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31. 发明授权

US06567450B2 Very narrow band, two chamber, high rep rate gas discharge laser system 有权
公开(公告)号：US06567450B2
公开(公告)日：2003-05-20
申请号：US09943343
申请日：2001-08-29
申请人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
发明人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

32. 发明授权

US06532247B2 Laser wavelength control unit with piezoelectric driver 有权
公开(公告)号：US06532247B2
公开(公告)日：2003-03-11
申请号：US09794782
申请日：2001-02-27
申请人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
发明人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

33. 发明授权

US07822092B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07822092B2
公开(公告)日：2010-10-26
申请号：US11981014
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

34. 发明授权

US07778302B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07778302B2
公开(公告)日：2010-08-17
申请号：US11981290
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
IPC分类号： H01S3/22
CPC分类号： H01S3/10092 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/08 , H01S3/08059 , H01S3/0835 , H01S3/121 , H01S3/225 , H01S3/2333 , H01S3/235 , H01S3/2383
摘要： A method/apparatus may comprise a seed laser oscillator producing an output which may comprise: a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage receiving the output of the seed laser oscillator which may comprise: a ring power amplification stage; a coherence busting mechanism intermediate the seed laser oscillator and the ring power amplification stage which may comprise a beam splitter separating the seed laser output into a main beam and a beam entering an optical delay path which may have a delay length longer than the coherence length of a pulse in the seed laser output and may have a beam angular offset mechanism offsetting a delayed beam and the main beam.
摘要翻译：一种方法/装置可以包括产生输出的种子激光振荡器，该输出可以包括：第一气体放电准分子或分子氟激光室; 第一振荡器腔内的线窄模块; 接收种子激光振荡器的输出的激光放大级，其可以包括：环形功率放大级; 种子激光振荡器和环形功率放大级之间的相干破坏机构，其可以包括将种子激光器输出分离成主波束的分束器和进入光学延迟路径的波束，该光束延迟路径可以具有比相干长度长的延迟长度种子激光器中的脉冲输出并且可以具有抵消延迟的光束和主光束的光束角偏移机构。

35. 发明授权

US08102889B2 Multi-chamber gas discharge laser bandwidth control through discharge timing 有权
标题翻译：多室气体放电激光带宽控制通过放电时序
公开(公告)号：US08102889B2
公开(公告)日：2012-01-24
申请号：US12806308
申请日：2010-08-10
申请人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
发明人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
IPC分类号： H01S3/00
CPC分类号： H01S3/225 , H01S3/08022 , H01S3/09702 , H01S3/1301 , H01S3/134 , H01S3/2308 , H01S3/2366
摘要： A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
摘要翻译：公开了一种用于控制多部分激光系统中的带宽的方法和装置，其包括向放大器激光系统部分提供线窄化种子脉冲的第一线窄化振荡器激光器系统部分，可以包括利用定时差分曲线来定义第一激光系统操作参数而不是带宽和定时差，并且还在曲线上的期望点定义期望的时序差，其中曲线上的每个唯一操作点对应于相应的带宽值; 确定曲线上期望点处的定时差与曲线上的实际工作点的实际偏移; 确定实际偏移与对应于期望带宽的期望偏移之间的误差; 修改击发差分定时以消除实际偏移和所需偏移之间的误差。

36. 发明授权

US07830934B2 Multi-chamber gas discharge laser bandwidth control through discharge timing 有权
标题翻译：多室气体放电激光带宽控制通过放电时序
公开(公告)号：US07830934B2
公开(公告)日：2010-11-09
申请号：US11323604
申请日：2005-12-29
申请人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
发明人： Robert N. Jacques , William N. Partlo , Daniel J. W. Brown
IPC分类号： H01S3/00
CPC分类号： H01S3/225 , H01S3/08022 , H01S3/09702 , H01S3/1301 , H01S3/134 , H01S3/2308 , H01S3/2366
摘要： A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
摘要翻译：公开了一种用于控制多部分激光系统中的带宽的方法和装置，其包括向放大器激光系统部分提供线窄化种子脉冲的第一线窄化振荡器激光器系统部分，可以包括利用定时差分曲线来定义第一激光系统操作参数而不是带宽和定时差，并且还在曲线上的期望点定义期望的时序差，其中曲线上的每个唯一操作点对应于相应的带宽值; 确定曲线上期望点处的定时差与曲线上的实际工作点的实际偏移; 确定实际偏移与对应于期望带宽的期望偏移之间的误差; 修改击发差分定时以消除实际偏移和所需偏移之间的误差。

37. 发明授权

US07746913B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07746913B2
公开(公告)日：2010-06-29
申请号：US11981449
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70583 , H01S3/005 , H01S3/08 , H01S3/08059 , H01S3/105 , H01S3/2251 , H01S3/235 , H01S3/2366
摘要： An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.
摘要翻译：可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法，其可以包括种子激光振荡器，其产生包括种子激光输出的脉冲光束的输出，所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光房间第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括激光系统输出光束的脉冲，其可以包括环形功率放大级; 种子注射机制。

38. 发明授权

US07630424B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07630424B2
公开(公告)日：2009-12-08
申请号：US11981195
申请日：2007-10-30
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70583 , H01S3/005 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2251 , H01S3/235 , H01S2301/02
摘要： A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.
摘要翻译：方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是：选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时，同时使ASE保持在选定的极限以下，并且脉冲能量激光系统输出光束的脉冲基本恒定。

39. 发明授权

US08908735B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US08908735B2
公开(公告)日：2014-12-09
申请号：US13231882
申请日：2011-09-13
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H01S3/22 , H01S3/225 , H01S3/08 , H01S3/00 , H01S3/23 , H01S3/083 , H01S3/10
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束脉冲，其可以包括环形功率放大级。

40. 发明授权

US07317196B2 LPP EUV light source 失效
标题翻译： LPP EUV光源
公开(公告)号：US07317196B2
公开(公告)日：2008-01-08
申请号：US10979919
申请日：2004-11-01
申请人： William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Alexander I. Ershov , David W. Myers
发明人： William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Alexander I. Ershov , David W. Myers
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.
摘要翻译：描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

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