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    • 34. 发明授权
    • Thin film capacitor formed in via
    • 薄膜电容器形成在通孔中
    • US06278153B1
    • 2001-08-21
    • US09420561
    • 1999-10-19
    • Katsumi KikuchiTadanori ShimotoKoji MatsuiAkinobu Shibuya
    • Katsumi KikuchiTadanori ShimotoKoji MatsuiAkinobu Shibuya
    • H01L27108
    • H01L28/55H01L21/3212H01L21/76877H01L28/75H05K1/162
    • There is provided a thin film capacitor including (a) a lower electrode, (b) an insulating layer formed burying the lower electrode therein and formed with a via-hole reaching the lower electrode, (c) a dielectric layer formed on an inner sidewall of the via-hole and covering an exposed surface of the lower electrode therewith, and (d) an upper electrode surrounded by the dielectric layer. In accordance with the thin film capacitor, the upper electrode is formed to be buried in the via-hole formed above the lower electrode. Hence, it is possible to prevent short-circuit between the upper and lower electrodes, and degradation of the dielectric layer during fabrication of a thin film capacitor, both of which enhances reliability of a capacitor. In addition, a multi-layered wiring structure could be readily fabricated on the thin film capacitor.
    • 提供一种薄膜电容器,其包括(a)下电极,(b)在其中埋设下电极并形成有到达下电极的通孔形成的绝缘层,(c)形成在内侧壁上的电介质层 的通孔,并且覆盖下电极的暴露表面,以及(d)由电介质层包围的上电极。 根据薄膜电容器,上电极被形成为埋在形成在下电极上的通孔中。 因此,可以防止上下电极之间的短路,以及薄膜电容器的制造时的电介质层的劣化,这两者都提高了电容器的可靠性。 此外,可以容易地在薄膜电容器上制造多层布线结构。
    • 35. 发明授权
    • Functional element built-in substrate and wiring substrate
    • 功能元件内置基板和布线基板
    • US08929090B2
    • 2015-01-06
    • US13574455
    • 2011-01-07
    • Yoshiki NakashimaShintaro YamamichiKatsumi KikuchiKentaro MoriHideya Murai
    • Yoshiki NakashimaShintaro YamamichiKatsumi KikuchiKentaro MoriHideya Murai
    • H05K1/18H01L23/00H01L23/498H01L23/538
    • H05K1/182H01L23/49838H01L23/5389H01L24/19H01L2224/04105H01L2224/32225H01L2224/73267H01L2224/92244H01L2924/12042H01L2924/15153H01L2924/18162H05K1/0298H05K1/115H05K1/185Y10T29/49126Y10T29/49165Y10T428/24322H01L2924/00
    • An object of the present invention is to propose a functional element built-in substrate which enables an electrode terminal of a functional element to be well connected to the back surface on the side opposite to the electrode terminal of the functional element, and which can be miniaturized. According to the present invention, there is provided a functional element built-in substrate including a functional element provided with an electrode terminal on one surface side of the functional element, and a wiring substrate including a laminated structure in which the functional element is embedded so that the electrode terminal of the functional element faces the front surface side of the structure, and which is formed at least in a side surface region of the functional element by laminating a plurality of wiring insulating layers each including a wiring, the functional element built-in substrate being featured in that the electrode terminal and the back surface side of the wiring substrate are electrically connected to each other through the wiring of the laminated structure, and in that, in a pair of the wiring insulating layers included in the laminated structure and that are in contact with each other, the cross-sectional shape of the wiring in each of the wiring insulating layers, which cross-sectional shape is taken along the plane perpendicular to the extension direction of the wiring in the wiring insulating layer, has a relationship that the cross-sectional area of the wiring in the back surface side wiring insulating layer is larger than the cross-sectional area of the wiring in the front surface side wiring insulating layer.
    • 本发明的目的是提出一种功能元件内置基板,其使功能元件的电极端子能够良好地连接到与功能元件的电极端子相反的一侧的背面,并且其可以是 小型化。 根据本发明,提供了一种功能元件内置基板,其包括在功能元件的一个表面侧上设置有电极端子的功能元件,以及包括功能元件嵌入其中的层叠结构的布线基板 所述功能元件的电极端子面向所述结构的前表面侧,并且通过层叠多个布线绝缘层而形成在所述功能元件的至少侧面区域中,所述多个布线绝缘层包括布线, 其特征在于,布线基板的电极端子和背面侧通过层叠结构的布线电连接,并且其中,在层叠结构中包括的一对布线绝缘层和 彼此接触,每个布线绝缘中的布线的横截面形状 与布线绝缘层中的配线的延伸方向垂直的平面截取的截面形状的层具有这样的关系:背面侧配线绝缘层中的布线的截面积大于 表面侧配线绝缘层中的配线的截面积。