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31. 发明申请

US20170115576A1 PROJECTION EXPOSURE APPARATUS INCLUDING AT LEAST ONE MIRROR 有权
公开(公告)号：US20170115576A1
公开(公告)日：2017-04-27
申请号：US15298323
申请日：2016-10-20
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Sonja Schneider , Ricarda Schoemer , Stefan Rist
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/7015 , G03F7/70258 , G03F7/705
摘要： A microlithographic projection exposure apparatus includes: a projection lens for imaging mask structures via an exposure radiation including at least one optical element and at least one manipulator; a read-in device for reading in application-specific structure information defining at least one property of an angular distribution of the exposure radiation upon entering the projection lens; and a travel establishing device for establishing a travel command defining a change to be made in an optical effect of the at least one optical element by manipulation of a property of the optical element via the at least one manipulator along a travel. The travel establishing device is configured to establish the travel command in an at least two-stage optimization.

32. 发明申请

US20170031247A1 LITHOGRAPHIC PROJECTION OBJECTIVE 审中-公开
标题翻译： LITHOGRAPHIC投影目标
公开(公告)号：US20170031247A1
公开(公告)日：2017-02-02
申请号：US15294281
申请日：2016-10-14
申请人： Carl Zeiss SMT GmbH
发明人： Olaf Rogalsky , Boris Bittner , Thomas Petasch , Jochen Haeussler
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70258 , G03F7/70975
摘要： Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.
摘要翻译：公开了诸如光刻投影曝光设备的投影目标的投影目标，以及相关系统，组件和方法，诸如修改和/或修复这些目标的方法。

33. 发明授权

US09372411B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US09372411B2
公开(公告)日：2016-06-21
申请号：US14199932
申请日：2014-03-06
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Zellner , Boris Bittner , Norbert Wabra , Martin von Hodenberg , Sonja Schneider , Ricarda Schoemer , Arne Schob , Guenter Rudolph , Alexander Gratzke , Bryce Anton Moffat
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , H01S5/00 , H01S5/40
CPC分类号： G03F7/70308 , G03F7/70891 , H01S5/005 , H01S5/0064 , H01S5/4025
摘要： A projection objective of a microlithographic projection exposure apparatus includes a wavefront correction device including a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system includes a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.
摘要翻译：微光刻投影曝光装置的投影物镜包括具有折射光学元件的波前校正装置，所述折射光学元件具有投影光通过的两个相对的光学表面和在两个光学表面之间延伸的圆周边缘表面。第一和第二光学系统被配置为将第一和第二加热光引导到边缘表面的不同部分，使得第一和第二加热光的至少一部分进入折射光学元件。由加热光的部分吸收引起的温度分布导致折射光学元件内的折射率分布，其校正波前误差。至少第一光学系统包括聚焦光学元件，其将第一加热光聚焦在焦点区域中，使得从焦点区域射出的第一加热光照射在边缘表面上。

34. 发明申请

US20160161845A1 METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION APPARATUS 有权
标题翻译：操作微波投影仪的方法
公开(公告)号：US20160161845A1
公开(公告)日：2016-06-09
申请号：US15041149
申请日：2016-02-11
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Ricarda Schoemer
IPC分类号： G03F1/70 , G06F17/50
CPC分类号： G03F1/70 , G03F1/144 , G03F7/70258 , G03F7/705 , G06F17/5068 , G06F17/5081 , G06F2217/12
摘要： A method of operating a microlithographic projection exposure apparatus includes, in a first step, providing a projection objective that includes a plurality of real manipulators. In a second step, a virtual manipulator is defined that is configured to produce preliminary control signals for at least two of the real manipulators. In a third step, performed during operation of the apparatus, a real image error of the projection objective is determined. In a fourth step, a desired corrective effect is determined. In a fifth step, first virtual control signals for the virtual manipulator are determined. In a sixth step, second virtual control signals for the real manipulators are determined.
摘要翻译：操作微光刻投影曝光装置的方法包括在第一步骤中提供包括多个真实操纵器的投影物镜。在第二步骤中，定义虚拟操纵器，其被配置为产生至少两个真实操纵器的初步控制信号。在第三步骤中，在设备的操作期间执行，确定投影物镜的实际图像误差。在第四步骤中，确定期望的校正效果。在第五步骤中，确定虚拟操纵器的第一虚拟控制信号。在第六步骤中，确定用于真实操纵器的第二虚拟控制信号。

35. 发明授权

US09164402B2 Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus 有权
标题翻译：操作这种装置的微光刻投影曝光装置和投影物镜的方法
公开(公告)号：US09164402B2
公开(公告)日：2015-10-20
申请号：US14327919
申请日：2014-07-10
申请人： Carl Zeiss SMT GmbH
发明人： Holger Walter , Boris Bittner
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , G02B7/02 , G02B27/00
CPC分类号： G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266 , G03F7/70308
摘要： A projection objective of a microlithographic projection exposure apparatus has a wavefront correction device including a first refractive optical element and a second refractive optical element. The first refractive optical element includes a first optical material having, for an operating wavelength of the apparatus, an index of refraction that decreases with increasing temperature. The second refractive optical element includes a second optical material having, for an operating wavelength of the apparatus, an index of refraction that increases with increasing temperature. In a correction mode of the correction device, a first heating device produces a non-uniform and variable first temperature distribution in the first optical material, and a second heating device produces a non-uniform and variable second temperature distribution in the second optical material.
摘要翻译：微光刻投影曝光装置的投影物镜具有包括第一折射光学元件和第二折射光学元件的波前校正装置。第一折射光学元件包括第一光学材料，对于该装置的工作波长，具有随温度升高而降低的折射率的第一光学材料。所述第二折射光学元件包括第二光学材料，对于所述装置的工作波长，所述第二光学材料具有随温度升高而增加的折射率。在校正装置的校正模式中，第一加热装置在第一光学材料中产生不均匀且可变的第一温度分布，第二加热装置在第二光学材料中产生不均匀且可变的第二温度分布。

36. 发明授权

US09134613B2 Illumination and displacement device for a projection exposure apparatus 有权
标题翻译：用于投影曝光装置的照明和位移装置
公开(公告)号：US09134613B2
公开(公告)日：2015-09-15
申请号：US14272982
申请日：2014-05-08
申请人： Carl Zeiss SMT GmbH
发明人： Sonja Schneider , Norbert Wabra , Martin von Hodenberg , Boris Bittner , Ricarda Schneider
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/2002 , G03F7/70191 , G03F7/70558
摘要： An illumination and displacement device for a projection exposure apparatus comprises an illumination optical unit for illuminating an illumination field. An object holder serves for mounting an object in such a way that at least one part of the object can be arranged in the illumination field. An object holder drive serves for displacing the object during illumination in an object displacement direction. A correction device serves for the spatially resolved influencing of an intensity of the illumination at least of sections of the illumination field, wherein there is a spatial resolution of the influencing of the intensity of the illumination of the illumination field at least along the object displacement direction. This results in an illumination and displacement device in which field-dependent imaging aberrations which are present during the projection exposure do not undesirably affect a projection result.
摘要翻译：用于投影曝光装置的照明和位移装置包括用于照明照明场的照明光学单元。物体保持器用于安装物体，使得物体的至少一部分可以布置在照明场中。物体保持器驱动器用于在物体移动方向的照明期间使物体移动。校正装置用于空间分辨影响至少照明场部分的照明强度，其中至少沿物体位移方向存在对照明场照明强度的影响的空间分辨率。这导致照明和位移装置，其中在投影曝光期间存在的场依赖的成像像差不会不期望地影响投影结果。

37. 发明申请

US20150168674A1 MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD FOR OPERATING THE SAME, AND EUV PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于EUV投影曝光装置的反射镜装置，其操作方法和EUV投影曝光装置
公开(公告)号：US20150168674A1
公开(公告)日：2015-06-18
申请号：US14584164
申请日：2014-12-29
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Sonja Schneider , Ricarda Schneider , Hendrik Wagner , Rumen Iliew , Walter Pauls
IPC分类号： G02B7/18 , G02B27/00 , G03F7/20 , G02B17/06
CPC分类号： G02B7/1815 , B82Y10/00 , G02B5/0891 , G02B7/008 , G02B17/0657 , G02B17/0663 , G02B27/0025 , G03F7/702 , G03F7/70216 , G03F7/70266 , G03F7/706 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A mirror arrangement for an EUV projection exposure apparatus for microlithography comprises a plurality of mirrors each having a layer which is reflective in the EUV spectral range and to which EUV radiation can be applied, and having a main body. In this case, at least one mirror of the plurality of mirrors has at least one layer comprising a material having a negative coefficient of thermal expansion. Moreover, a method for operating the mirror arrangement and a projection exposure apparatus are described. At least one heat source is arranged, in order to locally apply heat in a targeted manner to the at least one layer having a negative coefficient of thermal expansion of the at least one mirror.
摘要翻译：用于微光刻的EUV投影曝光装置的反射镜装置包括多个反射镜，每个反射镜具有在EUV光谱范围内具有反射性并且可以施加EUV辐射并具有主体的层。在这种情况下，多个反射镜中的至少一个反射镜具有至少一层，该层包括具有负的热膨胀系数的材料。此外，描述了用于操作镜子装置和投影曝光装置的方法。布置至少一个热源，以便以目标方式将热量局部地施加到具有至少一个反射镜的负的热膨胀系数的至少一个层。

38. 发明申请

US20140176924A1 PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY 有权
标题翻译：投影曝光装置优化调整可能性
公开(公告)号：US20140176924A1
公开(公告)日：2014-06-26
申请号：US14195001
申请日：2014-03-03
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Holger Walter , Matthias Roesch
IPC分类号： G03F7/20
CPC分类号： G03F7/70525 , G03F7/70191 , G03F7/70266 , G03F7/70308 , G03F7/705 , G03F7/70533 , G03F7/70891
摘要： A projection exposure apparatus for microlithography includes: an illumination system configured to illuminate a mask in an object field with exposure light; and a projection objective comprising multiple optical elements configured to image the exposure light from the mask in the object field to a wafer in an image field. The projection exposure apparatus is a wafer scanner configured to move the wafer relative to the mask during an exposure of the wafer with the exposure light. The projection objective further includes at least one manipulator configured to manipulate at least one of the optical elements and a control unit configured to control the manipulator. The control unit is configured to manipulate the optical element with the manipulator during the exposure of the wafer with the exposure light.
摘要翻译：一种用于微光刻的投影曝光装置，包括：照明系统，被配置为用曝光灯照亮物场中的掩模; 以及投影物镜，包括多个光学元件，其配置成将来自物场中的掩模的曝光光成像到图像场中的晶片。投影曝光装置是晶片扫描器，其构造成在曝光光的晶片曝光期间使晶片相对于掩模移动。投影物镜还包括至少一个操纵器，其构造成操纵光学元件中的至少一个以及被配置为控制操纵器的控制单元。控制单元被配置为在曝光用的晶片曝光期间用操纵器来操纵光学元件。

39. 发明授权

US10401540B2 Optical element having a coating for influencing heating radiation and optical arrangement 有权
公开(公告)号：US10401540B2
公开(公告)日：2019-09-03
申请号：US15405012
申请日：2017-01-12
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Holger Schmidt , Ricarda Schoemer , Sonja Schneider
IPC分类号： G02B5/08 , G02B27/00 , G02B7/18 , G03F7/20 , G02B5/30 , G21K1/06
摘要： The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λEUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.

40. 发明授权

US10261425B2 Projection exposure apparatus with a highly flexible manipulator 有权
公开(公告)号：US10261425B2
公开(公告)日：2019-04-16
申请号：US14837142
申请日：2015-08-27
申请人： Carl Zeiss SMT GmbH
发明人： Alexander Wolf , Toralf Gruner , Boris Bittner , Norbert Wabra
IPC分类号： G03B27/42 , G03F7/20
摘要： The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator for reducing image aberrations, wherein the manipulator has at least two optical elements that can be positioned relative to one another, wherein at least one of the optical elements is spatially dependent in terms of its effect on an optical wavefront passing therethrough such that a local phase change of a wavefront propagating in the optical system is produced in the case of a relative movement of the optical elements against one another. Here, the spatially dependent effect of the at least one optical element can be set in a reversible dynamic manner.

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