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    • 37. 发明授权
    • Method for fabrication of optical element, and optical element having three-dimensional laminated structure
    • 光学元件的制造方法以及具有三维层叠结构的光学元件
    • US07272290B2
    • 2007-09-18
    • US10571696
    • 2004-11-08
    • Mitsuro SugitaTakao Yonehara
    • Mitsuro SugitaTakao Yonehara
    • G02B6/10
    • B82Y20/00G02B6/12G02B6/12002G02B6/1225G02B6/13G02B6/136G02B6/14
    • A method for production of an optical element includes preparing a first member having formed on the surface of a first substrate 101 a first layer 103 by at least one of epitaxial growth and pore-making (micropore-making) and a second member having a porous layer for layer separation formed on a second substrate 104 and having formed thereon a second layer by at least one of epitaxial growth and pore-making (micropore-making), bonding the first layer 103 and the second layer, separating the second substrate 104 and the second layer of the second member from each other at the porous layer for layer separation in the second member, to form a laminated structure on the first substrate 101, forming a refraction index distribution pattern produced by a difference in refraction index in the plane of at least one of the first layer 103 and the second layer.
    • 一种光学元件的制造方法包括:通过外延生长和制孔(微孔制造)中的至少一种,制备第一部件,该第一部件在第一基板101的表面上形成第一层103,第二部件具有多孔 在第二基板104上形成的用于层间分离的层,并且通过外延生长和制孔(微孔制造)中的至少一个在其上形成第二层,将第一层103和第二层接合,分离第二基板104和 所述第二构件的第二层在所述第二构件中用于层分离的多孔层处彼此形成,以在所述第一基板101上形成层压结构,形成折射率分布图案,所述折射率分布图案由 第一层103和第二层中的至少一个。
    • 39. 发明申请
    • Sensor
    • 传感器
    • US20060123900A1
    • 2006-06-15
    • US10527840
    • 2003-10-10
    • Mitsuro Sugita
    • Mitsuro Sugita
    • G01F1/68
    • G01N21/7746G01H9/00G01N21/05G01N21/39G01N21/552G01N21/7703G01N2021/0346G01N2021/7723G01N2021/7776H01S5/1032H01S5/1042H01S5/1075H01S5/18383H01S5/423
    • Sensors are provided which enable detection with a high sensitivity in microchemistry and biochemical analysis by using devices integrated into a compact configuration and can be freely disposed on desired positions of a channel to perform detection. A measuring apparatus for detecting information and outputting light according to the information, the apparatus comprising: an active layer for emitting light and a micro-optical cavity, wherein light emission is limited in the active layer due to the influence of the selection of a photoelectromagnetic field mode, the selection is made by the micro-optical cavity, the light emission and a degree of selection of a photoelectromagnetic field mode is changed according to an environmental condition of the micro-optical cavity, so that the light emission is changed and the environmental condition is measured according to a change in the light emission.
    • 提供了通过使用集成到紧凑配置中的装置在微化学和生物化学分析中以高灵敏度进行检测的传感器,并且可以自由地设置在通道的期望位置上以进行检测。 一种用于根据该信息检测信息并输出光的测量装置,该装置包括:用于发射光的有源层和微光腔,其中由于选择光电磁场的影响,有源层中的发光被限制 场模式下,通过微光腔进行选择,根据微光腔的环境条件改变光发射和光电场模式的选择程度,从而改变发光,并且 根据发光的变化来测量环境条件。
    • 40. 发明授权
    • Multiple exposure method
    • 多重曝光法
    • US07023522B2
    • 2006-04-04
    • US11003889
    • 2004-12-06
    • Mitsuro SugitaMiyoko Kawashima
    • Mitsuro SugitaMiyoko Kawashima
    • G03B27/42G03B27/52
    • G03F7/70091G03F7/701G03F7/70125G03F7/7025G03F7/70466
    • An exposure apparatus including a first exposure device for illuminating a predetermined mask with light of a predetermined wavelength under a first mask-illumination condition, to print a first pattern on a predetermined exposure region, and a second exposure device for illuminating the predetermined mask with light of the predetermined wavelength under a second mask-illumination condition, different from the first mask-illumination condition, to superposedly print a second pattern on the predetermined exposure region where the first pattern has been printed. A first exposure by the first exposure device and a second exposure by the second exposure device are carried out simultaneously, prior to a development process.
    • 一种曝光装置,包括:用于在第一掩模照明条件下用预定波长的光照射预定掩模的第一曝光装置,以在预定曝光区域上打印第一图案;以及第二曝光装置,用于用光照射所述预定掩模 在与第一掩模照明条件不同的第二掩模照明条件下,将第二图案叠加在已经印刷了第一图案的预定曝光区域上。 在显影处理之前,同时进行第一曝光装置的第一曝光和第二曝光装置的第二次曝光。