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31. 发明授权

US06712078B2 Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same 失效
标题翻译：用于清洁半导体晶片的设备及使用其清洁晶片的方法
公开(公告)号：US06712078B2
公开(公告)日：2004-03-30
申请号：US09899226
申请日：2001-07-06
申请人： Im-soo Park , Kun-tack Lee , Yong-pil Han , Sang-rok Hah
发明人： Im-soo Park , Kun-tack Lee , Yong-pil Han , Sang-rok Hah
IPC分类号： B08B704
CPC分类号： H01L21/67115 , B08B3/04 , B08B7/0071 , H01L21/67051 , Y10S134/902
摘要： An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying cleaning solution onto the wafer, a cover for covering an upper part of the chamber, a heating lamp fixed on an upper part of the cover for heating the wafer or the cleaning solution, a cooling water conduit surrounding the cover, and an antipollution plate mounted on a lower part of the heating lamp in the cover for preventing the heating lamp from being polluted by the cleaning solution. According to an embodiment of the present invention, the cleaning solution, preferably of ozone water, hydrogen water, or electrolytic-ionized water, is heated for a short time and used to clean the wafer.
摘要翻译：一种用于清洁半导体晶片的装置及其清洗方法，其特征在于，所述装置包括：安装有晶片的腔室;安装在所述腔室中的用于支撑和固定晶片的旋转卡盘;用于喷射清洗液的喷嘴在所述晶片上，覆盖所述室的上部的盖，固定在所述盖的上部用于加热所述晶片或所述清洁溶液的加热灯，围绕所述盖的冷却水导管和安装在所述盖上的防污染板罩中的加热灯的下部，以防止加热灯被清洁溶液污染。根据本发明的一个实施方案，优选将臭氧水，氢水或电解电离水的清洁溶液加热很短时间并用于清洁晶片。

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