专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5652081A Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US5652081A
公开(公告)日：1997-07-29
申请号：US708676
申请日：1996-09-05
申请人： Shiro Tan , Shinji Sakaguchi , Yasumasa Kawabe
发明人： Shiro Tan , Shinji Sakaguchi , Yasumasa Kawabe
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： Provided is a positive working photoresist composition which comprises an alkali-soluble resin and a 1,2-quinonediazide compound, with the resin being a novolak resin obtained by the condensation reaction of monomers comprising specified phenol compounds with formaldehyde.
摘要翻译：提供了一种正性光致抗蚀剂组合物，其包含碱溶性树脂和1,2-醌二叠氮化合物，该树脂是通过使特定的酚化合物与甲醛的单体的缩合反应获得的酚醛清漆树脂。

2. 发明授权

US5674657A Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers 失效
标题翻译：包含由四种酚类单体制成的碱溶性酚醛清漆树脂的正性光致抗蚀剂组合物
公开(公告)号：US5674657A
公开(公告)日：1997-10-07
申请号：US743592
申请日：1996-11-04
申请人： Shiro Tan , Yasumasa Kawabe , Kenji Honda
发明人： Shiro Tan , Yasumasa Kawabe , Kenji Honda
IPC分类号： C08L61/06 , G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0236 , G03F7/022
摘要： The invention is directed to an alkali-soluble novolak binder resin composition made by addition condensation reaction of a phenolic mixture with at least one aldehyde source, the feedstock of said phenolic mixture for the reaction comprising about 33 to about 83 mole percent of meta-cresol; about 1 to about 4 mole percent of para-cresol; about 10 to about 60 mole percent of a phenolic monomer selected from the group consisting of 2,3-xylenol, 3,4-xylenol, 3,5-xylenol and mixtures thereof; and about 5 to about 55 mole percent of a methoxy phenol monomer, the amount of aldehyde source being from about 40 to about 200 percent of the stoichiometric amount needed to react with all of the phenolic moieties in said phenolic mixture, and the alkali-soluble novolak binder resin having a weight average molecular weight (M.sub.w) of about 3,000 to about 20,000 with a molecular weight polydispersity (M.sub.w /M.sub.n) of 1.5-4.0. The invention is also directed to a positive working photoresist made from the composition.
摘要翻译：本发明涉及通过酚类混合物与至少一种醛源的加成缩合反应制备的碱溶性酚醛清漆粘合剂树脂组合物，所述用于反应的酚类混合物的原料包含约33-约83摩尔％的间甲酚 ; 约1至约4摩尔％的对 - 甲酚; 约10至约60摩尔％的选自2,3-二甲苯酚，3,4-二甲苯酚，3,5-二甲苯酚及其混合物的酚单体; 和约5至约55摩尔％的甲氧基酚单体，醛源的量为所述酚类混合物中所有酚部分反应所需化学计量的约40至约200％，碱溶性酚醛清漆粘合剂树脂，重均分子量（Mw）约为3,000至约20,000，分子量多分散性（Mw / Mn）为1.5-4.0。本发明还涉及由该组合物制成的正性工作光致抗蚀剂。

3. 发明授权

US5948587A Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US5948587A
公开(公告)日：1999-09-07
申请号：US713997
申请日：1996-09-19
申请人： Yasumasa Kawabe , Shiro Tan
发明人： Yasumasa Kawabe , Shiro Tan
IPC分类号： G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0236
摘要： Provided is a positive working photoresist composition comprising (A) an alkali-soluble novolak resin obtained by condensation reaction of a mixture of phenols, which are constituted of specified proportions of m-cresol and two kinds of specific phenols, with an aldehyde and having a Mw/Mn ratio of from 1.5 to 4.0 (wherein Mw stands for a weight-average molecular weight, and Mn stands for a number-average molecular weight); (B) a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid ester as a photosensitive material; and (C) a low molecular weight compound having from 12 to 50 carbon atoms per molecule and from 2 to 8 phenolic hydroxy groups per molecule.
摘要翻译：提供一种正性光致抗蚀剂组合物，其包含（A）通过由特定比例的间甲酚和两种特定酚构成的酚的混合物与醛缩合反应得到的碱溶性酚醛清漆树脂，并且具有 Mw / Mn比为1.5〜4.0（Mw表示重均分子量，Mn表示数均分子量）。（B）作为感光材料的1,2-萘醌二叠氮化物-5-（和/或-4-）磺酸酯; 和（C）每分子具有12至50个碳原子且每分子具有2至8个酚羟基的低分子量化合物。

4. 发明授权

US5576139A Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst 失效
标题翻译：正型光致抗蚀剂组合物，其包含用二氧化硅 - 氧化镁固体催化剂制备的酚醛清漆树脂
公开(公告)号：US5576139A
公开(公告)日：1996-11-19
申请号：US783346
申请日：1991-10-28
申请人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Kazuya Uenishi , Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： C08G8/08 , C08L61/04 , C08L61/06 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： C08G8/08 , G03F7/022 , G03F7/0236
摘要： A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the presence of a silica-magnesia solid catalyst and a light-sensitive material containing 1,2-naphthoquinone-diazido-5-(and/or -4-) sulfonate as main component.
摘要翻译：提供了一种新型的正型光致抗蚀剂组合物，其包含通过在二氧化硅 - 氧化镁固体催化剂和含有1,2-萘醌的固体催化剂存在下缩合取代或未取代的酚和醛而获得的碱溶性酚醛清漆树脂，重氮基-5-（和/或-4-）磺酸盐为主要成分。

5. 发明授权

US5709977A Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US5709977A
公开(公告)日：1998-01-20
申请号：US677143
申请日：1996-07-09
申请人： Shiro Tan , Yasumasa Kawabe
发明人： Shiro Tan , Yasumasa Kawabe
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： Provided is a positive working photoresist composition which comprises a 1,2-quinonediazide compound and an alkali-soluble resin obtained by condensing a specified phenol compound, formaldehyde and a specified aromatic aldehyde having at least one alkoxy substituent and at least one hydroxy substituent.
摘要翻译：提供一种正性光致抗蚀剂组合物，其包含1,2-醌二叠氮化合物和通过使特定的酚化合物，甲醛和具有至少一个烷氧基取代基的特定芳香醛和至少一个羟基取代基缩合而获得的碱溶性树脂。

6. 发明授权

US5429905A Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound 失效
标题翻译：含有多羟基化合物的萘醌二叠氮磺酸酯的正性光刻胶组合物
公开(公告)号：US5429905A
公开(公告)日：1995-07-04
申请号：US227011
申请日：1994-04-13
申请人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： The present invention relates to a positive-working photoresist composition comprising at least one of the 1,2-naphthoquinonediazido-5- sulfonic acid ester of a polyhydroxy compound represented by formula (1) and the 1,2-naphthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound represented by formula (1): ##STR1## wherein R represents a hydrogen atom, a hydroxy group, a halogen atom, a nitro group, an alkyl group having from 1 to 6 carbon atoms, an aryl group, or an alkenyl group; and R.sub.1 to R.sub.15, which may be the same or different, each represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group, or a substituted or unsubstituted cycloalkyl group, with the proviso that at least one of R.sub.1 to R.sub.15 is a substituted or unsubstituted cycloalkyl group.
摘要翻译：本发明涉及一种正性光致抗蚀剂组合物，其包含由式（1）表示的多羟基化合物的1,2-萘醌二叠氮基-5-磺酸酯和1,2-萘醌二叠氮基-4-磺酸中的至少一种由式（1）表示的多羟基化合物的酯：其中R表示氢原子，羟基，卤素原子，硝基，具有1至6个碳原子的烷基，芳基基团或烯基; R 1〜R 15可以相同或不同，表示氢原子，羟基，卤素原子，碳原子数1〜6的烷基，烷氧基或取代或未取代的环烷基，条件是R 1至R 15中的至少一个是取代或未取代的环烷基。

7. 发明授权

US5620828A Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator 失效
标题翻译：含有醌二叠氮化物酯化产物，酚醛清漆树脂和聚羟基碱溶解促进剂的正性光致抗蚀剂组合物
公开(公告)号：US5620828A
公开(公告)日：1997-04-15
申请号：US579410
申请日：1995-12-27
申请人： Shiro Tan , Yasumasa Kawabe
发明人： Shiro Tan , Yasumasa Kawabe
IPC分类号： G03F7/004 , G03F7/023 , H01L21/027
CPC分类号： G03F7/0236
摘要： A positive photoresist composition is disclosed, which comprises prescribed amounts of an alkali-soluble novolak resin which is obtained from prescribed amounts of m- and p-cresols and at least one xylenol selected from 2,3-, 3,4- and 3,5-xylenols and an aldehyde, a 1,2-quinonediazide compound which is an esterified product of a polyhydroxy compound having from 3 to 7 phenolic hydroxyl groups in the molecule with 1,2-naphthoquinonediazido-5(and/or 4)-sulfonyl chloride(s) and an alkali dissolution accelerator which is a polyhydroxy compound having a molecular weight of 1,000 or less and from 2 to 7 phenolic hydroxyl groups in the molecule.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含规定量的由规定量的间甲酚和对甲酚获得的碱溶性酚醛清漆树脂和至少一种选自2,3-，3,4-和3的二甲苯酚， 5-二甲苯酚和醛，1,2-醌二叠氮化合物，其是分子中具有3-7个酚羟基的多羟基化合物与1,2-萘醌二叠氮基-5（和/或4） - 磺酰基的酯化产物氯化物和碱溶解促进剂，其为分子中分子量为1,000以下且为2〜7个酚羟基的多羟基化合物。

8. 发明授权

US5494773A Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group 失效
标题翻译：正型光致抗蚀剂组合物，其包含具有环亚烷基 - 双酚基团的酚醛清漆树脂
公开(公告)号：US5494773A
公开(公告)日：1996-02-27
申请号：US399046
申请日：1995-03-06
申请人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
发明人： Shiro Tan , Yasumasa Kawabe , Tadayoshi Kokubo
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/0236
摘要： A positive photoresist composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound is described, wherein the alkali-soluble novolak resin contains a novolak resin to be obtained by condensing a mixture of (a) at least one phenol represented by the following formula (1) and at least one compound represented by the following formula (2) and (b) at least one aldehyde: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group or an arylcarbonyl group; R.sub.4, R.sub.5, R.sub.6 and R.sub.7 are the same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkenyl group, an aryl group or an aralkyl group; and n represents an integer of from 4 to 7.
摘要翻译：描述了包含碱溶性酚醛清漆树脂和1,2-醌二叠氮化合物的正型光致抗蚀剂组合物，其中碱溶性酚醛清漆树脂含有酚醛清漆树脂，其通过将（a）至少一种由（1）和至少一种由下式（2）和（b）表示的化合物至少一种醛：其中R 1，R 2和R 3相同或不同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基，烯基，芳基，芳烷基，烷氧基羰基或芳基羰基; R4，R5，R6和R7相同或不同，各自表示氢原子，羟基，卤素原子，烷基，环烷基，烷氧基，烯基，芳基或芳烷基 ; n表示4〜7的整数。

9. 发明授权

US5324618A Positive type quinonediazide photoresist composition containing select tetraphenolic additive 失效
标题翻译：含有选择性四酚类添加剂的正型醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5324618A
公开(公告)日：1994-06-28
申请号：US985259
申请日：1992-12-03
申请人： Yasumasa Kawabe , Shiro Tan , Tadayoshi Kokubo
发明人： Yasumasa Kawabe , Shiro Tan , Tadayoshi Kokubo
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226
摘要： Disclosed is a positive type photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a compound represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 which may be the same or different and in which four groups for each group may be different from each other at the same time, each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, a nitro group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, an aryloxy group or an aralkoxy group; a, b, d and e each represents 0 or an integer 1 to 3; and c represents 0 or 1, with the proviso that a, b, c, d and e satisfy the relationship (a+b+c+d+e.gtoreq.2), at least one of a and d is 1 or more and at least one of b and e is 1 or more.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和由以下通式（I）表示的化合物：其中R 1，R 2，R 3和R 4可以相同或者不同，并且每个基团的四个基团可以同时彼此不同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基，硝基，烯基芳基，芳烷基，烷氧基羰基，芳基羰基，酰氧基，酰基，芳氧基或芳烷氧基; a，b，d和e各自表示0或整数1〜3; 并且c表示0或1，条件是a，b，c，d和e满足关系式（a + b + c + d + e> / = 2），a和d中的至少一个为1或更大 b和e中的至少一个为1以上。

10. 发明授权

US5318875A Positive quinonediazide photoresist composition containing select hydroxyphenol additive 失效
标题翻译：含有选择性羟基苯酚添加剂的正醌二叠氮化物光致抗蚀剂组合物
公开(公告)号：US5318875A
公开(公告)日：1994-06-07
申请号：US15921
申请日：1993-02-10
申请人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
发明人： Yasumasa Kawabe , Toshiaki Aoai , Tadayoshi Kokubo , Shiro Tan
IPC分类号： C07C45/46 , G03F7/022 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0226 , C07C45/46 , G03F7/022
摘要： A positive photoresist composition includes an alkali-soluble resin, a quinonediazide compound and a compound selected from the group consisting of compounds represented by formulae (I), (II) and (III): ##STR1## wherein R.sub.1 to R.sub.27, which may be the same or different, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group, nitro group, alkenyl group, aryl group, aralkyl group, alkoxycarbonyl group, arylcarbonyl group, acyloxy group, acyl group, aryloxy group or aralkoxy group; ##STR2## wherein R.sub.31 represents an organic group, single bond, ##STR3## R.sub.32 represents a hydrogen atom, monovalent organic group or ##STR4## R.sub.33 to R.sub.37, which may be the same or different, and in which not all four groups for each of R.sub.33 to R.sub.37 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group, with the proviso that at least one of R.sub.33 to R.sub.35 is a hydroxyl group; X represents a divalent organic group; and m represents an integer 0 or 1; ##STR5## wherein R.sub.41 to R.sub.44, which may be the same or different and in which not all four groups for each of R.sub.41 to R.sub.44 may be the same at the same time, each represents a hydrogen atom, hydroxyl group, halogen atom, alkyl group, alkoxy group or alkenyl group; R.sub.45 and R.sub.46 each represents a hydrogen atom, alkyl group or ##STR6## a and c each represents an integer 0 or 1; and b represents an integer from 1 to 4.
摘要翻译：正型光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物和选自由式（I），（II）和（III）表示的化合物的化合物：其中R 1至R 27，可以相同或不同，分别表示氢原子，羟基，卤素原子，烷基，烷氧基，硝基，烯基，芳基，芳烷基，烷氧基羰基，芳基羰基，酰氧基，酰基，芳氧基或芳烷氧基; （II）其中R31表示有机基团，单键，R32表示氢原子，一价有机基团或R33至R37，其可以相同或不同，并且其中并不全部为四 R 33〜R 37各自可以相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基，条件是R 33〜R 35中的至少一个为羟基; X表示二价有机基团; m表示0或1的整数; （III）其中R41〜R44可以相同或不同，并且其中R41至R44中的每一个不是全部四个基团可以同时相同，各自表示氢原子，羟基，卤素原子，烷基，烷氧基或烯基; R 45和R 46各自表示氢原子，烷基或者a和c各自表示0或1的整数; b表示1〜4的整数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式