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    • 35. 发明申请
    • SILICON FILM AND LITHIUM SECONDARY BATTERY
    • 硅胶片和锂二次电池
    • US20120244441A1
    • 2012-09-27
    • US13514893
    • 2010-12-10
    • Suguru NodaShingo MorokumaTaketsugu Yamamoto
    • Suguru NodaShingo MorokumaTaketsugu Yamamoto
    • C01B33/02B32B5/06C23C16/24C23C16/30B32B15/04H01M4/38B82Y30/00
    • H01M10/052C23C14/14C23C14/541H01G11/06H01G11/24H01G11/28H01M4/0421H01M4/134H01M4/1395Y02E60/13Y02T10/7011Y02T10/7022Y10T428/249921
    • Provided are a silicon film which can give an electrode suitable for use in high-capacity lithium secondary batteries, and a process for easily producing the silicon film. The silicon film comprises a columnar aggregate which is an aggregate of columnar structures made of Si or a Si compound. The silicon film may be a film wherein the diameter of the columnar structures is from 10 nm to 100 nm and the film thickness is from 0.2 μm to 100 μm. In the process for preparing a silicon film on a substrate by vapor deposition using a vapor deposition source made of Si or a Si compound, the temperature of the vapor deposition source is 1700 K or higher, the temperature of the substrate is lower than that of the vapor deposition source, and the temperature difference between the vapor deposition source and the substrate is 700 K or larger. In the process for preparing the silicon film, the distance (D) between the vapor deposition source and the substrate is shorter than the minimum diameter (P) of the substrate, the minimum diameter (P) being determined by viewing the substrate from the perpendicular direction. Also provided are an electrode comprising the silicon film, and a lithium secondary battery comprising the electrode as a negative electrode.
    • 提供一种能够提供适用于大容量锂二次电池的电极的硅膜,以及容易制造硅膜的方法。 硅膜包括柱状聚集体,其是由Si或Si化合物制成的柱状结构的聚集体。 硅膜可以是其中柱状结构的直径为10nm至100nm并且膜厚度为0.2μm至100μm的膜。 在通过使用由Si或Si化合物制成的气相沉积源通过气相沉积在衬底上制备硅膜的方法中,气相沉积源的温度为1700K或更高,衬底的温度低于 蒸镀源和蒸镀源与基板的温度差为700K以上。 在制备硅膜的过程中,蒸镀源与衬底之间的距离(D)比衬底的最小直径(P)短,最小直径(P)通过从垂直方向观察衬底来确定 方向。 还提供了包括硅膜的电极和包含该电极作为负电极的锂二次电池。