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31. 发明申请

US20100040958A1 Sub-Resolutional Grayscale Reticle 有权
标题翻译：子分辨灰度光栅
公开(公告)号：US20100040958A1
公开(公告)日：2010-02-18
申请号：US12193568
申请日：2008-08-18
申请人： Bruce D. Ulrich , Yoshi Ono , Wei Gao
发明人： Bruce D. Ulrich , Yoshi Ono , Wei Gao
IPC分类号： G03F1/00
CPC分类号： G03F1/50 , G03F7/0005
摘要： A sub-resolutional grayscale reticle and associated fabrication method have been presented. The method provides a transparent substrate, and forms a plurality of coincident partial-light transmissive layers overlying the transparent substrate. A pattern is formed, sub-resolutional at a first wavelength, in at least one of the transmissive layers. If there are n transmissive layers, the reticle transmits at least (n+1) intensities of light. In one aspect, each of the plurality of transmissive layers has the same extinction coefficient and the same thickness. In other aspects, the transmissive layers may have different thickness. Then, even if the extinction coefficients are the same, the attenuation of light through each layer is different. The transmission characteristics of the reticle can be further varied if the transmissive layers have different extinction coefficients. Likewise, the transmission characteristics through the sub-resolutional patterns can be varied.
摘要翻译：已经提出了一种亚分辨灰度标线和相关的制造方法。该方法提供透明基板，并且形成覆盖透明基板的多个重合部分透光层。在至少一个透射层中形成在第一波长处副溶液的图案。如果存在n个透射层，则光罩传播至少（n + 1）个光强。在一个方面，多个透射层中的每一个具有相同的消光系数和相同的厚度。在其它方面，透射层可以具有不同的厚度。那么即使消光系数相同，每层的光的衰减也是不同的。如果透射层具有不同的消光系数，则可以进一步改变掩模版的透射特性。同样，可以改变通过子解决图案的传输特性。

32. 发明授权

US07887980B2 Sub-resolutional grayscale reticle 有权
标题翻译：子分辨灰度光罩
公开(公告)号：US07887980B2
公开(公告)日：2011-02-15
申请号：US12193568
申请日：2008-08-18
申请人： Bruce D. Ulrich , Yoshi Ono , Wei Gao
发明人： Bruce D. Ulrich , Yoshi Ono , Wei Gao
IPC分类号： G03F1/00 , G03F7/00
CPC分类号： G03F1/50 , G03F7/0005
摘要： A sub-resolutional grayscale reticle and associated fabrication method have been presented. The method provides a transparent substrate, and forms a plurality of coincident partial-light transmissive layers overlying the transparent substrate. A pattern is formed, sub-resolutional at a first wavelength, in at least one of the transmissive layers. If there are n transmissive layers, the reticle transmits at least (n+1) intensities of light. In one aspect, each of the plurality of transmissive layers has the same extinction coefficient and the same thickness. In other aspects, the transmissive layers may have different thickness. Then, even if the extinction coefficients are the same, the attenuation of light through each layer is different. The transmission characteristics of the reticle can be further varied if the transmissive layers have different extinction coefficients. Likewise, the transmission characteristics through the sub-resolutional patterns can be varied.
摘要翻译：已经提出了一种亚分辨灰度标线和相关的制造方法。该方法提供透明基板，并且形成覆盖透明基板的多个重合部分透光层。在至少一个透射层中形成在第一波长处副溶液的图案。如果存在n个透射层，则光罩传播至少（n + 1）个光强。在一个方面，多个透射层中的每一个具有相同的消光系数和相同的厚度。在其它方面，透射层可以具有不同的厚度。那么即使消光系数相同，每层的光的衰减也是不同的。如果透射层具有不同的消光系数，则可以进一步改变掩模版的透射特性。同样，可以改变通过子解决图案的传输特性。

33. 发明授权

US07838174B2 Method of fabricating grayscale mask using smart cut® wafer bonding process 有权
标题翻译：使用smartcut®晶圆接合工艺制造灰度掩模的方法
公开(公告)号：US07838174B2
公开(公告)日：2010-11-23
申请号：US11657258
申请日：2007-01-24
申请人： Wei Gao , Bruce D. Ulrich , Yoshi Ono , Steven R. Droes
发明人： Wei Gao , Bruce D. Ulrich , Yoshi Ono , Steven R. Droes
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/50 , H01L27/14685
摘要： A method of fabricating a grayscale mask includes preparing a silicon wafer; depositing a layer of Si3N4 directly on the silicon wafer; implanting H+ ions into the silicon wafer to form a defect layer; depositing a first layer of SiOxNy directly on the Si3N4 layer; depositing a layer of SRO directly on the first layer of SiOxNy; patterning and etching the SRO layer to form a microlens array in the SRO layer; depositing a second layer of SiOxNy on the SRO microlens array; CMP to planarize the second layer of SiOxNy; bonding and cleaving the planarized SiOxNyto a quartz plate to form a graymask reticle; etching to remove silicon from the bonded structure; etching to remove SiOxNy and Si3N4 from the bonded structure; and cleaning and drying the graymask reticle.
摘要翻译：制造灰度掩模的方法包括制备硅晶片; 在硅晶片上直接沉积一层Si3N4; 将H +离子注入到硅晶片中以形成缺陷层; 在Si 3 N 4层上直接沉积第一层SiOxNy层; 在第一层SiOxNy上直接沉积一层SRO; 图案化和蚀刻SRO层以在SRO层中形成微透镜阵列; 在SRO微透镜阵列上沉积第二层SiOxNy; CMP平面化第二层SiOxNy; 将平面化的SiO x N y键合并切割成石英板以形成灰色掩模掩模; 蚀刻以从结合结构去除硅; 蚀刻从结合结构去除SiOxNy和Si3N4; 并清理并干燥灰色掩模。

34. 发明申请

US20090142673A1 SEMI-TRANSPARENT FILM GRAYSCALE MASK 有权
标题翻译：半透明薄膜面膜
公开(公告)号：US20090142673A1
公开(公告)日：2009-06-04
申请号：US11950196
申请日：2007-12-04
申请人： Wei Gao , Bruce D. Ulrich , Yoshi Ono
发明人： Wei Gao , Bruce D. Ulrich , Yoshi Ono
IPC分类号： G03F1/00
CPC分类号： G03F1/50
摘要： A grayscale mask made from semi-transparent film layers is provided, along with an associated fabrication method. The method provides a transparent substrate, such as quartz, with a surface. A first layer of a semi-transparent film having a surface with a first surface area, is formed overlying the substrate surface. At least a second layer of the semi-transparent film having a surface with a second surface area greater than the first surface area, is formed overlying the first layer. A first vertical region is formed having a light first attenuation parameter through the combination of substrate, first layer, and second layer. A second vertical region is formed having a light second attenuation parameter through the combination of the first layer and substrate, and a third vertical region is formed having a light third attenuation parameter through the substrate.
摘要翻译：提供了由半透明膜层制成的灰度掩模，以及相关的制造方法。该方法提供具有表面的透明衬底，例如石英。具有第一表面积的表面的半透明膜的第一层形成在衬底表面上。至少第二层半透明膜具有第二表面积大于第一表面积的表面，覆盖在第一层上。通过基板，第一层和第二层的组合形成具有第一衰减参数的第一垂直区域。通过第一层和衬底的组合形成具有第二衰减参数的第二垂直区域，并且通过衬底形成具有第三衰减参数的第三垂直区域。

35. 发明申请

US20080102641A1 Grayscale reticle for precise control of photoresist exposure 失效
标题翻译：用于精确控制光刻胶曝光的灰度光罩
公开(公告)号：US20080102641A1
公开(公告)日：2008-05-01
申请号：US11588891
申请日：2006-10-27
申请人： Yoshi Ono , Bruce D. Ulrich , Pooran Chandra Joshi
发明人： Yoshi Ono , Bruce D. Ulrich , Pooran Chandra Joshi
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G03F1/54 , G03F1/50 , Y10S438/942
摘要： A method of fabricating a grayscale reticle includes preparing a quartz substrate; depositing a layer of silicon-rich oxide on the quartz substrate; depositing a layer of silicon nitride as an oxidation barrier layer on the silicon-rich oxide layer; depositing and patterning a layer of photoresist; etching the silicon nitride layer with a pattern for the silicon nitride layer; removing the photoresist; cleaning the quartz substrate and the remaining layers; oxidizing the quartz substrate and the layers thereon, thereby converting the silicon-rich oxide layer to a transparent silicon dioxide layer; removing the remaining silicon nitride layer; forming the quartz substrate and the silicon dioxide thereon into a reticle; and using the reticle to pattern a microlens array.
摘要翻译：制造灰度标线的方法包括制备石英基片; 在石英衬底上沉积一层富硅氧化物; 在富硅氧化物层上沉积氮化硅层作为氧化阻挡层; 沉积和图案化一层光致抗蚀剂; 用氮化硅层的图案蚀刻氮化硅层; 去除光致抗蚀剂; 清洗石英衬底和其余层; 氧化石英衬底及其上的层，从而将富硅氧化物层转化为透明二氧化硅层; 去除剩余的氮化硅层; 在其上形成石英衬底和二氧化硅到掩模版中; 并使用掩模版对微透镜阵列进行图案化。

36. 发明授权

US07008756B2 Method of fabricating an X/Y alignment vernier 有权
标题翻译：制造X / Y对准游标的方法
公开(公告)号：US07008756B2
公开(公告)日：2006-03-07
申请号：US10985219
申请日：2004-11-09
申请人： Bruce D. Ulrich
发明人： Bruce D. Ulrich
IPC分类号： G03C5/00
CPC分类号： G03F7/70633 , G01B11/26
摘要： A two dimensional vernier is provided along with a method of fabrication. The two dimensional vernier has a reference array patterned into a substrate, or a material overlying the substrate. An active array is patterned into photoresist overlying the substrate or the material. Both the reference array and the active array each comprise a two dimensional array of shapes. A difference between a combination of size or spacing of the shapes in each array determines vernier resolution. Vernier range is determined by a combination of vernier resolution and an integer related to a total number of shapes along a given axis. The two dimensional vernier allows an operator to readily measure the misalignment of a pattern to be processed relative to a previous pattern in two dimensions using a microscope. The two dimensional vernier reduces, or eliminates, repositioning of the microscope to determine both x-axis misalignment and y-axis misalignment. If a significant misalignment is detected the photoresist can be stripped and the lithography step repeated prior to subsequent processing, and possible yield reduction.
摘要翻译：提供二维游标以及制造方法。二维游标具有图案化成衬底或覆盖衬底的材料的参考阵列。将有源阵列图案化成覆盖衬底或材料的光致抗蚀剂。参考阵列和有源阵列都包括形状的二维阵列。每个阵列中的形状的大小或间距的组合之间的差异决定游标分辨率。游标范围由游标分辨率和与给定轴的总体形状相关的整数组合决定。二维游标器允许操作者使用显微镜在两维中容易地测量相对于先前图案的被处理图案的未对准。二维游标可减少或消除显微镜的重新定位，以确定x轴未对准和y轴未对准。如果检测到显着的未对准，则可以剥离光致抗蚀剂，并在随后的处理之前重复光刻步骤，并降低可能的产量。

37. 发明授权

US07439187B2 Grayscale reticle for precise control of photoresist exposure 失效
标题翻译：用于精确控制光刻胶曝光的灰度光罩
公开(公告)号：US07439187B2
公开(公告)日：2008-10-21
申请号：US11588891
申请日：2006-10-27
申请人： Yoshi Ono , Bruce D. Ulrich , Pooran Chandra Joshi
发明人： Yoshi Ono , Bruce D. Ulrich , Pooran Chandra Joshi
IPC分类号： H01L21/00 , H01L21/302
CPC分类号： G03F1/54 , G03F1/50 , Y10S438/942
摘要： A method of fabricating a grayscale reticule includes preparing a quartz substrate; depositing a layer of silicon-rich oxide on the quartz substrate; depositing a layer of silicon nitride as an oxidation barrier layer on the silicon-rich oxide layer; depositing and patterning a layer of photoresist; etching the silicon nitride layer with a pattern for the silicon nitride layer; removing the photoresist; cleaning the quartz substrate and the remaining layers; oxidizing the quartz substrate and the layers thereon, thereby converting the silicon-rich oxide layer to a transparent silicon dioxide layer; removing the remaining silicon nitride layer; forming the quartz substrate and the silicon dioxide thereon into a reticule; and using the reticule to pattern a microlens array.
摘要翻译：制造灰度网格的方法包括制备石英基片; 在石英衬底上沉积一层富硅氧化物; 在富硅氧化物层上沉积氮化硅层作为氧化阻挡层; 沉积和图案化一层光致抗蚀剂; 用氮化硅层的图案蚀刻氮化硅层; 去除光致抗蚀剂; 清洗石英衬底和其余层; 氧化石英衬底及其上的层，从而将富硅氧化物层转化为透明二氧化硅层; 去除剩余的氮化硅层; 在其上形成石英衬底和二氧化硅到网状物中; 并使用网状物来形成微透镜阵列。

38. 发明授权

US07160656B2 Method for determining pattern misalignment over a substrate 有权
标题翻译：确定衬底上图案不对准的方法
公开(公告)号：US07160656B2
公开(公告)日：2007-01-09
申请号：US11336492
申请日：2006-01-20
申请人： Bruce D. Ulrich
发明人： Bruce D. Ulrich
IPC分类号： G03F9/00
CPC分类号： G03F7/70633 , G01B11/26
摘要： A two dimensional vernier is provided along with a method of fabrication. The two dimensional vernier has a reference array patterned into a substrate, or a material overlying the substrate. An active array is patterned into photoresist overlying the substrate or the material. Both the reference array and the active array each comprise a two dimensional array of shapes. A difference between a combination of size or spacing of the shapes in each array determines vernier resolution. Vernier range is determined by a combination of vernier resolution and an integer related to a total number of shapes along a given axis. The two dimensional vernier allows an operator to readily measure the misalignment of a pattern to be processed relative to a previous pattern in two dimensions using a microscope. The two dimensional vernier reduces, or eliminates, repositioning of the microscope to determine both x-axis misalignment and y-axis misalignment. If a significant misalignment is detected the photoresist can be stripped and the lithography step repeated prior to subsequent processing, and possible yield reduction.
摘要翻译：提供二维游标以及制造方法。二维游标具有图案化成衬底或覆盖衬底的材料的参考阵列。将有源阵列图案化成覆盖衬底或材料的光致抗蚀剂。参考阵列和有源阵列都包括形状的二维阵列。每个阵列中的形状的大小或间距的组合之间的差异决定游标分辨率。游标范围由游标分辨率和与给定轴的总体形状相关的整数组合决定。二维游标器允许操作者使用显微镜在两维中容易地测量相对于先前图案的被处理图案的未对准。二维游标可减少或消除显微镜的重新定位，以确定x轴未对准和y轴未对准。如果检测到显着的未对准，则可以剥离光致抗蚀剂，并在随后的处理之前重复光刻步骤，并降低可能的产量。

39. 发明授权

US07190526B1 Step-over lithography to produce parabolic photoresist profiles for microlens formation 失效
标题翻译：逐步光刻以产生用于微透镜形成的抛物线光致抗蚀剂轮廓
公开(公告)号：US07190526B1
公开(公告)日：2007-03-13
申请号：US11416983
申请日：2006-05-02
申请人： Bruce D. Ulrich , Yoshi Ono
发明人： Bruce D. Ulrich , Yoshi Ono
IPC分类号： G02B27/10 , B29D11/00 , G03C5/00
CPC分类号： G03F7/0007 , B29D11/00365 , G02B3/0012
摘要： A method of microlens fabrication for use in a photosensor includes preparing a photodetector element array which is sensitive to light in a specific color domain and depositing microlens material on the photodetector element array. The structure is coated with photoresist, and the photoresist is masked and exposed in a separate exposure for each color in the color domain. The photoresist is developed and the microlens material etched to form a microlens array.
摘要翻译：用于光电传感器的微透镜制造方法包括制备对特定色域中的光敏感的光电检测器元件阵列，并将微透镜材料沉积在光电探测元件阵列上。该结构涂覆有光致抗蚀剂，并且光致抗蚀剂被掩蔽并且在颜色域中针对每种颜色的单独曝光曝光。显影光致抗蚀剂，并将微透镜材料蚀刻以形成微透镜阵列。

40. 发明授权

US07297473B2 Method of forming a microlens array having a high fill factor 失效
公开(公告)号：US07297473B2
公开(公告)日：2007-11-20
申请号：US11270701
申请日：2005-11-08
申请人： Yoshi Ono , Bruce D. Ulrich
发明人： Yoshi Ono , Bruce D. Ulrich
IPC分类号： G02B3/00
CPC分类号： G02B3/0018 , G02B3/0056
摘要： A method of forming a microlens array includes preparing a substrate; fabricating a photosensitive array on the substrate; depositing a layer of lens material on the photosensitive array; depositing and patterning photoresist on the lens material, wherein patterning includes forming a photoresist region having a solid curved upper surface and a substantially rectangular base on the lens material layer; developing the photoresist; reflowing the photoresist; and processing the lens material for form a microlens array.

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