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    • 31. 发明授权
    • Methods for liquid transfer coating of three-dimensional substrates
    • 三维底物液体转移涂层方法
    • US08512581B2
    • 2013-08-20
    • US12193415
    • 2008-08-18
    • David Xuan-Qi WangMehrdad M. MoslehiSomnath Nag
    • David Xuan-Qi WangMehrdad M. MoslehiSomnath Nag
    • B44C1/22
    • B01D1/22H01L21/02617H01L21/6715H01L22/12H01L31/035281H01L31/046H01L31/1872H01L31/1892H01L31/202H05K1/0284H05K3/046H05K3/1258H05K3/207H05K2201/09036H05K2201/09045H05K2203/0126H05K2203/0528H05K2203/308Y02E10/50Y02P70/521
    • Methods here disclosed provide for selectively coating the top surfaces or ridges of a 3-D substrate while avoiding liquid coating material wicking into micro cavities on 3-D substrates. The substrate includes holes formed in a three-dimensional substrate by forming a sacrificial layer on a template. The template includes a template substrate with posts and trenches between the posts. The steps include subsequently depositing a semiconductor layer and selectively etching the sacrificial layer. Then, the steps include releasing the semiconductor layer from the template and coating the 3-D substrate using a liquid transfer coating step for applying a liquid coating material to a surface of the 3-D substrate. The method may further include coating the 3-D substrate by selectively coating the top ridges or surfaces of the substrate. Additional features may include filling the micro cavities of the substrate with a filling material, removing the filling material to expose only the substrate surfaces to be coated, coating the substrate with a layer of liquid coating material, and removing said filling material from the micro cavities of the substrate.
    • 这里公开的方法提供了选择性地涂覆3-D衬底的顶表面或脊,同时避免液体涂覆材料吸收到3-D衬底上的微腔中。 衬底包括通过在模板上形成牺牲层而形成在三维衬底中的孔。 模板包括具有在柱之间的柱和沟槽的模板衬底。 这些步骤包括随后沉积半导体层并选择性地蚀刻牺牲层。 然后,该步骤包括从模板中释放半导体层并使用用于将液体涂覆材料施加到3-D衬底的表面的液体转移涂覆步骤涂覆3-D衬底。 该方法还可以包括通过选择性地涂覆衬底的顶部脊或表面来涂覆3-D衬底。 附加特征可以包括用填充材料填充衬底的微腔,去除填充材料以仅暴露待涂覆的衬底表面,用一层液体涂覆材料涂覆衬底,以及从微孔中移除所述填充材料 的基底。
    • 33. 发明申请
    • METHOD FOR FABRICATING A THREE-DIMENSIONAL THIN-FILM SEMICONDUCTOR SUBSTRATE FROM A TEMPLATE
    • 从模板制造三维薄膜半导体基板的方法
    • US20100267186A1
    • 2010-10-21
    • US12731058
    • 2010-03-24
    • David Xuan-Qi WangMehrdad M. Moslehi
    • David Xuan-Qi WangMehrdad M. Moslehi
    • H01L31/18
    • H01L31/18H01L31/0236H01L31/035281H01L31/068H01L31/1804H01L31/1892Y02E10/547Y02P70/521
    • A method is presented for fabrication of a three-dimensional thin-film solar cell semiconductor substrate from a template. A semiconductor template having three-dimensional surface features comprising a top surfaces substantially aligned along a (100) crystallographic plane of semiconductor template and a plurality of inverted pyramidal cavities defined by sidewalls substantially aligned along a (111) crystallographic plane is formed according to an anisotropic etching process. A dose of relatively of high energy light-mass species is implanted in the template at a uniform depth and parallel to the top surfaces and said sidewalls defining the inverted pyramidal cavities of the template. The semiconductor template is annealed to convert the dose of relatively of high energy light-mass species to a mechanically-weak-thin layer. The semiconductor template is cleaved along the mechanically-weak-thin layer to release a three-dimensional thin-film semiconductor substrate from the semiconductor template.
    • 介绍了从模板制造三维薄膜太阳能电池半导体衬底的方法。 具有三维表面特征的半导体模板包括沿着半导体模板的(100)结晶平面基本对齐的顶表面和由沿着(111)晶面平行排列的侧壁限定的多个反向金字塔形腔,根据各向异性 蚀刻工艺。 将相对高能量光质物质的剂量以均匀的深度注入模板中,并平行于顶表面和限定模板的倒锥形腔的所述侧壁。 将半导体模板退火以将相对较高能量的光质物质的剂量转换成机械弱薄层。 半导体模板沿着机械弱薄层切割,以从半导体模板释放三维薄膜半导体衬底。
    • 40. 发明申请
    • SUBSTRATE RELEASE METHODS AND APPARATUSES
    • 基板释放方法和装置
    • US20100022074A1
    • 2010-01-28
    • US12473811
    • 2009-05-28
    • David Xuan-Qi WangMehrdad M. Moslehi
    • David Xuan-Qi WangMehrdad M. Moslehi
    • H01L21/762H01L21/20
    • H01L31/18H01L21/76259
    • The present disclosure relates to methods and apparatuses for fracturing or breaking a buried porous semiconductor layer to separate a 3-D thin-film semiconductor semiconductor (TFSS) substrate from a 3-D crystalline semiconductor template. The method involves forming a sacrificial porous semiconductor layer on the 3-D features of the template. A variety of techniques may be used to fracture and release the mechanically weak porous semiconductor layer without damaging the TFSS substrate layer or the template layer such as pressure variations, thermal stress generation, and mechanical bending. The methods also allow for processing three dimensional features not possible with current separation processes. Optional cleaning and final lift-off steps may be performed as part of the release step or after the release step.
    • 本公开内容涉及用于将埋入的多孔半导体层断裂或断裂以从3-D晶体半导体模板分离3-D薄膜半导体(TFSS)衬底的方法和装置。 该方法包括在模板的3-D特征上形成牺牲多孔半导体层。 可以使用各种技术来破坏和释放机械上的弱多孔半导体层,而不会损坏TFSS衬底层或模板层,例如压力变化,热应力产生和机械弯曲。 这些方法还允许处理当前分离过程不可能的三维特征。 可以在释放步骤的一部分或释放步骤之后执行可选的清洁和最终剥离步骤。