专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US5237031A Organic solid electrolyte 失效
标题翻译：有机固体电解质
公开(公告)号：US5237031A
公开(公告)日：1993-08-17
申请号：US652759
申请日：1991-02-08
申请人： Tadahiko Kubota , Shoichiro Yasunami
发明人： Tadahiko Kubota , Shoichiro Yasunami
IPC分类号： H01B1/12 , H01M6/16 , H01M10/052 , H01M10/0565
CPC分类号： H01M10/052 , H01B1/122 , H01M10/0565 , H01M6/164
摘要： An organic solid electrolyte is disclosed, which comprises a high molecular compound having a recurring unit represented by following formula (I), a nonprotonic polar solvent, and a salt of a metal ion belonging to group Ia or group IIa of the Periodic Table: ##STR1## wherein R.sub.1 represents a hydrogen atom, a lower alkyl group, a cyano group, or a chlorine atom; R.sub.2 represents a lower alkyl group, an alkenyl group, an aryl group, or an aralkyl group; X represents --CO.sub.2 --, ##STR2## --OCO--, or --O--, (wherein R.sub.3 represents a hydrogen atom or a lower alkyl group); L represents an alkylene group; a represents 0 or 1; and m represents an integer of from 0 to 5.
摘要翻译：公开了一种有机固体电解质，其包含具有由下式（I）表示的重复单元的高分子化合物，非质子极性溶剂和属于元素周期表第Ia族或第IIa族的金属离子的盐：（I）其中R1表示氢原子，低级烷基，氰基或氯原子; R2表示低级烷基，烯基，芳基或芳烷基; X表示-CO 2 - ， - OCO-或-O-，（其中R 3表示氢原子或低级烷基）。 L表示亚烷基; a表示0或1; m表示0〜5的整数。

32. 发明授权

US5153115A Silver halide photographic materials and method for manufacture thereof 失效
标题翻译：卤化银照相材料及其制造方法
公开(公告)号：US5153115A
公开(公告)日：1992-10-06
申请号：US742497
申请日：1991-08-05
申请人： Shoichiro Yasunami , Yasuo Mukunoki
发明人： Shoichiro Yasunami , Yasuo Mukunoki
IPC分类号： C08F16/36 , C08F16/38 , C08F18/00 , C08F18/24 , C08F20/10 , C08F20/26 , C08F20/34 , C08F20/38 , C08F20/52 , C08F20/54 , G03C1/85 , G03C1/89
CPC分类号： G03C1/89 , G03C1/853 , G03C1/895
摘要： Silver halide photographic materials are disclosed, comprising a support having thereon at least one photosensitive silver halide emulsion layer, wherein at least one layer of said photographic material is formed by polymerizing a film which contains a compound represented by formula (I): ##STR1## wherein X represents --CO--, --COO--, --OCO-- or an arylene group; L represents an alkylene group, an aralkylene group or an arylene group, any of which can optionally have substituents; Y represents --CO--, --SO.sub.2 -- or --NHCO--; m and p each independently represents 0 to 1, provided that when X is ##STR2## m is 1; Z represents --O--, --S-- or ##STR3## R.sub.1 represents a hydrogen atom, an alkyl group, a halogen atom or a cyano group; R.sub.2, R.sub.3 and R.sub.4 represent lower alkylene groups; R.sub.5 represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, an aralkyl group, --CO--R.sub.9 or --SO.sub.2 R.sub.9, any of which, other than a hydrogen atom, can optionally have substituents; R.sub.6, R.sub.7 and R.sub.8 represent hydrogen atoms, alkyl groups or alkenyl groups, any of which, other than hydrogen atoms, can optionally have substituents; R.sub.9 represents an alkyl group, an alkenyl group, an aryl group or an aralkyl group, any of which can optionally have substituents; and a, b and c each independently represents an integer of value from 0 to 30, and a, b and c are not all equal to 0.
摘要翻译：公开了卤化银照相材料，其包括其上具有至少一个光敏卤化银乳剂层的载体，其中至少一层所述照相材料是通过聚合含有由式（I）表示的化合物的膜形成的：（I）其中X表示-CO - ， - COO - ， - OCO-或亚芳基; L表示亚烷基，亚芳烷基或亚芳基，其中任何一个可任选具有取代基; Y表示-CO-，-SO 2 - 或-NHCO-; m和p各自独立地表示0至1，条件是当X是m时，m是1; Z表示-O - ， - S-或R1表示氢原子，烷基，卤素原子或氰基。 R2，R3和R4表示低级亚烷基; R5表示氢原子，烷基，烯基，芳基，芳烷基，-CO-R9或-SO2R9，氢原子以外的任何一个都可以具有取代基; R 6，R 7和R 8表示氢原子，烷基或链烯基，除氢原子之外，任选具有取代基; R9表示烷基，烯基，芳基或芳烷基，其中任何一个可任选地具有取代基; a，b和c各自独立地表示0〜30的整数，a，b，c不全部为0。

33. 发明授权

US07090960B2 Negative resist composition 有权
公开(公告)号：US07090960B2
公开(公告)日：2006-08-15
申请号：US10330332
申请日：2002-12-30
申请人： Shoichiro Yasunami , Kunihiko Kodama
发明人： Shoichiro Yasunami , Kunihiko Kodama
IPC分类号： G03F7/038
CPC分类号： G03F7/0045 , G03F7/0382
摘要： A negative resist composition comprising (A) an alkali-soluble polymer, (B) a cross-linking agent forming cross-links between molecules of the alkali-soluble polymer (A) under the action of an acid and (C) a specified acid generator, which can satisfy all of performance requirements concerning sensitivity, resolution, pattern profile and line-edge roughness in the pattern formation by irradiation with electron beams or X-rays.

34. 发明授权

US06887647B2 Negative-working resist composition for electron beams or x-rays 失效
标题翻译：用于电子束或X射线的负性抗蚀剂组合物
公开(公告)号：US06887647B2
公开(公告)日：2005-05-03
申请号：US10101178
申请日：2002-03-20
申请人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
发明人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
IPC分类号： C08F12/24 , C08F20/26 , C08F20/56 , C08F28/02 , C08K5/00 , C08K5/16 , C08L101/00 , G03F7/004 , G03F7/038 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/115
摘要： A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.
摘要翻译：一种用于电子束或X射线的负性抗蚀剂组合物，其包含（A）通过照射电子束或X射线产生磺酸的化合物，（B）不溶于水并溶于碱性水溶液的树脂溶液，（C）通过酸作用与树脂（B）交联的交联剂，和（D）通过电子束或X射线的照射产生具有特定结构的羧酸的化合物。

35. 发明申请

US20080096130A1 POSITIVE RESIST COMPOSITION 有权
标题翻译：积极抵抗组成
公开(公告)号：US20080096130A1
公开(公告)日：2008-04-24
申请号：US11926479
申请日：2007-10-29
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/73
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

36. 发明授权

US07332258B2 Positive resist composition and process for forming pattern using the same 有权
标题翻译：正型抗蚀剂组成和使用其形成图案的工艺
公开(公告)号：US07332258B2
公开(公告)日：2008-02-19
申请号：US10941925
申请日：2004-09-16
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification, and is insoluble or slightly soluble in an alkali developer and becomes soluble in an alkali developer by an action of an acid, and (B) a compound generating a sulfonic acid compound represented by formula (3) defined in the specification upon irradiation of actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且不溶或微溶于碱显影剂并且通过酸的作用变得可溶于碱性显影剂，和（B）在光化射线或辐射照射时产生本说明书中定义的式（3）表示的磺酸化合物的化合物。

37. 发明授权

US06773862B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US06773862B2
公开(公告)日：2004-08-10
申请号：US10274386
申请日：2002-10-21
申请人： Koji Shirakawa , Yutaka Adegawa , Shoichiro Yasunami
发明人： Koji Shirakawa , Yutaka Adegawa , Shoichiro Yasunami
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10S430/168
摘要： A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.
摘要翻译：一种负性抗蚀剂组合物，其包含：（A）能够在用光化射线或辐射照射时能够产生酸的化合物; （B）碱溶性聚合物; 和（C）至少两种能够通过酸的作用与聚合物（B）发生交联的交联剂，其中所述交联剂（C）包含至少两种具有彼此不同骨架的化合物，其被选择在苯环上具有羟甲基和烷氧基甲基中的至少一个的苯酚衍生物，其中羟甲基和烷氧基甲基的和为两个或多个，所述至少两种交联剂中的一种包含一个或两个其分子中的苯环，并且所述至少两种交联剂中的另一种在其分子中包含3至5个苯环。

38. 发明授权

US06270941B1 Positive silicone-containing photosensitive composition 失效
标题翻译：含有机硅的感光组合物
公开(公告)号：US06270941B1
公开(公告)日：2001-08-07
申请号：US09493285
申请日：2000-01-28
申请人： Shoichiro Yasunami
发明人： Shoichiro Yasunami
IPC分类号： G03F7004
CPC分类号： G03F7/0757 , C08L83/06 , G03F7/0045 , C08L2666/04 , C08L2666/28
摘要： Disclosed is a positive silicone-containing photosensitive composition comprising a water-insoluble and alkali-soluble silicon-containing polymer having a specific siloxane structure, a compound which generates an acid upon irradiation with actinic rays or radiation, and a polymer having a repeating unit of a specific structure and showing the enhanced solubility in an alkaline developing solution by the action of an acid.
摘要翻译：公开了一种含有有机硅的光敏组合物，其包含具有特定硅氧烷结构的水不溶性和碱溶性含硅聚合物，在光化辐射或辐射下产生酸的化合物，以及具有重复单元的聚合物具体结构，并且通过酸的作用显示出在碱性显影液中的增强的溶解度。

39. 发明授权

US5340672A Secondary battery 失效
标题翻译：二次电池
公开(公告)号：US5340672A
公开(公告)日：1994-08-23
申请号：US85173
申请日：1993-07-02
申请人： Tadahiko Kubota , Shoichiro Yasunami , Yukio Maekawa
发明人： Tadahiko Kubota , Shoichiro Yasunami , Yukio Maekawa
IPC分类号： H01B1/06 , H01M2/16 , H01M4/58 , H01M4/587 , H01M4/96 , H01M6/16 , H01M6/22 , H01M10/05 , H01M10/0565 , H01M10/0568 , H01M10/00
CPC分类号： H01M10/0565 , H01M10/052 , H01M2/16 , H01M6/22 , H01M10/0525 , H01M4/131 , H01M4/133 , H01M4/485 , H01M4/505 , H01M4/525 , H01M6/168
摘要： A secondary battery containing at least a negative electrode, a positive electrode, an electrolyte comprising an alkaline metal salt dissolved therein, and a separator in which the said separator includes a high molecular solid electrolyte membrane formed by coating a latex on a porous membrane, and then drying the material. The separator may include a high molecular solid electrolyte membrane formed by coating a latex on both surfaces of a porous membrane, and then drying the material.
摘要翻译：至少含有负极，正极，溶解有碱金属盐的电解质的二次电池以及分离器，其中所述隔板包括通过在多孔膜上涂布胶乳而形成的高分子固体电解质膜，以及然后干燥材料。隔板可以包括通过在多孔膜的两个表面上涂布胶乳形成的高分子固体电解质膜，然后干燥该材料。

40. 发明授权

US5250409A Silver halide photographic material 失效
标题翻译：卤化银照相材料
公开(公告)号：US5250409A
公开(公告)日：1993-10-05
申请号：US935336
申请日：1992-08-27
申请人： Shoichiro Yasunami , Yasuo Mukunoki
发明人： Shoichiro Yasunami , Yasuo Mukunoki
IPC分类号： G03C1/89 , G03C1/35
CPC分类号： G03C1/89
摘要： A silver halide photographic material which comprises a support having thereon one or more constituent layers including at least one silver halide emulsion layer, wherein at least one of said constituent layers is a layer formed by (a) coating a composition which contains a high molecular weight compound having at least one repeating unit represented by the following formula (I), and then (b) making the composition undergo a crosslinking reaction: ##STR1## wherein R.sub.1 represents a hydrogen atom, an alkyl group, a chlorine atom, or a cyano group; R.sub.2 and R.sub.3, which may be the same or different, each represents an alkyl group; L.sub.1 and L.sub.2 each represents a divalent linking group; Y represents --O--, or ##STR2## wherein R.sub.4 represents a hydrogen atom, or an alkyl group; X represents a crosslinking group containing an activated vinyl component; and Z represents a counter ion for balancing the electric charge.
摘要翻译：一种卤化银照相材料，其包含其上具有一个或多个包含至少一个卤化银乳剂层的构成层的载体，其中所述构成层中的至少一个是通过（a）涂覆含有高分子量的组合物形成的层具有至少一个由下式（I）表示的重复单元的化合物，然后（b）使组合物进行交联反应：其中R 1表示氢原子，烷基，氯原子，或氰基; R 2和R 3可以相同或不同，各自表示烷基; L1和L2各自表示二价连接基团; Y表示-O-或其中R 4表示氢原子或烷基; X表示含有活性乙烯基成分的交联基团; Z表示用于平衡电荷的抗衡离子。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式