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31. 发明授权

US06411364B1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US06411364B1
公开(公告)日：2002-06-25
申请号：US09249303
申请日：1999-02-12
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/70225 , G03F7/70358 , G03F7/70433 , G03F7/70558 , G03F7/70716
摘要： An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a scanning device for scanning synchronously the mask and the photosensitive substrate, and a device for setting a width of an exposure area in a scan direction of the photosensitive substrate conjugate with an illumination area on the mask with respect to the projection optical system, to integer times as large as a distance which the photosensitive substrate moves during an interval between pulse emissions from the light source.
摘要翻译：用于将形成在掩模上的图案转印到感光基板上的曝光装置设置有用光束照射掩模上的局部区域的照明光学系统，用于将掩模的图案投影到感光基板的投影光学系统以及用于同时扫描掩模和感光基板的扫描装置，以及用于设置与掩模相对于投影光学系统的照明区域共轭的感光基板的扫描方向上的曝光区域的宽度的装置，在光源的脉冲发射间隔期间，感光基片移动的距离的整数倍。

32. 发明授权

US06277533B1 Scanning exposure method 有权
标题翻译：扫描曝光方法
公开(公告)号：US06277533B1
公开(公告)日：2001-08-21
申请号：US09599493
申请日：2000-06-22
申请人： Shinji Wakamoto , Yuji Imai , Kazuaki Suzuki
发明人： Shinji Wakamoto , Yuji Imai , Kazuaki Suzuki
IPC分类号： G03F900
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7003 , G03F9/7026 , G03F9/7088
摘要： In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.
摘要翻译：在通过扫描曝光系统进行曝光时，当在向前扫描的情况下将掩模版的图案暴露在晶片上的拍摄区域上以在曝光区域16,116之前的预读区域相对于扫描方向检测对焦位置时， 1），晶片15的周边区域的拍摄区域S10，S1-S4，S5，S23，S28，S29-S32中的每一个，通过扫描晶片15进行曝光，使得狭缝状曝光区域16移动相对地从晶片15的内部到外部; 或者，（2）当曝光区域中的预读区域135的焦点位置和成像面139的焦点位置之间的差的绝对值超过允许值时，晶片15的高度被固定在高度设置到此为止，同时忽略预读数据。

33. 发明授权

US06218058B1 Charged particle beam transfer mask 失效
标题翻译：带电粒子束传递掩模
公开(公告)号：US06218058B1
公开(公告)日：2001-04-17
申请号：US09363686
申请日：1999-07-29
申请人： Takehisa Yahiro , Kazuaki Suzuki , Shin-ichi Kojima
发明人： Takehisa Yahiro , Kazuaki Suzuki , Shin-ichi Kojima
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/3174 , H01J2237/31788
摘要： A charged particle beam transfer mask (6) has a plurality of subfields (8) each of which having a different pattern density. The charged particle beam transfer mask (6) divide-irradiates a charged particle beam (5) for each of the subfields (8) and reduce-transfers a pattern onto a sensitive substrate. The charged particle beam transfer mask (6) corrects the differences in the de-focus amounts (3) caused by Coulomb effect due to the different pattern densities when the pattern is transferred for each of the subfields (8) so as to eliminate the differences in the de-focus amounts (3) caused by Coulomb effect by pre-varying the position (height) of each of the subfields (8) in the optical axis direction.
摘要翻译：带电粒子束传递掩模（6）具有多个具有不同图案密度的子场（8）。带电粒子束传递掩模（6）对每个子场（8）分开照射带电粒子束（5），并将图案减少到敏感基片上。带电粒子束传递掩模（6）校正当为每个子场（8）传送图案时由于不同图案密度而由库仑效应引起的去焦量（3）的差异，以消除差异在通过预先改变每个子场（8）在光轴方向上的位置（高度）而由库仑效应引起的去焦量（3）中。

34. 发明授权

US6118515A Scanning exposure method 失效
标题翻译：扫描曝光方法
公开(公告)号：US6118515A
公开(公告)日：2000-09-12
申请号：US647325
申请日：1996-05-09
申请人： Shinji Wakamoto , Yuji Imai , Kazuaki Suzuki
发明人： Shinji Wakamoto , Yuji Imai , Kazuaki Suzuki
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , G03B27/42
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7003 , G03F9/7026 , G03F9/7088
摘要： In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.
摘要翻译：在通过扫描曝光系统进行曝光时，当在向前扫描的情况下将掩模版的图案暴露在晶片上的拍摄区域上以在曝光区域16,116之前的预读区域相对于扫描方向检测对焦位置时， 1），晶片15的周边区域的拍摄区域S10，S1-S4，S5，S23，S28，S29-S32中的每一个，通过扫描晶片15进行曝光，使得狭缝状曝光区域16移动相对地从晶片15的内部到外部; 或者，（2）当曝光区域中的预读区域135的焦点位置和成像面139的焦点位置之间的差的绝对值超过允许值时，晶片15的高度被固定在高度设置到此为止，同时忽略预读数据。

35. 发明授权

US6104474A Apparatus and method for controlling scanning exposure of photosensitive substrate 失效
标题翻译：用于控制感光基板的扫描曝光的装置和方法
公开(公告)号：US6104474A
公开(公告)日：2000-08-15
申请号：US50052
申请日：1998-03-30
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03F7/20 , G03B27/42 , G03B27/72 , G03B27/74 , G03B27/32
CPC分类号： G03F7/70558 , G03F7/70358
摘要： An exposure amount control device for controlling an integrated exposure amount of pulsed light to a photosensitive substrate within a predetermined range in which a pattern of a mask is successively exposed on the substrate by synchronously scanning the mask forming the pattern to be exposed and the photosensitive substrate relatively with respect to a predetermined illumination area illuminated with pulsed light from a pulsed light source, satisfies the following relationship:.DELTA.D.sub.12 .gtoreq.D/(2N.sub.min)wherein luminous intensity distribution of the predetermined illumination area in a scan direction is shaped to be a trapezoid, .DELTA.D.sub.12 is an average value of half of the widths of the slope portions on the lateral sides of the trapezoid-shaped luminous intensity distribution in the scan direction, D is the width, at half peak value points, of the luminous intensity distribution on the predetermined illumination area of the substrate in the scan direction and N.sub.min is a minimum number of exposure pulses necessary for controlling an integrated exposure amount at respective points on the substrate within predetermined accuracy.
摘要翻译：一种曝光量控制装置，用于通过同步扫描形成待曝光图案的掩模和感光基板，在预定范围内控制脉冲光到感光基板的曝光量，其中掩模图案在基板上连续曝光相对于来自脉冲光源的脉冲光照射的预定照明区域，满足以下关系：DELTA D12> / = D /（2Nmin）其中扫描方向上的预定照明区域的发光强度分布为梯形，DELTA D12是扫描方向上的梯形发光强度分布的横向侧的倾斜部分的宽度的一半的平均值，D是发光强度的半峰值点处的宽度在扫描方向上的基板的预定照明区域上的分布，Nmin是e的最小数量在预定精度内控制基板上的各个点处的积分曝光量所需的曝光脉冲。

36. 发明授权

US6078381A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US6078381A
公开(公告)日：2000-06-20
申请号：US662519
申请日：1996-06-13
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03F7/20 , G03B27/68
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/70225 , G03F7/70358 , G03F7/70433 , G03F7/70558 , G03F7/70716
摘要： An exposure apparatus for transferring a pattern formed on a mask to a photo-sensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a scanning device for scanning synchronously the mask and the photosensitive substrate, and a device for setting a width of an exposure area in a scan direction of the photosensitive substrate conjugate with an illumination area on the mask with respect to the projection optical system, to integer times as large as a distance which the photosensitive substrate moves during an interval between pulse emissions from the light source.
摘要翻译：用于将形成在掩模上的图案转印到感光基板上的曝光装置设置有用光束照射掩模上的局部区域的照明光学系统，用于将掩模的图案投影到投影光学系统的投影光学系统感光基板和用于同时扫描掩模和感光基板的扫描装置，以及用于设置与感光基板的扫描方向上的曝光区域的宽度相关的投影光学系统与掩模上的照明区域共轭的装置到光敏衬底在来自光源的脉冲发射之间的间隔期间移动的距离的整数倍。

37. 发明授权

US5796467A Scanning projection exposure method and apparatus using substrate position adjustment based on mask pattern positioin during scanning exposure 失效
标题翻译：在扫描曝光期间使用基于掩模图案位置的基板位置调整的扫描投影曝光方法和装置
公开(公告)号：US5796467A
公开(公告)日：1998-08-18
申请号：US309745
申请日：1994-09-21
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70691 , G03F7/70241 , G03F7/70358 , G03F9/70
摘要： A transfer method includes a step of disposing a mask and a substrate with a projection optical system interposed therebetween in planes substantially perpendicular to the optical axis thereof; and a step of moving the image plane of the projection optical system and the substrate relative to each other along the optical axis in accordance with a variation in the positional relationship between the mask and the projection optical system along the optical axis while the mask and the substrate are moved perpendicular to the optical axis of the projection optical system, in order to transfer a pattern on the mask onto the substrate.
摘要翻译：转印方法包括以下步骤：在基本上垂直于其光轴的平面中设置有投影光学系统的掩模和基板; 以及根据掩模和投影光学系统之间的沿着光轴的位置关系的变化沿光轴移动投影光学系统和基板的像面的步骤，同时掩模和衬底垂直于投影光学系统的光轴移动，以将掩模上的图案转印到衬底上。

38. 发明授权

US5611878A Method of manufacturing microwave circulator 失效
标题翻译：微波循环器的制造方法
公开(公告)号：US5611878A
公开(公告)日：1997-03-18
申请号：US407855
申请日：1995-03-21
申请人： Taro Miura , Makoto Kobayashi , Kazuaki Suzuki
发明人： Taro Miura , Makoto Kobayashi , Kazuaki Suzuki
IPC分类号： H01P1/383 , H01P1/387 , H01P11/00 , B32B31/12 , B32B31/26
CPC分类号： H01P11/00 , H01P1/387
摘要： A method of manufacturing a circulator includes the steps of forming, on at least one sheet (41, 42) of an insulating ferromagnetic material, dummy inner conductors (44a, 44b, 44c, 45a, 45b, 45e) made of a material which is thermally decomposed at a temperature equal to or less than a sintering completion temperature of the insulating ferromagnetic material, laminating a plurality of the sheets (40, 41, 42) of the insulating ferromagnetic material so that at least one insulating ferromagnetic material sheet (40, 41) covers the dummy inner conductors formed on the sheets (41, 42), firing the laminated insulating ferromagnetic material sheets (40, 41, 42) to form an insulating ferromagnetic material body (46) in a single continuous body and to form ducts (47) for inner conductors at portions occupied by the dummy inner conductors, injecting with pressure conductive paste into the ducts (47) in the insulating ferromagnetic material body (46), and firing the insulating ferromagnetic material body (46) to form the inner conductors (48) in the insulating ferromagnetic body (46).
摘要翻译：制造循环器的方法包括以下步骤：在绝缘铁磁材料的至少一个片材（41,42）上形成由材料制成的虚拟内导体（44a，44b，44c，45a，45b，45e）在等于或小于绝缘铁磁材料的烧结完成温度的温度下热分解，层叠绝缘铁磁材料的多个片材（40,41,42），使得至少一个绝缘铁磁材料片（40， 41）覆盖形成在片材（41,42）上的虚拟内部导体，焙烧层叠的绝缘铁磁材料片（40,41,42）以在单个连续体中形成绝缘铁磁材料体（46）并形成导管（47），用于在虚拟内部导体所占据的部分处的内部导体，将压力导电浆料注入到绝缘铁磁材料体（46）中的管道（47）中，并且将绝缘铁磁材料（46），以在绝缘铁磁体（46）中形成内部导体（48）。

39. 发明授权

US5137349A Projection-type optical apparatus 失效
标题翻译：投影式光学装置
公开(公告)号：US5137349A
公开(公告)日：1992-08-11
申请号：US633314
申请日：1990-12-24
申请人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
发明人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70883 , G03F7/70241 , G03F9/7023
摘要： In a projection-type optical apparatus in which a projection optical system projects an image of an object upon a substrate, a position detecting sensor mechanically connected to the projection optical system detects the position of the projection optical system relative to the substrate along the optical axis of the projection optical system. A displacement measuring device measures relative displacement between the position detecting sensor and the projection optical system along the optical axis. The substrate is brought into coincidence with an optimum image forming plane of the projection optical system on the basis of the position detected by the position detecting sensor and the displacement measured by the displacement measuring device.
摘要翻译：在其中投影光学系统将物体的图像投射到基板的投影型光学装置中，机械地连接到投影光学系统的位置检测传感器沿着光轴检测投影光学系统相对于基板的位置的投影光学系统。位移测量装置测量沿着光轴的位置检测传感器和投影光学系统之间的相对位移。基于由位置检测传感器检测到的位置和由位移测量装置测量的位移，使基板与投影光学系统的最佳图像形成平面一致。

40. 发明授权

US08922441B2 Receiver 有权
标题翻译：接收器
公开(公告)号：US08922441B2
公开(公告)日：2014-12-30
申请号：US13265104
申请日：2010-04-20
申请人： Kazuaki Suzuki , Kenya Nagano
发明人： Kazuaki Suzuki , Kenya Nagano
IPC分类号： H01Q1/00 , H01Q1/24 , F16M11/00 , H01Q1/08 , H01Q21/28
CPC分类号： H01Q1/24 , H01Q1/08 , H01Q1/12 , H01Q21/28 , H04N5/64
摘要： In order to solve a problem that, if a reinforcing plate of a housing is used as an antenna in a receiver, a desired antenna gain is less likely to be obtained and therefore an antenna gain is degraded, a receiver for receiving information transmitted by a radio wave includes an output portion configured to output information which is receivable by a viewer or another receiver; a stand portion contacting the output portion and configured to hold the output portion on an installation surface at an angle suitable for receiving the information or viewing an image; a reinforcing portion contacting the output portion and the stand portion at points other than a contact point between the output portion and the stand portion and configured to reinforce the output portion and the stand portion so that the angle is maintained; and an antenna portion arranged in a space ensured by at least the reinforcing portion and configured to receive the radio wave.
摘要翻译：为了解决如果在接收机中使用外壳的加强板作为天线的问题，则不太可能获得期望的天线增益，并且因此天线增益降低，用于接收由a发送的信息的接收机无线电波包括输出部分，被配置为输出可由观看者或另一接收者接收的信息; 接触所述输出部分并且被配置为以适于接收所述信息或观看图像的角度将所述输出部分保持在安装表面上的支架部分; 在所述输出部和所述支架部之间的接触点以外的点处，与所述输出部和所述支架部接触的加强部，并且被配置为加强所述输出部和所述支架部，从而保持所述角度。以及天线部，其布置在至少由所述加强部保证的空间中，并被配置为接收所述无线电波。

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