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    • 32. 发明授权
    • Apparatus and method for recording mark
    • US07095703B2
    • 2006-08-22
    • US10374715
    • 2003-02-27
    • Seong-sue KimDu-seop YoonIn-sik ParkDong-ho Shin
    • Seong-sue KimDu-seop YoonIn-sik ParkDong-ho Shin
    • G11B7/00
    • G11B7/0948G11B7/00454G11B7/095G11B7/0956G11B7/126G11B7/1392
    • A recording apparatus to record a mark on a recording medium includes an aberration detecting part and an optical power controller. The aberration detecting part detects an aberration signal corresponding to the amount of an aberration contained in a light beam radiated onto a recording surface of the recording medium by using an optical pickup system which includes a light source and an objective lens. The light source emits a light beam having a power to record the mark on the recording medium. The objective lens condenses the light beam to focus the light beam as an optical spot on the recording surface of the recording medium. The optical power controller controls the power output from the light source according to the detected aberration signal, so as to have the light source output an optical power to record the mark, in which a deformation due to the aberration is compensated for, on the recording medium. Accordingly, even though the aberration occurs, a proper mark in which the deformation due to the aberration is compensated for can be recorded by increasing the recording power of the light source in proportion to the amount of the aberration to compensate for the aberration. As a result, the mark showing a good signal characteristic can be recorded on the recording medium without an additional aberration compensating device.
    • 39. 发明申请
    • Image sensors and methods of manufacturing the same
    • 图像传感器及其制造方法
    • US20080036024A1
    • 2008-02-14
    • US11889122
    • 2007-08-09
    • Sung-ho HwangDuck-hyung LeeSeong-sue KimHong-ki KimChang-rok MoonYun-ki Lee
    • Sung-ho HwangDuck-hyung LeeSeong-sue KimHong-ki KimChang-rok MoonYun-ki Lee
    • H01L31/0232H01L21/00
    • H01L27/14627H01L27/14621H01L27/14645
    • An image sensor may include a semiconductor substrate having unit pixel regions on the semiconductor substrate; photoelectric converters formed in the unit pixel regions; interlayer insulating films covering the photoelectric converters and having opening portions formed above the photoelectric converters; a light-transmissive portion filling the opening portions; color filters formed on the light-transmissive portion; and microlenses formed on the color filters. The microlenses may include a plurality of concentric circle patterns and a plurality of arc patterns arranged around the concentric circle patterns. An arc pattern around a specific concentric circle pattern may have a same center as the specific concentric circle pattern. A method of manufacturing the image sensor may include forming the photoelectric converters; forming the interlayer insulating films; removing parts of the interlayer insulating films to form the opening portions; forming the light-transmissive portion to fill the opening portions; forming the color filters; and forming the microlenses.
    • 图像传感器可以包括在半导体衬底上具有单位像素区域的半导体衬底; 形成在单位像素区域的光电转换器; 层间绝缘膜覆盖光电转换器,并具有形成在光电转换器上方的开口部分; 填充所述开口部的透光部; 形成在透光部分上的滤色器; 和在滤色器上形成的微透镜。 微透镜可以包括多个同心圆形图案和围绕同心圆图案布置的多个弧形图案。 围绕特定同心圆图案的弧形图案可以具有与特定同心圆图案相同的中心。 图像传感器的制造方法可以包括形成光电转换器; 形成层间绝缘膜; 去除层间绝缘膜的部分以形成开口部分; 形成所述透光部以填充所述开口部; 形成滤色片; 并形成微透镜。