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21. 发明申请

US20180261423A1 Control Method and Control Program for Focused Ion Beam Device 审中-公开
公开(公告)号：US20180261423A1
公开(公告)日：2018-09-13
申请号：US15909601
申请日：2018-03-01
申请人： Hitachi, Ltd.
发明人： Keiji WATANABE , Toshiyuki MINE , Hiroyasu SHICHI , Masatoshi MORISHITA
IPC分类号： H01J37/147 , H01J37/304 , H01J37/30 , H01J37/15
CPC分类号： H01J37/1471 , H01J37/15 , H01J37/3007 , H01J37/3045 , H01J37/3056 , H01J37/3171 , H01J2237/20285 , H01J2237/30455 , H01J2237/30472 , H01J2237/31735 , H01J2237/31749
摘要： The present invention is directed to a technique for correcting processing positional deviation and processing size deviation during processing by a focused ion beam device. A focused ion beam device control method includes forming a first processed figure on the surface of a specimen through the application of a focused ion beam in a first processing range of vision; determining the position of a next, second processing range of vision based on the outer dimension of the first processed figure; and moving a stage to the position of the second processing range of vision thus determined. Further, the control method includes forming a second processed figure through the application of the focused ion beam in a second processing range of vision.

22. 发明授权

US09773635B2 Device for producing an electron beam 有权
公开(公告)号：US09773635B2
公开(公告)日：2017-09-26
申请号：US14412754
申请日：2013-03-12
申请人： LIMO Patentverwaltung GmbH & Co. KG
发明人： Vitalij Lissotschenko
IPC分类号： H01J29/70 , H01J37/06 , H01J37/147 , H01J37/15 , H01J37/305 , H01J3/30 , H01J29/04 , H01J29/48 , H01J31/00
CPC分类号： H01J29/70 , H01J3/30 , H01J29/04 , H01J29/48 , H01J31/00 , H01J37/06 , H01J37/147 , H01J37/15 , H01J37/305 , H01J2237/0213 , H01J2237/061 , H01J2237/06308
摘要： The invention relates to a device (20) for producing an electron beam (4), which comprises a hot cathode (1), a cathode electrode (2), an anode electrode (3) having an opening (6) through which an electron beam (4) produced by the device can pass, wherein during the operation of the device (20) a voltage for accelerating the electrons exiting from the hot cathode (1) is applied between the cathode electrode (2) and the anode electrode (3), and further comprising deflection means that can deflect the electron beam (4) that has passed through the opening of the anode electrode (3), wherein the deflection means comprise at least one deflection electrode (8, 12), which can reflect the electron beam (4) and/or which comprises a deflection surface (9) that is inclined towards the propagation direction of the electron beam (4).

23. 发明授权

US09455115B2 Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system 有权
标题翻译：调整粒子束装置和粒子束系统中的扫描器的方法
公开(公告)号：US09455115B2
公开(公告)日：2016-09-27
申请号：US14574190
申请日：2014-12-17
申请人： Carl Zeiss Microscopy GmbH
发明人： Simon Diemer
IPC分类号： H01J37/15 , H01J37/147 , H01J37/12 , H01J37/285
CPC分类号： H01J37/147 , H01J37/12 , H01J37/15 , H01J37/153 , H01J37/285 , H01J2237/12 , H01J2237/15 , H01J2237/153 , H01J2237/1532 , H01J2237/1534 , H01J2237/285
摘要： A method of adjusting a stigmator in a particle beam apparatus comprises directing a particle beam onto a sample wherein the particle beam traverses a quadrupole field 37 generated by energizing at least four field generators of the stigmator; acquiring first and second images of the sample at different field strengths of the quadrupole field while energizing the at least four field generators according to a first setting of a plurality of settings; acquiring third and fourth images of the sample at different field strengths of the quadrupole field 37 while energizing the at least four field generators according to a second setting of the plurality of settings; determining a plurality of image displacements based on the first, second, third and fourth images; determining an optimum setting of the at least four field generators based on the plurality of image displacements and the plurality of settings.
摘要翻译：调整粒子束装置中的标示器的方法包括将粒子束引导到样品上，其中，粒子束穿过通过对至少四个场效应晶体管的场发生器通电而产生的四极场37; 在所述四极场的不同场强下采集所述样本的第一和第二图像，同时根据多个设置的第一设置激励所述至少四个场发生器; 在所述四极场37的不同场强下采集所述样本的第三和第四图像，同时根据所述多个设置的第二设置激励所述至少四个场发生器; 基于所述第一，第二，第三和第四图像确定多个图像位移; 基于所述多个图像位移和所述多个设置来确定所述至少四个场发生器的最佳设置。

24. 发明授权

US08872144B1 System and method for laser beam focus control for extreme ultraviolet laser produced plasma source 有权
标题翻译：用于激光束聚焦控制的系统和方法用于极紫外激光产生的等离子体源
公开(公告)号：US08872144B1
公开(公告)日：2014-10-28
申请号：US14035847
申请日：2013-09-24
申请人： Cymer, LLC
发明人： Igor V. Fomenkov
IPC分类号： H01J37/00 , H01J37/15 , H01J37/21 , H01J35/20 , H05G2/00
CPC分类号： H05G2/008
摘要： Focus of a laser beam on a target in a Laser Produced Plasma (LPP) Extreme Ultraviolet (EUV) light source is maintained by focusing reflected light from the target illuminated by a laser source, sampling the focused reflected light in a plurality of planes at different optical path lengths, and comparing the image sizes of the focused reflected light at the plurality of planes to determine a correction signal to correct the focus of the laser source. In an embodiment, the focused reflected light is split into a two optical paths of differing optical path lengths, with each optical path directed to a sensing device at an imaging plane. Since each of the optical paths is of a different length, the images of the target taken by the sensing device at the imaging plane will be of different sizes. By comparing the relative sizes of the target images from the optical paths, a correction signal is produced to correct the focus of the laser source.
摘要翻译：在激光产生的等离子体（LPP）极紫外（EUV）光源中的激光束的聚焦通过聚焦来自由激光源照射的目标的反射光来维持，在不同的多个平面中对聚焦的反射光进行采样光路长度，并且比较多个平面上的聚焦反射光的图像尺寸，以确定校正信号以校正激光源的焦点。在一个实施例中，聚焦的反射光被分成具有不同光程长度的两个光路，其中每个光路指向成像平面处的感测装置。由于每个光路具有不同的长度，所以由感测装置在成像平面拍摄的目标的图像将具有不同的尺寸。通过比较来自光路的目标图像的相对尺寸，产生校正信号以校正激光源的焦点。

25. 发明授权

US07928406B2 Method and system for extracting ion beams composed of molecular ions (cluster ion beam extraction system) 有权
标题翻译：提取离子束分子离子束（簇离子束提取系统）的方法和系统
公开(公告)号：US07928406B2
公开(公告)日：2011-04-19
申请号：US12125176
申请日：2008-05-22
申请人： Thomas N. Horsky , Sami K. Hahto
发明人： Thomas N. Horsky , Sami K. Hahto
IPC分类号： H01J37/15
CPC分类号： H01J49/06
摘要： A new type of triode extraction system, a Cluster Ion Beam Extraction System, is disclosed for broad energy range cluster ion beam extraction applications while still being applicable to atomic and molecular ion species as well. The extraction aperture plate contours are set to minimize the beam cross over and at the same time shield the source from excess extraction electric fields thus allowing smaller values of the extraction gap. In addition, a novel focusing feature is integrated into these new optics which allows the beam to be either focused or de-focused in the non-dispersive plane by using a bipolar bias voltage of only a few kV over a broad range of beam energy. This is a superior solution to a stand-alone electrostatic lens solution, for example an einzel lens, which would require tens of kV of bias voltage in order to be able to focus an energetic beam.
摘要翻译：公开了一种新型的三极管提取系统，即群离子束提取系统，用于宽能量范围的簇离子束提取应用，同时仍适用于原子和分子离子物种。提取孔径板轮廓被设置为最小化束交叉并且同时将源遮蔽于过量的提取电场，从而允许较小的提取间隙值。此外，将新颖的聚焦特征集成到这些新的光学器件中，其允许光束在非分散平面中被聚焦或去聚焦，通过在宽范围的光束能量上使用仅几kV的双极偏置电压。这是独立静电透镜解决方案的优越解决方案，例如双面透镜，其将需要几十kV的偏置电压，以便能够聚焦能量束。

26. 发明授权

US07279687B2 Technique for implementing a variable aperture lens in an ion implanter 有权
标题翻译：在离子注入机中实现可变孔径透镜的技术
公开(公告)号：US07279687B2
公开(公告)日：2007-10-09
申请号：US11212099
申请日：2005-08-26
申请人： Gordon C. Angel , Svetlana B. Radovanov , Edward D. Macintosh
发明人： Gordon C. Angel , Svetlana B. Radovanov , Edward D. Macintosh
IPC分类号： H01J37/147 , H01J37/15
CPC分类号： H01J37/3171 , H01J37/15
摘要： A technique for implementing a variable aperture lens in an ion implanter is disclosed. In one particular exemplary embodiment, the technique may be realized as a variable aperture lens. The variable aperture lens may comprise a first electrode element. The variable aperture lens may also comprise a second electrode element. The variable aperture lens may further comprise a driver assembly coupled to at least one of the first and the second electrode elements, wherein the driver assembly alters an aperture between the first and the second electrode elements based on a geometry of an ion beam.
摘要翻译：公开了一种用于在离子注入机中实现可变孔径透镜的技术。在一个特定的示例性实施例中，该技术可以被实现为可变孔径透镜。可变孔径透镜可以包括第一电极元件。可变孔径透镜还可以包括第二电极元件。可变孔径透镜还可以包括耦合到第一和第二电极元件中的至少一个的驱动器组件，其中驱动器组件基于离子束的几何形状改变第一和第二电极元件之间的孔。

27. 发明授权

US5304888A Mechanically stable field emission gun 失效
标题翻译：力学稳定的场发射枪
公开(公告)号：US5304888A
公开(公告)日：1994-04-19
申请号：US828538
申请日：1992-01-24
申请人： Mark A. Gesley , Daniel B. DeBra
发明人： Mark A. Gesley , Daniel B. DeBra
IPC分类号： H01J37/12 , H01J37/06 , H01J37/073 , H01J37/08 , H01J37/15 , H01L21/027 , H01J7/24 , H01J25/02
CPC分类号： H01J37/073 , H01J2237/0216 , H01J2237/061 , H01J2237/3175
摘要： An improved electron or ion gun support structure includes a hollow cylinder for rigidly connecting the source assembly to the source-motion ring, with the source cathode and associated lens extending into the hollow portion of the cylinder. The gun is thus made very stable and less susceptible to outside vibrations.
摘要翻译：改进的电子或离子枪支撑结构包括用于将源组件刚性地连接到源运动环的中空圆柱体，源极阴极和相关联的透镜延伸到气缸的中空部分中。因此，枪非常稳定，并且不易受到外部振动的影响。

28. 发明授权

US4207489A Movable extraction electrode for an ion source 失效
标题翻译：用于离子源的可移动提取电极
公开(公告)号：US4207489A
公开(公告)日：1980-06-10
申请号：US964294
申请日：1978-11-28
申请人： Jean Camplan , Jacques Chaumont , Robert Meunier
发明人： Jean Camplan , Jacques Chaumont , Robert Meunier
IPC分类号： H01J27/02 , H01J27/08 , H01J37/08 , H01J37/15 , H01J1/94 , H01J27/00 , H05H1/00
CPC分类号： H01J37/15 , H01J27/022 , H01J37/08
摘要： The extraction electrode consists of a metallic screen provided with an opening and placed within a vacuum chamber in front of an ion source, the screen being brought to a negative potential with respect to the source. Displacement of the electrode is controlled from the exterior of the chamber by two mechanical systems for independent displacement of the two lateral sides of the screen. Each system comprises a deformable parallelogram pivotally coupled to a member for supporting one side of the screen and to a member which is slidably mounted on a guide column, and a mechanism for controlling the deformation of the parallelogram by means of a link-arm rigidly fixed at one end to a toothed wheel in mesh with an endless screw and control rod which is accessible from the exterior of the chamber. The invention is primarily applicable to the construction of ion implanters, especially for the fabrication of semiconductors.
摘要翻译：提取电极由设置有开口并设置在离子源前面的真空室内的金属屏幕组成，屏幕相对于源极处于负电位。电极的位移通过两个机械系统从腔室的外部控制，用于屏幕的两个侧面的独立位移。每个系统包括可枢转地联接到用于支撑屏幕的一侧的构件和可滑动地安装在导向柱上的构件的可变形平行四边形，以及用于通过刚性固定的连杆臂来控制平行四边形的变形的机构一端连接到与环形螺钉啮合的齿轮和从腔室的外部可接近的控制杆。本发明主要适用于离子注入机的构造，特别是用于制造半导体。

29. 发明授权

US3987242A Automatic DC restorer and gain control 失效
标题翻译：自动直流回收器和增益控制
公开(公告)号：US3987242A
公开(公告)日：1976-10-19
申请号：US463496
申请日：1974-04-24
申请人： James J. Gold
发明人： James J. Gold
IPC分类号： H01J37/15 , H01J37/28 , H03G3/20 , H04N5/52 , H04N5/16
CPC分类号： H03G3/20 , H01J37/28
摘要： Apparatus for stabilizing the range of black to white level in a signal to a cathode ray tube, especially a signal produced by a detector in a charged particle microscope system. The stabilizing apparatus includes electronic circuitry for remembering the most negative (blackest) excursion of the signal for a predetermined time period, means for stabilizing all video input to that level and means for controlling the range of the signal (black to white) to remain within predetermined limits.

30. 发明授权

US3363098A Combined electron microscope and diffraction apparatus for the electronoptical inspection of the surfaces of objects 失效
$Combined electron microscope and diffraction apparatus for the electronoptical inspection of the surfaces of objects$
标题翻译：组合电子显微镜和衍射装置用于电子光学检查物体表面
公开(公告)号：US3363098A
公开(公告)日：1968-01-09
申请号：US39522264
申请日：1964-09-09
申请人： BALZERS PATENT BETEILIG AG
发明人： LIENHARD WEGMANN
IPC分类号： H01J37/15 , H01J37/16 , H01J37/248 , H01J37/285 , H01J37/295
CPC分类号： H01J37/248 , H01J37/15 , H01J37/16 , H01J37/285 , H01J37/295

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