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    • 36. 发明授权
    • Roll-vortex plasma chemical vapor deposition system
    • 卷涡等离子体化学气相沉积系统
    • US07464663B2
    • 2008-12-16
    • US11420429
    • 2006-05-25
    • Marvin S KeshnerWarren B. JacksonKrzysztof Nauka
    • Marvin S KeshnerWarren B. JacksonKrzysztof Nauka
    • C23C16/00B05C11/00C23F1/00H01L21/306
    • C23C16/45502C23C16/4412C23C16/45578C23C16/509H01J37/32082H01J37/3244H01J37/32449
    • A system comprises a processing chamber for maintaining a hydrogen plasma at low pressure. The processing chamber has a long, wide, thin geometry to favor deposition of thin-film silicon on sheet substrates over the chamber walls. The sheet substrates are moved through between ends. A pair of opposing radio frequency electrodes above and below the workpieces are electrically driven hard to generate a flat, pancaked plasma cloud in the middle spaces of the processing chamber. A collinear series of gas injector jets pointed slightly up on a silane-jet manifold introduce 100% silane gas at high velocity from the side in order to roll the plasma cloud in a coaxial vortex. A second such silane-jet manifold is placed on the opposite side and pointed slightly down to further help roll the plasma and maintain a narrow band of silane concentration. A silane-concentration monitor observes the relative amplitudes of the spectral signatures of the silane and the hydrogen constituents in the roll-vortex plasma and outputs a process control feedback signal that is used to keep the silane in hydrogen concentration at about 6-7%.
    • 一种系统包括用于在低压下维持氢等离子体的处理室。 处理室具有长的,宽的,薄的几何形状,以有利于在室壁上的薄片基材上沉积薄膜硅。 片材基片在两端之间移动。 在工件上方和下方的一对相对的射频电极被电驱动,以在处理室的中间空间中产生平坦的,扁平的等离子体云。 在硅烷喷射歧管上略微向上突出的共线系列气体喷射器喷嘴从侧面以高速度引入100%硅烷气体,以在同轴涡流中滚动等离子体云。 第二个这样的硅烷喷射歧管放置在相反的一侧并稍微向下倾斜,以进一步帮助滚动等离子体并保持窄的硅烷浓度带。 硅烷浓度监测器观察到辊涡流等离子体中硅烷和氢组分的光谱特征的相对振幅,并输出用于将硅烷在氢浓度中保持在约6-7%的过程控制反馈信号。