硅或多晶硅锭的石英玻璃坩埚的方法，该方法包括将整个或部分厚度方向上具有坩埚形状的二氧化硅粉末烧结体玻璃化的方法，从内表面电弧熔融二氧化硅粉末烧结体，其中该方法还包括（1）在电弧熔合期间从外表面侧使二氧化硅粉末烧结体减压的至少一种方法，和（2）形成合成玻璃态通过在电弧熔合期间将合成二氧化硅粉末喷涂到二氧化硅粉末烧结体的内表面上，在内表面上形成二氧化硅层。

34. 发明授权

US09347148B2 Vitreous silica crucible with specific ratio of transparent layer and bubble-containing layer thicknesses 有权
标题翻译：玻璃硅石坩埚具有特定比例的透明层和含气泡层厚度
公开(公告)号：US09347148B2
公开(公告)日：2016-05-24
申请号：US13308250
申请日：2011-11-30
申请人： Toshiaki Sudo , Ken Kitahara , Koichi Suzuki , Shinsuke Yamazaki
发明人： Toshiaki Sudo , Ken Kitahara , Koichi Suzuki , Shinsuke Yamazaki
IPC分类号： C30B15/10
CPC分类号： C30B15/10 , Y10T117/1032
摘要： Provided is a vitreous silica crucible, which is resistant to deformation and corrosion even when heated at high temperature for a long time. There is provided a vitreous silica crucible of the present invention including a substantially cylindrical straight body portion, a curved bottom portion, and a corner portion smoothly connecting the straight body portion and the bottom portion, wherein a wall of the vitreous silica crucible includes, from an inner surface side, a transparent layer and a bubble-containing layer, and a ratio of a thickness of the bubble-containing layer with respect to a thickness of the transparent layer at an intermediate position between an upper end and a lower end of the straight body portion is 0.7 to 1.4.
摘要翻译：提供一种二氧化硅玻璃坩埚，即使长时间在高温下加热也能抵抗变形和腐蚀。提供了一种本发明的石英玻璃坩埚，其包括基本上圆柱形的直体部分，弯曲的底部部分和平滑地连接直体部分和底部部分的角部分，其中，石英坩埚坩埚的壁包括内表面侧，透明层和含气泡层，以及气泡含量层的厚度相对于透明层的厚度在上端和下端之间的中间位置的比例直体部分为0.7〜1.4。

35. 发明授权

US08281620B1 Apparatus for manufacturing vitreous silica crucible 有权
标题翻译：玻璃石坩埚制造装置
公开(公告)号：US08281620B1
公开(公告)日：2012-10-09
申请号：US13095425
申请日：2011-04-27
申请人： Toshiaki Sudo , Takeshi Fujita
发明人： Toshiaki Sudo , Takeshi Fujita
IPC分类号： C03B19/09
CPC分类号： C03B19/095 , Y02P40/57
摘要： During fabrication of a vitreous silica crucible, contamination of the vitreous silica crucible due to wear particles and debris of components of an apparatus for manufacturing a vitreous silica crucible is reduced by preventing damage and wear of the components of the apparatus due to silica fume. The apparatus for manufacturing a vitreous silica crucible is divided into a lower section for accommodating a mold and a mold driving system and an upper section for accommodating an arc electrode driving system, wherein a sectioning member including one or more communication paths for allowing penetration of arc electrodes, thereby the air flow is controlled so as to reduce exchange between gas in the upper section and gas in the lower section.
摘要翻译：在制造石英玻璃坩埚期间，通过防止二氧化硅烟雾对设备的部件造成损坏和磨损，从而降低了由于磨石颗粒和用于制造石英玻璃坩埚的装置的部件的碎屑引起的石英玻璃坩埚的污染。用于制造石英玻璃坩埚的装置被分成用于容纳模具的下部和模具驱动系统以及用于容纳弧形电极驱动系统的上部，其中，包括一个或多个连通路径以允许电弧穿透的分段部件电极，从而控制空气流，以减少上部气体与下部气体之间的交换。

36. 发明授权

US08774959B2 Method of calculating temperature distribution of crucible 有权
标题翻译：计算坩埚温度分布的方法
公开(公告)号：US08774959B2
公开(公告)日：2014-07-08
申请号：US13147736
申请日：2010-12-14
申请人： Toshiaki Sudo , Eriko Suzuki , Naoki Ono
发明人： Toshiaki Sudo , Eriko Suzuki , Naoki Ono
IPC分类号： G06F19/00 , C03B19/09 , G06F17/50 , C30B15/10
CPC分类号： C03B19/095 , C30B15/10 , G06F17/5018 , G06F2217/80
摘要： Provided is a method of calculating a temperature distribution with higher accuracy than a conventional method, which calculates a temperature distribution of an inner surface of a silica powder molded body during manufacturing based on boundary conditions corrected in accordance with the actually measured temperature in consideration of plasma radiation by arc discharge and heat radiation of arc discharge.According to a method of calculating a temperature distribution of a crucible during manufacturing, includes a temperature calculation process in which a temperature calculator calculates temperature distribution in an inner surface of a silica powder molded body through a numerical calculation method which mesh-divides an object to be calculated, by calculating heat flux from heat plasma modeled by a gas flow and radiation of heat plasma radiated from arc electrodes, wherein the temperature distribution is calculated by adjusting gas flow and radiation conditions in a way that the calculated temperature distribution and the actually measured temperature distribution of an inner surface of a silica powder molded body becomes similar, and reading, from a correspondence table, gas flow and radiation conditions corresponding each step of a control sequence for producing a crucible.
摘要翻译：提供了一种比传统方法更高精度地计算温度分布的方法，该方法基于考虑到等离子体而根据实际测量的温度校正的边界条件计算制造期间二氧化硅粉末成型体的内表面的温度分布电弧放电辐射和放电电弧放电。根据制造时的坩埚的温度分布的计算方法，包括温度计算处理，其中温度计算器通过数值计算方法计算二氧化硅粉末成形体的内表面的温度分布，通过计算由通过气流和从电弧电极辐射的热等离子体的辐射建立的热等离子体的热通量来计算，其中通过以计算的温度分布和实际测量的方式调节气体流量和辐射条件来计算温度分布二氧化硅粉末成型体的内表面的温度分布变得相似，并且从对应表读取对应于用于制造坩埚的控制顺序的每个步骤的气体流量和辐射条件。

37. 发明授权

US08689584B2 Method of manufacturing vitreous silica crucible 有权
标题翻译：石英玻璃坩埚的制造方法
公开(公告)号：US08689584B2
公开(公告)日：2014-04-08
申请号：US13337888
申请日：2011-12-27
申请人： Toshiaki Sudo , Eriko Suzuki
发明人： Toshiaki Sudo , Eriko Suzuki
IPC分类号： C03B19/09
CPC分类号： C03B19/095 , G01J5/0003 , G01J5/0044 , G01J5/047
摘要： The present invention provides a method of manufacturing a vitreous silica crucible including: a silica powder supplying process of supplying a material silica powder into a mold for molding a vitreous silica crucible, to form a silica powder layer, and an arc fusing process of arc fusing the silica powder layer by arc discharge generated by carbon electrodes, wherein the arc fusing process includes processes of measuring temperatures at measuring points provided on different heights of an inner surface of the silica powder layer while rotating the mold, and controlling the arc discharge to enable detection, at each measuring point, of a local maximum point which appears first in the arc fusing process.
摘要翻译：本发明提供一种石英玻璃坩埚的制造方法，其特征在于，包括：二氧化硅粉末供给工序，其将二氧化硅粉末供给到用于成型二氧化硅玻璃坩埚的模具中，形成二氧化硅粉末层，以及电弧熔合电弧熔合工艺所述二氧化硅粉末层由碳电极产生的电弧放电，其中所述电弧定影处理包括在旋转所述模具的同时测量在所述二氧化硅粉末层的内表面的不同高度上设置的测量点处的温度，并且控制所述电弧放电以使得能够在每个测量点检测首先出现在电弧定影过程中的局部最大点。

38. 发明授权

US08671716B2 Method of manufacturing vitreous silica crucible 有权
标题翻译：石英玻璃坩埚的制造方法
公开(公告)号：US08671716B2
公开(公告)日：2014-03-18
申请号：US13308328
申请日：2011-11-30
申请人： Toshiaki Sudo , Takuma Yoshioka
发明人： Toshiaki Sudo , Takuma Yoshioka
IPC分类号： C03B19/09
CPC分类号： C03B19/095 , Y02P40/57
摘要： There is provided a method of manufacturing a vitreous silica crucible having non-bubbles on the inner surface without necessitating new apparatuses for grinding and polishing and without damaging the productivity. According to the present invention, there is provided a method of manufacturing a vitreous silica crucible including the processes of: gathering a vitreous silica layer containing residual bubbles existing in a near-surface region of the transparent layer of the vitreous silica crucible by controlling the number of rotations applied to the vitreous silica crucible in a state that an inner surface side of the vitreous silica crucible is fused by arc heating; and moving a portion of a non-bubble layer in the surface of the transparent layer exposed by movement of the residual bubble-containing layer to cover a region in which bubbles have gathered with the non-bubble layer.
摘要翻译：提供了一种在内表面上制造具有非气泡的玻璃状石英坩埚的方法，而不需要用于研磨和抛光的新装置，而不损害生产率。根据本发明，提供一种石英玻璃坩埚的制造方法，其特征在于，包括以下工序：通过控制所述玻璃状石英玻璃坩埚的透明层的近表面区域而含有存在残留气泡的玻璃状石英层在通过电弧加热使石英玻璃坩埚的内表面侧熔融的状态下施加到石英玻璃坩埚上的旋转; 以及通过残留的含气泡层的移动而暴露在透明层的表面中的非气泡层的一部分，以覆盖气泡已经与非气泡层聚集的区域。

39. 发明授权

US09266763B2 Composite crucible and method of manufacturing the same 有权
标题翻译：复合坩埚及其制造方法
公开(公告)号：US09266763B2
公开(公告)日：2016-02-23
申请号：US13335778
申请日：2011-12-22
申请人： Toshiaki Sudo , Ken Kitahara , Takuma Yoshioka
发明人： Toshiaki Sudo , Ken Kitahara , Takuma Yoshioka
IPC分类号： C03B19/06 , C03B19/09 , C30B15/10 , C30B29/06 , C30B35/00
CPC分类号： C03B19/095 , C30B15/10 , C30B29/06 , C30B35/002 , Y02P40/57 , Y10T117/10
摘要： The purpose of the present invention is to provide a crucible which has high viscosity at high temperature, can be used for a long time, and can be manufactured at low cost, and a method of manufacturing the crucible. The present invention provides a composite crucible including a vitreous silica crucible body having a sidewall portion and a bottom portion, and a reinforcement layer provided on an outer surface side of an upper end portion of the vitreous silica crucible body, wherein the reinforcement layer is made of mullite material whose main component is alumina and silica.
摘要翻译：本发明的目的是提供一种在高温下具有高粘度的坩埚，可以长时间使用并且可以低成本地制造的坩埚以及坩埚的制造方法。本发明提供一种复合坩埚，其包括具有侧壁部和底部的玻璃状石英坩埚体，以及设置在所述玻璃状石英坩埚主体的上端部的外表面侧的加强层，其中，形成所述加强层主要成分为氧化铝和二氧化硅的莫来石材料。

40. 发明授权

US09187357B2 Vitreous silica crucible having outer, intermediate, and inner layers 有权
标题翻译：具有外层，中层和内层的玻璃硅石坩埚
公开(公告)号：US09187357B2
公开(公告)日：2015-11-17
申请号：US13387384
申请日：2010-07-28
申请人： Toshiaki Sudo , Masaru Sato
发明人： Toshiaki Sudo , Masaru Sato
IPC分类号： C30B15/10 , C03B19/09 , C30B29/06 , C30B35/00
CPC分类号： C03B19/095 , C30B15/10 , C30B29/06 , C30B35/002 , Y02P40/57 , Y10T117/1032
摘要： A vitreous silica crucible has high strength at high temperature, and allows easy taking-out from a susceptor after completion of pulling. The vitreous silica crucible includes a vitreous silica outer layer provided on the outer surface side of the crucible, a vitreous silica inner layer provided on the inner surface side of the crucible, and an vitreous silica intermediate layer provided between the vitreous silica outer layer and the vitreous silica inner layer. The vitreous silica outer layer has a mineralizer concentration of 100 ppm or more, and the vitreous silica intermediate layer and the vitreous silica inner layer has a mineralizer concentration of 50 ppm or less. The thickness of the vitreous silica outer layer is 0.5 mm to 2.0 mm on the bottom portion, and the thickness on the sidewall portion of the vitreous silica outer layer is larger than that on the bottom portion.
摘要翻译：石英玻璃坩埚在高温下具有高强度，并且在拉伸完成之后容易从基座中取出。石英玻璃坩埚包括设置在坩埚的外表面侧的玻璃态石英外层，设置在坩埚的内表面侧的玻璃态二氧化硅内层和设置在玻璃状石英外层与玻璃状石英外层之间的玻璃态二氧化硅中间层，玻璃体二氧化硅内层。氧化硅玻璃外层的矿化剂浓度为100ppm以上，玻璃状二氧化硅中间层和玻璃状二氧化硅内层的矿化剂浓度为50ppm以下。玻璃体外层的厚度在底部为0.5mm〜2.0mm，玻璃状二氧化硅外层的侧壁部的厚度大于底部的厚度。

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