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21. 发明申请

US20020134403A1 Combined plasma/liquid cleaning of substrates 有权
标题翻译：组合等离子体/液体清洗基材
公开(公告)号：US20020134403A1
公开(公告)日：2002-09-26
申请号：US09803065
申请日：2001-03-08
发明人： Gary S. Selwyn , Ivars Henins
IPC分类号： B08B003/02 , B08B007/04
CPC分类号： H01L21/67051 , B08B3/02 , B08B7/0035 , Y10S134/902
摘要： Apparatus and method for cleaning substrates. A substrate is held and rotated by a chuck and an atmospheric pressure plasma jet places a plasma onto predetermined areas of the substrate. Subsequently liquid rinse is sprayed onto the predetermined areas. In one embodiment, a nozzle sprays a gas onto the predetermined areas to assist in drying the predetermined areas when needed.
摘要翻译：用于清洁基板的装置和方法。基板通过卡盘保持和旋转，并且大气压等离子体射流将等离子体放置在基板的预定区域上。随后将液体冲洗喷到预定区域上。在一个实施例中，喷嘴将气体喷射到预定区域上以有助于在需要时干燥预定区域。

22. 发明申请

US20020096200A1 Bowl, spin, rinse, and dry module, and method for loading a semiconductor wafer into a spin, rinse, and dry module 有权
标题翻译：碗，旋转，冲洗和干燥模块以及将半导体晶片装载到旋转，冲洗和干燥模块中的方法
公开(公告)号：US20020096200A1
公开(公告)日：2002-07-25
申请号：US10013198
申请日：2001-11-02
申请人： Lam Research Corporation
发明人： Roy Winston Pascal , Brian M. Bliven
IPC分类号： B08B003/02
CPC分类号： H01L21/67017 , H01L21/67028 , Y10S134/902
摘要： A bowl includes a bottom wall having a generally circular shape. A sidewall extends upwardly from the bottom wall to define a cylindrical chamber. The sidewall has a projection that extends into the cylindrical chamber. The projection has a top surface that defines a step in the cylindrical chamber and a sloped surface that extends between the top surface and an inner surface of the sidewall. The top surface of the projection is sloped slightly downwardly. The sloped surface of the projection is oriented relative to the top surface such that extensions of the top surface and the sloped surface define an angle in a range from about 30 degrees to about 45 degrees. A spin, rinse, and dry module including the bowl and a method for loading a semiconductor wafer into a spin, rinse, and dry module also are described.
摘要翻译：碗包括具有大致圆形形状的底壁。侧壁从底壁向上延伸以限定圆柱形腔室。侧壁具有延伸到圆柱形腔室中的突起。突起具有限定圆柱形腔室中的台阶的顶表面和在顶壁和侧壁的内表面之间延伸的倾斜表面。突起的顶部表面略微向下倾斜。突起的倾斜表面相对于顶表面定向，使得顶表面和倾斜表面的延伸部分限定在约30度至约45度范围内的角度。还描述了包括碗的旋转，冲洗和干燥模块以及将半导体晶片装载到旋转，冲洗和干燥模块中的方法。

23. 发明申请

US20020074024A1 Automatic cleaning mechanism for a paint sprayer 失效
标题翻译：喷漆机自动清洗机构
公开(公告)号：US20020074024A1
公开(公告)日：2002-06-20
申请号：US10023570
申请日：2001-12-17
发明人： Sharon Schwartz
IPC分类号： B08B003/02
CPC分类号： B44D3/006 , B05B15/555
摘要： A cleaning device which washes each of the components of a paint sprayer from the correct angle to ensure that all residue is properly removed. The invention provides a mechanism for aligning cleaning nozzles with the components of the paint sprayer. Holding devices precisely position components of the paint sprayer such that they align the components to be cleaned with adapters happening solvent spray nozzles. Each holding device is aligned with individual spray nozzles that spray cleaning fluid onto surfaces from which paint is to be removed. Adjustable spray nozzles are provided which allow the cleaning device to be adjusted such that the it can be used with paint sprayers having different configurations. An alternative embodiment provides a kit assembly that can be retrofitted to a conventional cleaning machine. Alternatively, the device may be used with other tools which are disassembled prior to cleaning.
摘要翻译：一种清洁装置，其从正确的角度洗涤喷漆机的每个部件，以确保所有残留物被适当地移除。本发明提供了一种用于将清洁喷嘴与喷漆器的部件对准的机构。保持装置精确地定位喷漆机的组件，使得它们将待清洁的部件与适配器发生溶剂喷嘴对准。每个保持装置与单独的喷嘴对准，其将清洁流体喷射到要从中去除油漆的表面上。提供了可调节的喷嘴，其允许调节清洁装置，使得其可以与具有不同结构的喷漆机一起使用。替代实施例提供可以改装到常规清洁机器的套件组件。或者，该装置可以与在清洁之前被拆卸的其它工具一起使用。

24. 发明申请

US20020066473A1 Solar collector washing system 审中-公开
标题翻译：太阳能集热器清洗系统
公开(公告)号：US20020066473A1
公开(公告)日：2002-06-06
申请号：US09726584
申请日：2000-12-01
发明人： Gil Levy , Michael Gefen
IPC分类号： B08B003/02
CPC分类号： E04D15/006 , B08B1/008 , B08B3/02 , F24S40/20 , Y02E10/40
摘要： The present invention is a system for, and a method of automatic washing of solar collection panels from dust, sediment, and the like, which tend to accumulate over time. The solar collector washing system comprises: (a) a solar collector having a solar collecting surface, the collector disposed in an angled position; (b) a water pipe mounted substantially above the solar collecting surface, the water pipe having a plurality of holes distributed along a length of the pipe for distribution of water onto the solar collecting surface, and (c) a control mechanism, operatively connected to said pipe, for releasing the water supply.
摘要翻译：本发明是一种随着时间的推移而积聚的灰尘，沉积物等的太阳能收集板的自动清洗系统和方法。太阳能收集器清洗系统包括：（a）具有太阳能收集表面的太阳能收集器，该收集器设置成倾斜的位置; （b）基本上安装在太阳能收集表面上的水管，该水管具有多个沿管道长度分布的孔，用于将水分配到太阳能收集表面上，以及（c）控制机构，说管道，用于释放供水。

25. 发明申请

US20020050281A1 Fluid processing method of an object to be processed and apparatus thereof 失效
标题翻译：待处理物体的流体处理方法及其装置
公开(公告)号：US20020050281A1
公开(公告)日：2002-05-02
申请号：US09955212
申请日：2001-09-19
申请人： Kokusai Electric Co., Ltd.
发明人： Hitoshi Oka , Fumio Morita , Masataka Fujiki , Akinobu Yamaoka
IPC分类号： B08B003/02
CPC分类号： H01L21/67017 , B08B3/10 , B08B11/02 , Y10S134/902
摘要： To carry out very clean and low-cost fluid processing on both the front and rear surfaces of an object to be processed without generating rubbing particles and without leakage of fluid. A retention member for the object to be processed 18 that retains the object to be processed 17 and a rear shielding plate 15 that prevents the rear surface of the object to be processed from becoming contaminated by excessive fluid flow are mechanically separated. The rear shielding plate 15 is fixed in like manner to a front shielding plate 11, only the retention member for the object to be processed 18 is allowed to rotate making it possible to rigidly connect a supply pipe 22 (that supplies fluid through the rear shielding plate 15) to the rear shielding plate 15. Further, a circulation system is provided that collects fluid which underwent front surface processing in a collection tube 13, circulates that fluid and then supplies it to the rear surface of the object to be processed from a supply pipe.
摘要翻译：在待加工物体的前表面和后表面上进行非常干净且低成本的流体处理，而不会产生摩擦颗粒并且不会泄漏流体。机械地分离用于保护被处理物体18的保持构件18和防止被处理物的后表面被过度流体流动污染的后挡板15。后屏蔽板15以与前屏蔽板11相同的方式固定，仅允许被处理物体18的保持构件旋转，从而可以将供给管22（通过后屏蔽板15）连接到后屏蔽板15.此外，提供一种循环系统，其收集在收集管13中经历前表面处理的流体，使该流体循环，然后将其从一个供应管道。

26. 发明申请

US20020036006A1 Wet cleaning process and wet cleaning equipment 失效
标题翻译：湿法清洗和湿洗设备
公开(公告)号：US20020036006A1
公开(公告)日：2002-03-28
申请号：US09921555
申请日：2001-08-06
申请人： m FSI LTD.
发明人： Takeji Ueda , Koji Oka , Sanae Sumi
IPC分类号： B08B003/02
CPC分类号： H01L21/6708 , B08B3/02 , H01L21/67051 , Y10S438/906
摘要： A wet treatment method useful in at least one of a chemical processing step and a rinsing step performed upon fabrication of semiconductor devices is disclosed. According to this method, a substrate under treatment is treated with a desired liquid while causing the substrate to revolve around an axis of rotation outside the substrate itself instead of allowing the substrate to rotate about the axis of rotation such that the liquid flowing on a surface of the substrate is maintained flowing under a centrifugal force greater than gravitation. The substrate is treated while supplying a fresh liquid of the same kind as the desired liquid at a flow rate at least equal to a discharge rate of the desired liquid only in a direction conforming with that of the centrifugal force or with that of a flow of the liquid flowing on the surface of the substrate under the centrifugal force. The substrate is, therefore, evenly treated at the surface thereof with the desired liquid while avoiding development of such a situation that flows of the liquid run against each other on the surface of the substrate or a flow of the liquid stagnates on the surface of the substrate. A wet treatment apparatus suitable for use in practicing the wet treatment method is also disclosed.
摘要翻译：公开了一种在半导体器件制造中进行的化学处理步骤和漂洗步骤中的至少一个中有用的湿法处理方法。根据该方法，将处理的基板用期望的液体处理，同时使基板围绕基板本身的旋转轴线旋转，而不是允许基板围绕旋转轴线旋转，使得在表面上流动的液体的衬底在大于重力的离心力下保持流动。处理衬底，同时以与期望液体的排出速率至少等于所需液体的排出速率的流速仅在与离心力的流动方向一致的方向供应与所需液体相同种类的新鲜液体，液体在离心力下在基体表面流动。因此，在其表面上用所需的液体均匀地处理基材，同时避免液体在基材表面上彼此流动的液体的流动或液体停留在表面上的流动的情况的发展基质。还公开了一种适用于实施湿法处理方法的湿式处理设备。

27. 发明申请

US20020036004A1 Substrate cleaning apparatus and method 失效
标题翻译：基板清洗装置及方法
公开(公告)号：US20020036004A1
公开(公告)日：2002-03-28
申请号：US09800156
申请日：2001-03-06
申请人： Applied Materials, Inc.
发明人： Yu Lei Shih
IPC分类号： B08B003/02
CPC分类号： H01L21/67051 , B08B3/02 , Y10S134/902
摘要： A substrate cleaning apparatus includes a chamber having a substrate support capable of supporting and rotating a substrate in the chamber. A cleaning solution injector is provided to inject a cleaning solution onto the substrate in the chamber. A portion of the cleaning solution is thrown off the rotating substrate to form a cleaning solution mist in the chamber. A cleaning gas inlet introduces a cleaning gas into the chamber and an outlet exhausts the cleaning solution mist and cleaning gas from the chamber. This reduces the formation of residues from the cleaning solution mist on the substrate.
摘要翻译：基板清洁装置包括具有能够支撑和旋转室中的基板的基板支撑件的室。提供清洁溶液注射器以将清洁溶液注入到腔室中的基底上。清洗液的一部分从旋转基板上甩出，在室内形成清洗液雾。清洁气体入口将清洁气体引入室中，并且出口排出清洁溶液雾和从室中清洁气体。这减少了清洁溶液雾在基底上的形成。

28. 发明申请

US20020035762A1 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US20020035762A1
公开(公告)日：2002-03-28
申请号：US09957652
申请日：2001-09-21
发明人： Seiichiro Okuda , Hiroaki Sugimoto , Takuya Kuroda , Masanobu Sato , Sadao Hirae , Shuichi Yasuda , Kenya Morinishi , Masayoshi Imai
IPC分类号： B08B007/04 , B08B003/02 , B08B001/00
CPC分类号： H01L21/67046 , B08B1/04 , B08B3/02 , B08B2203/0288 , H01L21/67051 , Y10S134/902
摘要： The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
摘要翻译：基板处理装置设置有气液混合喷嘴，用于通过混合液体和加压气体来产生处理液雾，以将处理液雾以高速排放到基板。液体可以是去除液体，中间漂洗液体或去离子水。在蚀刻过程中在基板上产生的反应产物随着雾的流动以高速度被去除，从而提高了工艺的质量。

29. 发明申请

US20020033185A1 Multi-container pressure washer and related product selecting valve 失效
标题翻译：多容器压力清洗机及相关产品选择阀
公开(公告)号：US20020033185A1
公开(公告)日：2002-03-21
申请号：US09999421
申请日：2001-11-15
申请人： Generac Portable Products, LLC.
发明人： Herb Hoenisch , Peter Nushart , Wes Sodemann
IPC分类号： B08B003/02 , B08B009/032
CPC分类号： B08B3/026 , B08B2203/0217
摘要： A pressure washer includes a chassis as well as a liquid pump, a pump-driving prime mover, plural chemical product containers and a product selecting valve, all supported by the chassis. Each of the containers is attached to a separate valve conduit extending to the valve and the valve is connected to a device conduit extending to the mixing device. A distributor is mounted for movement with respect to the valve body and has a channel for selectively connecting one of the valve conduits to the device conduit. The user may thereby use the pressure washer to dispense any one of plural solutions. A fresh water container facilitates nullwash outnull of the valve and device conduit before switching to another chemical product.
摘要翻译：压力清洗机包括底盘以及液体泵，泵驱动原动机，多个化学制品容器和产品选择阀，全部由底盘支撑。每个容器连接到延伸到阀的单独的阀导管，并且阀连接到延伸到混合装置的装置导管。分配器安装成相对于阀体运动，并且具有用于选择性地将阀导管中的一个连接到装置导管的通道。因此，用户可以使用压力清洗机来分配多种解决方案中的任何一种。淡水容器在切换到另一种化学产品之前便于“清洗”阀门和设备导管。

30. 发明申请

US20020011256A1 Wafer cleaning method 有权
公开(公告)号：US20020011256A1
公开(公告)日：2002-01-31
申请号：US09953504
申请日：2001-09-13
发明人： Mario E. Bran
IPC分类号： B08B003/02
CPC分类号： H01L21/02041 , B06B3/00 , B08B3/12 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe. In one arrangement, fluid is sprayed onto both sides of a wafer while a probe is positioned close to an upper side. In another arrangement, a short probe is positioned with its end face close to the surface of a wafer, and the probe is moved over the wafer as it rotates. The probe may also be positioned through a central hole in a plurality of discs to clean a group of such elements at one time.

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