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31. 发明申请

US20130302728A1 PHOTORESIST COMPOSITIONS 审中-公开
标题翻译：光电组合物
公开(公告)号：US20130302728A1
公开(公告)日：2013-11-14
申请号：US13939387
申请日：2013-07-11
申请人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
发明人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
IPC分类号： G03F7/028 , C08F110/02 , C08F110/06 , G03F7/00
CPC分类号： G03F7/028 , C07D211/94 , C07D491/113 , C08F110/02 , C08F110/06 , C08F265/02 , C08K5/3435 , G03F7/0007 , G03F7/031 , G03F7/40 , C08L33/06
摘要： The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking.The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula I
摘要翻译：本发明涉及一种可自由基聚合的组合物，其包含用于制造滤色器的羟胺酯。本发明还涉及新的羟胺酯。本发明还涉及在需要后烘烤的所有液晶显示组件中使用羟胺酯。本发明涉及可自由基聚合的组合物，其包含：（a）至少一种碱性显影树脂; （b）至少一种丙烯酸酯单体; （c）至少一种光引发剂; （d）至少一种式I的羟胺酯化合物

32. 发明申请

US20120038996A1 PHOTORESIST COMPOSITIONS 有权
标题翻译：光电组合物
公开(公告)号：US20120038996A1
公开(公告)日：2012-02-16
申请号：US13255543
申请日：2010-03-17
申请人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
发明人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
IPC分类号： G02B5/22 , G03F7/20 , G03F7/40 , C07D401/12 , C08F8/32 , C08F8/50 , C07D491/113 , C07D211/94 , G03F7/028 , C08F2/00
CPC分类号： G03F7/028 , C07D211/94 , C07D491/113 , C08F110/02 , C08F110/06 , C08F265/02 , C08K5/3435 , G03F7/0007 , G03F7/031 , G03F7/40 , C08L33/06
摘要： The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein Ra represents an acyl radical; one of Rb and Rc represents hydrogen and the other one represents a substituent; or Rb and Rc both represent hydrogen or identical or different substituents; or Rb and Rc together represent oxygen; or Rb and Rc together form a ring; R1-R4 each represent C1-C6 alkyl; and R5 and R6 each represent independently of one another hydrogen, C1-C6 alkyl or C6-C10 aryl; or R5 and R6 together represent oxygen.
摘要翻译：本发明涉及一种可自由基聚合的组合物，其包含用于制造滤色器的羟胺酯。本发明还涉及新的羟胺酯。本发明还涉及在需要后烘烤的所有液晶显示组件中使用羟胺酯。本发明涉及可自由基聚合的组合物，其包含：（a）至少一种碱性显影树脂; （b）至少一种丙烯酸酯单体; （c）至少一种光引发剂; （d）至少一种式（I）的羟胺酯化合物，其中R a表示酰基; Rb和Rc之一表示氢，另一个表示取代基; 或Rb和Rc都表示氢或相同或不同的取代基; 或Rb和Rc一起代表氧; 或Rb和Rc一起形成环; R1-R4各自表示C1-C6烷基; R 5和R 6各自独立地表示氢，C 1 -C 6烷基或C 6 -C 10芳基; 或R5和R6一起表示氧。

33. 发明授权

US08507569B2 Photoresist compositions 有权
标题翻译：光刻胶组合物
公开(公告)号：US08507569B2
公开(公告)日：2013-08-13
申请号：US13255543
申请日：2010-03-17
申请人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
发明人： Hisatoshi Kura , Kaori Sameshima , Kazuhiko Kunimoto , Peter Nesvadba , Masaki Ohwa
IPC分类号： H05B6/68 , C08G61/04
CPC分类号： G03F7/028 , C07D211/94 , C07D491/113 , C08F110/02 , C08F110/06 , C08F265/02 , C08K5/3435 , G03F7/0007 , G03F7/031 , G03F7/40 , C08L33/06
摘要： The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein Ra represents an acyl radical; one of Rb and Rc represents hydrogen and the other one represents a substituent; or Rb and Rc both represent hydrogen or identical or different substituents; or Rb and Rc together represent oxygen; or Rb and Rc together form a ring; R1-R4 each represent C1-C6 alkyl; and R5 and R6 each represent independently of one another hydrogen, C1-C6 alkyl or C6-C10 aryl; or R5 and R6 together represent oxygen.
摘要翻译：本发明涉及一种可自由基聚合的组合物，其包含用于制造滤色器的羟胺酯。本发明还涉及新的羟胺酯。本发明还涉及在需要后烘烤的所有液晶显示组件中使用羟胺酯。本发明涉及可自由基聚合的组合物，其包含：（a）至少一种碱性显影树脂; （b）至少一种丙烯酸酯单体; （c）至少一种光引发剂; （d）至少一种式（I）的羟胺酯化合物，其中R a表示酰基; Rb和Rc之一表示氢，另一个表示取代基; 或Rb和Rc都表示氢或相同或不同的取代基; 或Rb和Rc一起代表氧; 或Rb和Rc一起形成环; R1-R4各自表示C1-C6烷基; R 5和R 6各自独立地表示氢，C 1 -C 6烷基或C 6 -C 10芳基; 或R5和R6一起表示氧。

34. 发明申请

US20050260520A1 Heat stable photocurable resin composition for dry film resist 失效
标题翻译：用于干膜抗蚀剂的热稳定的光固化树脂组合物
公开(公告)号：US20050260520A1
公开(公告)日：2005-11-24
申请号：US10520701
申请日：2003-07-01
申请人： Hidetaka Oka , Masaki Ohwa , James Taylor
发明人： Hidetaka Oka , Masaki Ohwa , James Taylor
IPC分类号： G03F7/004 , G03F7/027 , G03F7/029 , G03F7/031 , G03F7/09 , G03F7/105 , G03F7/11 , G03F7/16 , H05K3/06 , H05K3/18 , G03C1/492
CPC分类号： G03F7/029 , G03F7/027 , G03F7/092 , G03F7/105 , G03F7/11 , G03F7/161 , Y10S430/111
摘要： The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 μm and optionally laminate a protective film onto the photocursable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20-90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.1 to 10% by weight of a leuco triphenylmethane dye of the formula (I), wherein R1 is a residue selected from (II), R2 is C1-C12 alkyl or phenyl which may be mono-, di- or tri-substituted by C1-C6 alkyl, trifluoromethyl, C1-6 alkoxy, C1-6 alkylthio, halogen and nitro; R3 is hydrogen or C1-C12 alkyl; R4 to R9 independently of one another are hydrogen or C1-C12 alkyl; X is O, S, NH or N—C1-C12-alkyl; (a) to (e) being 100% by weight. The above composition is useful to avoid unfavourable colour generation during the heat lamination.
摘要翻译：本发明涉及一种通过将光固化树脂组合物形成在厚度为1-50μm的支撑膜上制备干膜抗蚀剂的方法，并且任选地将保护膜层压到可光固化组合物层上以获得干膜抗蚀剂; 由此可光固化树脂由包含（a）20-90重量％的碱溶性粘合剂低聚物或聚合物的均匀混合物形成; （b）5至60重量％的与组分（a）的低聚物和聚合物相容的一种或多种可光聚合单体; （c）0.01至20重量％的一种或多种光引发剂; （d）0至20重量％的添加剂和/或助剂; 和（e）0.1至10重量％的式（I）的无色三苯甲烷染料，其中R 1是选自（II），R 2 O / 是C 1 -C 12烷基或可以被C 1 -C 1亚烷基取代的苯基， C 1-6烷基，三氟甲基，C 1-6烷氧基，C 1-6烷基硫基，卤素和硝基; R 3是氢或C 1 -C 12烷基; R 3是氢或C 1 -C 12烷基; R 9与R 9彼此独立地是氢或C 1 -C 12烷基; X是O，S，NH或N-C 1 -C 12 - 烷基; （a）至（e）为100重量％。上述组合物可用于在热层压期间避免不利的颜色产生。

35. 发明授权

US07198884B2 Heat stable photocurable resin composition for dry film resist 失效
标题翻译：用于干膜抗蚀剂的热稳定的光固化树脂组合物
公开(公告)号：US07198884B2
公开(公告)日：2007-04-03
申请号：US10520701
申请日：2003-07-01
申请人： Hidetaka Oka , Masaki Ohwa , James Philip Taylor
发明人： Hidetaka Oka , Masaki Ohwa , James Philip Taylor
IPC分类号： G03C1/805 , G03C1/494 , G03C1/492 , G03C1/76
CPC分类号： G03F7/029 , G03F7/027 , G03F7/092 , G03F7/105 , G03F7/11 , G03F7/161 , Y10S430/111
摘要： The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 μm and optionally laminate a protective film onto the photocurable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20–90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.1 to 10% by weight of a leuco triphenylmethane dye of the formula (I), wherein R1 is a residue selected from (II), R2 is C1–C12 alkyl or phenyl which may be mono-, di- or tri-substituted by C1–C6 alkyl, trifluoromethyl, C1-6 alkoxy, C1-6 alkylthio, halogen and nitro; R3 is hydrogen or C1–C12 alkyl; R4 to R9 independently of one another are hydrogen or C1–C12 alkyl; X is O, S, NH or N—C1–C12-alkyl; (a) to (e) being 100% by weight. The above composition is useful to avoid unfavourable colour generation during the heat lamination
摘要翻译：本发明涉及一种制备干膜抗蚀剂的方法，该方法是将光固化性树脂组合物形成在厚度为1〜50μm的载体膜上，任选地将保护膜层叠在光固化性组合物层上，得到干膜抗蚀剂; 由此可光固化树脂由包含（a）20-90重量％的碱溶性粘合剂低聚物或聚合物的均匀混合物形成; （b）5至60重量％的与组分（a）的低聚物和聚合物相容的一种或多种可光聚合单体; （c）0.01至20重量％的一种或多种光引发剂; （d）0至20重量％的添加剂和/或助剂; 和（e）0.1至10重量％的式（I）的无色三苯甲烷染料，其中R 1是选自（II），R 2 O / 是C 1 -C 12烷基或可以被C 1 -C 1亚烷基取代的苯基， C 1-6烷基，三氟甲基，C 1-6烷氧基，C 1-6烷基硫基，卤素和硝基; R 3是氢或C 1 -C 12烷基; R 3是氢或C 1 -C 12烷基; R 9与R 9彼此独立地是氢或C 1 -C 12烷基; X是O，S，NH或N-C 1 -C 12 - 烷基; （a）至（e）为100重量％。上述组合物可用于在热层压期间避免不利的颜色产生

36. 发明授权

US07244544B2 Oxime derivatives and the use thereof as latent acids 有权
公开(公告)号：US07244544B2
公开(公告)日：2007-07-17
申请号：US11262104
申请日：2005-10-27
申请人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Masaki Ohwa
发明人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Masaki Ohwa
IPC分类号： G03F7/031 , C07C249/00
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII R1 is for example C1–C18alkylsulfonyl, R2 is halogen or C1–C10haloalkyl; R3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1–C12alkylene; —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, —O—, or —S—, or are C1–C12alkylene or phenylene unsubstituted or substituted; Y1 is C1–C12alkylene which is for example substituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1–C12alkylene; Y3 is e.g. a tetravalent radical of C1–C12alkylene; X is halogen; Ar′1 is for example C1–C12alkyl which is unsubstituted or substituted; Ar″1 is for example phenylene; provided that at least one of the radicals Ar′1, Ar″1, is substituted by 1 to 3 groups of example halogen; R15, R16, R17 and R18 e.g. hydrogen or phenyl; R19, R20, R21, R22 R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.

37. 发明授权

US06673850B1 Photoinitiators and their applications 失效
标题翻译：光引发剂及其应用
公开(公告)号：US06673850B1
公开(公告)日：2004-01-06
申请号：US09959174
申请日：2001-10-18
申请人： Hitoshi Yamato , Masaki Ohwa , Toshikage Asakura , Akira Matsumoto
发明人： Hitoshi Yamato , Masaki Ohwa , Toshikage Asakura , Akira Matsumoto
IPC分类号： C08F246
CPC分类号： C07D295/108 , B33Y70/00 , C07C323/54 , C08F2/50 , C08F293/005 , C08F295/00 , C08L53/00 , C08L53/02 , C09D153/00 , C09D153/02 , C09J153/00 , C09J153/02 , G03F7/031 , Y10S522/904
摘要： Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.
摘要翻译：具有链转移基团的式（Ia）或（Ib）的光引发剂，其中n为1或2; PI是例如式（IIa）的一组; PI“特别是一组式（IIIa）; Ar是例如苯基; Ar2尤其是亚苯基; R 1和R 2例如是C 1 -C 8烷基，或者R 1和R 2一起是C 2 -C 9亚烷基; M1特别是-NR 3 R 4或-OH; M1'例如是一组（c）; R3'是直接键，C1-C12亚烷基或亚苯基; R3是例如氢或C1-C12烷基; R4是例如 C 1 -C 12烷基; A1和A2例如是直接键; CT是链转移组; 可用于制备可用于制备嵌段共聚物的大分子引发剂。

38. 发明授权

US07026094B2 Substituted oxime derivatives and the use thereof as latent acids 失效
公开(公告)号：US07026094B2
公开(公告)日：2006-04-11
申请号：US10478963
申请日：2002-05-23
申请人： Akira Matsumoto , Hitoshi Yamato , Toshikage Asakura , Masaki Ohwa , Peter Murer
发明人： Akira Matsumoto , Hitoshi Yamato , Toshikage Asakura , Masaki Ohwa , Peter Murer
IPC分类号： G03C1/494 , G03C1/76
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1C4haloalkyl, hydrogon, OR9, NR10R11, SR12 or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4 and R5 are for example hydrogen or C1-C12alkyl; R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R′6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8 and R9 for example are hydrogen or C1-C6alkyl; R10 and R11, are for example hydrogen or C1-C18alkyl; R12 is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21 and R22 independently of one other have one of the meanings given for R7; R23, R24, R25 and R26 independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or N; and Z1 is CR22 or N; and Z1 is CR22 or N; and Z1 is CH2, S, O or NR13 are particularly suitable as photo-latent acids in resist applications.

39. 发明申请

US20060068325A1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US20060068325A1
公开(公告)日：2006-03-30
申请号：US11262104
申请日：2005-10-27
申请人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Masaki Ohwa
发明人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Masaki Ohwa
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII R1 is for example C1-C18alkylsulfonyl, R2 is halogen or C1-C10haloalkyl; R3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12alkylene; —O—C-bond or a —O—Si—bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, —O—, or —S—, or are C1-C12alkylene or phenylene unsubstituted or substituted; Y0 is C1-C12alkylene which is for example substituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12alkylene; Y3 is e.g. a tetravalent radical of C1-C12alkylene; X is halogen; Ar′1 is for example C1-C12alkyl which is unsubstituted or substituted; Ar″1 is for example phenylene; provided that at least one of the radicals Ar′1, Ar″11 is substituted by 1 to 3 groups of example halogen; R15, R16, R17 and R18 e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.
摘要翻译：式I，II，III，IV，V，VI和VII的新的肟磺酸酯化合物

40. 发明授权

US06986981B2 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06986981B2
公开(公告)日：2006-01-17
申请号：US10380029
申请日：2001-09-18
申请人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Masaki Ohwa
发明人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Masaki Ohwa
IPC分类号： G03F7/031
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII wherein the substituents are defined in the specification
摘要翻译：式I，II，III，IV，V，VI和VII的新的肟磺酸酯化合物，其中取代基在说明书中定义

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