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21. 发明授权

US5734164A Charged particle apparatus having a canted column 失效
标题翻译：具有倾斜柱的带电粒子装置
公开(公告)号：US5734164A
公开(公告)日：1998-03-31
申请号：US757727
申请日：1996-11-26
申请人： Colin A. Sanford
发明人： Colin A. Sanford
IPC分类号： H01J37/20 , H01J37/15 , H01J37/16 , H01J37/28
CPC分类号： H01J37/28 , H01J2237/20
摘要： A charged particle beam apparatus has a carrier for supporting a sample. A tilt mechanism is provided for tilting the wafer carrier through a range of attitudes including an attitude wherein a normal to the carrier defines a predetermined first angle on one side of vertical. A charged particle beam column irradiates a sample on the carrier with a beam of charged particles. The column is canted at a second angle on the opposite side of vertical from the stage normal such that the angle of beam incidence on the sample relative to the stage normal is equal to the sum of the first and second angles. The carrier may be tilted an attitude at the other end of the range of attitudes which is such that the carrier normal is parallel to the column axis and the beam is thus normal to the sample. The first and second angles in limit preferably equal thirty degrees, and the maximum angle of beam incidence on the sample thus equals sixty degrees.
摘要翻译：带电粒子束装置具有用于支撑样品的载体。提供倾斜机构，用于通过包括姿态的一系列姿态来倾斜晶片载体，其中载体的法线在垂直方向的一侧限定预定的第一角度。带电粒子束柱用带有粒子的束照射载体上的样品。该列在垂直于载物台法线的相对侧上以第二角度倾斜，使得样品相对于载物台法线的入射角度等于第一和第二角度之和。载体可以在姿态范围的另一端倾斜，使得载体法线平行于列轴线，并且束因此垂直于样品。极限的第一和第二角度最好等于三十度，并且样品上的光束入射的最大角度等于六十度。

22. 发明授权

US5519216A Electron-optical imaging system having controllable elements 失效
标题翻译：具有可控元件的电子光学成像系统
公开(公告)号：US5519216A
公开(公告)日：1996-05-21
申请号：US296678
申请日：1994-08-26
申请人： Gerd Benner , Josef Frey , Martin Ross-Messemer , Eugen Weimer
发明人： Gerd Benner , Josef Frey , Martin Ross-Messemer , Eugen Weimer
IPC分类号： H01J37/22 , H01J37/248 , H01J37/26 , H01J37/15
CPC分类号： H01J37/265 , H01J2237/30411 , H01J2237/30433
摘要： The invention is directed to an electron-optical imaging system such as for an electron microscope. The imaging system has magnetic lenses, current and voltage sources corresponding thereto, a computer, a permanent memory and a touch panel. The electron microscope is manually calibrated when first taken into use by a discrete sequence of different operating conditions. Polynomes of the second degree are adapted to the experimentally calibrated parameter values for the lens currents. The computer polynome coefficients are stored in a permanent memory. Operating states are adjustable via the touch panel on the operating console of the electron microscope. These operating states lie between the calibrated operating states. The lens currents necessary for these operating states are computed in the computer based on the function coefficients stored in the memory and are subsequently emitted to the current sources by the computer. The step width in which the operating states are adjustable is preselectable via the keyboard independently of the position of the calibrated operating conditions.
摘要翻译：本发明涉及电子显微镜等电子光学成像系统。成像系统具有磁性透镜，对应于其的电流和电压源，计算机，永久存储器和触摸面板。当通过不同操作条件的离散序列首次使用时，电子显微镜被手动校准。第二度的多义性适用于透镜电流的实验校准参数值。计算机多项式系数存储在永久存储器中。操作状态可通过电子显微镜操作台上的触摸面板进行调节。这些操作状态位于校准的操作状态之间。这些操作状态所需的镜头电流在计算机中基于存储在存储器中的功能系数来计算，随后由计算机发射到当前的源。可以通过键盘预先选择操作状态可调节的台阶宽度，而与校准的操作条件的位置无关。

23. 发明授权

US4524277A Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US4524277A
公开(公告)日：1985-06-18
申请号：US455941
申请日：1982-12-16
申请人： Yoshimasa Shimura , Hideyuki Kakiuchi , Yoshihisa Minamikawa , Katsuhiro Kawasaki
发明人： Yoshimasa Shimura , Hideyuki Kakiuchi , Yoshihisa Minamikawa , Katsuhiro Kawasaki
IPC分类号： H01J37/04 , H01J37/15 , H01J37/28 , H01J37/304 , H01J37/305 , H01L21/027 , G01K1/08 , H01J3/00
CPC分类号： H01J37/15 , H01J37/304
摘要： A charged particle beam apparatus in which a beam of charged particles emitted from a beam source is focussed on a target in a predetermined size and shape through a plurality of aperture members. Each of the aperture members is combined with a respective deflecting unit which effects a two-dimensional scan with the charged particle beam in response to a scan signal supplied thereto. The center axis of the aperture formed in the aperture member is arithmetically determined on the basis of time-based variation in the quantity of the charged particles trapped by the aperture member during the scan operation. Further, deviation of the arithmetically determined center axis of the aperture from a reference axis is determined. The aperture member is slided on a plane extending perpendicularly to the center axis of the aperture to cancel out the deviation.
摘要翻译：一种带电粒子束装置，其中从束源发射的带电粒子束通过多个孔径构件以预定尺寸和形状聚焦在靶上。每个孔径构件与相应的偏转单元组合，其响应于提供给其的扫描信号，利用带电粒子束进行二维扫描。基于在扫描操作期间由孔构件捕获的带电粒子的量的时间变化，算术地确定在孔构件中形成的孔的中心轴线。此外，确定孔径的算术确定的中心轴线与参考轴线的偏差。孔径构件在垂直于孔的中心轴延伸的平面上滑动以抵消偏差。

24. 发明授权

US4317022A Electron beam welding machine 失效
标题翻译：电子束焊机
公开(公告)号：US4317022A
公开(公告)日：1982-02-23
申请号：US208428
申请日：1980-11-19
申请人： Hisanao Kita , Yoshinori Karatsu , Takamitsu Nakazaki , Yoji Akutsu
发明人： Hisanao Kita , Yoshinori Karatsu , Takamitsu Nakazaki , Yoji Akutsu
IPC分类号： B23K15/00 , H01J37/15 , H01J37/315 , B23K27/00
CPC分类号： H01J37/315 , B23K15/0013 , H01J37/15
摘要： An electron beam welding machine comprises an electron gun including a first beam adjusting means, a second beam adjusting means disposed spaced from the first beam adjusting means so as to be movable in the direction of an electron beam path, and position adjusting means for adjusting the position of the second beam adjusting means through rotary movement about an axis perpendicularly crossing the electron beam path and linear movements on a plane perpendicular to the electron beam path. The machine further includes a mirror and light source mounted on the electron gun to emit light on the electron beam path, and photodetectors mounted on the opposite sides of the second beam adjusting means so as to face the electron gun and a workpiece, whereby the correct position of the second beam adjusting means is detected.
摘要翻译：电子束焊接机包括电子枪，该电子枪包括第一光束调节装置，与第一光束调节装置间隔开以便能够沿电子束路径移动的第二光束调节装置，以及位置调节装置，第二光束调节装置通过围绕垂直于电子束路径的轴线的旋转运动和垂直于电子束路径的平面上的线性运动而进行第二光束调节装置的位置。该机器还包括安装在电子枪上的反射镜和光源，以在电子束路径上发光，以及安装在第二光束调节装置的相对侧上以便面对电子枪和工件的光电检测器，由此正确检测第二光束调整装置的位置。

25. 发明授权

US4168434A Long focal length magnetic lens for the optical imaging of a specimen having a large surface area 失效
标题翻译：用于具有大表面积的试样的光学成像的长焦距磁透镜
公开(公告)号：US4168434A
公开(公告)日：1979-09-18
申请号：US870068
申请日：1978-01-17
申请人： Burkhard Lischke , Matthias Sturm
发明人： Burkhard Lischke , Matthias Sturm
IPC分类号： H01J37/141 , H01J37/15 , G21K1/08
CPC分类号： H01J37/15 , H01J37/141
摘要： An improved magnetic lens having a long focal length for the optical imaging of a specimen having a large surface area by means of a charged-particle beam. The lens includes a cylindrical coil including at least one winding which is surrounded by a field-carrying metallic shell member fabricated of magnetic material disposed at the radially outer surface of winding. The improvement of the invention comprises a first ring member disposed on the radially outer surface of the metallic shell member approximately in the plane of the center of gravity of the lens; a plurality of slidable shoe members disposed on a lower surface of the first ring member; a housing fabricated of magnetic material surrounding the lens and including an annular shoulder on the radially inner surface thereof; a second ring member fabricated of non-magnetic material disposed on the annular shoulder for supporting the slidable shoe members, the shoe members being disposed between the first and second ring members; and at least three adjusting pin members distributed approximately uniformly over the surface of the housing and fabricated of non-magnetic material. The pin members extend through the housing and engage the first ring member of the metallic shell member for adjusting the position of the lens in a direction perpendicular to the axis of the lens.
摘要翻译：一种具有长焦距的改进型磁性透镜，用于通过带电粒子束对具有大表面积的样本进行光学成像。该透镜包括一个圆柱形线圈，该圆柱形线圈包括至少一个绕组，该绕组由设置在绕组的径向外表面处的由磁性材料制成的磁场承载金属壳构件包围。本发明的改进包括大致在透镜的重心平面上设置在金属壳体的径向外表面上的第一环件; 多个可滑动的鞋部件，设置在第一环件的下表面上; 由围绕透镜的磁性材料制成的壳体，并且在其径向内表面上包括环形肩部; 第二环构件，由设置在所述环形肩上的非磁性材料制成，用于支撑所述可滑动的鞋构件，所述鞋构件设置在所述第一和第二环构件之间; 并且至少三个调节销构件大致均匀地分布在壳体的表面上并由非磁性材料制成。销构件延伸穿过壳体并与金属壳构件的第一环构件接合，用于调节透镜在垂直于透镜轴线的方向上的位置。

26. 发明授权

US3887784A Welding guns 失效
标题翻译：焊枪
公开(公告)号：US3887784A
公开(公告)日：1975-06-03
申请号：US33006773
申请日：1973-02-06
申请人： COMMISSARIAT ENERGIE ATOMIQUE
发明人： ALAIS MICHEL , CAILLOT ROBERT , CORCELLE FRANCOIS
IPC分类号： B23K15/00 , H01J37/06 , H01J37/15
CPC分类号： H01J37/06 , B23K15/0013 , H01J37/15
摘要： A welding method by electron bombardment utilizes an electron gun which comprises an electron beam having an elongated cross section in the operating plane. The geometrical axis of the beam is inclined relatively to the axis of a system which influences the geometry of the electron beam before the beam is influenced by that system, while keeping the crossover point of the beam approximately on the axis of the geometry-influencing system first acting on the beam. The inclination of the beam before it passes the beam-influencing system provides greater energy density near one end of the spot than near the other end, which retards cooling of the molten metal. The elongation of the beam is more stable than if it were dependent on a variable voltage.
摘要翻译：通过电子轰击的焊接方法利用电子枪，其包括在操作平面中具有细长横截面的电子束。光束的几何轴线相对于系统的轴线倾斜，该系统的轴线在光束受该系统影响之前影响电子束的几何形状，同时保持光束的交叉点近似于几何影响系统的轴线首先作用在梁上。光束在其通过光束影响系统之前的倾斜度在斑点的一端附近提供比靠近另一端更大的能量密度，这阻碍了熔融金属的冷却。光束的伸长比依赖于可变电压的光束更为稳定。

27. 发明授权

US3757117A Earrangement for the magnification adjustment of an electron microscop 失效
标题翻译：电子显微镜放大调整的概述
公开(公告)号：US3757117A
公开(公告)日：1973-09-04
申请号：US3757117D
申请日：1972-09-15
申请人： MULLER K , RINDFLEISCH V
发明人： MULLER K , RINDFLEISCH V
IPC分类号： H01J37/15 , H01J37/24 , H01J37/26
CPC分类号： H01J37/24
摘要： An improved setting device for providing accurately reproducible, incrementally variable control voltages to the input of a control and regulating circuit for adjusting electromagnetic coil current in magnifying lenses of electron microscopes. The setting device includes a digital counter, preferably a forward-backward counter, connected to the input of the control circuit through a digital-to-analog converter. A digital-to-digital converter, programmed with a series of predetermined control settings, is connected between the output of the digital counter and the input to the digital-to-analgo converter to serve as a read-only memory for supplying a programmed magnification setting in response to address signals from the counter. A pulse source, preferably pushbuttoncontrolled, provides stepping pulses for adjusting the output voltage of the setting device to achieve desired values of magnification as indicated by a numeric display device connected to the output of the digital counter.

28. 发明授权

US3560781A Corpuscular beam microscope apparatus 失效
标题翻译：。AR。。。。。。。。
公开(公告)号：US3560781A
公开(公告)日：1971-02-02
申请号：US3560781D
申请日：1967-07-27
申请人： MAX PLANCK GESELLSCHAFT
发明人： RIECKE WOLFGANG DIETER
IPC分类号： H01J37/04 , H01J37/09 , H01J37/141 , H01J37/15 , H01J37/153 , H01J29/46 , H01J37/16
CPC分类号： H01J37/04 , H01J37/09 , H01J37/141 , H01J37/15 , H01J37/153
摘要： The beam condenser located in an electron or ion microscope between the beam source and the objective lens comprises at least two lenses, namely a first condenser lens which produces a reduced image of the beam source, and a last condenser lens which produces a reduced image of an aperture diaphragm upon the object plane defined by the objective lens. Within such an arrangement, the first condenser lens comprises a plurality of lens pole shoe systems that can be selectively placed into active position of axial alignment with the beam source and the objective lens. The pole shoe systems have respectively different imaging lengths but have the diameter of their lens bore as well as the width and axial position of their lens gap, so adapted to one another as to maintain an invariable axial position of the source image produced by the first condenser lens, regardless of which one of the pole shoe systems is placed into active position at a time. This affords selecting different radiation (illumination) apertures for one and the same illuminated area of the object without the necessity of changing the focal lengths of the other lenses; and it permits adjusting the size of the illuminated area of the object independently of the magnitude of the illumination aperture of the object.

29. 发明授权

US3466487A Device for moving a beam of charged particles 失效
标题翻译：用于移动充电颗粒束的装置
公开(公告)号：US3466487A
公开(公告)日：1969-09-09
申请号：US3466487D
申请日：1967-06-16
申请人： UNITED AIRCRAFT CORP
发明人： DAVIS JACK W , FERREIRA FERNAND J
IPC分类号： H01J37/06 , H01J37/077 , H01J37/09 , H01J37/15 , H01J1/44 , H01J1/52 , H01J35/28
CPC分类号： H01J37/15 , H01J37/06 , H01J37/077 , H01J37/09

30. 发明授权

US3445652A Beam deflecting apparatus with deflection coils located within an electron microscope specimen chamber 失效
标题翻译：具有定位在电子显微镜样本室内的偏转线圈的光束偏转装置
公开(公告)号：US3445652A
公开(公告)日：1969-05-20
申请号：US3445652D
申请日：1966-09-20
申请人： NIPPON ELECTRON OPTICS LAB
发明人： SUZUKI SHIGERU , BABA YASUTAKA
IPC分类号： H01J37/147 , H01J37/15 , H01J37/18 , H01J37/20 , H01J37/26
CPC分类号： H01J37/20 , H01J37/1471 , H01J37/15 , H01J37/18

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