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1. 发明授权

US06746813B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US06746813B2
公开(公告)日：2004-06-08
申请号：US10396583
申请日：2003-03-26
申请人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
发明人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , Y10S430/106
摘要： A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.
摘要翻译：一种负型抗蚀剂组合物，其包含（A-1）含有本说明书中定义的式（1）表示的重复单元的碱溶性树脂（A-2）含有式（2）表示的重复单元的碱溶性树脂，（B）通过酸的作用与碱溶性树脂（A-1）或（A-2）交联的交联剂，（C）在光化反应下产生酸的化合物射线或辐射，和（D）含氮碱性化合物。

2. 发明授权

US06887647B2 Negative-working resist composition for electron beams or x-rays 失效
标题翻译：用于电子束或X射线的负性抗蚀剂组合物
公开(公告)号：US06887647B2
公开(公告)日：2005-05-03
申请号：US10101178
申请日：2002-03-20
申请人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
发明人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
IPC分类号： C08F12/24 , C08F20/26 , C08F20/56 , C08F28/02 , C08K5/00 , C08K5/16 , C08L101/00 , G03F7/004 , G03F7/038 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/115
摘要： A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.
摘要翻译：一种用于电子束或X射线的负性抗蚀剂组合物，其包含（A）通过照射电子束或X射线产生磺酸的化合物，（B）不溶于水并溶于碱性水溶液的树脂溶液，（C）通过酸作用与树脂（B）交联的交联剂，和（D）通过电子束或X射线的照射产生具有特定结构的羧酸的化合物。

3. 发明授权

US06773862B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US06773862B2
公开(公告)日：2004-08-10
申请号：US10274386
申请日：2002-10-21
申请人： Koji Shirakawa , Yutaka Adegawa , Shoichiro Yasunami
发明人： Koji Shirakawa , Yutaka Adegawa , Shoichiro Yasunami
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/115 , Y10S430/143 , Y10S430/167 , Y10S430/168
摘要： A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.
摘要翻译：一种负性抗蚀剂组合物，其包含：（A）能够在用光化射线或辐射照射时能够产生酸的化合物; （B）碱溶性聚合物; 和（C）至少两种能够通过酸的作用与聚合物（B）发生交联的交联剂，其中所述交联剂（C）包含至少两种具有彼此不同骨架的化合物，其被选择在苯环上具有羟甲基和烷氧基甲基中的至少一个的苯酚衍生物，其中羟甲基和烷氧基甲基的和为两个或多个，所述至少两种交联剂中的一种包含一个或两个其分子中的苯环，并且所述至少两种交联剂中的另一种在其分子中包含3至5个苯环。

4. 发明授权

US07361446B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07361446B2
公开(公告)日：2008-04-22
申请号：US10812074
申请日：2004-03-30
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

5. 发明申请

US20050064327A1 Positive resist composition and process for forming pattern using the same 有权
标题翻译：正型抗蚀剂组成和使用其形成图案的工艺
公开(公告)号：US20050064327A1
公开(公告)日：2005-03-24
申请号：US10941925
申请日：2004-09-16
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： C08F212/14 , C08F220/10 , C08F220/42 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification, and is insoluble or slightly soluble in an alkali developer and becomes soluble in an alkali developer by an action of an acid, and (B) a compound generating a sulfonic acid compound represented by formula (3) defined in the specification upon irradiation of actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且不溶或微溶于碱显影剂并且通过酸的作用变得可溶于碱性显影剂，和（B）在光化射线或辐射照射时产生本说明书中定义的式（3）表示的磺酸化合物的化合物。

6. 发明授权

US08080362B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US08080362B2
公开(公告)日：2011-12-20
申请号：US11926479
申请日：2007-10-29
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/00 , G03F7/00 , H01L21/00
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

7. 发明授权

US07432034B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US07432034B2
公开(公告)日：2008-10-07
申请号：US10642291
申请日：2003-08-18
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/111
摘要： A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound containing: in the molecule one or more benzene rings; and at least two cross-linking groups bonded to any of the benzene rings, the cross-linking group being a group selected from the group consisting of a hydroxymethyl group, an alkoxymethyl group and an acyloxymethyl group; (B-2) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent contains at least two specific groups; and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
摘要翻译：本发明的负光刻胶组合物包含：（A）碱溶性树脂; （B-1）能够通过酸的作用与碱溶性树脂（A）交联的交联剂，其中交联剂是酚化合物，其在分子中含有一个或多个苯环; 和至少两个与任何苯环结合的交联基团，所述交联基团是选自羟甲基，烷氧基甲基和酰氧基甲基的基团; （B-2）能够通过酸的作用与碱溶性树脂（A）交联的交联剂，其中交联剂含有至少两个特定基团; 和（C）能够在用光化射线或辐射照射时能产生酸的化合物。

8. 发明授权

US07326513B2 Positive working resist composition 有权
标题翻译：积极的工作抗拒组成
公开(公告)号：US07326513B2
公开(公告)日：2008-02-05
申请号：US10791559
申请日：2004-03-03
申请人： Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
发明人： Shoichiro Yasunami , Koji Shirakawa , Kazuyoshi Mizutani
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045
摘要： A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or sparingly soluble in an alkali developing solution and becoming soluble in an alkali developing solution by the action of an acid, and (B) a compound capable of generating sulfonic acid upon irradiation with active rays or radiations in an amount of from 5 to 20% by weight based on the total solid content of the positive working resist composition.
摘要翻译：一种正性抗蚀剂组合物，其包含（A1）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且具有不溶或微溶于碱显影液，通过酸的作用变得可溶于碱性显影液，（B）以活性射线或辐射照射时能够产生磺酸的化合物的量为5〜20重量％，基于正性抗蚀剂组合物的总固体含量。

9. 发明申请

US20080096130A1 POSITIVE RESIST COMPOSITION 有权
标题翻译：积极抵抗组成
公开(公告)号：US20080096130A1
公开(公告)日：2008-04-24
申请号：US11926479
申请日：2007-10-29
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/73
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

10. 发明授权

US07332258B2 Positive resist composition and process for forming pattern using the same 有权
标题翻译：正型抗蚀剂组成和使用其形成图案的工艺
公开(公告)号：US07332258B2
公开(公告)日：2008-02-19
申请号：US10941925
申请日：2004-09-16
申请人： Shoichiro Yasunami , Koji Shirakawa
发明人： Shoichiro Yasunami , Koji Shirakawa
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification, and is insoluble or slightly soluble in an alkali developer and becomes soluble in an alkali developer by an action of an acid, and (B) a compound generating a sulfonic acid compound represented by formula (3) defined in the specification upon irradiation of actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）含有本说明书中定义的式（1）表示的重复单元的树脂和由说明书中定义的式（2）表示的重复单元，并且不溶或微溶于碱显影剂并且通过酸的作用变得可溶于碱性显影剂，和（B）在光化射线或辐射照射时产生本说明书中定义的式（3）表示的磺酸化合物的化合物。

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