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31. 发明授权

US09171655B2 Solid electrolyte film, and method for producing same 有权
标题翻译：固体电解质膜及其制造方法
公开(公告)号：US09171655B2
公开(公告)日：2015-10-27
申请号：US13574167
申请日：2011-02-15
申请人： Katsutoshi Suzuki , Yoshihiko Obara , Toru Tanaka , Haruhiko Komoriya
发明人： Katsutoshi Suzuki , Yoshihiko Obara , Toru Tanaka , Haruhiko Komoriya
IPC分类号： H01B1/12 , H01M8/04 , H01M8/10
CPC分类号： H01B1/122 , H01M8/04197 , H01M8/1011 , H01M8/1023 , H01M8/103 , Y02E60/523 , Y02P70/56
摘要： A solid electrolyte film including a resin having a repeating unit containing a bis(perfluoroalkanesulfonyl)methide moiety. This solid electrolyte film combines high proton conductivity with low methanol permeability for prevention of methanol crossover and can suitably be used for a direct methanol fuel cell.
摘要翻译：一种固体电解质膜，包括具有含有双（全氟烷基磺酰基）甲基化物部分的重复单元的树脂。这种固体电解质膜结合了高质子传导性和低甲醇渗透性，以防止甲醇交叉，并且可以适用于直接甲醇燃料电池。

32. 发明授权

US07378218B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07378218B2
公开(公告)日：2008-05-27
申请号：US11345325
申请日：2006-02-02
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： G03F7/004 , G03F7/32
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
摘要翻译：提供了包含式（1a）至（1d）的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团，R 2是单键或亚甲基，a1，a2，a3和a4是大于0至小于1的数，并且0

33. 发明授权

US07276623B2 Polymerizable ester compounds 有权
标题翻译：可聚合的酯化合物
公开(公告)号：US07276623B2
公开(公告)日：2007-10-02
申请号：US11440107
申请日：2006-05-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： C07C69/00 , G03C1/00
CPC分类号： G03F7/0397 , G03F7/0046
摘要： Ester compounds having formula (1) wherein R1 is fluorine or C1-C10 fluoroalkyl, R2 is C1-C10 alkylene or fluoroalkylene, and R3 is an acid labile group are novel. They can be polymerized into polymers which are used to formulate resist compositions, which are processed by the lithography involving ArF exposure, offering many advantages including improved resolution and transparency, minimal line edge roughness, improved etch resistance, and especially minimal surface roughness after etching.
摘要翻译：式（1）其中R 1是氟或C 1 -C 10氟烷基的酯化合物，其中R 1是氢或C 1 -C 10 - 是C 1 -C 10亚烷基或氟代亚烷基，R 3是酸不稳定基团是新的。它们可以聚合成用于配制抗蚀剂组合物的聚合物，其通过涉及ArF曝光的光刻加工，提供许多优点，包括改进的分辨率和透明度，最小的线边缘粗糙度，改善的耐蚀刻性，以及蚀刻后特别是最小的表面粗糙度。

34. 发明申请

US20060269871A1 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20060269871A1
公开(公告)日：2006-11-30
申请号：US11440126
申请日：2006-05-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： G03C1/00
CPC分类号： G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.
摘要翻译：包含式（1）的重复单元的聚合物，其中R 1是F或氟代烷基，R 2是亚烷基或氟代亚烷基，R 3是使用Mw为1,000-500,000的酸不稳定基团来配制抗蚀剂组合物，其通过涉及ArF曝光的光刻进行处理，并提供许多优点，包括分辨率，最小线边缘粗糙度，耐蚀刻性和蚀刻后的最小表面粗糙度。当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，组合物表现良好。

35. 发明申请

US20060269870A1 Novel polymerizable ester compounds 有权
标题翻译：新型可聚合酯化合物
公开(公告)号：US20060269870A1
公开(公告)日：2006-11-30
申请号：US11440107
申请日：2006-05-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0046
摘要： Ester compounds having formula (1) wherein R1 is fluorine or C1-C10 fluoroalkyl, R2 is C1-C10 alkylene or fluoroalkylene, and R3 is an acid labile group are novel. They can be polymerized into polymers which are used to formulate resist compositions, which are processed by the lithography involving ArF exposure, offering many advantages including improved resolution and transparency, minimal line edge roughness, improved etch resistance, and especially minimal surface roughness after etching.
摘要翻译：式（1）其中R 1是氟或C 1 -C 10氟烷基的酯化合物，其中R 1是氢或C 1 -C 10 - 是C 1 -C 10亚烷基或氟代亚烷基，R 3是酸不稳定基团是新的。它们可以聚合成用于配制抗蚀剂组合物的聚合物，其通过涉及ArF曝光的光刻加工，提供许多优点，包括改进的分辨率和透明度，最小的线边缘粗糙度，改善的耐蚀刻性，以及蚀刻后特别是最小的表面粗糙度。

36. 发明申请

US20060177765A1 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20060177765A1
公开(公告)日：2006-08-10
申请号：US11345325
申请日：2006-02-02
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： G03C1/76
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
摘要翻译：提供了包含式（1a）至（1d）的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团，R 2是单键或亚甲基，a1，a2，a3和a4是大于0至小于1的数，并且0

37. 发明授权

US07001707B2 Resist compositions and patterning process 有权
标题翻译：抗蚀剂组合物和图案化工艺
公开(公告)号：US07001707B2
公开(公告)日：2006-02-21
申请号：US10925014
申请日：2004-08-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Kazuhiro Yamanaka
IPC分类号： G03F7/004 , C08F114/18
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108
摘要： A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.
摘要翻译：包含具有醇基作为可溶性基团的环状聚合物和具有羧酸或六氟醇基团的聚合物的共聚物的抗蚀剂组合物，其氢原子被酸不稳定基团替代为基础树脂形成抗蚀剂膜，其透明度提高，碱溶解对比度和等离子体耐蚀刻性。

38. 发明授权

US06855477B2 Chemically amplified resist compositions and patterning process 有权
标题翻译：化学扩增抗蚀剂组合物和图案化工艺
公开(公告)号：US06855477B2
公开(公告)日：2005-02-15
申请号：US10256141
申请日：2002-09-27
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Haruhiko Komoriya , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Haruhiko Komoriya , Kazuhiko Maeda
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A chemically amplified resist composition comprising (A) a polymer comprising recurring units containing at least one fluorine atom, (B) a compound of formula (1) wherein R1 and R2 are H, F or alkyl or fluorinated alkyl, at least one of R1 and R2 contains at least one fluorine atom, R3 is a single bond or alkylene, R4 is a n-valent aromatic or cyclic diene group, R5 is H or C(═O)R6, R6 is H or methyl, and n is 2, 3 or 4, (C) an organic solvent, and (D) a photoacid generator is sensitive to high-energy radiation and has improved sensitivity and transparency at a wavelength of less than 200 nm.
摘要翻译：一种化学放大抗蚀剂组合物，其包含（A）包含含有至少一个氟原子的重复单元的聚合物，（B）式（1）的化合物，其中R 1和R 2为H，F或烷基或氟化烷基，R 1和R 2中的至少一个含有至少一个氟原子，R 3是单键或亚烷基，R 4是n价的芳族或环状二烯基，R 5 >为H或C（= O）R 6，R 6为H或甲基，n为2,3或4，（C）有机溶剂，（D）光致酸发生剂对高能量辐射，并且在小于200nm的波长下具有改善的灵敏度和透明度。

39. 发明授权

US06322606B1 Coated granular fertilizer and method for producing same 有权
标题翻译：涂层颗粒肥料及其制备方法
公开(公告)号：US06322606B1
公开(公告)日：2001-11-27
申请号：US09665123
申请日：2000-09-20
申请人： Haruhiko Komoriya , Kazuhiko Maeda , Masayuki Shiota , Yoshi Hirashima , Kentaro Tsutsumi , Mikio Ootani , Yukio Ikeda
发明人： Haruhiko Komoriya , Kazuhiko Maeda , Masayuki Shiota , Yoshi Hirashima , Kentaro Tsutsumi , Mikio Ootani , Yukio Ikeda
IPC分类号： C05G500
CPC分类号： C08G18/36 , C05G3/0029 , C08G18/5021 , C08G18/8051
摘要： The invention relates to a coated granular fertilizer having a film covering fertilizer granules. This film comprises a polyurethane resin prepared by a method comprising the steps of (a) reacting an aromatic polyisocyanate with a first polyol component (i.e., castor oil or a castor oil derivative), thereby to obtain a prepolymer having terminal isocyanate groups in the molecule; and (b) reacting the prepolymer with a second polyol component (i.e., castor oil or a castor oil derivative) and a third polyol component which is an amine having at least two hydroxyl groups in the molecule, thereby to cure the prepolymer and thus to prepare the polyurethane resin. The invention relates to another coated granular fertilizer having a film covering fertilizer granules. This film comprises a urethane resin and aqueous-fluid-absorbing particles having a particle diameter of from 1 to 200 &mgr;m. This urethane resin may be the above polyurethane resin. This coated granular fertilizer can be produced by a method comprising the steps of (a) applying an aromatic polyisocyanate, a polyol component (i.e., castor oil or a castor oil derivative), an amine, and the aqueous-fluid-absorbing particles, at the same time or separately in no special order, while the fertilizer granules are kept fluidized or rolled, thereby to form a precursory film on the fertilizer granules; and (b) curing the precursory film into the film. Each coated granular fertilizer is substantially superior in regulation of the release of plant nutrient elements therefrom.
摘要翻译：本发明涉及具有覆盖肥料颗粒的薄膜的涂覆颗粒肥料。该膜包括通过包括以下步骤的方法制备的聚氨酯树脂：（a）使芳族多异氰酸酯与第一多元醇组分（即蓖麻油或蓖麻油衍生物）反应，由此得到分子中具有末端异氰酸酯基团的预聚物 ; 和（b）使预聚物与第二多元醇组分（即蓖麻油或蓖麻油衍生物）和第三多元醇组分反应，所述第三多元醇组分是分子中具有至少两个羟基的胺，从而固化预聚物，从而使制备聚氨酯树脂。本发明涉及具有覆盖肥料颗粒的膜的另一种涂覆颗粒肥料。该膜包含聚氨酯树脂和粒径为1〜200μm的水溶液吸收性粒子。该聚氨酯树脂可以是上述聚氨酯树脂。该涂覆的颗粒肥料可以通过以下方法制备：（a）将芳族多异氰酸酯，多元醇组分（即蓖麻油或蓖麻油衍生物），胺和水性流体吸收颗粒施用于同时或以特殊顺序分开，同时将肥料颗粒保持流化或滚动，从而在肥料颗粒上形成前体膜; 和（b）将前体膜固化成膜。每个涂覆的颗粒肥料在调节植物营养元素的释放方面基本上都是优异的。

40. 发明授权

US4977232A Aromatic polyamide from 2,2'-bis(4-(4-amino-phenoxy)phenyl)hexafluoro propane 失效
标题翻译：来自2,2'-双（4-（4-氨基 - 苯氧基）苯基）六氟丙烷的芳族聚酰胺
公开(公告)号：US4977232A
公开(公告)日：1990-12-11
申请号：US227532
申请日：1988-08-03
申请人： Yutaka Maruyama , Haruhiko Komoriya
发明人： Yutaka Maruyama , Haruhiko Komoriya
IPC分类号： C08G69/40 , C08G69/26 , C08G69/42
CPC分类号： C08G69/26
摘要： Novel aromatic polyamides high in heat resistance and soluble in various organic solvents are obtained each by reacting 2,2'-bis[4-(4-aminophenoxy)phenyl]-hexafluoropropane or a simple derivative thereof with an aromatic dicarboxylic acid, e.g. isophthalic acid, or its dihalide or diester.
摘要翻译：通过使2,2'-双[4-（4-氨基苯氧基）苯基] - 六氟丙烷或其简单衍生物与芳族二羧酸例如二甲基甲酰胺反应，得到高耐热性和可溶于各种有机溶剂的新型芳族聚酰胺。间苯二甲酸或其二卤化物或二酯。

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