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31. 发明授权

US5835261A Semiconductor optical amplifier device capable of deflecting output laser beam 失效
标题翻译：能够偏转输出激光束的半导体光放大器件
公开(公告)号：US5835261A
公开(公告)日：1998-11-10
申请号：US579162
申请日：1995-12-27
申请人： Takemasa Tamanuki , Tatsuya Sasaki , Mitsuhiro Kitamura
发明人： Takemasa Tamanuki , Tatsuya Sasaki , Mitsuhiro Kitamura
IPC分类号： G02B6/12 , G02F1/295 , H01S5/00 , H01S5/026 , H01S5/042 , H01S5/06 , H01S5/062 , H01S5/10 , H01S5/12 , H01S5/20 , H01S5/40 , H01S5/50 , H01S3/00
CPC分类号： H01S5/0425 , H01S5/026 , H01S5/50 , H01S5/0267 , H01S5/06243 , H01S5/1053 , H01S5/1064 , H01S5/1082 , H01S5/12 , H01S5/4075 , H01S5/4081
摘要： In a semiconductor optical amplifier device comprising a semiconductor laser section and a semiconductor optical amplifier both of which are formed on the same semiconductor substrate and which are coupled to each other, the semiconductor optical amplifier comprises a tapered electrode formed on an upper surface thereof. The tapered electrode is divided into a plurality of divided electrodes by at least one of dividing sections which extends along a propagation direction of an incident laser beam. The plurality of divided electrodes are supplied with injection currents which are variable in each of the plurality of divided electrodes.
摘要翻译：在包括半导体激光器部分和半导体光放大器的半导体光放大器装置中，半导体光放大器都形成在相同的半导体衬底上并彼此耦合，半导体光放大器包括形成在其上表面上的锥形电极。锥形电极通过沿着入射激光束的传播方向延伸的分割部分中的至少一个被分成多个分开的电极。多个分割电极被供给在多个分割电极中的每一个中可变的注入电流。

32. 发明授权

US5770466A Semiconductor optical integrated circuits and method for fabricating the same 失效
标题翻译：半导体光集成电路及其制造方法
公开(公告)号：US5770466A
公开(公告)日：1998-06-23
申请号：US400570
申请日：1995-03-08
申请人： Tatsuya Sasaki , Mitsuhiro Kitamura , Kiichi Hamamoto , Shotaro Kitamura , Keiro Komatsu , Yasutaka Sakata
发明人： Tatsuya Sasaki , Mitsuhiro Kitamura , Kiichi Hamamoto , Shotaro Kitamura , Keiro Komatsu , Yasutaka Sakata
IPC分类号： H01S5/026 , H01S5/0625 , H01S5/10 , H01S5/125 , H01S5/20 , H01S5/227 , H01S5/40 , H01L21/20
CPC分类号： H01S5/4031 , H01S5/026 , H01S5/06256 , H01S2304/04 , H01S5/0265 , H01S5/06258 , H01S5/1003 , H01S5/125 , H01S5/2077 , H01S5/2272 , H01S5/4025 , H01S5/4068 , H01S5/4087
摘要： A semiconductor optical monolithic integration device has a semiconductor substrate including an active region and a passive region. Epitaxial layers including a multiple quantum well structure have a variation in band gap energy and thickness along a waveguide direction. The epitaxial layers in the active region are selectively grown by a metal organic vapor phase epitaxy on a first selective growth area defined by a first mask pattern provided in the active region except in the passive region. The first mask pattern has a variation in width along the waveguide direction. The epitaxial layers are simultaneously and non-selectively grown on an entire surface of the passive region by the metal organic vapor phase epitaxy and the epitaxial layers have a mesa structure in the active region and a plane structure in the passive region. A cladding layer having a ridged structure is selectively grown by a metal organic vapor phase epitaxy on a second selective growth area defined by a second mask pattern provided in the active and passive regions. The second mask pattern has a constant width. In the active region, the ridged cladding layer completely embeds the mesa structure epitaxial layers and in the passive region the ridged cladding layer are provided on the plane structure epitaxial layers.
摘要翻译：半导体光学单片集成器件具有包括有源区和被动区的半导体衬底。包括多量子阱结构的外延层具有沿着波导方向的带隙能量和厚度的变化。有源区中的外延层通过金属有机气相外延选择性地生长在由除了被动区域之外的有源区域中提供的第一掩模图案限定的第一选择性增长区域上。第一掩模图案沿波导方向具有宽度变化。外延层通过金属有机气相外延在无源区的整个表面上同时且非选择性地生长，并且外延层在有源区中具有台面结构和在被动区中具有平面结构。通过在由有源和无源区域中提供的第二掩模图案限定的第二选择性增长区域上的金属有机气相外延选择性地生长具有脊状结构的覆层。第二掩模图案具有恒定的宽度。在有源区域中，脊状覆层完全嵌入台面结构外延层，并且在无源区域中，脊状覆层设置在平面结构外延层上。

33. 发明授权

US5565693A Semiconductor optical integrated circuits 失效
标题翻译：半导体光集成电路
公开(公告)号：US5565693A
公开(公告)日：1996-10-15
申请号：US179049
申请日：1994-01-07
申请人： Tatsuya Sasaki , Mitsuhiro Kitamura , Kiichi Hamamoto , Shotaro Kitamura , Keiro Komatsu , Yasutaka Sakata
发明人： Tatsuya Sasaki , Mitsuhiro Kitamura , Kiichi Hamamoto , Shotaro Kitamura , Keiro Komatsu , Yasutaka Sakata
IPC分类号： H01S5/026 , H01S5/0625 , H01S5/10 , H01S5/125 , H01S5/20 , H01S5/227 , H01S5/40 , H01L33/00
CPC分类号： H01S5/4031 , H01S5/026 , H01S5/06256 , H01S2304/04 , H01S5/0265 , H01S5/06258 , H01S5/1003 , H01S5/125 , H01S5/2077 , H01S5/2272 , H01S5/4025 , H01S5/4068 , H01S5/4087
摘要： A semiconductor optical monolithic integration device comprises a semiconductor substrate including an active region and a passive region. Epitaxial layers including a multiple quantum well structure have a variation in band gap energy and thickness along a waveguide direction. The epitaxial layers in the active region are selectively grown by a metal organic vapor phase epitaxy on a first selective growth area defined by a first mask pattern provided in the active region except in the passive region. The first mask pattern has a variation in width along the waveguide direction. The epitaxial layers are simultaneously and non-selectively grown on the entirety of the passive region by metal organic vapor phase epitaxy and epitaxial layers having a mesa structure in the active region and a plane structure in the passive region are formed. A cladding layer having a ridged structure is selectively grown by a metal organic vapor phase epitaxy on a second selective growth area defined by a second mask pattern provided in both the active and passive regions. The second mask pattern has a constant width. In the active region the ridged cladding layer completely embeds the mesa structure epitaxial layers and in the passive region the ridged cladding layer is provided on the plane structure epitaxial layers.
摘要翻译：半导体光学单片集成器件包括包括有源区和无源区的半导体衬底。包括多量子阱结构的外延层具有沿着波导方向的带隙能量和厚度的变化。有源区中的外延层通过金属有机气相外延选择性地生长在由除了被动区域之外的有源区域中提供的第一掩模图案限定的第一选择性增长区域上。第一掩模图案沿波导方向具有宽度变化。外延层通过金属有机气相外延在整个无源区上同时且非选择性地生长，并且在有源区中具有台面结构并形成无源区中的平面结构的外延层。具有脊状结构的包覆层通过金属有机气相外延选择性地生长在由在有源区域和被动区域中提供的第二掩模图案限定的第二选择性增长区域上。第二掩模图案具有恒定的宽度。在有源区域中，脊状覆层完全嵌入台面结构外延层，并且在无源区域中，脊状覆层设置在平面结构外延层上。

34. 发明授权

US08893842B2 Motorcycle and shock-absorber 有权
标题翻译：摩托车和减震器
公开(公告)号：US08893842B2
公开(公告)日：2014-11-25
申请号：US13594068
申请日：2012-08-24
申请人： Yotaro Mori , Yusaburo Tani , Akihiko Matsukawa , Tatsuya Sasaki
发明人： Yotaro Mori , Yusaburo Tani , Akihiko Matsukawa , Tatsuya Sasaki
IPC分类号： B62D61/02 , F16F9/00 , B62K25/28 , F16F9/06
CPC分类号： F16F9/065 , B62K25/286
摘要： A technique capable of suppressing a rise in the temperature of a shock-absorber. A motorcycle includes a swing arm having a front end swingably supported by a body frame. A shock-absorber includes a rear end supported by the swing arm via a link and an upper end supported by the body frame via a support hole. A cylindrical reserve tank is connected to the shock-absorber for reserving the hydraulic operating fluid flowing into the shock-absorber, the reserve tank is arranged such that an axis thereof is positioned above the axis of the support hole provided in the upper end of the shock-absorber and extends in the width direction of a vehicle.
摘要翻译：能够抑制减震器的温度上升的技术。摩托车包括具有可摆动地被车身框架支撑的前端的摆臂。减震器包括经由连杆支撑在摆臂上的后端，以及通过支撑孔由主体框架支撑的上端。一个圆柱形储备罐连接到减震器上，用于储存流入减震器的液压工作流体，储备箱的轴线设置成使其轴线位于设在上述支撑孔的上端的支撑孔的轴线的上方减震器，并在车辆的宽度方向上延伸。

35. 发明申请

US20140271303A1 VANE-TYPE COMPRESSOR 有权
标题翻译： VANE型压缩机
公开(公告)号：US20140271303A1
公开(公告)日：2014-09-18
申请号：US14350959
申请日：2012-01-11
申请人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
发明人： Shin Sekiya , Raito Kawamura , Hideaki Maeyama , Shinichi Takahashi , Tatsuya Sasaki , Kanichiro Sugiura
IPC分类号： F04C18/02
CPC分类号： F04C18/02 , F01C21/0809 , F01C21/0836 , F04C18/321 , F04C18/3441 , F04C18/352 , F04C23/008 , F04C29/025 , F04C29/028 , F04C2240/603 , F04C2240/809
摘要： A vane-type compressor includes a rotor shaft that includes rotating shaft portions and a rotor portion, which are integrated with one another. A lower end of the rotating shaft is disposed in an oil reservoir. The vane-type compressor also includes vane aligners disposed at both end portions of vanes, and recess portions, which are respectively formed in a frame and a cylinder head so as to be concentric with an inner circumferential surface of a cylinder. Outer circumferential surfaces of the vane aligners are slidably supported by the recess portions. In the rotor shaft, oil supply channels, which allow communication between the oil reservoir and the recess portions of the frame and the cylinder head, and an oil pump, which supplies refrigerating machine oil in the oil reservoir to the oil supply channels, are provided.
摘要翻译：叶片式压缩机包括转子轴，该转子轴包括彼此结合的旋转轴部分和转子部分。旋转轴的下端设置在储油器中。叶片式压缩机还包括设置在叶片的两个端部处的叶片对准器和分别形成在框架和气缸盖中以与圆筒的内周表面同心的凹部。叶片对准器的外周面由凹部可滑动地支撑。在转子轴中，提供允许储油器与框架和气缸盖的凹部之间的连通的供油通道，以及将储油器中的冷冻机油供给到供油通道的油泵，。

36. 发明申请

US20140234755A1 MASK BLANK SUBSTRATE, MASK BLANK, REFLECTIVE MASK BLANK, TRANSFER MASK, REFLECTIVE MASK, AND METHODS OF MANUFACTURING THE SAME 有权
标题翻译：掩蔽空白基板，掩模布，反射掩模布，转印掩模，反射掩模及其制造方法
公开(公告)号：US20140234755A1
公开(公告)日：2014-08-21
申请号：US14118479
申请日：2012-05-15
申请人： Tatsuya Sasaki , Takahito Nishimura
发明人： Tatsuya Sasaki , Takahito Nishimura
IPC分类号： G03F1/24 , B32B3/02 , G03F1/22
CPC分类号： G03F1/24 , B32B3/02 , G03F1/22 , G03F1/38 , G03F1/42 , G03F1/60 , Y10T428/24488
摘要： A mask blank substrate is provided with a substrate mark comprising an oblique section. The inclination angle of the substrate mark with respect to a main surface is greater than 45° and less than 90° and the distance from the boundary between the main surface and the substrate mark to the outer periphery of the mask blank substrate is less than 1.5 mm.
摘要翻译：掩模空白基板设置有包括倾斜部分的基板标记。基板标记相对于主表面的倾斜角度大于45°且小于90°，并且从主表面和基板标记之间的边界到掩模基板的外周的距离小于1.5 mm。

37. 发明授权

US08453780B2 Electrical component attachment structure for two-wheeled motor vehicle 有权
标题翻译：两轮汽车电气部件安装结构
公开(公告)号：US08453780B2
公开(公告)日：2013-06-04
申请号：US12353417
申请日：2009-01-14
申请人： Takao Yamamoto , Tatsuya Sasaki , Kunihiro Kai , Takashi Sasaki
发明人： Takao Yamamoto , Tatsuya Sasaki , Kunihiro Kai , Takashi Sasaki
IPC分类号： B62K11/04 , B62K19/30
CPC分类号： B62K11/04 , B62K19/30
摘要： An electrical component attachment structure for a two-wheeled motor vehicle includes a main frame supporting components of a vehicle body such as an engine, a center frame extending vertically behind the engine, and a pair of right and left seat rails detachably attached to the center frame, the seat rails being attached with a bracket which supports an electrical component, in which the bracket is formed in an approximate U-shape and is arranged with an opening section of the U-shape directed towards the front of the vehicle body, so that the bracket is configured to support the electrical component inside the approximate U-shape and to allow the electrical component to be taken out towards the front of the vehicle body from the opening section.
摘要翻译：用于两轮机动车辆的电气部件安装结构包括支撑发动机等车辆的主体的框架，在发动机后方垂直延伸的中央框架，以及一对可拆卸地安装在中心的左右座椅导轨座椅导轨上安装有支撑电气部件的支架，其中支架形成为大致U形，并且配置有朝向车体前部的U形开口部分，因此支架被配置为支撑大致U形内部的电气部件，并且允许电气部件从开口部分朝向车身前部取出。

38. 发明申请

US20130084202A1 VANE ROTARY COMPRESSOR 有权
标题翻译： VANE旋转压缩机
公开(公告)号：US20130084202A1
公开(公告)日：2013-04-04
申请号：US13592415
申请日：2012-08-23
申请人： Shinichi Takahashi , Hideaki Maeyama , Shin Sekiya , Tatsuya Sasaki , Raito Kawamura , Kanichirou Sugiura
发明人： Shinichi Takahashi , Hideaki Maeyama , Shin Sekiya , Tatsuya Sasaki , Raito Kawamura , Kanichirou Sugiura
IPC分类号： F04C29/12 , F04C18/00
CPC分类号： F01C21/106 , F04C18/3564 , F04C23/008 , F04C29/126 , F05C2201/02 , F05C2201/021
摘要： In a vane rotary compressor, a discharge valve on a discharge flow channel communicates an operating chamber in a compression element with a discharge hole. The discharge valve is pushed from an opening portion of a discharge valve groove to an outer circumferential surface of a roller by a high-pressure refrigerant when pressure in an operating chamber is lower than the pressure of the high-pressure refrigerant. The discharge valve is pushed back into the discharge valve groove by the refrigerant pressure in the operating chamber when the pressure in the operating chamber is higher than the pressure of the high-pressure refrigerant. The discharge flow channel is closed by the outer circumferential surface of the discharge valve pushed out from the opening portion of the discharge valve groove and the outer circumferential surface of the roller, and opens when the discharge valve is pushed back into the discharge valve groove.
摘要翻译：在叶片式旋转式压缩机中，排出流路上的排出阀将压缩元件的动作室与排出孔连通。当操作室中的压力低于高压制冷剂的压力时，排出阀由排出阀槽的开口部分通过高压制冷剂被推压到辊的外周面。当操作室中的压力高于高压制冷剂的压力时，排出阀被操作室中的制冷剂压力推回到排出阀槽中。排出流路由从排出阀槽的开口部和辊的外周面推出的排出阀的外周面封闭，并且当排出阀被推回到排出阀槽时打开。

39. 发明授权

US08405912B2 Headup display device and method for controlling the same 有权
标题翻译：前置显示装置及其控制方法
公开(公告)号：US08405912B2
公开(公告)日：2013-03-26
申请号：US12928020
申请日：2010-12-01
申请人： Kazuhide Ohta , Tatsuya Sasaki
发明人： Kazuhide Ohta , Tatsuya Sasaki
IPC分类号： G02B27/14
CPC分类号： G02B26/0816 , G02B7/1827 , G02B27/0093 , G02B27/01 , G02B2027/014 , G02B2027/0181
摘要： A reflection unit reflects an image indicated on an indicator and projects the image on a combiner to indicate a virtual image of the image at a position viewable for a user. A stepping motor rotates the reflection unit to move the virtual image continuously in a predetermined section of the combiner. A control unit controls a driving power of the stepping motor such that a smoothness parameter becomes less than a predetermined value. The smoothness parameter is defined by a division of a difference between the maximum speed of the virtual image and an average speed of the virtual image, when the virtual image moves continuously in the predetermined section, by the average speed.
摘要翻译：反射单元反映指示符上指示的图像，并将图像投影到组合器上，以在可以为用户查看的位置处指示图像的虚拟图像。步进电机旋转反射单元以在组合器的预定部分中连续移动虚像。控制单元控制步进电动机的驱动力，使得平滑度参数变得小于预定值。平滑度参数是通过虚拟图像的最大速度与虚拟图像的平均速度之间的差的除法来定义的，当虚拟图像在预定部分中连续移动平均速度时。

40. 发明授权

US08388409B2 Substrate polishing apparatus 有权
标题翻译：基材抛光装置
公开(公告)号：US08388409B2
公开(公告)日：2013-03-05
申请号：US12700917
申请日：2010-02-05
申请人： Hidetaka Nakao , Yasumitsu Kawabata , Yoshifumi Katsumata , Naoki Ozawa , Tatsuya Sasaki , Atsushi Shigeta
发明人： Hidetaka Nakao , Yasumitsu Kawabata , Yoshifumi Katsumata , Naoki Ozawa , Tatsuya Sasaki , Atsushi Shigeta
IPC分类号： B24B51/00
CPC分类号： B24B37/013 , B24B49/03 , B24B49/12
摘要： A substrate polishing apparatus is provided for preventing excessive polishing and insufficient polishing, and enabling a quantitative setting of an additional polishing time. The substrate polishing apparatus comprises a mechanism for polishing a substrate to be polished; a film thickness measuring device for measuring the thickness of a thin film deposited on the substrate; an interface for entering a target thickness for the polished thin film; a storage area for preserving past polishing results; and a processing unit for calculating a polishing time and a polishing rate. The substrate polishing apparatus builds an additional polishing database for storing data acquired from the result of additional polishing in the storage area.
摘要翻译：提供了用于防止过度抛光和研磨不足的基板抛光装置，并且能够定量设定额外的抛光时间。基板抛光装置包括用于抛光待抛光的基板的机构; 用于测量沉积在基板上的薄膜的厚度的膜厚测量装置; 用于输入抛光薄膜的目标厚度的界面; 用于保留过去抛光结果的存储区域; 以及用于计算抛光时间和抛光速率的处理单元。衬底抛光装置构建另外的抛光数据库，用于存储从存储区域中的附加抛光结果获取的数据。

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