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31. 发明授权

US07771673B2 Plasma generating electrode and plasma reactor 失效
标题翻译：等离子发生电极和等离子体反应器
公开(公告)号：US07771673B2
公开(公告)日：2010-08-10
申请号：US10561841
申请日：2004-06-25
申请人： Yukio Miyairi , Yasumasa Fujioka , Masaaki Masuda , Takeshi Sakuma , Tatsuhiko Hatano , Yoshihiro Sato , Junichi Suzuki
发明人： Yukio Miyairi , Yasumasa Fujioka , Masaaki Masuda , Takeshi Sakuma , Tatsuhiko Hatano , Yoshihiro Sato , Junichi Suzuki
IPC分类号： B01J19/08
CPC分类号： F01N3/0892 , B01D53/32 , B01D2259/818 , B01J19/088 , B01J2219/0809 , B01J2219/0835 , B01J2219/0875 , B01J2219/0894 , B01J2219/2453 , B01J2219/2487 , H05H1/2406 , H05H2001/2418 , H05H2001/2437
摘要： A plasma generating electrode of the present invention includes a pair of unit electrodes 2, each of the pair of unit electrodes 2 including a plate-like ceramic body 19 and a conductive film 12 disposed inside the ceramic body 19 and including a plurality of protrusions 13 on a front surface, the pair of unit electrodes 2 constituting a basic unit 1 by being hierarchically layered at intervals corresponding to thickness of the protrusion 13 in a state that a plurality of spaces which are open on each end in the arrangement direction of the protrusion are formed, the basic units 1 constituting an electrode unit in which the basic units 1 are hierarchically layered at intervals corresponding to the thickness of the protrusion 13, and the plasma generating electrode being capable of generating plasma in the three-dimensionally arranged spaces V upon application of voltage between the unit electrodes 2 constituting the electrode unit. Therefore, the plasma generating electrode is capable of generating uniform and stable plasma and exhibiting excellent heat resistance.
摘要翻译：本发明的等离子体产生电极包括一对单位电极2，每对单元电极2包括板状陶瓷体19和布置在陶瓷体19内部的导电膜12，并且包括多个突起13 在前表面上，构成基本单元1的一对单元电极2通过以与突起13的厚度相对应的间隔对应于在突起的排列方向上的每个端部开口的多个空间的状态而分层地层叠构成电极单元的基本单元1，其中基本单元1以对应于突起13的厚度的间隔分层地层叠，并且等离子体产生电极能够在三维布置的空间V中产生等离子体在构成电极单元的单位电极2之间施加电压。因此，等离子体产生电极能够产生均匀且稳定的等离子体并且表现出优异的耐热性。

32. 发明申请

US20090315569A1 IMPEDANCE MEASURING INSTRUMENT AND IMPEDANCE MEASURING METHOD FOR FINE PARTICLE COLLECTOR 审中-公开
标题翻译：用于微粒收集器的阻抗测量仪和阻抗测量方法
公开(公告)号：US20090315569A1
公开(公告)日：2009-12-24
申请号：US12548737
申请日：2009-08-27
申请人： Kyosuke Katsuyama , Kenshin Kitoh , Takeshi Sakuma
发明人： Kyosuke Katsuyama , Kenshin Kitoh , Takeshi Sakuma
IPC分类号： G01R27/28
CPC分类号： F01N9/002 , F01N2560/05 , G01N15/0656 , G01N27/043 , Y02T10/47
摘要： An impedance measuring instrument of a fine particle collector comprising a fine particle collection body for collecting fine particles in a fluid, a conductive can body for containing the fine particle collection body, and a buffering body disposed between the fine particle collection body and the conductive can body, wherein two or more electrodes are arranged on the fine particle collection body, at least one of the electrodes is connected with an AC power supply, at least the other electrode is connected with an ammeter, the AC power supply and the ammeter are interconnected and further connected with the conducive can body, and the conducive can body is grounded.
摘要翻译：一种细粒子收集器的阻抗测量装置，包括用于收集流体中的细颗粒的微粒收集体，用于容纳微粒收集体的导电罐本体和设置在细粒收集体与导电罐之间的缓冲体主体，其中两个或多个电极布置在所述微粒收集体上，所述电极中的至少一个与AC电源连接，至少所述另一个电极与电流表连接，所述AC电源和所述电流表互连并进一步与有利的罐体相连，并有利于罐身接地。

33. 发明申请

US20090308251A1 PARTICULATE MATERIAL DETECTING APPARATUS 失效
标题翻译：颗粒材料检测装置
公开(公告)号：US20090308251A1
公开(公告)日：2009-12-17
申请号：US12542805
申请日：2009-08-18
申请人： Atsuo Kondou , Takeshi Sakuma , Yasumasa Fujioka
发明人： Atsuo Kondou , Takeshi Sakuma , Yasumasa Fujioka
IPC分类号： B03C3/68
CPC分类号： G01N15/0656 , G01M15/102
摘要： A particulate matter detecting apparatus (100) includes a detecting apparatus main body having a cavity (2) that is formed through the detecting apparatus main body, a particle charging section (3) that can charge particulate matter that has entered the cavity through an inflow-side end (6) of the cavity, a collection section (4) that can collect the particulate matter charged by the particle charging section (3) and measure the amount of the particulate matter, and an ion wind generation section (5) that allows the particulate matter charged by the particle charging section (3) to flow toward an outflow-side end (7) of the cavity, the particle charging section, the collection section (4), and the ion wind generation section (5) being provided inside the cavity in this order from the inflow-side end (6). The particulate matter detecting apparatus has a reduced size, shows only a small measurement error, and can be produced inexpensively.
摘要翻译：一种颗粒物检测装置（100），包括：检测装置主体，具有通过检测装置主体形成的空腔（2）;粒子充填部（3），其能够通过流入（6）的收集部（4），能够收集粒状物充填部（3）所装载的粒子状物并测定粒子状物的量的收集部（4）和离子风生成部（5）允许由颗粒充填部分（3）装入的颗粒物质流向空腔的流出侧端部（7），颗粒充电部分，收集部分（4）和离子风发生部分（5）为从流入侧端部（6）依次设置在空腔内。颗粒物检测装置的尺寸减小，仅显示小的测量误差，并且可以廉价地生产。

34. 发明授权

US07540923B2 Shower head structure for processing semiconductor 失效
标题翻译：用于加工半导体的淋浴头结构
公开(公告)号：US07540923B2
公开(公告)日：2009-06-02
申请号：US10505169
申请日：2003-02-28
申请人： Toshio Takagi , Takeshi Sakuma , Yuji Kato , Kenji Matsumoto
发明人： Toshio Takagi , Takeshi Sakuma , Yuji Kato , Kenji Matsumoto
IPC分类号： C23C16/52 , C23F1/00 , H01L21/306 , C23C16/18
CPC分类号： H01J37/32935 , H01J37/3244 , H01L21/67115
摘要： A shower head structure disposed in a device 2 for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a shower head 12 having a plurality of gas injection holes 20B for supplying the processing gas and a light introducing rod 68 of a radiation thermometer 66 inserted into at least one of the gas injection holes 20B.
摘要翻译：一种淋浴喷头结构，其设置在用于处理半导体的装置2中，同时向处理空间S供应处理气体，所述处理空间S用于存储加热的处理基板W，包括具有多个用于供应处理气体的气体注入孔20B的喷头12，插入至少一个气体注入孔20B的辐射温度计66的光导入杆68。

35. 发明申请

US20080072574A1 Plasma reactor 失效
标题翻译：等离子体反应器
公开(公告)号：US20080072574A1
公开(公告)日：2008-03-27
申请号：US11723721
申请日：2007-03-21
申请人： Masaaki Masuda , Michio Takahashi , Takeshi Sakuma
发明人： Masaaki Masuda , Michio Takahashi , Takeshi Sakuma
IPC分类号： F01N3/01 , H05H1/24
CPC分类号： H01J37/32431 , B01D53/32 , B01D53/944 , B01D2258/012 , B01D2259/818 , F01N3/01 , F01N3/023 , F01N2240/28 , H05H1/2406 , H05H2001/2412 , H05H2245/1215
摘要： The present invention provides a plasma reactor which can suppress deactivation of components (active components) activated by plasma when causing exhaust gas to flow through a plasma generating space to ensure efficient reaction between the active components and particulate matter, whereby the particulate matter can be efficiently purified via reaction. The plasma reactor includes a plasma reactor main body 1, a positive electrode 11 disposed on an inlet side 2 of the plasma reactor main body 1, a conductive honeycomb filter 21 disposed so that a filter inlet side 22 faces an outlet side 3 of the plasma reactor main body 1, and a pulse power supply 31 which is connected with the positive electrode 11 and the honeycomb filter 21 and is capable of applying a pulse voltage between the positive electrode 11 and the honeycomb filter 21 as plasma generating electrodes to generate plasma.
摘要翻译：本发明提供了一种等离子体反应器，其可以抑制当等离子体产生的废气流过等离子体产生空间时由等离子体活化的组分（活性组分）失活，以确保活性组分与颗粒物质之间的有效反应，由此颗粒物质可以有效地通过反应纯化。等离子体反应器包括等离子体反应器主体1，设置在等离子体反应器主体1的入口侧2上的正极11，设置成使过滤器入口侧22面向等离子体的出口侧3的导电蜂窝过滤器21 反应器主体1和与正极11和蜂窝过滤器21连接并能够在正极11和蜂窝过滤器21之间施加脉冲电压的脉冲电源31作为等离子体产生电极产生等离子体。

36. 发明申请

US20070242492A1 Pulse generator circuit 审中-公开
标题翻译：脉冲发生器电路
公开(公告)号：US20070242492A1
公开(公告)日：2007-10-18
申请号：US11405698
申请日：2006-04-18
申请人： Tatsuhiko Hatano , Takeshi Sakuma
发明人： Tatsuhiko Hatano , Takeshi Sakuma
IPC分类号： H02M7/537
CPC分类号： H02M7/537 , H03K3/53
摘要： A pulse generator circuit comprises a DC power supply (power supply voltage=V); a transformer series connected across the DC power supply; and a single switch; wherein an output is derived from the two ends of a secondary winding of the transformer. While the switch is on-state, a pulse of negative polarity is outputted from the two ends of the secondary winding. When the switch is turned off, a discharging to a resistive load is commenced and an induced electromotive force occurring in the transformer causes the output voltage to abruptly rise, thereby outputting a pulse of positive polarity.
摘要翻译：脉冲发生器电路包括直流电源（电源电压= V）; 连接直流电源的变压器系列; 和单个开关; 其中输出是从变压器的次级绕组的两端导出的。当开关处于导通状态时，从次级绕组的两端输出负极性的脉冲。当开关断开时，开始对电阻性负载的放电，并且变压器中产生的感应电动势使输出电压突然上升，从而输出正极性的脉冲。

37. 发明申请

US20060226883A1 High-voltage pulse generating circuit 有权
公开(公告)号：US20060226883A1
公开(公告)日：2006-10-12
申请号：US11447377
申请日：2006-06-06
申请人： Tatsuhiko Hatano , Takeshi Sakuma , Katsuji Iida
发明人： Tatsuhiko Hatano , Takeshi Sakuma , Katsuji Iida
IPC分类号： H03K3/00
CPC分类号： H03K17/105 , H03K3/57
摘要： A high-voltage pulse generating circuit has an inductor, a first semiconductor switch, and a second semiconductor switch which are connected in series between opposite terminals of a DC power supply unit, and a diode having a cathode terminal connected to a terminal of the inductor which has another terminal connected to an anode terminal of the first semiconductor switch, and an anode terminal connected to a gate terminal of the first semiconductor switch. The inductor stores an induction energy when the first semiconductor switch is rendered conductive by a turn-on of the second semiconductor switch, and generates a high-voltage pulse when the first semiconductor switch is turned off by a turn-off of the second semiconductor switch.

38. 发明申请

US20060208650A1 Plasma reactor 失效
标题翻译：等离子体反应器
公开(公告)号：US20060208650A1
公开(公告)日：2006-09-21
申请号：US11374120
申请日：2006-03-14
申请人： Atsuo Kondou , Yasumasa Fujioka , Takeshi Sakuma , Masaaki Masuda , Kenji Dosaka , Keizo Iwama
发明人： Atsuo Kondou , Yasumasa Fujioka , Takeshi Sakuma , Masaaki Masuda , Kenji Dosaka , Keizo Iwama
IPC分类号： H01J7/24
CPC分类号： H01J37/32009
摘要： A plasma reactor is provided with two or more plasma generating electrodes which are installed in series inside a gas passage in a casing, with each plasma generating electrode being electrically controlled independently. The surface area of the conductor on each unit electrode forming the plasma generating electrode installed on the upstream side of the gas passage is smaller than the surface area of the conductor on the unit electrode forming the plasma generating electrode installed on the downstream side of the gas passage. Plasma can be generated between each of the unit electrodes by supplying each of the plasma generating electrodes with independently controlled electric power. The plasma reactor can efficiently react specific components contained in the gas passing through the gas passage.
摘要翻译：等离子体反应器设置有两个或更多个等离子体产生电极，其串联安装在壳体中的气体通道内，每个等离子体产生电极被独立地电控制。形成设置在气体通道上游侧的等离子体发生电极的各单位电极上的导电体的表面积小于形成设置在气体下游侧的等离子体发生电极的单位电极上的导体的表面积通道。可以通过向等离子体产生电极中的每一个提供独立控制的电力而在每个单元电极之间产生等离子体。等离子体反应器可以有效地反应通过气体通道的气体中包含的特定组分。

39. 发明申请

US20050282033A1 Black zinc-plated steel sheet 有权
标题翻译：黑色镀锌钢板
公开(公告)号：US20050282033A1
公开(公告)日：2005-12-22
申请号：US10536564
申请日：2004-01-30
申请人： Hiroki Nakamaru , Yuuzo Ootuka , Takeshi Sakuma , Hiroyuki Ogata , Shigeru Umino , Chiyoko Tada
发明人： Hiroki Nakamaru , Yuuzo Ootuka , Takeshi Sakuma , Hiroyuki Ogata , Shigeru Umino , Chiyoko Tada
IPC分类号： B05D7/00 , B05D7/16 , C23C2/26 , C23C22/42 , C23C28/00 , B32B15/18
CPC分类号： C23C22/42 , B05D7/16 , B05D7/52 , C23C2/26 , C23C28/00 , Y10T428/12549 , Y10T428/12556 , Y10T428/12569 , Y10T428/12611 , Y10T428/12799 , Y10T428/265 , Y10T428/31678
摘要： A black galvanized steel sheet including a composite coating layer formed on a surface of a blackened galvanized steel sheet by applying a treatment solution containing a phosphate ion, a vanadate ion, a metal ion, an α,β-unsaturated carboxylic acid and a glycoluril resin; and an organic resin layer formed on the composite coating layer, is provided. The black galvanized steel sheet is excellent in heat absorption and heat dissipation, electrical conductance, and corrosion resistance in a worked portion. Furthermore, the black galvanized steel sheet does not include hexavalent chromium.
摘要翻译：一种黑色镀锌钢板，其通过涂布含有磷酸根离子，钒酸根离子，金属离子，α，β-不饱和羧酸和甘脲醛树脂的处理液形成在黑化镀锌钢板的表面上的复合涂层 ; 并且在复合涂层上形成有机树脂层。黑色镀锌钢板在加工部分中的吸热和散热性，导电性和耐腐蚀性优异。此外，黑色镀锌钢板不包括六价铬。

40. 发明申请

US20050118737A1 Shower head structure for processing semiconductor 失效
标题翻译：用于加工半导体的淋浴头结构
公开(公告)号：US20050118737A1
公开(公告)日：2005-06-02
申请号：US10505169
申请日：2003-02-28
申请人： Toshio Takagi , Takeshi Sakuma , Yuji Kato , Kenji Matsumoto
发明人： Toshio Takagi , Takeshi Sakuma , Yuji Kato , Kenji Matsumoto
IPC分类号： C23C16/52 , H01J37/32 , H01L21/00 , H01L21/3065 , H01L21/31 , H01L21/66 , C23C16/00 , G01R31/26 , H01L21/44
CPC分类号： H01J37/32935 , H01J37/3244 , H01L21/67115
摘要： A shower head structure disposed in a device 2 for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a shower head 12 having a plurality of gas injection holes 20B for supplying the processing gas and a light introducing rod 68 of a radiation thermometer 66 inserted into at least one of the gas injection holes 20B.
摘要翻译：一种淋浴头结构，其设置在用于处理半导体的设备2中，同时向处理空间S供应处理气体，用于存储加热的处理基板W，包括具有多个用于供应处理气体的气体注入孔20B的喷头12，插入至少一个气体注入孔20B中的辐射温度计66的光导入杆68。

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