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    • 32. 发明授权
    • Production of resist images, and a suitable dry film resist
    • 生产抗蚀剂图像和合适的干膜抗蚀剂
    • US4789622A
    • 1988-12-06
    • US886177
    • 1986-07-16
    • Reinhold J. LeyrerGerhard WegnerMichael Mueller
    • Reinhold J. LeyrerGerhard WegnerMichael Mueller
    • G03F7/039G03C1/495
    • G03F7/039Y10S430/145Y10S430/146Y10S438/949
    • In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.
    • 在通过将基于可降解聚合物的辐射敏感的正性抗蚀剂层应用于基底上来制备抗蚀剂图像时,抗蚀剂层成像曝光于光化辐射并且随着抗蚀剂图像的显影而去除被照射部分 所用的辐射敏感抗蚀剂层由聚(二乙炔),特别是可溶性抗蚀剂层组成。 优选地,基于聚(二乙炔)的辐射敏感抗蚀剂层包含可以通过光化辐射活化的敏化剂,并且在被激活后,引发或加速聚(二乙炔)的分子降解。 干膜抗蚀剂包括临时尺寸稳定的基底和施加在基底上的辐射敏感抗蚀剂层,可以通过暴露于光化辐射而降解,并且基于聚(​​二乙炔),特别是可溶性的,具有或不具有覆盖物 在所述抗蚀剂层的顶部上。
    • 36. 发明授权
    • Double-sided rapid drift correction
    • 双面快速漂移校正
    • US08571811B1
    • 2013-10-29
    • US12657617
    • 2010-01-22
    • Michael Mueller
    • Michael Mueller
    • G01N31/00
    • G01N33/0011G01N21/274G01N21/3504
    • A method and system for gas sensor drift correction is disclosed, appropriate for use in a system placed in an environment that with some regularity reaches a background gas concentration. A background gas concentration range is defined. When the gas sensor readings drop below the background gas concentration range for at least a defined short dwell time, an upwards calibration adjustment is effected. When the gas sensor readings stay above the background gas concentration range for a defined long dwell time (longer than the maximum expected interval between excursions to the background gas concentration), a downwards calibration adjustment is effected.
    • 公开了一种用于气体传感器漂移校正的方法和系统,适用于放置在具有一定规律性到达背景气体浓度的环境中的系统中。 定义背景气体浓度范围。 当气体传感器读数低于背景气体浓度范围至少一定的短停留时间时,进行向上校准调整。 当气体传感器读数在规定的长停留时间(超过背景气体浓度的偏移之间的最大预期间隔之后)保持在背景气体浓度范围之上时,进行向下校准调整。