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    • 32. 发明授权
    • Hydrodynamic bearing type rotary device and recording and reproducing apparatus including the same
    • 流体动力轴承型旋转装置及包括其的记录和再现装置
    • US07883270B2
    • 2011-02-08
    • US11812170
    • 2007-06-15
    • Takafumi AsadaHiroyuki KiriyamaHiroaki SaitoDaisuke Ito
    • Takafumi AsadaHiroyuki KiriyamaHiroaki SaitoDaisuke Ito
    • F16C32/06
    • F16C17/045F16C17/026F16C33/107F16C2370/12
    • A hydrodynamic bearing type rotary device is configured to prevent air from being trapped inside a bearing and causing the bearing to have oil film rupture and NPPR to deteriorate. In the device, a flange having a shape substantially like a disc is provided integrally with a shaft near its lower portion. A sleeve having a bearing hole is fitted to the shaft so as to be relatively rotatable. Hydrodynamic grooves are provided on at least one of an outer periphery of the shaft and an inner periphery of the sleeve. The flange forms a thrust bearing surface with a lower end surface of the sleeve. Hydrodynamic grooves are provided on at least one of the lower surface of the sleeve and an upper surface of the flange. During rotation of the bearing, the hydrodynamic grooves circulate the lubricant. Capillary pressures at respective portions in the lubricant circulation path have different magnitudes. The principle that air tends to move toward the portion having a smaller capillary pressure is utilized to make it difficult for the air to be trapped inside the bearing and to smoothly discharge the air.
    • 流体动力轴承型旋转装置被构造成防止空气被捕获在轴承内并导致轴承具有油膜破裂和NPPR劣化。 在该装置中,具有基本上类似于盘的形状的凸缘与其下部附近的轴一体设置。 具有轴承孔的套筒被安装在轴上以相对旋转。 流体动力槽设置在轴的外周和套筒的内周中的至少一个上。 凸缘形成具有套筒下端表面的止推轴承表面。 流体动力槽设置在套筒的下表面和凸缘的上表面中的至少一个上。 在轴承旋转期间,流体动力槽使润滑剂循环。 润滑剂循环路径各部分的毛细管压力具有不同的大小。 利用空气倾向于朝向具有较小毛细管压力的部分移动的原理,使得难以将空气捕获在轴承内并平滑地排出空气。
    • 33. 发明申请
    • HYDRODYNAMIC BEARING DEVICE AND DISK ROTATION APPARATUS
    • 水力轴承装置和盘旋转装置
    • US20100085661A1
    • 2010-04-08
    • US12412870
    • 2009-03-27
    • Takafumi ASADAHiroaki SaitoTakao YoshitsuguKeigo KusakaHiroyuki KiriyamaDaisuke Ito
    • Takafumi ASADAHiroaki SaitoTakao YoshitsuguKeigo KusakaHiroyuki KiriyamaDaisuke Ito
    • G11B17/02F16C32/06
    • F16C17/107F16C33/103F16C33/107F16C2370/12
    • In a hydrodynamic bearing device in which a radial bearing face having a dynamic pressure generating groove on a shaft or an inner periphery of a sleeve is provided and a clearance between the shaft and the sleeve is filled with lubricant, an annular depression is provided on one end face of the sleeve adjacent to a rotor hub and a cover plate for covering the depression is attached to the sleeve so as to define a reservoir for the lubricant or air for the purpose of preventing such a risk that absence of an oil film occurs in clearances of a bearing of the hydrodynamic bearing device due to outflow of oil upon forcing of the oil by air received into the bearing. A step portion is provided on the other end face of the sleeve such that the step portion and the reservoir are communicated with each other by a communication hole. During operation of the hydrodynamic bearing device, air in the hydrodynamic bearing device reaches the reservoir via the communication hole so as to be discharged from the reservoir.
    • 在一种流体动力轴承装置中,其中设置有在轴上的动压产生槽或套筒的内周上的径向支承面,并且轴与套筒之间的间隙充满润滑剂,环形凹部设置在一个 与转子轮毂相邻的套筒的端面和用于覆盖凹部的盖板附接到套筒上,以便限定用于润滑剂或空气的储存器,以便防止在油膜中不存在油膜的风险 由于在接收到轴承中的空气迫使油被油流出时,流体动力轴承装置的轴承的间隙。 台阶部设置在套筒的另一端面上,使得台阶部分和储存器通过连通孔相互连通。 在流体动力轴承装置的操作期间,流体动力轴承装置中的空气经由连通孔到达储存器,以便从储存器排出。
    • 34. 发明授权
    • Hydrodynamic bearing rotary device
    • 流体动力轴承旋转装置
    • US07674043B2
    • 2010-03-09
    • US11723316
    • 2007-03-19
    • Takafumi AsadaHiroaki SaitoDaisuke ItouHiroyuki KiriyamaTomoharu Takeda
    • Takafumi AsadaHiroaki SaitoDaisuke ItouHiroyuki KiriyamaTomoharu Takeda
    • F16C32/06
    • F16C33/102F16C17/107F16C33/107F16C33/74F16C2370/12
    • An object of the present invention is to provide a hydrodynamic bearing type rotary device which can improve rotation performance, suppress a friction torque, and reduce power consumption of motor, and a recording and reproducing apparatus including the same. A shaft having a flange on one end and a hub on the other end is provided with a bearing of a sleeve so as to be rotatable. The sleeve includes a communication hole. A third gap between the hub and the sleeve end surface is a flow path, and is connected to the communication hole. Provided that a first gap between a thrust plate 4 and the flange 3 is S1, a second gap between the flange 3 and a lower end surface of the sleeve 1 is S2, and a third gap between the upper end surface of the sleeve 1 and the hub 7 is S3, widths of the gaps satisfy the relational expression, S3>(S1+S2).
    • 本发明的目的是提供一种能够提高旋转性能,抑制摩擦转矩并降低电动机的功率消耗的流体动力轴承型旋转装置,以及包括其的记录和再现装置。 具有一端的凸缘和另一端的毂的轴设置有可旋转的套筒的轴承。 套筒包括一个连通孔。 轮毂和套筒端面之间的第三间隙是流动路径,并连接到连通孔。 假设推力板4和凸缘3之间的第一间隙为S1,凸缘3与套筒1的下端面之间的第二间隙为S2,套管1的上端面与 轮毂7是S3,间隙的宽度满足关系式S3>(S1 + S2)。
    • 36. 发明申请
    • Method of manufacturing semiconductor device with trench
    • 制造具有沟槽的半导体器件的方法
    • US20070166905A1
    • 2007-07-19
    • US11709147
    • 2007-02-22
    • Masamichi YanagidaHirotoshi KuboJunichiro TojoHiroaki SaitoMasahito Onda
    • Masamichi YanagidaHirotoshi KuboJunichiro TojoHiroaki SaitoMasahito Onda
    • H01L21/8234H01L21/336
    • H01L29/7813H01L29/1095H01L29/66734
    • In an embodiment of the present invention, after trenches, a gate oxide film and gate electrodes are formed, a channel layer is formed by plural high-acceleration ion implantations where acceleration voltages are different with one another. The channel layer is an impurity implanted layer on which diffusion by a heat treatment is not performed. The channel layer is allowed to have its impurity concentration substantially uniform in a depth-wise direction of the trenches, by implanting ions of the impurity at plural different times by use of a high-acceleration ion implantation system. Since a second region having almost no influence on a characteristic of the channel layer can be reduced, the channel layer having a minimum necessary depth can be obtained. The trenches are thus made shallow, and accordingly a capacitance can be reduced. Furthermore, an on resistance can be made lower by making an epitaxial layer thinner.
    • 在本发明的实施例中,在沟槽之后,形成栅氧化膜和栅电极,通过加速电压彼此不同的多个高加速度离子注入形成沟道层。 沟道层是不进行通过热处理的扩散的杂质注入层。 通过使用高加速度离子注入系统,在多个不同时间通过注入杂质的离子,允许沟道层在沟槽的深度方向上具有基本均匀的杂质浓度。 由于可以减少对沟道层的特性几乎没有影响的第二区域,所以可以获得具有最小所需深度的沟道层。 因此,沟槽变浅,因此可以减小电容。 此外,通过使外延层更薄,可以使导通电阻更低。
    • 38. 发明申请
    • Semiconductor device
    • 半导体器件
    • US20050133814A1
    • 2005-06-23
    • US10958640
    • 2004-10-06
    • Tetsuya YoshidaTetsuya OkadaHiroaki SaitoShigeyuki MuraiKikuo Okada
    • Tetsuya YoshidaTetsuya OkadaHiroaki SaitoShigeyuki MuraiKikuo Okada
    • H01L29/70H01L29/06H01L29/73H01L29/739H01L29/78H01L29/80H01L29/423
    • H01L29/7397H01L29/0619
    • In a conventional semiconductor device, there was a problem that, in a guard ring region, a shape of a depletion layer is distorted and stable withstand voltage characteristics cannot be obtained. In a semiconductor device of the present invention, a thermal oxide film in an actual operation region and a thermal oxide film in a guard ring region are formed in the same process. Thereafter, the thermal oxide film is once removed and is formed again. Thus, a film thickness of the thermal oxide film on the upper surface of the guard ring region is set to, for example, about 8000 to 10000 Å. Accordingly, a CVD oxide film including moving ions is formed in a position distant from a surface of an epitaxial layer. Consequently, distortion of a depletion layer, which is influenced by the moving ions, is suppressed and desired withstand voltage characteristics can be maintained.
    • 在传统的半导体器件中,存在在保护环区域中耗尽层的形状变形而不能得到稳定的耐电压特性的问题。 在本发明的半导体装置中,以相同的工序形成实际工作区域中的热氧化膜和防护环区域的热氧化膜。 此后,热氧化膜被一次除去并再次形成。 因此,保护​​环区域的上表面上的热氧化膜的膜厚设定为例如约8000〜10000。 因此,包含移动离子的CVD氧化膜形成在远离外延层的表面的位置。 因此,受到移动离子影响的耗尽层的失真被抑制,并且可以保持期望的耐受电压特性。