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31. 发明授权

US08541286B2 Methods for fabricating integrated circuits 有权
标题翻译：集成电路的制造方法
公开(公告)号：US08541286B2
公开(公告)日：2013-09-24
申请号：US13399674
申请日：2012-02-17
申请人： Chang Seo Park
发明人： Chang Seo Park
IPC分类号： H01L21/76
CPC分类号： H01L21/823431 , H01L21/76232 , H01L21/76283 , H01L29/7853
摘要： Methods are provided for forming semiconductor devices. One method includes forming a first layer overlying a bulk semiconductor substrate. A second layer is formed overlying the first layer. A first plurality of trenches is etched into the first and second layers. The first plurality of trenches is filled to form a plurality of support structures. A second plurality of trenches is etched into the first and second layers. Portions of the second layer disposed between adjacent trenches of the first and second pluralities of trenches define a plurality of fins. The first layer is etched to form gap spaces between the bulk semiconductor substrate and the plurality of fins. The plurality of fins is supported in position adjacent to the gap spaces by the plurality of support structures. The gap spaces are filled with an insulating material.
摘要翻译：提供了形成半导体器件的方法。一种方法包括形成覆盖体半导体衬底的第一层。第二层形成在第一层上。第一多个沟槽被蚀刻到第一层和第二层中。第一多个沟槽被填充以形成多个支撑结构。第二多个沟槽被蚀刻到第一层和第二层中。设置在第一和第二多个沟槽的相邻沟槽之间的第二层的部分限定多个鳍。蚀刻第一层以在体半导体衬底和多个鳍之间形成间隙。多个翅片通过多个支撑结构支撑在与间隙空间相邻的位置。间隙空间填充绝缘材料。

32. 发明申请

US20120138845A1 COMPOSITION COMPRISING IONIZED GERMANUIM DIOXIDE, METHOD OF MAKING AND USE THEREOF 审中-公开
标题翻译：包含离子化二异氰酸酯的组合物，其制备和使用方法
公开(公告)号：US20120138845A1
公开(公告)日：2012-06-07
申请号：US13369979
申请日：2012-02-09
申请人： Chang Seo PARK
发明人： Chang Seo PARK
IPC分类号： C09K5/20
CPC分类号： C09K5/10 , C23C30/00 , C23F11/08 , C23F11/182
摘要： A composition comprising at least one ionized silicate mineral and water, wherein the at least one ionized silicate mineral is solvated in water, and wherein decomposition comprises an ionized germanium dioxide, its method of making, and its method of using are disclosed. While the composition is subject to a wide range of applications, it is especially suited for use in a coolant system for a combustion engine, and in particular, the coolant system for an internal combustion engine for vehicles.
摘要翻译：一种包含至少一种离子化硅酸盐矿物和水的组合物，其中所述至少一种离子化硅酸盐矿物质溶解在水中，并且其中分解包括电离二氧化锗，其制备方法及其使用方法。虽然组合物受到广泛的应用，但是它特别适用于用于内燃机的冷却剂系统，特别是用于车辆的内燃机的冷却剂系统。

33. 发明申请

US20120060784A1 COMPOSITION COMPRISING IONIZED GERMANUIM DIOXIDE, METHOD OF MAKING AND USE THEREOF 有权
公开(公告)号：US20120060784A1
公开(公告)日：2012-03-15
申请号：US12880873
申请日：2010-09-13
申请人： Chang Seo PARK
发明人： Chang Seo PARK
IPC分类号： F02B43/00 , C09K5/00
CPC分类号： C09K5/10 , C23C30/00 , C23F11/08 , C23F11/182
摘要： A composition comprising at least one ionized silicate mineral and water, wherein the at least one ionized silicate mineral is solvated in water, and wherein decomposition comprises an ionized germanium dioxide, its method of making, and its method of using are disclosed. While the composition is subject to a wide range of applications, it is especially suited for use in a coolant system for a combustion engine, and in particular, the coolant system for an internal combustion engine for vehicles.

34. 发明授权

US08022051B2 Composition for protection and improvement of skin, or reinforcing skin barrier function comprising phosphatidylserine 有权
标题翻译：用于保护和改善皮肤或包含磷脂酰丝氨酸的增强皮肤屏障功能的组合物
公开(公告)号：US08022051B2
公开(公告)日：2011-09-20
申请号：US11665868
申请日：2005-10-20
申请人： Sang-June Nam , So-Young Chung , Jeong-Jun Han , Wang-Keun Choi , Chang-Seo Park , Yun-Sik Kim , Sang-Woo Cho , Young-Ho Lee , Jin-Wook Kim , Ui-Chan Koh
发明人： Sang-June Nam , So-Young Chung , Jeong-Jun Han , Wang-Keun Choi , Chang-Seo Park , Yun-Sik Kim , Sang-Woo Cho , Young-Ho Lee , Jin-Wook Kim , Ui-Chan Koh
IPC分类号： A61K31/685 , A61P17/00 , A61P17/16
CPC分类号： A61K31/685
摘要： Disclosed is a composition containing phosphatidylserine as an effective ingredient, and more particularly to a composition containing phosphatidylserine as an effective ingredient for protecting and improving a skin, reinforcing a skin barrier function, suppressing and alleviating an inflammatory response, treating and improving an atopic skin, activating PPAR-a promoting a differentiation of the skin, protecting the skin and preventing and improving skin aging and wrinkle. Accordingly, it is possible to protect and improve the skin from the injury due to the ultraviolet or the external stimulating material such as chemical material and to reinforce and strengthen the skin barrier function using the composition, thereby improving a general skin state.
摘要翻译：公开了含有磷脂酰丝氨酸作为有效成分的组合物，更具体地，涉及含有磷脂酰丝氨酸作为保护和改善皮肤，增强皮肤屏障功能，抑制和减轻炎症反应，治疗和改善特应性皮肤的有效成分的组合物，激活PPAR-a促进皮肤分化，保护皮肤，预防和改善皮肤老化和皱纹。因此，可以保护和改善由于紫外线或外部刺激材料如化学材料造成的伤害的皮肤，并且可以使用该组合物增强和增强皮肤屏障功能，从而改善一般的皮肤状态。

35. 发明申请

US20110006378A1 Semiconductor Manufacturing Method Using Maskless Capping Layer Removal 审中-公开
标题翻译：使用无掩模顶盖去除的半导体制造方法
公开(公告)号：US20110006378A1
公开(公告)日：2011-01-13
申请号：US12498775
申请日：2009-07-07
申请人： Muhammad Hussain , Chang Seo Park
发明人： Muhammad Hussain , Chang Seo Park
IPC分类号： H01L29/78 , H01L21/3205 , H01L21/311
CPC分类号： H01L21/31111 , H01L21/823842 , H01L21/823857
摘要： A method of manufacturing a semiconductor device includes depositing a first capping layer on a dielectric layer. The method also includes etching the first capping layer from a second portion of the semiconductor device. The first capping layer remaining in a first portion of the semiconductor device may form a PMOS device. The method further includes depositing a second capping layer after etching the first capping layer. After the second capping layer is deposited a maskless process results in selectively etching the second capping layer from the first portion of the semiconductor device. The second portion of the semiconductor device may be a NMOS device. The method described may be used in manufacturing integrated CMOS devices as scaling reduces device size. Additionally, the method of selectively etching capping layers may be used to manufacture multi-threshold voltage devices.
摘要翻译：制造半导体器件的方法包括在电介质层上沉积第一覆盖层。该方法还包括从半导体器件的第二部分蚀刻第一覆盖层。保留在半导体器件的第一部分中的第一覆盖层可以形成PMOS器件。该方法还包括在蚀刻第一覆盖层之后沉积第二覆盖层。在沉积第二覆盖层之后，无掩模工艺导致从半导体器件的第一部分选择性地蚀刻第二覆盖层。半导体器件的第二部分可以是NMOS器件。所描述的方法可以用于制造集成CMOS器件，因为缩放减小器件尺寸。此外，选择性蚀刻封盖层的方法可用于制造多阈值电压器件。

36. 发明授权

US06403111B1 Method for preparing aqueous phytosphingosine solution 失效
标题翻译：水溶性鞘氨醇溶液的制备方法
公开(公告)号：US06403111B1
公开(公告)日：2002-06-11
申请号：US09691469
申请日：2000-10-18
申请人： Chang Seo Park , Jin Wook Kim , Jee Hean Jeong
发明人： Chang Seo Park , Jin Wook Kim , Jee Hean Jeong
IPC分类号： A61K3578
CPC分类号： A61K8/97 , A61K8/68 , A61Q19/00 , Y10S514/844
摘要： Disclosed is a method for preparing an aqueous phytosphingosine solution containing as much as 5-10 weight % of phytosphingosine without using any solvents other than water. A high content of phytosphingosine is dissolved in water and lactic acid with the help of a willow bark extract. In addition to being clear, the aqueous phytosphingosine solution is able to recover damaged skin with activity against bacteria and inflammation. Also, when being applied for cosmetics, the aqueous phytosphingosine solution allows them to contain as much as 1-2 weight % of phytosphingosine by virtue of its high content of phytosphingosine. Further, the phytosphingosine solution is greatly improved in compatibility with cosmetic components so that it can be readily applied for aqueous cosmetics such as skin lotions, essence lotions, aqueous pack products, body essence compositions, etc., for which phytosphingosine has not yet been applied, thus far. Thus, the phytosphingosine solution of the present invention gives a great contribution to the functional improvement of aqueous cosmetics.
摘要翻译：公开了一种在不使用水以外的任何溶剂的情况下制备含有多达5-10重量％的植物鞘氨醇的水溶性植物鞘氨醇溶液的方法。借助柳树皮提取物，将高含量的植物鞘氨醇溶于水和乳酸。除了清楚，植物水溶液能够恢复损伤的皮肤，具有抵抗细菌和炎症的活性。另外，当用于化妆品时，由于植物鞘氨醇含量高，植物水溶液使得它们能含有1-2重量％的植物鞘氨醇。此外，植物鞘氨醇溶液与化妆品组分的相容性大大提高，因此其可以容易地用于尚未应用植物鞘氨醇的水性化妆品如皮肤洗剂，精华液，水性包装产品，身体精华组合物等，迄今。因此，本发明的植物鞘氨醇溶液对水性化妆品的功能改善有很大的贡献。

37. 发明授权

US5958742A Microbiological method for preparing sphingolipids using a novel yeast pichia ciferrii DSCC 7-25 失效
标题翻译：使用新型酵母毕赤酵母DSCC 7-25制备鞘脂的微生物学方法
公开(公告)号：US5958742A
公开(公告)日：1999-09-28
申请号：US119958
申请日：1998-07-21
申请人： Chang Seo Park , Ji Hean Jeong , Sung Yong Hong , Woo Seok Choi
发明人： Chang Seo Park , Ji Hean Jeong , Sung Yong Hong , Woo Seok Choi
IPC分类号： C12P13/00 , C12N1/14 , C12P13/02
CPC分类号： C12P13/02 , C12R1/84 , Y10S435/938
摘要： The present invention relates to a microbiological process for preparing sphingolipids, especially, tetraacetylphytosphingosine(TAPS), using novel yeast cell Pichia ciferrii DSCC 7-25 under optimal fermentation conditions. Further, this invention concerns a novel yeast cell Pichia ciferrii DSCC 7-25 and it's isolation method from wild type of Pichia ciferrii strain.
摘要翻译：本发明涉及在最佳发酵条件下使用新型酵母细胞毕赤酵母DSCC 7-25制备鞘脂，特别是四乙酰鸟嘌呤（TAPS）的微生物学方法。此外，本发明涉及一种新型酵母细胞毕赤酵母DSCC7-25，其是野生型毕赤酵母菌株的分离方法。

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