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31. 外观设计

USD649126S1 Vacuum contact pad 有权
标题翻译：真空接触垫
公开(公告)号：USD649126S1
公开(公告)日：2011-11-22
申请号：US29334787
申请日：2009-04-01
申请人： Tamami Takahashi
设计人： Tamami Takahashi

32. 发明授权

US06889730B2 Hydraulic drive system 失效
标题翻译：液压驱动系统
公开(公告)号：US06889730B2
公开(公告)日：2005-05-10
申请号：US10467803
申请日：2001-02-13
申请人： Masao Shinoda , Shimpei Miyakawa , Chishiro Yamashina , Tamami Takahashi , Yoshihiro Mochizuki , Shinzo Mammoto , Shiro Kumazawa , Ryuji Kodama
发明人： Masao Shinoda , Shimpei Miyakawa , Chishiro Yamashina , Tamami Takahashi , Yoshihiro Mochizuki , Shinzo Mammoto , Shiro Kumazawa , Ryuji Kodama
IPC分类号： F15B1/26 , F15B21/04 , F15B21/06 , B65B1/04
CPC分类号： F15B21/06 , A23L3/00 , F15B1/26 , F15B21/041
摘要： A hydraulic drive system that does not cause a decrease in efficiency of actuators, does not hinder an optimal action of devices such as flow adjustment valves, and does not cause any corrosion of water acting as an operating fluid. The system uses water as an operating fluid. The system includes a hydraulic generation apparatus 40 including, a main tank 41, a return path 52, an accessory tank 54, and a water disposal apparatus 56 disposed in a path 57. The operating fluid from structuring devices of the processing apparatuses 10, 20 and 30 flows through the return path 52. The operating fluid flows from the accessory tank 54 to the main tank 41 through the path 57 and the water disposal apparatus 56.
摘要翻译：不会导致执行器的效率降低的液压驱动系统不妨碍诸如流量调节阀的装置的最佳作用，并且不会对作为工作流体的水造成任何腐蚀。该系统使用水作为工作流体。该系统包括液压发生装置40，其包括设置在路径57中的主箱41，返回路径52，附件箱54和水处理装置56。来自处理装置10,20和30的构造装置的工作流体流过返回路径52。工作流体通过路径57和水处理装置56从辅助箱54流向主箱41。

33. 发明授权

US06659121B1 Solenoid and hydraulic control valve 失效
标题翻译：电磁阀和液压控制阀
公开(公告)号：US06659121B1
公开(公告)日：2003-12-09
申请号：US10069998
申请日：2002-03-01
申请人： Tamami Takahashi , Chishiro Yamashina
发明人： Tamami Takahashi , Chishiro Yamashina
IPC分类号： F15B13044
CPC分类号： F16K31/0689 , F16K31/0613 , Y10T137/4245 , Y10T137/8013 , Y10T137/86622
摘要： A solenoid has a cylindrical excitation coil and a plunger movable in the excitation coil and generates electromagnetic force to move the plunger when an electric current is supplied to the excitation coil. A cover for closing a side of a plunger compartment accommodating the plunger is provided with upper and lower through-holes communicatively extending through the cover from the outside of the solenoid to the plunger compartment. The uppermost part of the upper through-hole is above or level with the uppermost part of the plunger compartment. The lowermost part of the lower through-hole is below or level with the lowermost part of the plunger compartment.
摘要翻译：螺线管具有圆柱形激励线圈和可在励磁线圈中移动的柱塞，并且当向励磁线圈提供电流时产生电磁力以移动柱塞。用于封闭容纳柱塞的柱塞室的一侧的盖设置有从螺线管的外部到柱塞隔室通过盖连通地延伸的上通孔和下通孔。上通孔的最上部分位于柱塞隔室的最上部或上方。下部通孔的最下部分位于柱塞隔室的最下部或下方。

34. 发明授权

US5704827A Polishing apparatus including cloth cartridge connected to turntable 失效
标题翻译：抛光设备包括连接到转盘的布料盒
公开(公告)号：US5704827A
公开(公告)日：1998-01-06
申请号：US544534
申请日：1995-10-18
申请人： Toyomi Nishi , Manabu Tsujimura , Tamami Takahashi , Hiromi Yajima , Riichiro Aoki , Yukio Imoto , Shoichi Kodama , Kazuaki Himukai , Gisuke Kouno , Takanobu Nishimura
发明人： Toyomi Nishi , Manabu Tsujimura , Tamami Takahashi , Hiromi Yajima , Riichiro Aoki , Yukio Imoto , Shoichi Kodama , Kazuaki Himukai , Gisuke Kouno , Takanobu Nishimura
IPC分类号： B24B37/20 , B24B37/24 , H01L21/304 , B24B5/00
CPC分类号： B24B37/12
摘要： A polishing apparatus includes a detachable light weight cloth cartridge which shows little deformation under uneven loading during a polishing operation. Either mechanical or non-mechanical fixation of the cloth cartridge to a turntable is achieved. Mechanical fixation involves attaching the cloth cartridge to the turntable at peripheral and center sections of the cloth cartridge. Non-mechanical fixation involves attaching the cloth cartridge to the turntable by a vacuum arrangement. The assembly of the cloth cartridge and the turntable not only produces excellent flatness on polished semiconductor wafers by maintaining a level polishing surface, but also improves the production yield by preventing breakage of wafers during the polishing process.
摘要翻译：抛光装置包括可拆卸轻量布料筒，其在抛光操作期间在不均匀载荷下几乎不变形。实现了布料盒到转台的机械或非机械固定。机械固定包括将布料盒连接到布料盒周边和中心部分的转台上。非机械固定包括通过真空装置将布料盒附接到转台上。布料盒和转盘的组装不仅通过保持抛光表面而在抛光的半导体晶片上产生优异的平整度，而且还通过防止抛光过程中的晶片破损而提高了生产率。

35. 发明申请

US20120061309A1 SEAWATER DESALINATION SYSTEM AND ENERGY EXCHANGE CHAMBER 有权
标题翻译：海水淡化系统和能源交换室
公开(公告)号：US20120061309A1
公开(公告)日：2012-03-15
申请号：US13320351
申请日：2010-05-17
申请人： Tamami Takahashi , Masao Shinoda , Masato Eguchi , Masanori Goto
发明人： Tamami Takahashi , Masao Shinoda , Masato Eguchi , Masanori Goto
IPC分类号： B01D61/06 , C02F1/44 , B01D61/02
CPC分类号： B01D61/06 , B01D61/025 , B01D61/08 , B01D61/10 , B01D63/02 , B01D2313/246 , C02F1/441 , C02F2201/004 , C02F2303/10 , Y02A20/131 , Y02W10/30
摘要： A seawater desalination system which can solve a problem of wear of a sliding member and can suppress mixing of concentrated seawater and seawater by making an energy exchange chamber no-piston configuration is provided.In a seawater desalination system for producing fresh water from seawater by passing the seawater pressurized by a pump through a reverse-osmosis membrane-separation apparatus (4) to separate the seawater into fresh water and concentrated seawater, an energy exchange chamber (20) for utilizing pressure energy of the concentrated seawater discharged from the reverse-osmosis membrane-separation apparatus (3) as energy for pressurizing part of the seawater is provided. The energy exchange chamber includes a concentrated seawater port (P1) for introducing and discharging the concentrated seawater, a seawater port (P2) for introducing and discharging the seawater, and a plurality of partitioned fluid passages (R) provided in the chamber to allow the concentrated seawater port (P1) and the seawater port (P2) to communicate with each other.
摘要翻译：能够解决滑动构件的磨损问题的海水淡化系统，能够通过制造能量交换室无活塞构造来抑制浓缩海水和海水的混合。在通过使由泵加压的海水通过反渗透膜分离装置（4）将海水分离成淡水和浓缩海水的用于从海水生产淡水的海水淡化系统中，用于利用从反渗透膜分离装置（3）排出的浓缩海水的压力能作为对海水的一部分加压的能量。能量交换室包括用于引入和排出浓缩海水的集中海水口（P1），用于引入和排出海水的海水口（P2）和设置在室中的多个分隔流体通道（R），以允许集中海水口（P1）和海水口（P2）相互通信。

36. 发明授权

US5846335A Method for cleaning workpiece 失效
标题翻译：清洁工件的方法
公开(公告)号：US5846335A
公开(公告)日：1998-12-08
申请号：US844903
申请日：1997-04-22
申请人： Toshiro Maekawa , Koji Ono , Motoaki Okada , Tamami Takahashi , Shiro Mishima , Masako Kodera , Atsushi Shigeta , Riichiro Aoki , Gisuke Kouno
发明人： Toshiro Maekawa , Koji Ono , Motoaki Okada , Tamami Takahashi , Shiro Mishima , Masako Kodera , Atsushi Shigeta , Riichiro Aoki , Gisuke Kouno
IPC分类号： B08B1/00 , B08B1/04 , B08B3/08 , B24B37/34 , B24D3/32 , H01L21/00 , H01L21/306 , B08B1/02 , B08B3/04 , B08B7/04
CPC分类号： H01L21/02046 , B08B1/007 , B08B1/04 , B08B3/08 , B24B37/345 , B24D3/32 , H01L21/02052 , H01L21/67046 , Y10S134/902
摘要： A semiconductor cleaning method includes scrubbing a semiconductor wafer using a cleaning member made primarily of polyurethane and having micropores in a surface contacting the semiconductor wafer. The micropores have an average diameter ranging from 10 to 200 .mu.m. The cleaning member may be made of either polyurethane foam or non-woven fabric composed of fibers bound together by urethane resin. By this scrubbing step, particles that are strongly attached to the surface of a substrate such as the semiconductor wafer can easily be removed. During cleaning of the substrate, surface irregularities and crystalline protrusions on the surface of a substrate such as a semiconductor wafer can be scraped off to adjust the surface roughness of the semiconductor wafer to a desired degree for making the semiconductor wafer surface flat.
摘要翻译：半导体清洁方法包括使用主要由聚氨酯制成并且在与半导体晶片接触的表面中具有微孔的清洁部件来擦洗半导体晶片。微孔的平均直径为10〜200μm。清洁构件可以由聚氨酯泡沫或由聚氨酯树脂粘合在一起的纤维组成的无纺织物制成。通过该洗涤步骤，可以容易地除去强烈附着到诸如半导体晶片的基板的表面的颗粒。在清洁基板期间，可以刮掉诸如半导体晶片的基板的表面上的表面不规则和晶体突起，以将半导体晶片的表面粗糙度调整到期望的程度，以使半导体晶片表面平坦。

37. 发明申请

US20120267292A1 SEAWATER DESALINATION SYSTEM AND ENERGY EXCHANGE CHAMBER 有权
标题翻译：海水淡化系统和能源交换室
公开(公告)号：US20120267292A1
公开(公告)日：2012-10-25
申请号：US13447518
申请日：2012-04-16
申请人： Tamami Takahashi , Kazuaki Maeda , Masanori Goto
发明人： Tamami Takahashi , Kazuaki Maeda , Masanori Goto
IPC分类号： B01D61/00
CPC分类号： C02F1/441 , B01D61/06 , B01D2313/246 , C02F1/006 , C02F2103/08 , C02F2201/003 , C02F2301/022 , C02F2303/10 , Y02A20/131 , Y02W10/30
摘要： An energy exchange chamber is used for exchanging pressure energy between concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus and a part of seawater to be treated by the reverse-osmosis membrane separation apparatus in a seawater desalination system. The energy exchange chamber includes a concentrated seawater distributor communicating with a concentrated seawater port and configured to distribute a flow of the concentrated seawater flowing therein all over a horizontal plane of an interior of a chamber, and a seawater distributor communicating with a seawater port and configured to distribute a flow of the seawater flowing therein all over a horizontal plane of the interior of the chamber. The concentrated seawater and the seawater introduced into the chamber are brought into direct contact with each other over the horizontal plane of the interior of the chamber to exchange pressure energy between the concentrated seawater and the seawater.
摘要翻译：能量交换室用于在由反渗透膜分离装置排出的浓缩海水与在海水淡化系统中由反渗透膜分离装置进行处理的部分海水之间交换压力能量。能量交换室包括集中的海水分配器，其与集中的海水端口连通并且被配置为分配在其中流过其中的集中海水的流动在室的内部的水平面上，以及与海水端口连通并配置的海水分配器以便在室的内部的水平平面上分布流过其中的海水的流动。引入室中的浓缩海水和海水在室内部的水平面上彼此直接接触，以在集中的海水和海水之间交换压力能量。

38. 外观设计

USD650344S1 Vacuum contact pad 有权
公开(公告)号：USD650344S1
公开(公告)日：2011-12-13
申请号：US29335604
申请日：2009-04-17
申请人： Tamami Takahashi
设计人： Tamami Takahashi

39. 发明授权

US6102786A Polishing apparatus including turntable with polishing surface of different heights 失效
标题翻译：抛光装置包括具有不同高度的抛光表面的转台
公开(公告)号：US6102786A
公开(公告)日：2000-08-15
申请号：US234633
申请日：1999-01-21
申请人： Masayoshi Hirose , Yoshimi Sasaki , Akira Ogata , Seiji Ishikawa , Tamami Takahashi , Hirokuni Hiyama , Yutaka Wada
发明人： Masayoshi Hirose , Yoshimi Sasaki , Akira Ogata , Seiji Ishikawa , Tamami Takahashi , Hirokuni Hiyama , Yutaka Wada
IPC分类号： B24B37/005 , B24D13/14 , H01L21/304 , B24B29/02
CPC分类号： B24B37/26 , B24B37/042 , B24B37/24
摘要： A polishing apparatus includes a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring disposed above the turntable for supporting a workpiece to be polished and pressing the workpiece against the abrasive cloth under a predetermined pressure. The turntable and the top ring are movable relatively to each other to polish a surface of the workpiece supported by the top ring with the abrasive cloth. The abrasive cloth has a projecting region on a surface thereof for more intensive contact with the workpiece than other surface of the abrasive cloth. The projecting region has a smaller dimension in a radial direction of the turntable than a diameter of the workpiece when the projecting region is held in contact with the workpiece. A position of the projecting region is determined on the basis of an area in which the projecting region acts on the workpiece.
摘要翻译：抛光装置包括：转盘，其具有安装在其上表面上的研磨布;以及顶环，其设置在所述转台上方，用于支撑待抛光的工件，并在预定压力下将所述工件压靠所述研磨布。转盘和顶环彼此相对移动，用研磨布抛光由顶环支撑的工件的表面。研磨布在其表面上具有突出区域，用于与研磨布的其它表面更加紧密地接触工件。当突出区域与工件保持接触时，突出区域在转台的径向上具有比工件的直径更小的尺寸。基于突出区域作用在工件上的区域来确定突出区域的位置。

40. 发明授权

US5639388A Polishing endpoint detection method 失效
标题翻译：抛光端点检测方法
公开(公告)号：US5639388A
公开(公告)日：1997-06-17
申请号：US588241
申请日：1996-01-18
申请人： Norio Kimura , Fumihiko Sakata , Tamami Takahashi
发明人： Norio Kimura , Fumihiko Sakata , Tamami Takahashi
IPC分类号： B24B37/013 , B24B37/07 , B24B49/16 , H01L21/66
CPC分类号： B24B37/013 , B24B49/16
摘要： An endpoint detection in a polishing process of a polishing object which has a first layer and a second layer, formed under the first layer, is performed by holding the polishing object on a top ring and pressing a surface of the first layer of the polishing object onto a polishing cloth mounted on a rotating turntable so as to remove the first layer, oscillating the top ring in contact with the turntable, periodically measuring a torque on the rotating turntable when the top ring is positioned at a specific radial location defined by a radius from a rotational center of the turntable, and determining the endpoint based on a change in the torque generated when the first layer is removed and the second layer comes into contact with the polishing cloth.
摘要翻译：通过将抛光对象保持在顶环上并按压抛光对象的第一层的表面来进行在第一层下方形成有第一层和第二层的抛光对象的抛光工序中的端点检测到安装在旋转转台上的抛光布上，以便去除第一层，使顶环与转台相接触，使顶环周期性地测量旋转转台上的转矩，当顶环位于由半径限定的特定径向位置时并且基于当去除第一层并且第二层与抛光布接触时产生的扭矩的变化来确定端点。

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