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    • 35. 发明授权
    • Method of fabricating a semiconductor device having silicide layers for
electrodes
    • 制造具有用于电极的硅化物层的半导体器件的方法
    • US5607866A
    • 1997-03-04
    • US458112
    • 1995-06-02
    • Kazushige SatoAtsuo WatanabeKenichi KikushimaNobuo OwadaMasaya Iida
    • Kazushige SatoAtsuo WatanabeKenichi KikushimaNobuo OwadaMasaya Iida
    • H01L21/285H01L21/8249H01L27/06H01L21/265
    • H01L21/8249H01L21/28518H01L27/0635Y10S148/009
    • In a method of fabricating a semiconductor device having a MISFET and/or bipolar transistor and/or a resistor formed with different surface portions of a single silicon semiconductor substrate in which a silicide layer is formed on each of source/drain regions of the MISFET and/or collector contact region and extrinsic base region of the bipolar transistor and/or contact regions of the resistor, the bipolar transistor has its emitter region formed by diffusing an impurity contained in doped polysilicon film serving as an emitter electrode of the bipolar transistor into a part of its base region. The resistor may have a resistive region formed in a surface portion of the substrate and may be covered with an insulating film and a doped polysilicon film thereon or may have a doped polysilicon film formed over a surface portion of the substrate as a resistor element. These doped polysilicon films in the resistor are films which are formed in the same step as that for the doped silicon film serving as the emitter electrode in the bipolar transistor. Each of the doped polysilicon film in the bipolar transistor and that in the resistor are covered with an insulating film before a refractory metal film is formed over a whole surface of the substrate to prevent formation of silicide films on the doped polysilicon films in the bipolar transistor and resistor.
    • 在制造具有MISFET和/或双极晶体管和/或形成有单晶硅半导体衬底的不同表面部分的电阻器的半导体器件的方法中,其中在MISFET的每个源极/漏极区域上形成硅化物层, /或集电极接触区域和双极性晶体管的非本征基极区域和/或电阻器的接触区域,双极晶体管的发射极区域通过将掺杂多晶硅膜中所含的杂质扩散到双极型晶体管的发射电极而形成, 其基地区的一部分。 电阻器可以具有形成在衬底的表面部分中的电阻区域,并且可以在其上覆盖绝缘膜和掺杂多晶硅膜,或者可以在衬底的表面部分上形成作为电阻器元件的掺杂多晶硅膜。 电阻器中的这些掺杂多晶硅膜是与双极晶体管中的发射极电极的掺杂硅膜相同的步骤形成的膜。 在双极晶体管的整个表面上形成耐火金属膜之前,双极晶体管中的每个掺杂多晶硅膜和电阻器中的掺杂多晶硅膜都被绝缘膜覆盖,以防止在双极晶体管中的掺杂多晶硅膜上形成硅化物膜 和电阻。
    • 37. 发明授权
    • Concentration of solution by reverse osmosis
    • 通过反向麻醉的浓度浓度
    • US4990257A
    • 1991-02-05
    • US538540
    • 1990-06-14
    • Atsuo WatanabeMitsutoshi NakajimaHiroshi NabetaniYasunori YamadaTsutomu Ohmori
    • Atsuo WatanabeMitsutoshi NakajimaHiroshi NabetaniYasunori YamadaTsutomu Ohmori
    • B01D61/08A23L2/08B01D61/02B01D61/58
    • A23L2/085B01D61/022
    • Provided is a multistage method and apparatus for concentrating a solution by reverse osmosis, comprising the steps and means for: maximizing the concentration of absolute in a solution in a multistage apparatus having only standard capacity pumps, including steps of providing first concentrating means for concentrating a solution to a first concentration, said first concentrating means comprising a least one concentrating unit which positioned upstream with respect to a direction in which a solution to be concentrated flows, and providing second concentrating means for concentrating the solution that has been concentrated by first concentrating means to a second concentration which is higher than said first concentrating means comprising at least one concentrating unit which is positioned downstream with respect to said direction; said concentrating units comprising consisting essentially of respective membrane modules and respective standard capacity pumps, the membrane module of the concentrating unit of said first concentrating means comprising a tight reverse osmosis membrane with a high rejection percentage sufficient to achieve a high concentration of said solution with a high flux density of solvent flowing through the membrane, and the membrane module of the concentrating unit of said second concentrating means comprising a loose reverse osmosis membrane with a lower rejection percentage sufficient to easily achieve a further concentration of said first concentrating means with a high flux density of solution flowing through the membrane.
    • 39. 发明申请
    • AUDIO SIGNAL REPRODUCTION DEVICE AND AUDIO SIGNAL REPRODUCTION SYSTEM
    • 音频信号再现设备和音频信号再现系统
    • US20100183157A1
    • 2010-07-22
    • US12664557
    • 2008-05-23
    • Atsuo Watanabe
    • Atsuo Watanabe
    • H04R5/00
    • H04S3/002H04R2400/03
    • In an audio signal reproduction device and an audio signal reproduction system of the present invention, an SLch sound is reproduced as a mixed sound that is adjusted appropriately by two speakers 5a, 5d located at Lch and SBLch speaker positions, and an SRch sound is reproduced as a mixed sound that is adjusted appropriately by two speakers 5b, 5e located at Rch and SBRch speaker positions. This configuration can achieve 5.1 ch virtual reproduction with high sound quality in which sounds for 5.1 channels of LPCM 7.1 ch audio information included in the contents are output as they are and sounds for the remaining 2 channels are reproduced artificially even if speakers compatible with the 5.1 ch sound field system are connected.
    • 在本发明的音频信号再现装置和音频信号再现系统中,SLch声音被再现为由位于Lch和SBLch扬声器位置的两个扬声器5a,5d适当地调节的混合声音,并且再现SRch声音 作为由位于Rch和SBRch扬声器位置的两个扬声器5b,5e适当调节的混合声音。 该配置可以实现5.1声道高音质虚拟再现,其中包含在内容中的5.1声道LPCM 7.1声道信息的声音原样输出,其余2声道的声音即使人声兼容,即使扬声器与5.1 ch声场系统连接。