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31. 发明授权

US07365350B2 Method and arrangement for the suppression of debris in the generation of short-wavelength radiation based on a plasma 有权
标题翻译：在基于等离子体的短波长辐射的产生中抑制碎屑的方法和装置
公开(公告)号：US07365350B2
公开(公告)日：2008-04-29
申请号：US11380487
申请日：2006-04-27
申请人： Duc Chinh Tran , Jesko Brudermann , Bjoern Mader , René De Bruijn , Juergen Kleinschmidt
发明人： Duc Chinh Tran , Jesko Brudermann , Bjoern Mader , René De Bruijn , Juergen Kleinschmidt
IPC分类号： H04H1/04
CPC分类号： G03F7/70916 , G03F7/70033
摘要： The invention is directed to a method and arrangements for the suppression of debris in short-wavelength radiation sources based on a plasma, particularly for EUV sources for semiconductor lithography. The object of the invention is to find a novel possibility for suppressing the particle flow (debris) from a plasma which keeps the debris away from primarily optical components located downstream without excessive attenuation of the desired radiation emitted from the plasma. According to the invention, this object is met in that a buffer gas is injected inside the filter structure of the debris filter lateral to openings that are provided for passing the radiation. The filter structure generates a flow resistance in direction of the plasma and in direction of propagation of the radiation so that an increased gas pressure of buffer gas remains limited to a defined volume layer in the debris filter relative to the pressure in the vacuum chamber, and the buffer gas exiting from the filter structure of the debris filter is sucked out of the vacuum chamber by vacuum pumps.
摘要翻译：本发明涉及一种用于抑制基于等离子体的短波长辐射源中的碎屑的方法和装置，特别是用于半导体光刻的EUV源。本发明的目的是找到一种抑制来自等离子体的颗粒流（碎屑）的新型可能性，该等离子体使碎片远离主要位于下游的光学部件，而不会从等离子体发射的期望辐射的过度衰减。根据本发明，这个目的在于，缓冲气体被注入碎片过滤器的过滤器结构内，侧向设置用于通过辐射的开口。过滤器结构在等离子体的方向和辐射的传播方向上产生流动阻力，使得缓冲气体的增加的气体压力相对于真空室中的压力保持限于碎屑过滤器中的限定体积层，以及从碎屑过滤器的过滤器结构排出的缓冲气体由真空泵从真空室中抽出。

32. 发明授权

US07266137B2 Laser gas replenishment method 有权
标题翻译：激光加气方式
公开(公告)号：US07266137B2
公开(公告)日：2007-09-04
申请号：US11263626
申请日：2005-10-31
申请人： Hans-Stephan Albrecht , Klaus Wolfgang Vogler , Juergen Kleinschmidt , Thomas Schroeder , Igor Bragin , Vadim Berger , Uwe Stamm , Wolfgang Zschocke , Sergei Govorkov
发明人： Hans-Stephan Albrecht , Klaus Wolfgang Vogler , Juergen Kleinschmidt , Thomas Schroeder , Igor Bragin , Vadim Berger , Uwe Stamm , Wolfgang Zschocke , Sergei Govorkov
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G02B5/1814 , G02B5/1838 , G03F7/70575 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/08045 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225
摘要： Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.
摘要翻译：气体放电激光器的输出光束参数通过使用气体供应单元和处理器将分子氟成分保持在预定的分压来稳定。分子氟在放电室内会耗尽。包括分子氟在内的气体注入可以将分子氟的分压提高一定量。注射可以以选定的间隔进行，以使构成气体基本保持在初始分压。基于诸如驱动电压和排放室中分子量的计算量的因素，可以改变每次注入的量和/或注射间隔。驱动电压可以是根据系统老化进行调整的多个驱动电压范围之一。在每个范围内，可以基于例如总施加的电能或时间/脉冲计数进行气体注入和气体替换。

33. 发明申请

US20070045573A1 EUV radiation source with high radiation output based on a gas discharge 有权
标题翻译：基于气体放电的具有高辐射输出的EUV辐射源
公开(公告)号：US20070045573A1
公开(公告)日：2007-03-01
申请号：US11504957
申请日：2006-08-16
申请人： Juergen Kleinschmidt , Jens Ringling , Alexander Geier
发明人： Juergen Kleinschmidt , Jens Ringling , Alexander Geier
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.
摘要翻译：本发明涉及一种基于具有12nm至14nm范围内的高辐射发射的气体放电等离子体产生EUV辐射的装置。本发明的目的是在EUV光谱区（12nm和14nm）之间找到具有高辐射输出的等离子体辐射产生的新颖可能性，这使得可以使用锡作为EUV气体放电中的工作介质工业应用来源。根据本发明，满足本发明的目的在于提供一种气体制备单元，用于限定含锡工作介质的温度和压力及其在气态下进入真空室的流量。提供至少一个隔热储存器容器和绝热供应管线，用于将气态含锡工作介质从气体制备单元转移到位于电极壳体内的预电离单元。

34. 发明授权

US06965624B2 Laser gas replenishment method 有权
标题翻译：激光加气方式
公开(公告)号：US06965624B2
公开(公告)日：2005-11-15
申请号：US10338779
申请日：2003-01-06
申请人： Hans-Stephan Albrecht , Klaus Wolfgang Vogler , Juergen Kleinschmidt , Thomas Schroeder , Igor Bragin , Vadim Berger , Uwe Stamm , Wolfgang Zschocke , Sergei Govorkov
发明人： Hans-Stephan Albrecht , Klaus Wolfgang Vogler , Juergen Kleinschmidt , Thomas Schroeder , Igor Bragin , Vadim Berger , Uwe Stamm , Wolfgang Zschocke , Sergei Govorkov
IPC分类号： G02B5/18 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/08 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225 , H01S3/00 , H01S3/09 , H01S3/097 , H01S3/22
CPC分类号： G03F7/70025 , G02B5/1814 , G02B5/1838 , G03F7/70575 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/08045 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225
摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of F2 already within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the molecular fluorine in the discharge chamber. The driving voltage is preferably determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.
摘要翻译：提供了一种用于通过使用气体供应单元和处理器将激光气体混合物的分子氟成分维持在预定分压来稳定气体放电激光器的输出光束参数的方法和装置。分子氟以初始分压提供，并在激光放电室内耗尽。每次喷射包括分子氟的气体，以在激光室中选择的量增加分子氟的分压，优选地每次注射小于0.2毫巴，或者已经在其中的2％的量的7％在激光室内。可以以选定的间隔执行多次连续喷射，以维持构成气体基本处于初始分压，以维持稳定的输出光束参数。每次注射量和/或注射间隔可以基于驱动电压的测量值和/或放电室中分子氟的计算量而变化。驱动电压优选地被确定为基于系统的老化而被调整的多个驱动电压范围之一。在每个范围内，气体注入和气体替换优选基于对放电的总施加电能和/或时间和/或脉冲计数进行。

35. 发明授权

US06721345B2 Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers 失效
标题翻译：用于气体放电激光器气体状态检测和控制系统的静电除尘器电晕放电点火电压探头
公开(公告)号：US06721345B2
公开(公告)日：2004-04-13
申请号：US09905640
申请日：2001-07-12
申请人： Igor Bragin , Juergen Kleinschmidt , Gerhard Ahlborn
发明人： Igor Bragin , Juergen Kleinschmidt , Gerhard Ahlborn
IPC分类号： H01S322
CPC分类号： H01S3/225 , B03C3/41 , B03C3/49 , B03C3/68 , B03C2201/04 , B03C2201/24 , H01S3/036
摘要： An excimer or molecular fluorine laser system is provided which emits a laser beam during operation and has a gas mixture with a gas composition initially provided within a discharge chamber. The laser system includes a discharge chamber containing a laser gas mixture at least including a halogen-containing species and a buffer gas, multiple electrodes within the discharge chamber and connected to a discharge circuit for energizing the gas mixture, a resonator for generating a laser beam, an electrostatic precipitator for having a voltage applied thereto and for receiving and precipitating contaminant particulates from a flow of the gas mixture, and a processor for monitoring the corona discharge ignition voltage of the electrostatic precipitator and for determining a status of said gas mixture based on the monitored voltage.
摘要翻译：提供准分子或分子氟激光系统，其在操作期间发射激光束，并且具有最初设置在放电室内的气体组成的气体混合物。激光系统包括：放电室，其包含至少包含含卤物质和缓冲气体的激光气体混合物，放电室内的多个电极，并连接到用于激励气体混合物的放电电路;激光束产生激光束，用于施加电压并用于从气体混合物流中接收和沉淀污染物颗粒的静电除尘器，以及用于监测静电除尘器的电晕放电点火电压并用于基于以下方式确定所述气体混合物的状态的处理器：监测电压。

36. 发明授权

US06678291B2 Molecular fluorine laser 失效
标题翻译：分子氟激光
公开(公告)号：US06678291B2
公开(公告)日：2004-01-13
申请号：US09738849
申请日：2000-12-15
申请人： Klaus Wolfgang Vogler , Juergen Kleinschmidt
发明人： Klaus Wolfgang Vogler , Juergen Kleinschmidt
IPC分类号： H01S313
CPC分类号： H01S3/036 , G02B5/1814 , G02B5/1838 , H01S3/0315 , H01S3/038 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/0809 , H01S3/0971 , H01S3/1055 , H01S3/137 , H01S3/225 , H01S3/2258
摘要： An efficient F2 laser is provided with improvements in line selection, monitoring capabilities, alignment stabilization, performance at high repetition rates and polarization characteristics. Line selection is preferably provided by a transmission grating or a grism. The grating or grism preferably outcouples the laser beam. The line selection may be fully provided at the front optics module. A monitor grating and an array detector monitor the intensity of the selected (and unselected) lines for line selection control. An energy detector is enclosed in an inert gas purged environment at slight overpressure. A blue or green reference beam is used for F2 laser beam alignment stabilization and/or spectral monitoring of the output laser beam. The blue or green reference beam advantageously is not reflected out with a atomic fluorine red emission of the laser and is easily resolved from the red emission. The clearing ratio of the laser gas flow through the discharge area is reduced by narrowing the discharge width using improved laser electrodes and/or by increasing the gas flow rate through the discharge while maintaining uniformity by using a more aerodynamic discharge chamber. The F2 laser beam is substantially polarized, e.g., 98% or better, using at least one intracavity polarization element preferably in combination with Brewster discharge chamber windows.
摘要翻译：提供高效的F2激光器，具有线路选择，监视功能，对准稳定性，高重复率性能和极化特性的改进。线选择优选地由透射光栅或棱镜提供。光栅或棱镜优选地将激光束输出耦合。线路选择可以完全提供在前光学模块。监视器光栅和阵列检测器监视所选（和未选择）线的强度用于线选择控制。一个能量检测器被封闭在惰性气体吹扫的环境中，轻微的超压。使用蓝色或绿色参考光束进行F2激光束对准稳定和/或输出激光束的光谱监测。蓝色或绿色参考光束有利地不被激光的原子氟红色发射反射，并且容易地从红色发射中消除。通过使用改进的激光电极使放电宽度变窄并且/或通过增加通过放电的气体流量而减小激光气体流过放电区域的清除率，同时通过使用更多的空气动力学放电室来保持均匀性。使用至少一个腔内偏振元件，优选与布鲁斯特放电室窗口组合，F2激光束基本上被极化，例如98％或更好。

37. 发明授权

US06603789B1 Narrow band excimer or molecular fluorine laser with improved beam parameters 失效
标题翻译：具有改进光束参数的窄带准分子或分子氟激光
公开(公告)号：US06603789B1
公开(公告)日：2003-08-05
申请号：US09900703
申请日：2001-07-05
申请人： Juergen Kleinschmidt
发明人： Juergen Kleinschmidt
IPC分类号： H01S322
CPC分类号： H01S3/106 , H01S3/1305 , H01S3/225 , H01S3/2258
摘要： An excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture including a halogen-containing molecular species and at least one noble gas including a buffer gas, multiple electrodes within the discharge chamber and connected to a pulsed power supply circuit for energizing the gas mixture, and a resonator for generating an output beam. The resonator includes the discharge chamber and one or more optics for narrowing a bandwidth of the beam and for magnifying the beam in each of orthogonal beam axis directions for suppressing fluctuations in one or more output beam parameters.
摘要翻译：准分子或分子氟激光系统包括：填充有包含含卤素的分子种类的气体混合物和至少一种包括缓冲气体的惰性气体的放电室，在放电室内的多个电极并连接到用于激励的脉冲电源电路气体混合物和用于产生输出光束的谐振器。谐振器包括放电室和一个或多个光学器件，用于使光束的带宽变窄并且用于在每个正交光束轴线方向上放大光束，以抑制一个或多个输出光束参数的波动。

38. 发明授权

US06476987B1 Excimer laser with line narrowing 失效
标题翻译：准分子激光线变窄
公开(公告)号：US06476987B1
公开(公告)日：2002-11-05
申请号：US09629256
申请日：2000-07-31
申请人： Juergen Kleinschmidt , Peter Heist , Matthias Kramer
发明人： Juergen Kleinschmidt , Peter Heist , Matthias Kramer
IPC分类号： G02B504
CPC分类号： G02B5/04 , H01S3/0811 , H01S3/223 , H01S3/225
摘要： A line narrowing unit for use within an excimer or molecular fluorine laser resonator includes a dispersive prism having antireflection coatings on entrance and exit surfaces. Entrance and exit angles and an apex angle are increased to enhance the dispersive power of the prism, while the antireflective coatings limit reflective losses. Preferably, a laser beam makes a non-symmetric pass through said prism. The apex angle is preferably greater than 65°, or even 75°, and the angle of incidence and the exit angle of the beam are each preferably greater than 65°. A beam expanding prism configured for enhanced beam expansion has an apex angle between within a range of 37.5° and 42.5°, and a beam incidence angle at the entrance surface of more than 65°, and an antireflection coating on preferably both the entrance and exit surfaces.
摘要翻译：在准分子或分子氟激光谐振器内使用的线窄化单元包括在入射和出射表面上具有抗反射涂层的分散棱镜。增加出入角和顶角以增强棱镜的分散力，而抗反射涂层则限制了反射损耗。优选地，激光束使不对称通过所述棱镜。顶角优选大于65°或甚至75°，并且梁的入射角和出射角各自优选地大于65°。配置用于增强光束膨胀的光束扩张棱镜具有在37.5°和42.5°之间的范围内的顶角和大于65°的入射面处的光束入射角，并且优选地，入射和出射两者的抗反射涂层表面。

39. 发明授权

US09170505B2 Arrangement for generating EUV radiation 有权
标题翻译：产生EUV辐射的安排
公开(公告)号：US09170505B2
公开(公告)日：2015-10-27
申请号：US12254272
申请日：2008-10-20
申请人： Vladimir Korobochko , Juergen Kleinschmidt
发明人： Vladimir Korobochko , Juergen Kleinschmidt
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70083 , H05G2/003
摘要： The invention is directed to an arrangement for generating EUV radiation particularly for source modules in exposure installations for EUV lithography for semiconductor chip fabrication. The object of the invention, to find a novel possibility for realizing an EUV source module which appreciably improves the ratio of resources to results in the transfer of radiation from the primary source location (plasma 3) to the secondary source location (output opening (6) of the source module (1)/intermediate focus plane (62)), is met according to the invention in that the plasma (3) is formed as a volume emitter for direct illumination of the output opening (6) without collector optics (5), and the transverse dimension (d) of the plasma (3) is greater than the diameter (D) of the output opening (6), wherein the extent to which the diameter is exceeded depends on the distance (L) between the plasma (3) and the output opening (6) and on the numerical aperture (NA) of the illumination system downstream.
摘要翻译：本发明涉及一种用于产生EUV辐射的装置，特别是用于用于半导体芯片制造的EUV光刻的曝光装置中的源模块。本发明的目的是找到一种实现EUV源模块的新型可能性，其明显地改善了资源的比例，导致辐射从主源位置（等离子体3）到次级源位置（输出开口6 ）源于根据本发明的源模块（1）/中间聚焦平面（62）），其中等离子体（3）形成为用于直接照射输出开口（6）的体积发射器，而没有集光器光学器件 5），等离子体（3）的横向尺寸（d）大于输出开口（6）的直径（D），其中直径超过的范围取决于两者之间的距离（L）等离子体（3）和输出开口（6）以及下游照明系统的数值孔径（NA）。

40. 发明申请

US20120135022A1 ASSEMBLY ACTIVATING PROTEIN (AAP) AND ITS USE FOR THE MANUFACTURE OF PARVOVIRUS PARTICLES ESSENTIALLY CONSISTING OF VP3 有权
标题翻译：组蛋白激活蛋白（AAP）及其用于制备基于VP3的PARVOVIRUS颗粒的生产
公开(公告)号：US20120135022A1
公开(公告)日：2012-05-31
申请号：US13203442
申请日：2010-03-04
申请人： Florian Sonntag , Juergen Kleinschmidt , Markus Hoerer , Kerstin Lux
发明人： Florian Sonntag , Juergen Kleinschmidt , Markus Hoerer , Kerstin Lux
IPC分类号： A61K35/76 , C07K14/015 , C07K16/08 , C12N7/00 , A61K39/23 , A61P37/02 , A61P35/00 , A61P37/08 , A61P3/00 , A61P29/00 , A61P25/00 , A61P27/02 , A61P25/30 , A61P1/00 , A61P19/02 , C12N15/35
CPC分类号： C07K14/005 , A61K39/0005 , A61K2039/5256 , A61K2039/5258 , C12N7/00 , C12N2750/14122 , C12N2750/14123 , C12N2750/14143
摘要： The present invention relates to nucleic acids encoding the novel parvoviral protein “assembly activating protein” (AAP), the encoded polypeptides, methods of producing the polypeptides, antibodies specific for AAP, the use of the nucleic acids for the preparation of the polypeptides, the use of the nucleic acids or the polypeptides for the preparation of the parvoviral particle and methods of producing parvoviral particles essentially consisting of VP3 by providing in addition to the coding sequence of the parvoviral structural protein VP3 a sequence fragment Z/a nucleic acid encoding AAP in the cell and expressing VP3 and fragment Z under control of a rep-independent promoter. Furthermore, the present invention relates to parvoviral particles essentially consisting of VP3 and/or obtainable by the above method as well as expression cassettes comprising (i) a heterologous promoter and (ii) VP3 coding sequence and/or fragment Z. The present invention further relates to a medicament, particularly a vaccine, comprising the parvoviral particles or expression cassettes and their use.
摘要翻译：本发明涉及编码新型细小病毒蛋白“装配激活蛋白”（AAP）的核酸，编码多肽，产生多肽的方法，对AAP特异的抗体，使用该核酸来制备多肽，使用核酸或多肽进行细小病毒颗粒的制备以及生产由VP3组成的细小病毒颗粒的方法，除了通过提供细小病毒结构蛋白VP3的编码序列之外还提供编码AAP的序列片段Z / a核酸细胞并在代表性独立启动子的控制下表达VP3和片段Z。此外，本发明涉及基本由VP3组成和/或可通过上述方法获得的细小病毒颗粒以及包含（i）异源启动子和（ii）VP3编码序列和/或片段Z的表达盒。本发明进一步涉及包含细小病毒颗粒或表达盒的药物，特别是疫苗及其用途。

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