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31. 发明授权

US06660445B2 Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound 有权
标题翻译：包含乙烯基共聚物和邻萘醌二叠氮化合物的感光组合物
公开(公告)号：US06660445B2
公开(公告)日：2003-12-09
申请号：US09970988
申请日：2001-10-05
申请人： Kazuo Fujita , Shiro Tan
发明人： Kazuo Fujita , Shiro Tan
IPC分类号： G03F7023
CPC分类号： G03F7/0233
摘要： The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.
摘要翻译：本发明涉及包含不溶于水并可溶于碱性水溶液和邻萘醌二叠氮化合物的乙烯基聚合物化合物的光敏化合物，其中所述乙烯基聚合物化合物是包含至少一种衍生自单体化合物的单体单元的共聚物（ A）：具有本说明书中定义的通式（I），（II）或（III）表示的碱溶性基团的化合物和至少一种衍生自单体化合物（B）的单体单元：（甲基）丙烯酸酯具有聚（氧化烯）链。由具有本发明的感光性化合物的感光层的预感板制备的平版印刷版显示耐磨性，印刷耐久性，耐化学性，显影宽容性和污染性的提高。

32. 发明授权

US06517987B2 Positive-working presensitized plate useful for preparing a lithographic printing plate 失效
标题翻译：用于制备平版印刷版的正性工作预敏板
公开(公告)号：US06517987B2
公开(公告)日：2003-02-11
申请号：US09811425
申请日：2001-03-20
申请人： Kazuo Fujita , Shiro Tan , Akira Nagashima
发明人： Kazuo Fujita , Shiro Tan , Akira Nagashima
IPC分类号： G03F7023
CPC分类号： G03F7/022 , G03F7/023 , G03F7/0233
摘要： The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at least one ester of 1,2-naphthoquinone-2-diazide-5-sulfonic acid, at least one ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid, and at least one polymer which is insoluble in water and soluble in an aqueous alkaline solution and which comprises at least one group or bond selected from sulfonamide group, urea bond or urethane bond. A lithographic printing plate prepared from the presensitized plate of the present invention shows improvement of chemical-resistance and printing durability, and good sensitivity, coupling property, adaptability to ball-point pen, shelf stability, and stability of sensitivity with time after exposure.
摘要翻译：本发明涉及一种用于制备平版印刷版的正极工作预敏板，其包含正性光敏组合物，其包含至少一种1,2-萘醌-2-重氮化物-5-磺酸酯，至少一种酯的1,2-萘醌-2-二叠氮-4-磺酸，以及至少一种不溶于水并可溶于碱性水溶液的聚合物，其包含至少一个选自磺酰胺基，脲键或氨基甲酸酯键。由本发明的预敏板制备的平版印刷版显示出耐化学性和印刷耐久性的改善，以及良好的灵敏度，偶联性，圆珠笔的适应性，储存稳定性以及曝光后随时间的灵敏度的稳定性。

33. 发明授权

US5948587A Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US5948587A
公开(公告)日：1999-09-07
申请号：US713997
申请日：1996-09-19
申请人： Yasumasa Kawabe , Shiro Tan
发明人： Yasumasa Kawabe , Shiro Tan
IPC分类号： G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0236
摘要： Provided is a positive working photoresist composition comprising (A) an alkali-soluble novolak resin obtained by condensation reaction of a mixture of phenols, which are constituted of specified proportions of m-cresol and two kinds of specific phenols, with an aldehyde and having a Mw/Mn ratio of from 1.5 to 4.0 (wherein Mw stands for a weight-average molecular weight, and Mn stands for a number-average molecular weight); (B) a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid ester as a photosensitive material; and (C) a low molecular weight compound having from 12 to 50 carbon atoms per molecule and from 2 to 8 phenolic hydroxy groups per molecule.
摘要翻译：提供一种正性光致抗蚀剂组合物，其包含（A）通过由特定比例的间甲酚和两种特定酚构成的酚的混合物与醛缩合反应得到的碱溶性酚醛清漆树脂，并且具有 Mw / Mn比为1.5〜4.0（Mw表示重均分子量，Mn表示数均分子量）。（B）作为感光材料的1,2-萘醌二叠氮化物-5-（和/或-4-）磺酸酯; 和（C）每分子具有12至50个碳原子且每分子具有2至8个酚羟基的低分子量化合物。

34. 发明授权

US5652081A Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US5652081A
公开(公告)日：1997-07-29
申请号：US708676
申请日：1996-09-05
申请人： Shiro Tan , Shinji Sakaguchi , Yasumasa Kawabe
发明人： Shiro Tan , Shinji Sakaguchi , Yasumasa Kawabe
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： Provided is a positive working photoresist composition which comprises an alkali-soluble resin and a 1,2-quinonediazide compound, with the resin being a novolak resin obtained by the condensation reaction of monomers comprising specified phenol compounds with formaldehyde.
摘要翻译：提供了一种正性光致抗蚀剂组合物，其包含碱溶性树脂和1,2-醌二叠氮化合物，该树脂是通过使特定的酚化合物与甲醛的单体的缩合反应获得的酚醛清漆树脂。

35. 发明授权

US5576139A Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst 失效
标题翻译：正型光致抗蚀剂组合物，其包含用二氧化硅 - 氧化镁固体催化剂制备的酚醛清漆树脂
公开(公告)号：US5576139A
公开(公告)日：1996-11-19
申请号：US783346
申请日：1991-10-28
申请人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： C08G8/08 , C08L61/04 , C08L61/06 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： C08G8/08 , G03F7/022 , G03F7/0236
摘要： A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the presence of a silica-magnesia solid catalyst and a light-sensitive material containing 1,2-naphthoquinone-diazido-5-(and/or -4-) sulfonate as main component.
摘要翻译：提供了一种新型的正型光致抗蚀剂组合物，其包含通过在二氧化硅 - 氧化镁固体催化剂和含有1,2-萘醌的固体催化剂存在下缩合取代或未取代的酚和醛而获得的碱溶性酚醛清漆树脂，重氮基-5-（和/或-4-）磺酸盐为主要成分。

36. 发明授权

US5340686A Positive-type photoresist composition 失效
标题翻译：正型光致抗蚀剂组合物
公开(公告)号：US5340686A
公开(公告)日：1994-08-23
申请号：US173924
申请日：1993-12-28
申请人： Shinji Sakaguchi , Shiro Tan , Tadayoshi Kokubo
发明人： Shinji Sakaguchi , Shiro Tan , Tadayoshi Kokubo
IPC分类号： G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30 , G03F7/30
CPC分类号： G03F7/0226 , G03F7/0236
摘要： A positive-type photoresist composition is described as including:(1) an alkali-soluble phenol novolak having a degree of dispersion of from 1.5 to 4.0;(2) a 1,2-quinone diazide compound; and(3) from 2 to 30% by weight, based on the above-mentioned novolak, of a low molecular weight compound having a total of from 12 to 50 carbon atoms per molecule and 2 to 8 phenolic hydroxyl groups per molecule. The degree of dispersion is determined from a weight-average molecular weight of the novolak and a number-average molecular weight of the novolak, both the weight-average and number-average molecular weights being obtained by gel penetration chromatography (GPC) defined by using standard polystyrene as a reference, such that the degree of dispersion is a ratio of the weight-average molecular weight to the number average molecular weight.The positive-type photoresist composition of the present invention is excellent in development latitude and has a high sensitivity and a high resolving power. Thus, it is suitable for use in, for example, the production of semiconductors such as integrated circuits, the production of circuit substrates for thermal heads, and photofabrication processes.
摘要翻译：正型光致抗蚀剂组合物包括：（1）分散度为1.5〜4.0的碱溶性酚醛清漆; （2）1,2-醌二叠氮化合物; 和（3）基于上述酚醛清漆的2至30重量％的每分子具有总共12至50个碳原子的低分子量化合物和每分子2至8个酚羟基。分散度由酚醛清漆的重均分子量和酚醛清漆的数均分子量确定，通过使用通过凝胶渗透色谱法（GPC）得到的重均分子量和数均分子量均为标准聚苯乙烯作为参考，使得分散度是重均分子量与数均分子量的比率。本发明的正型光致抗蚀剂组合物的显影宽度优良，灵敏度高，分辨率高。因此，适用于例如集成电路等半导体的制造，热敏头的电路基板的制造以及光制造工序。

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