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31. 发明授权

US08524421B2 Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device 有权
标题翻译：掩模空白，转印掩模，其制造方法和制造半导体器件的方法
公开(公告)号：US08524421B2
公开(公告)日：2013-09-03
申请号：US13076254
申请日：2011-03-30
申请人： Osamu Nozawa , Hiroaki Shishido , Toshiyuki Suzuki
发明人： Osamu Nozawa , Hiroaki Shishido , Toshiyuki Suzuki
IPC分类号： G03F1/50
CPC分类号： G03F1/80 , G03F1/50 , G03F1/54 , G03F1/58
摘要： In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film. The highly oxidized layer is placed on a side opposite to a transparent substrate side.
摘要翻译：在用于制造转印掩模的掩模坯料中，掩模坯料在透明基板上具有遮光膜。遮光膜由含有钽作为主要金属成分的材料制成，并且包含氧含量为60原子％以上且形成为遮光膜的表面层的高度氧化层。高氧化层位于与透明基板侧相反的一侧。

32. 发明授权

US08507155B2 Photomask blank, photomask, and method for manufacturing photomask blank 有权
标题翻译：光掩模坯料，光掩模以及制造光掩模坯料的方法
公开(公告)号：US08507155B2
公开(公告)日：2013-08-13
申请号：US12935464
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
IPC分类号： G03F1/46 , G03F1/50 , G03F1/58 , G03F1/80
CPC分类号： G03F1/46 , G03F1/54 , G03F1/80
摘要： A photomask blank for a photomask used with an ArF excimer laser. The photo mask has a light transmissive substrate with a surface on which a light-shielding film is formed. The light-shielding film has a laminated structure comprising a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer. The thickness of the entire light-shielding film is 70 nm or less. The back-surface antireflection layer comprises a film containing a metal and having first etching rate. The front-surface antireflection layer comprises a film containing a metal and having a third etching rate. The light-shielding layer comprises a film containing the same metal as that contained in the back-surface antireflection layer or the front-surface antireflection layer, with a second etching rate that is lower than the first and third etching rates. The thickness of the light-shielding layer is 45% or less of the thickness of the entire light-shielding film.
摘要翻译：用于与ArF准分子激光器一起使用的光掩模的光掩模坯料。光掩模具有其上形成有遮光膜的表面的透光基板。遮光膜具有包括背面防反射层，遮光层和前表面抗反射层的层叠结构。整个遮光膜的厚度为70nm或更小。背面抗反射层包括含有金属并具有第一蚀刻速率的膜。前表面抗反射层包括含有金属并具有第三蚀刻速率的膜。遮光层包括含有与背面防反射层或前表面抗反射层中所含金属相同的金属的膜，其第二蚀刻速率低于第一和第三蚀刻速率。遮光层的厚度为整个遮光膜的厚度的45％以下。

33. 发明授权

US08435704B2 Mask blank, transfer mask, and methods of manufacturing the same 有权
标题翻译：掩模空白，转印掩模及其制造方法
公开(公告)号：US08435704B2
公开(公告)日：2013-05-07
申请号：US12875783
申请日：2010-09-03
申请人： Osamu Nozawa , Hiroaki Shishido
发明人： Osamu Nozawa , Hiroaki Shishido
IPC分类号： G03F1/22
CPC分类号： G03F1/54 , G03F1/50
摘要： In a mask blank for manufacturing a transfer mask adapted to exposure light having a wavelength of 200 nm or less, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film, that is placed on a side opposite to a transparent substrate side.
摘要翻译：在用于制造适于曝光波长为200nm以下的光的转印掩模的掩模坯料中，掩模坯料在透明基板上具有遮光膜。遮光膜由含有钽作为主要金属成分的材料制成，并且包含氧含量为60原子％以上且形成为遮光膜的表面层的高度氧化层，放置在与透明基板侧相对的一侧。

34. 发明申请

US20110305978A1 PHOTOMASK BLANK, PHOTOMASK, AND METHOD OF MANUFACTURING PHOTOMASK BLANK 有权
标题翻译： PHOTOMASK BLANK，PHOTOMASK，以及制造光电白皮书的方法
公开(公告)号：US20110305978A1
公开(公告)日：2011-12-15
申请号：US12935766
申请日：2009-03-31
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto , Morio Hosoya
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto , Morio Hosoya
IPC分类号： G03F1/00
CPC分类号： G03F1/22 , G03F1/46 , G03F1/54 , G03F1/80 , H01L21/0274
摘要： The present invention provides a photomask blank for producing a photomask to which an ArF excimer laser light is applied, wherein: a thin film having a multilayer structure is provided on a light transmissive substrate; and the uppermost layer of the thin film has an amorphous structure made of a material comprising chromium and at least one of nitrogen, oxygen and carbon.
摘要翻译：本发明提供一种用于制造施加了ArF准分子激光的光掩模的光掩模坯料，其中：在透光基板上设置具有多层结构的薄膜; 并且薄膜的最上层具有由包含铬和氮，氧和碳中的至少一种的材料制成的无定形结构。

35. 发明授权

US07791725B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07791725B2
公开(公告)日：2010-09-07
申请号：US12271348
申请日：2008-11-14
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本，检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

36. 发明授权

US07456963B2 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07456963B2
公开(公告)日：2008-11-25
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

37. 发明授权

US5539514A Foreign particle inspection apparatus and method with front and back illumination 失效
标题翻译：具有前后照明的外来颗粒检查装置及方法
公开(公告)号：US5539514A
公开(公告)日：1996-07-23
申请号：US269379
申请日：1994-06-30
申请人： Hiroaki Shishido , Shunichi Matsumoto
发明人： Hiroaki Shishido , Shunichi Matsumoto
IPC分类号： G01N21/94 , G01N21/956 , G01N21/00
CPC分类号： G01N21/956 , G01N21/94
摘要： A method of inspecting a phase shift reticle comprising a transparent or translucent substrate, a circuit pattern of an opaque film formed on the front surface of the substrate and a pattern of a transparent or translucent film formed on the front surface of the substrate comprises: obliquely projecting a front illuminating light beam on the front surface of the substrate by a front illuminating system; concentrating scattered light scattered by the surface of the substrate and the surfaces of the patterns, obliquely projecting a back illuminating light beam on the back surface of the substrate by a back illuminating system, concentrating transmitted-and-diffracted light transmitted and diffracted by the substrate and the patterns; intercepting the scattered light scattered by the patterns and the transmitted-and-diffracted light transmitted and diffracted by the patterns with spatial filters disposed on Fourier transform planes, focusing the scattered light and the transmitted-and-diffracted light transmitted by the spatial filters on detectors; and comparing detection signals provided by the detectors to see if there are any foreign particles on the phase shift reticle.
摘要翻译：检查包括透明或半透明基板的相移掩模版的方法，形成在基板的前表面上的不透明膜的电路图案和形成在基板的前表面上的透明或半透明膜的图案包括：通过前照明系统将前照明光束投影在基板的前表面上; 集中由基板表面和图案表面散射的散射光，通过后照明系统将后照明光束倾斜地投射在基板的背面上，集中由基板透射和衍射的透射衍射光和模式; 截取由图案散射的散射光和通过布置在傅立叶变换平面上的空间滤光片通过图案传输和衍射的透射衍射光，将散射光和由空间滤光器透射的透射衍射光聚焦在检测器 ; 并比较由检测器提供的检测信号，以查看相移掩模版上是否存在任何异物。

38. 发明授权

US08846274B2 Mask blank, transfer mask and process for manufacturing semiconductor devices 有权
标题翻译：掩模空白，传输掩模和制造半导体器件的工艺
公开(公告)号：US08846274B2
公开(公告)日：2014-09-30
申请号：US13605125
申请日：2012-09-06
申请人： Hiroaki Shishido , Osamu Nozawa , Atsushi Kominato
发明人： Hiroaki Shishido , Osamu Nozawa , Atsushi Kominato
IPC分类号： G03F1/00 , G03F1/50
CPC分类号： C03C17/3411 , C03C17/3423 , C03C17/3435 , G03F1/38
摘要： The present invention is the mask blank includes a glass substrate and a thin film formed on a main surface of the glass substrate, the thin film includes a material containing tantalum and substantially no hydrogen, and the mask blank has a invasion suppressive film between the main surface of the glass substrate and the thin film which suppresses hydrogen from being invaded from the glass substrate into the thin film.
摘要翻译：本发明的掩模坯料包括玻璃基板和形成在玻璃基板的主表面上的薄膜，该薄膜包括含有钽并且基本上不含氢的材料，掩模坯料在主体之间具有侵入抑制膜玻璃基板的表面和抑制氢从玻璃基板侵入薄膜的薄膜。

39. 发明申请

US20110111332A1 PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK 有权
标题翻译：相移屏蔽层和相位移屏蔽
公开(公告)号：US20110111332A1
公开(公告)日：2011-05-12
申请号：US13001365
申请日：2009-06-25
申请人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
发明人： Hiroyuki Iwashita , Hiroaki Shishido , Atsushi Kominato , Masahiro Hashimoto
IPC分类号： G03F1/00
CPC分类号： G03F1/58 , G03F1/32
摘要： The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a lower layer, an interlayer and an upper layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the lower layer is made of a film containing a metal and has a first etching rate; the upper layer is made of a film containing a metal and has a third etching rate; the interlayer is made of a film containing the same metal as that contained in the lower layer or the upper layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the interlayer is 30% or less of the thickness of the entire light-shielding film.
摘要翻译：本发明提供一种用于制造施加了ArF准分子激光的光掩模的光掩模坯料，其中：在透光基板上设置有遮光膜; 遮光膜具有层叠结构，其中从靠近透光基底的一侧依次层叠下层，中间层和上层; 整个遮光膜的厚度为60nm以下; 下层由含有金属的膜制成，具有第一蚀刻速率; 上层由含有金属的膜制成，具有第三蚀刻速率; 中间层由含有与下层或上层相同的金属的膜制成，具有比第一蚀刻速度和第三蚀刻速度低的第二蚀刻速率; 并且中间层的厚度为整个遮光膜的厚度的30％以下。

40. 发明申请

US20110001972A1 Method And Equipment For Detecting Pattern Defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20110001972A1
公开(公告)日：2011-01-06
申请号：US12876709
申请日：2010-09-07
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

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