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    • 32. 发明授权
    • Apparatus for testing semiconductor device package and multilevel pusher thereof
    • 半导体器件封装及其多级推进器测试装置
    • US07893702B2
    • 2011-02-22
    • US12319329
    • 2009-01-06
    • Young-Chul Lee
    • Young-Chul Lee
    • G01R31/20
    • G01R31/2887G01R1/0466
    • A semiconductor package testing apparatus comprises a test substrate that electrically tests a semiconductor package chip; a socket having an electrical contact between the test substrate and the semiconductor package; an insert block inserted into the socket, wherein the semiconductor package is mounted to the insert block; and a pusher that brings the socket into contact with the semiconductor package by compressing an upper part of the semiconductor package, wherein the pusher is multilevel-controlled to compress the semiconductor package by a predefined pressure according to a thickness of the semiconductor package.
    • 一种半导体封装测试装置,包括对半导体封装芯片进行电测试的测试基板; 插座,其在所述测试基板和所述半导体封装之间具有电接触; 插入块插入到插座中,其中半导体封装被安装到插入块上; 以及推动器,其通过压缩半导体封装的上部而使插座与半导体封装接触,其中推动器被多级控制,以根据半导体封装的厚度以预定的压力压缩半导体封装。
    • 33. 发明申请
    • Apparatus for guiding and aligning semiconductor chip package
    • 用于引导和对准半导体芯片封装的装置
    • US20100244346A1
    • 2010-09-30
    • US12659717
    • 2010-03-18
    • Young-Chul Lee
    • Young-Chul Lee
    • B23Q1/25
    • G01R31/2893
    • Provided is an apparatus for guiding and aligning a semiconductor chip package. The apparatus may include an insert, a plate above the insert, and an adapter. The insert may be configured to house various sizes of semiconductor chip packages. The plate may be configured to move vertically with respect to the insert. The adapter may be coupled to the plate and may be configured to guide at least one semiconductor chip package into the insert and to perform alignment of the at least one semiconductor chip package. In accordance with example embodiments, the at least one semiconductor chip package may have a size corresponding to at least one of the various sizes.
    • 提供一种用于引导和对准半导体芯片封装的装置。 该装置可以包括插入件,插入件上方的板和适配器。 插入件可以被配置成容纳各种尺寸的半导体芯片封装。 板可以被配置为相对于插入件垂直移动。 适配器可以耦合到板并且可以被配置为将至少一个半导体芯片封装引导到插入件中并且执行至少一个半导体芯片封装的对准。 根据示例实施例,所述至少一个半导体芯片封装可以具有对应于各种尺寸中的至少一个的尺寸。
    • 34. 发明授权
    • Tunable inter-digital capacitor and method of manufacturing the same
    • 可调式数字量电容器及其制造方法
    • US07738237B2
    • 2010-06-15
    • US11789311
    • 2007-04-24
    • Young Chul Lee
    • Young Chul Lee
    • H01G4/06H01G4/005
    • H01G7/06Y10T29/43
    • Provided are a tunable inter-digital capacitor (IDC) and a method of manufacturing the same. The tunable IDC includes: a first dielectric layer formed on a substrate and having electrode pattern grooves of an IDC including a ground line and a signal line formed therein; electrode metal patterns formed in the electrode pattern grooves of the IDC including the ground line and the signal line formed in the first dielectric layer; and a second dielectric layer formed on an upper surface of the first dielectric layer to cover all of the electrode metal patterns except for parts of the ground and signal lines. Therefore, it is possible to increase tunability of the IDC and reduce drive voltage.
    • 提供可调谐的数字间电容器(IDC)及其制造方法。 可调谐IDC包括:第一电介质层,其形成在基板上,并且具有IDC的电极图案槽,所述电极图案槽包括形成在其中的接地线和信号线; 形成在包括接地线的IDC的电极图案凹槽中的电极金属图案和形成在第一介电层中的信号线; 以及形成在所述第一电介质层的上表面上的第二电介质层,以覆盖除了所述接地和信号线的部分之外的所有电极金属图案。 因此,可以提高IDC的可调性并降低驱动电压。
    • 35. 发明授权
    • Platen assembly, apparatus having the platen assembly and method of polishing a wafer using the platen assembly
    • 压板组件,具有压板组件的装置和使用压板组件抛光晶片的方法
    • US07431634B2
    • 2008-10-07
    • US11702854
    • 2007-02-06
    • Young-Chul Lee
    • Young-Chul Lee
    • B24B49/16
    • B24B37/12B24B21/08
    • In a platen assembly for a polishing apparatus, a platen supports a polishing belt that makes contact with an object during a polishing process, so that the platen provides a pressure on the polishing belt during the polishing process. A plurality of first bladders extends in a first direction on an entire surface of the platen and is spaced apart by a uniform distance, and the first bladders apply pressure to the polishing belt. A plurality of second bladders extends in the first direction on a middle portion of the surface of the platen between a central portion and a peripheral portion of the platen and is positioned between the first bladders, and the second bladders apply pressure to the polishing belt. The pressures of the bladders are individually controlled by pressure controllers. Various pressures are individually applied different portions of the polishing belt by the bladders.
    • 在用于抛光装置的压板组件中,压板支撑在抛光过程中与物体接触的抛光带,使得压板在抛光过程中在抛光带上提供压力。 多个第一气囊在压板的整个表面上沿第一方向延伸并且间隔开均匀的距离,并且第一气囊向抛光带施加压力。 多个第二气囊在压板表面的中间部分的第一方向上延伸,位于压板的中心部分和周边部分之间,并且位于第一气囊之间,并且第二气囊向抛光带施加压力。 气囊的压力由压力控制器单独控制。 通过气囊分别施加各种压力的抛光带的不同部分。