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32. 发明申请

US20110153265A1 METHOD OF MEASURING PROPERTIES OF DYNAMIC POSITIONING ERRORS IN A LITHOGRAPHIC APPARATUS, DATA PROCESSING APPARATUS, AND COMPUTER PROGRAM PRODUCT 失效
标题翻译：数字处理设备和计算机程序产品测量动态定位错误属性的方法
公开(公告)号：US20110153265A1
公开(公告)日：2011-06-23
申请号：US12969289
申请日：2010-12-15
申请人： Frank STAALS , Hans Butler , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
发明人： Frank STAALS , Hans Butler , Gerardus Carolus Johannus Hofmans , Hans Van Der Laan , Sven Gunnar Krister Magnusson
IPC分类号： G01B11/14 , G06F15/00
CPC分类号： G03F7/709 , G03F7/70625 , G03F7/70633 , G03F7/70666 , G03F7/70725 , G03F9/7088
摘要： Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency.
摘要翻译：光刻设备的运动包括在一个或多个轴上的动态定位误差，其产生可以在所施加的图案中测量的相应误差。测试方法包括多次操作该设备，同时在不同的特定频率和轴处故意施加相对大的动态定位误差。对于给定的轴或轴，针对感兴趣的频带的注入误差的不同频率和幅度测量所应用模式中的误差的变化。使用所述测量和所注入的频率的知识的计算允许分析与每个注入的错误频率相关的频带中的动态定位误差变化。

33. 发明申请

US20110001951A1 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：US20110001951A1
公开(公告)日：2011-01-06
申请号：US12920799
申请日：2009-03-02
申请人： Hans Butler
发明人： Hans Butler
IPC分类号： G03B27/54 , G05B11/06
CPC分类号： G03F7/70725
摘要： A drive system for controllably driving an electric actuator includes a current sensor system to sense a current conducted by the actuator and a driver to electrically drive the actuator based on an output signal of the current sensor system. The current sensor system includes at least a first and a second %forwardcurrent sensor that have a mutually different sensitivity for the current to be sensed and the drive system includes a current sensor controller to control an extent to which each of the current sensors to determine the output signal of the current sensor system.
摘要翻译：用于可控地驱动电致动器的驱动系统包括用于感测由致动器传导的电流的电流传感器系统和用于基于当前传感器系统的输出信号电驱动致动器的驱动器。当前传感器系统包括至少第一和第二％正向电流传感器，其对于要被感测的电流具有相互不同的灵敏度，并且驱动系统包括电流传感器控制器，以控制每个电流传感器确定输出信号。

34. 发明授权

US07847919B2 Lithographic apparatus having feedthrough control system 有权
标题翻译：具有馈通控制系统的平版印刷设备
公开(公告)号：US07847919B2
公开(公告)日：2010-12-07
申请号：US11730189
申请日：2007-03-29
申请人： Hans Butler
发明人： Hans Butler
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62 , G03B27/32
CPC分类号： G03F7/70725 , G03F7/70775
摘要： An optical component of the lithographic apparatus is moved. A substrate support is moved so as to be synchronous with the motion of the optical component. A momentary position of the optical component is measured. A momentary position of the substrate support is measured at a first sampling rate. The measured momentary position of the optical component is compared with a desired momentary position of the optical component to generate an optical component position error signal in accordance with a difference between the two optical component positions. The measured momentary position of the substrate support is compared with a desired momentary position of the substrate support to generate a substrate support position error signal in accordance with a difference between the two substrate support positions. The momentary position of the optical component is adjusted so as to compensate for the difference between the two substrate support positions.
摘要翻译：移动光刻设备的光学部件。移动基板支撑件以与光学部件的运动同步。测量光学部件的瞬时位置。以第一采样率测量衬底支撑件的瞬时位置。将光学部件的测量的瞬时位置与光学部件的期望的瞬时位置进行比较，以根据两个光学部件位置之间的差异产生光学部件位置误差信号。将基板支撑件的测量的瞬时位置与基板支撑件的期望的瞬时位置进行比较，以根据两个基板支撑位置之间的差异产生基板支撑位置误差信号。调整光学部件的瞬时位置，以便补偿两个基板支撑位置之间的差异。

35. 发明申请

US20100089712A1 PROJECTION ASSEMBLY AND LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：投影装配和平版印刷设备
公开(公告)号：US20100089712A1
公开(公告)日：2010-04-15
申请号：US12574573
申请日：2009-10-06
申请人： Hans Butler , Cornelius Adrianus,Lambertus De Hoon
发明人： Hans Butler , Cornelius Adrianus,Lambertus De Hoon
IPC分类号： F16F7/10 , G03B27/42
CPC分类号： G03B27/42 , F16F7/1011 , G03F7/709
摘要： A projection assembly includes a projection system to project a patterned radiation beam onto a substrate, a damping system to dampen a vibration of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, the active damping subsystem including a sensor to measure a position of the interface damping mass, an electromagnetic actuator to exert a force on the interface damping mass, and a controller to drive the electromagnetic actuator based on a signal provided by the sensor, the active damping subsystem including a reaction mass for the electromagnetic actuator to exert a counterforce upon based on the signal provided by the first sensor.
摘要翻译：投影组件包括将图案化的辐射束投影到基板上的投影系统，用于抑制投影系统的振动的阻尼系统，阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼至少部分的振动接口阻尼块的接口阻尼块，连接到投影系统的界面阻尼块，主动阻尼子系统包括用于测量接口阻尼块的位置的传感器，对接口阻尼块施加力的电磁致动器，以及控制器基于由传感器提供的信号来驱动电磁致动器，主动阻尼子系统包括用于电磁致动器的反作用质量，以基于由第一传感器提供的信号施加反作用力。

36. 发明申请

US20090195763A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20090195763A1
公开(公告)日：2009-08-06
申请号：US12331870
申请日：2008-12-10
申请人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van Den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
发明人： Hans Butler , Marc Wilhelmus Maria Van Der Wijst , Johan Hendrik Geerke , Peter Paul Hempenius , Youssef Karel Maria De Vos , Joost De Pee , Clementius Andreas Johannes Beijers , Nicolaas Bernardus Roozen , Erwin Antonius Henricus Fransiscus Van Den Boogaert , Marco Hendrikus Hermanus Oude Nijhuis , Francois Xavier Debiesme
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G10K11/178 , G03B27/42 , G03F7/709 , G10K2210/129
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.
摘要翻译：光刻设备被布置成将图案从图案形成装置转印到基底上。光刻设备包括用于测量光刻设备中传感器测量区域中的第一声振动的声学传感器。提供致动器以在光刻设备的至少一个区域中产生第二声振动。此外，提供了具有传感器输入以接收声学传感器的传感器信号和致动器输出以向致动器提供致动器驱动信号的控制装置。控制装置被布置成驱动致动器，以使得第二声振动在该区域中至少部分地补偿第一声振动。

37. 发明申请

US20080308749A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080308749A1
公开(公告)日：2008-12-18
申请号：US11812090
申请日：2007-06-14
申请人： Hans Butler
发明人： Hans Butler
IPC分类号： G03B27/54
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of the one or more lens elements and/or of the projection system housing.
摘要翻译：公开了一种光刻设备，其具有在内部支撑一个或多个透镜元件的投影系统外壳和连接到投影系统外壳的运动阻尼件，所述运动阻尼器构造成以至少一个的本征频率来阻止投影系统壳体的运动一个或多个透镜元件和/或投影系统外壳。

38. 发明授权

US07348752B1 Stage apparatus and lithographic apparatus 有权
标题翻译：舞台装置和光刻设备
公开(公告)号：US07348752B1
公开(公告)日：2008-03-25
申请号：US11523736
申请日：2006-09-20
申请人： Hans Butler
发明人： Hans Butler
IPC分类号： H01J37/20
CPC分类号： G03F7/70758 , G03F7/70858
摘要： A stage apparatus and a lithographic apparatus comprising such a stage apparatus are described. The stage apparatus includes an electromagnetic motor arranged to displace an object table, an electromagnetic actuator configured to position the object table and a device configured to provide a current to the stage apparatus such that, in use, an effect of a stray field of the electromagnetic motor on the electromagnetic actuator is at least partly compensated by the current.
摘要翻译：描述了包括这种平台装置的舞台装置和光刻装置。平台装置包括布置成移动物体台的电磁马达，被配置为定位物体台的电磁致动器和被配置为向舞台装置提供电流的装置，使得在使用中电磁场的杂散场的效果电磁致动器上的电机至少部分地被电流补偿。

39. 发明申请

US20070216882A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070216882A1
公开(公告)日：2007-09-20
申请号：US11378627
申请日：2006-03-20
申请人： Jozef Benschop , Hans Butler , Nicolaas Kemper , Bartholomeus Koek , Frits Van Der Meulen , Harmen Van Der Schoot
发明人： Jozef Benschop , Hans Butler , Nicolaas Kemper , Bartholomeus Koek , Frits Van Der Meulen , Harmen Van Der Schoot
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with anl element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.
摘要翻译：公开了一种浸没式光刻投影装置，其中使用挡板部件来在衬底交换期间阻挡液体供应系统，以确保在衬底互换期间液体保持与投影系统的一个元件接触。挡板构件连接到也支撑投影系统的计量框架。以这种方式，挡板部件的位置总是已知的。

40. 发明授权

US07199858B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07199858B2
公开(公告)日：2007-04-03
申请号：US10705804
申请日：2003-11-12
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B24/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译：公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。

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