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    • 40. 发明授权
    • Non-volatile memory devices having floating gates
    • 具有浮动门的非易失性存储器件
    • US07592665B2
    • 2009-09-22
    • US11594327
    • 2006-11-08
    • Joon-Hee LeeJong-Ho ParkJin-Hyun ShinSung-Hoi HurYong-Seok KimJong-Won Kim
    • Joon-Hee LeeJong-Ho ParkJin-Hyun ShinSung-Hoi HurYong-Seok KimJong-Won Kim
    • H01L29/788
    • H01L29/7881H01L27/115H01L27/11521H01L29/42324
    • A nonvolatile memory device may include a substrate having a cell region, and a cell device isolation layer on the cell region of the substrate to define a cell active region. A floating gate may include a lower floating gate and an upper floating gate sequentially stacked on the cell active region, and a tunnel insulation pattern may be between the floating gate and the cell active region. A control gate electrode may be on the floating gate, and a blocking insulation pattern may be between the control gate electrode and the floating gate. More particularly, the upper floating gate may include a flat portion on the lower floating gate and a pair of wall portions extending upward from both edges of the flat portion adjacent to the cell device isolation layer. Moreover, a width of an upper portion of a space surrounded by the flat portion and the pair of wall portions may be larger than a width of a lower portion of the space. Related methods are also discussed.
    • 非易失性存储器件可以包括具有单元区域的衬底和在衬底的单元区域上的单元器件隔离层,以限定电池活性区域。 浮置栅极可以包括顺序堆叠在单元有源区上的下浮置栅极和上浮置栅极,并且隧道绝缘图案可以在浮栅和电池有源区之间。 控制栅极电极可以在浮置栅极上,并且阻挡绝缘图案可以在控制栅电极和浮栅之间。 更具体地说,上部浮动栅极可以包括在下部浮动栅极上的平坦部分和从邻近电池器件隔离层的平坦部分的两个边缘向上延伸的一对壁部分。 此外,由平坦部分和一对壁部分围绕的空间的上部的宽度可以大于空间的下部的宽度。 还讨论了相关方法。