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31. 发明授权

US06717296B2 Lithographic apparatus and motor for use in the apparatus 有权
标题翻译：用于设备的平版印刷设备和电机
公开(公告)号：US06717296B2
公开(公告)日：2004-04-06
申请号：US10222975
申请日：2002-08-19
申请人： Sven Antoin Johan Hol , Jan Van Eijk , Angelo Oscar Peter De Klerk , Harmen Klaas Van Der Schoot
发明人： Sven Antoin Johan Hol , Jan Van Eijk , Angelo Oscar Peter De Klerk , Harmen Klaas Van Der Schoot
IPC分类号： H02K41035
CPC分类号： G03F7/70758 , H02K41/0356 , Y10S414/135
摘要： A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.
摘要翻译：洛伦兹致动器在装置的第一部分和第二部分之间提供力，包括附接到装置的第一部分并提供第一磁场的主磁体系统; 辅助磁体系统，附接到第一部分并且以Halbach配置布置，提供第二磁场; 以及导电元件，其附接到所述设备的第二部分并且布置成通过所述导电元件承载的电流与所述第一和第二元件的组合相互作用而在所述设备的所述第一和第二部分之间产生力磁场。

32. 发明授权

US5953105A Positioning device with a reference frame for a measuring system, and a lithographic device provided with such a positioning device 失效
标题翻译：具有用于测量系统的参考系的定位装置以及设置有这种定位装置的光刻装置
公开(公告)号：US5953105A
公开(公告)日：1999-09-14
申请号：US776418
申请日：1997-01-30
申请人： Gerard Van Engelen , Frank B. Sperling , Henricus W. A. Janssen , Adianus G. Bouwer , Cornelis D. Van Dijk , Johannes M. M. Van Kimmenade , Jan Van Eijk , Adrianus Van Der Pal
发明人： Gerard Van Engelen , Frank B. Sperling , Henricus W. A. Janssen , Adianus G. Bouwer , Cornelis D. Van Dijk , Johannes M. M. Van Kimmenade , Jan Van Eijk , Adrianus Van Der Pal
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/709 , G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70833 , G03F9/70
摘要： A lithographic device comprising a mask table (5), a projection system (3), a substrate table (1) which is displaceable relative to the projection system (3) by means of a drive unit (21), and a measuring system (39) for measuring a position of the substrate table (1) relative to the projection system (3). A stationary part (157) of the drive unit (21) is fastened to a machine frame (85) of the lithographic device, while a stationary part (51, 53, 55) of the measuring system (39) is fastened to a reference frame (89) of the lithographic device which is dynamically isolated from the machine frame (85) by means of dynamic isolators (95). This prevents vibrations caused in the machine frame (85) by reaction forces of the drive unit (21) from being transmitted to the reference frame (89), so that the accuracy of the measuring system (39) is not adversely affected by such vibrations. The mask table (5) is displaceable relative to the projection system (3) by means of a further drive unit (31) having a stationary part (119) fastened to the machine frame (85), and the measuring system comprises a further stationary part (71, 73, 75) for measuring a position of the mask table (5) relative to the projection system (3), said further stationary part (71, 73, 75) being fastened to the reference frame (89).
摘要翻译： PCT No.PCT / IB96 / 00383 Sec。 371日期1997年1月30日 102（e）1997年1月30日PCT PCT 1996年4月29日PCT公布。出版物WO96 / 38765 日期1996年12月5日一种光刻设备，包括一个掩模台（5），一个投影系统（3），一个通过驱动单元（21）可相对于投影系统（3）移位的衬底台（1）以及用于测量所述基板台（1）相对于所述投影系统（3）的位置的测量系统（39）。驱动单元（21）的固定部分（157）被紧固到平版印刷装置的机架（85）上，而测量系统（39）的固定部分（51,53,55）被固定到参考通过动态隔离器（95）与机架（85）动态隔离的光刻设备的框架（89）。这防止由驱动单元（21）的反作用力引起的机架（85）的振动传递到参考框架（89），使得测量系统（39）的精度不受这种振动的不利影响。掩模台（5）可通过具有固定在机架（85）上的固定部分（119）的另外的驱动单元（31）相对于投影系统（3）移动，并且测量系统包括另外的固定用于测量掩模台（5）相对于投影系统（3）的位置的部分（71,73,75），所述另外的固定部分（71,73,75）紧固到参考框架（89）。

33. 发明授权

US5844666A Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device 失效
公开(公告)号：US5844666A
公开(公告)日：1998-12-01
申请号：US642014
申请日：1996-05-02
申请人： Gerard Van Engelen , Cornelis D. Van Dijk , Johannes M. M. Van Kimmenade , Jan Van Eijk
发明人： Gerard Van Engelen , Cornelis D. Van Dijk , Johannes M. M. Van Kimmenade , Jan Van Eijk
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68 , G03B27/58 , G03B27/42 , G03B27/62
CPC分类号： G03F7/70241 , G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A positioning device with a drive unit with which an object table is displaceable over a guide which is fastened to a first frame thereof. A stationary part of the drive unit is fastened to a second frame thereof and dynamically isolated from the first frame while a reaction force of the object table arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.

34. 发明授权

US07902494B2 System for detecting motion of a body 失效
标题翻译：用于检测身体运动的系统
公开(公告)号：US07902494B2
公开(公告)日：2011-03-08
申请号：US12067358
申请日：2006-09-13
申请人： Ronatus Gerardus Klaver , Theo Anjes Maria Ruijl , Michael Josepha Mathijs Renkens , Jan Van Eijk
发明人： Ronatus Gerardus Klaver , Theo Anjes Maria Ruijl , Michael Josepha Mathijs Renkens , Jan Van Eijk
IPC分类号： G01D5/38 , G03F9/00
CPC分类号： G01D5/38 , G03F7/70775 , G03F7/7085
摘要： The invention relates to a system (1) for detecting motion of a body (2) comprising a first elongated grating strip (4) coupled to said body and a separate and substantially stationary second elongated grating strip (5) crossing said first elongated grating strip. The system further comprises optical detection means (6) arranged to receive one or more light beams diffracted at said first and second elongated grating strips to detect motion of said body. The invention further relates to a method for detecting motion of a body (2) and to a body processing or inspection system.
摘要翻译：本发明涉及一种用于检测主体（2）的运动的系统（1），其包括耦合到所述主体的第一细长光栅条（4）和与所述第一细长光栅条交叉的单独且基本上固定的第二细长光栅条（5）。该系统还包括光学检测装置（6），其布置成接收在所述第一和第二细长光栅条带处衍射的一个或多个光束以检测所述主体的运动。本发明还涉及一种用于检测身体（2）和身体加工或检查系统的运动的方法。

35. 发明申请

US20090001260A1 System for Detecting Motion of a Body 失效
标题翻译：用于检测身体运动的系统
公开(公告)号：US20090001260A1
公开(公告)日：2009-01-01
申请号：US12067358
申请日：2006-09-13
申请人： Ronatus Gerardus Klaver , Theo Anjes Maria Ruijl , Michael Josepha Renkens , Jan Van Eijk
发明人： Ronatus Gerardus Klaver , Theo Anjes Maria Ruijl , Michael Josepha Renkens , Jan Van Eijk
IPC分类号： G01D5/38
CPC分类号： G01D5/38 , G03F7/70775 , G03F7/7085
摘要： The invention relates to a system (1) for detecting motion of a body (2) comprising a first elongated grating strip (4) coupled to said body and a separate and substantially stationary second elongated grating strip (5) crossing said first elongated grating strip. The system further comprises optical detection means (6) arranged to receive one or more light beams diffracted at said first and second elongated grating strips to detect motion of said body. The invention further relates to a method for detecting motion of a body (2) and to a body processing or inspection system.
摘要翻译：本发明涉及一种用于检测主体（2）的运动的系统（1），其包括耦合到所述主体的第一细长光栅条（4）和与所述第一细长光栅条交叉的单独且基本上固定的第二细长光栅条（5）。该系统还包括光学检测装置（6），其布置成接收在所述第一和第二细长光栅条带处衍射的一个或多个光束以检测所述主体的运动。本发明还涉及一种用于检测身体（2）和身体加工或检查系统的运动的方法。

36. 发明授权

US07375479B2 Apparatus for processing an object with high position accurancy 失效
标题翻译：用于处理具有高位置精度的物体的装置
公开(公告)号：US07375479B2
公开(公告)日：2008-05-20
申请号：US10539371
申请日：2003-12-15
申请人： Jan Van Eijk , Arjan Franklin Bakker , Dennis Erwin Bos , Johan Cornelis Compter , Angelo Cesar Peter De Klerk , Franciscus Martinus Roes , Hubert Gerard Jean Joseph Amaury Vroomen , Thomas Petrus Hendricus Warmerdam
发明人： Jan Van Eijk , Arjan Franklin Bakker , Dennis Erwin Bos , Johan Cornelis Compter , Angelo Cesar Peter De Klerk , Franciscus Martinus Roes , Hubert Gerard Jean Joseph Amaury Vroomen , Thomas Petrus Hendricus Warmerdam
IPC分类号： H02K41/00 , H02P1/00 , H02P3/00 , H02P5/00 , H02P7/00
CPC分类号： F16C32/0472 , F16C32/0444 , G05B2219/41327 , G05B2219/42092 , G05B2219/49276 , H01J37/20 , H01J2237/20278 , H01J2237/3175 , H02K11/22 , H02K41/031
摘要： A apparatus processes an object (19), such as a semi-conductor wafer at accurately controlled positions. The object (19) is supported by a working platform (12) that is moveable along a path. A suspension actuator part (14) attached to the working platform (12), contains a soft magnetic core (24) with poles facing the surface of a soft magnetic element (34) on the support structure along the path and a winding (20) for application of a current to generate a magnetic field that runs through the core (24) v the poles and returns via the soft magnetic element (34). A sensor (17) senses a measured position of the suspension actuator part (14) relative to the position reference element (16). A control circuit comprises an outer control circuit (40) and an inner control circuit (42). The outer control circuit (40) receives a sensing result and determines force set point information to regulate the measured position of the actuator part (14) to a required value. The inner control circuit (42) receives the force set point information and controls the current to realize a force between the actuator part (14) and the support structure (10) according to the force set point information.
摘要翻译：一种设备在精确控制的位置处理诸如半导体晶片的物体（19）。物体（19）由可沿着路径移动的工作平台（12）支撑。安装在工作平台（12）上的悬架致动器部件（14）包含一个软磁芯（24），该软磁芯（24）具有面向沿该路径的支撑结构上的软磁元件（34）表面的磁极和一个绕组（20）用于施加电流以产生穿过磁芯（24）的磁场，并通过软磁元件（34）返回磁极。传感器（17）相对于位置参考元件（16）感测悬架致动器部件（14）的测量位置。控制电路包括外部控制电路（40）和内部控制电路（42）。外部控制电路（40）接收感测结果并且确定力设定点信息以将致动器部件（14）的测量位置调节到所需值。内部控制电路（42）接收力设定点信息并根据力设定点信息控制电流以实现致动器部件（14）和支撑结构（10）之间的力。

37. 发明授权

US06943464B2 Lithographic apparatus and motor for use in the apparatus 有权
标题翻译：用于设备的平版印刷设备和电机
公开(公告)号：US06943464B2
公开(公告)日：2005-09-13
申请号：US10740576
申请日：2003-12-22
申请人： Sven Antoin Johan Hol , Jan Van Eijk , Angelo Cesar Peter De Klerk , Harmen Klaas Van Der Schoot
发明人： Sven Antoin Johan Hol , Jan Van Eijk , Angelo Cesar Peter De Klerk , Harmen Klaas Van Der Schoot
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H02K41/03 , H02K41/035
CPC分类号： G03F7/70758 , H02K41/0356 , Y10S414/135
摘要： A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.
摘要翻译：洛伦兹致动器在装置的第一部分和第二部分之间提供力，包括附接到装置的第一部分并提供第一磁场的主磁体系统; 辅助磁体系统，附接到第一部分并且以Halbach配置布置，提供第二磁场; 以及导电元件，其附接到所述设备的第二部分并且布置成通过所述导电元件承载的电流与所述第一和第二元件的组合相互作用而在所述设备的所述第一和第二部分之间产生力磁场。

38. 发明授权

US5844664A Positioning device with a force actuator system for compensating center-of-gravity displacements, and lithographic device provided with such a positioning device 失效
公开(公告)号：US5844664A
公开(公告)日：1998-12-01
申请号：US637895
申请日：1996-04-25
申请人： Johannes M. M. Van Kimmenade , Adrianus Van Der Pal , Jan Van Eijk
发明人： Johannes M. M. Van Kimmenade , Adrianus Van Der Pal , Jan Van Eijk
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/68 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/709
摘要： A positioning device (21, 31) with a drive unit (147, 149, 151; 69, 71) with which an object table (1, 5) is displaceable over a guide (141, 65) which is fastened to a frame (45) of the positioning device (21, 31). The positioning device (21, 31) includes a force actuator system (205) which exerts on the frame (45) a compensation force which has a moment about a reference point (P) of the frame (45) whose value is equal to a value of a moment of a force of gravity acting on the object table (1, 5) about the reference point (P), and whose direction is opposed to a direction of the moment of said force of gravity. The use of the force actuator system (205) prevents the frame (45) from vibrating or being elastically deformed when a point of application on the frame (45) of the force of gravity is displaced relative to the frame (45) during a displacement of the object table (1,5). The accuracy with which the object table (1, 5) can be positioned relative to the guide (141, 65) by the drive unit (147, 149, 151; 69, 71) is accordingly not adversely affected by such vibrations or deformations. The positioning device (21, 31) is used in a lithographic device for the manufacture of integrated semiconductor circuits. The lithographic device includes a first positioning device (21) with which a substrate holder (1) is displaceable relative to a focusing system (3), and a second positioning device (31) with which a mask holder (5) is displaceable relative to the focusing system (3). A special embodiment of a lithographic device includes a joint force actuator system (205) for the first positioning device (21) and the second positioning device (31), by which system displacements of the centers, of gravity of both the substrate holder (1) and the mask holder (5) can be compensated. The force actuator system has three force actuators (205) which are integrated with three dynamic isolators (51) with which a machine frame (45) of the lithographic device rests on a base (39).

39. 发明授权

US5767948A Lithographic device with a three-dimensionally positionable mask holder 失效
标题翻译：平版印刷设备，具有三维定位的掩模支架
公开(公告)号：US5767948A
公开(公告)日：1998-06-16
申请号：US642010
申请日：1996-05-02
申请人： Erik R. Loopstra , Frank B. Sperling , Hendricus J.M. Meijer , Jan Van Eijk
发明人： Erik R. Loopstra , Frank B. Sperling , Hendricus J.M. Meijer , Jan Van Eijk
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/677 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70833
摘要： A lithographic device includes a machine frame which supports a substrate holder, a focusing system and a mask holder in a vertical direction. The substrate holder is displaceable parallel to a horizontal X-direction and a horizontal Y-direction perpendicular to the X-direction by a first positioning device, and the mask holder is displaceable parallel to the X-direction by a second positioning device. The substrate holder and the mask holder are displaced synchronously parallel to the X-direction during exposure of a semiconductor substrate. The second positioning device is capable of positioning the mask holder also parallel to the Y-direction and of rotating it about a vertical axis of rotation. Therefore, a displacement of the mask holder has a parallelism to the X-direction which is determined by a positioning accuracy of the second positioning device and which is not adversely affected by a deviation from parallelism and straightness of a guide of the second positioning device. An accuracy with which the semiconductor substrate is exposed is improved by a factor corresponding to an optical reduction factor of the focusing system.
摘要翻译：光刻设备包括在垂直方向上支撑衬底保持器，聚焦系统和掩模保持器的机架。基板保持器可以通过第一定位装置平行于水平X方向和垂直于X方向的水平Y方向移位，并且掩模保持器可通过第二定位装置平行于X方向移位。衬底保持器和掩模保持器在半导体衬底的曝光期间与X方向平行地同步移位。第二定位装置能够将掩模支架定位成平行于Y方向并围绕垂直旋转轴线旋转。因此，掩模保持架的位移与X方向平行，该X方向由第二定位装置的定位精度确定，并且不受第二定位装置的引导件的平行度和平直度的偏差的不利影响。通过与聚焦系统的光学降低因子相对应的因子来提高半导体衬底的曝光精度。

40. 发明授权

US5204712A Support device with a tiltable object table, and optical lithographic device provided with such a support device 失效
标题翻译：具有可倾斜物体表的支撑装置和具有这种支撑装置的光学装置
公开(公告)号：US5204712A
公开(公告)日：1993-04-20
申请号：US774763
申请日：1991-10-09
申请人： Adrianus G. Bouwer , Marcel C. M. Baggen , Henricus W. A. Janssen , Petrus R. Bartray , Jan Van Eijk
发明人： Adrianus G. Bouwer , Marcel C. M. Baggen , Henricus W. A. Janssen , Petrus R. Bartray , Jan Van Eijk
IPC分类号： B23Q1/36 , B23Q1/54 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/68
CPC分类号： G03F7/70825 , B23Q1/36 , B23Q1/5462 , G03F7/70716 , H01L21/682
摘要： A support device comprises a first and a second bearing unit for guiding the support device along a base surface and a straight guide extending parallel to the base surface, respectively. The support device has an object table which is coupled to a rigidification member and which is displaceable relative to the two bearing units in a z-direction transverse to the base surface and is tiltable about at least one axis of rotation directed parallel to the base surface by three force actuators. The rigidification member is coupled to the second bearing unit by a coupling member which is elastically deformable in the z-direction, and coupled to the first bearing unit via the force actuators, whereby a statically determined coupling of the rigidification member and the object table to the two bearing units is obtained. The support device is particularly suitable for displacements of an object in the sub-micron range, such as, for example, in an optical lithographic device. In particular, an accurate focusing of the object may be obtained by the use of the support device in an optical lithographic device.

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