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    • 23. 发明申请
    • LIQUID METAL ION GUN
    • 液体金属离子枪
    • US20120126684A1
    • 2012-05-24
    • US13375147
    • 2010-05-14
    • Hiroyasu KagaKanehiro NagaoMotohide Ukiana
    • Hiroyasu KagaKanehiro NagaoMotohide Ukiana
    • H01J27/02
    • H01J37/08H01J27/26H01J2237/061H01J2237/0805H01J2237/31749
    • A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.
    • 液体金属离子枪3包括液体金属离子源31和束限制孔33.液体金属离子源31包括储存器36和​​发射器35.储存器36由钨(W)制成并保持液态金属镓 (Ga)。 发射器35由W制成。限流孔33由放置在由W制成的基座46上的由Ga制成的液态金属构件44形成,具有能够从液态金属离子源中提取离子束2的开口41 31限制了离子束2的直径。光束限制孔33具有凹槽结构45,其使液体金属44聚集到位于开口41周围的区域中。光束限制孔径的寿命 并且可以长时间保持稳定的发射并且可再现地恢复到稳定状态。
    • 24. 发明授权
    • Modular gas ion source
    • 模块化气体离子源
    • US08101922B2
    • 2012-01-24
    • US12167734
    • 2008-07-03
    • Dieter WinklerThomas JasinskiUdo Weigel
    • Dieter WinklerThomas JasinskiUdo Weigel
    • H01T23/00
    • H01J37/08H01J27/26H01J2237/006H01J2237/03H01J2237/0807
    • A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.
    • 描述了气体场离子源。 气体离子源包括发射器模块。 发射器模块包括发射器支架,发射器结构,发射器模块的可拆卸连接的电连接组件以及发射器模块的可拆卸地连接的气体供应连接组件。 所述气体离子源还包括供电模块,其中所述供应模块包括用于提供电压和/或电流的电导体,气体供应导管,热导体,所述供应模块的可拆卸地连接的电连接组件, 供电模块的可连接气体供应连接组件。 发射器模块和供电模块可通过发射器模块的可拆卸连接的连接组件和供应模块的可拆卸连接的连接组件可拆卸地连接。
    • 27. 发明申请
    • Method for Preparing Ion Source From Nanoparticles
    • 从纳米颗粒制备离子源的方法
    • US20110012024A1
    • 2011-01-20
    • US12560451
    • 2009-09-16
    • Gou-Chung ChiPing-Jung HuangChung-Wei ChenChing-Jen PanYu-Lun LiuFu-Chun Tsao
    • Gou-Chung ChiPing-Jung HuangChung-Wei ChenChing-Jen PanYu-Lun LiuFu-Chun Tsao
    • H01J27/02
    • H01J27/26H01J37/08H01J37/3171
    • A method for preparing an ion source from nanoparticles is provided. The method includes the steps of: providing nanoparticles, vaporizing the nanoparticles from a solid state to a gaseous state, and ionizing the gas to form the ion source. The ion source is prepared by placing solid nanoparticles in a stainless tube, heating and vaporizing the solid nanoparticles into a gaseous state, and ionizing the gas. The gas can be formed at a lower heating temperature than when solid lumps are used because solid nanoparticles have a lower melting point than solid lumps. Thus, the heating temperature is lowered, and the preparing time of the ion source is shortened. Besides, under the same temperature, an ion source prepared from nanoparticles provides higher vapor pressure and allows a higher implantation dose than when the ion source is prepared from solid lumps, thus expanding the applicability of ion implantation technology.
    • 提供了一种从纳米颗粒制备离子源的方法。 该方法包括以下步骤:提供纳米颗粒,将纳米颗粒从固体状态汽化成气态,并使气体离子化形成离子源。 离子源通过将固体纳米颗粒置于不锈钢管中,将固体纳米颗粒加热并汽化成气态并使气体离子化来制备。 气体可以在比使用固体块时低的加热温度下形成,因为固体纳米颗粒具有比固体块更低的熔点。 因此,加热温度降低,离子源的制备时间缩短。 此外,在相同温度下,从纳米颗粒制备的离子源提供更高的蒸气压力,并且允许比从固体块制备离子源时更高的注入剂量,从而扩大了离子注入技术的适用性。
    • 30. 发明申请
    • DUAL MODE GAS FIELD ION SOURCE
    • 双模气体场源
    • US20090200484A1
    • 2009-08-13
    • US12366390
    • 2009-02-05
    • Juergen FROSIEN
    • Juergen FROSIEN
    • H01J3/14
    • H01J37/08H01J27/26H01J37/241H01J37/243H01J2237/002H01J2237/006H01J2237/061H01J2237/0807H01J2237/0827H01J2237/28H01J2237/317
    • A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.
    • 描述了聚焦离子束装置。 聚焦离子束装置包括离子束柱,其包括用于容纳具有用于产生离子的发射极区域的气体场离子源发射器的外壳,用于从气体离子源发射器提取离子的电极,适于引入离子源的一个或多个气体入口 将第一气体和第二气体输送到发射器区域,用于聚焦由第一气体或第二气体产生的离子束的物镜,用于在电极和气体离子源发射器之间提供电压的电压源,以及 控制器,用于在电压源的第一电压和第二电压之间切换,用于产生第一气体的离子离子束或第二气体的离子离子束。