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21. 发明申请

US20160268096A1 Apparatus of Plural Charged-Particle Beams 有权
标题翻译：多次充电粒子束装置
公开(公告)号：US20160268096A1
公开(公告)日：2016-09-15
申请号：US15065342
申请日：2016-03-09
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/10 , H01J37/28 , H01J37/06
CPC分类号： H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
摘要翻译：提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。在该装置中，源转换单元将单个电子源改变为虚拟多源阵列，初级投影成像系统投射阵列以在样本上形成多个探针点，并且聚光透镜调节多个探针的电流斑点。在源转换单元中，图像形成装置在子束极限装置的上游，从而产生较少散射的电子。图像形成装置不仅形成虚拟多源阵列，而且补偿多个探测点的离轴像差。

22. 发明授权

US09425022B2 Monochromator and charged particle apparatus including the same 有权
标题翻译：包括其的单色器和带电粒子装置
公开(公告)号：US09425022B2
公开(公告)日：2016-08-23
申请号：US14696569
申请日：2015-04-27
申请人： Korea Research Institute of Standards and Science
发明人： Takashi Ogawa , Bok Lae Cho , Sang Jung Ahn , In Yong Park , Cheolsu Han
IPC分类号： H01J37/05 , H01J49/44 , H01J37/12 , G01N23/225 , H01J37/21
CPC分类号： H01J37/05 , G01N23/2251 , H01J37/12 , H01J37/21 , H01J49/44 , H01J2237/057 , H01J2237/1516 , H01J2237/2448 , H01J2237/24485
摘要： Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.
摘要翻译：本文公开了一种单色仪和包括该单色仪的带电粒子束装置。单色仪可以包括第一静电透镜，其被配置为具有由入射在第一静电透镜上的发射体放电的带电粒子束，折射带电粒子束的射线，并且包括多个电极和与该第一静电透镜间隔开的第二静电透镜第一静电透镜以特定间隔被配置为具有与第一静电透镜的中心轴线相同设置的中心轴，由入射在第二静电透镜上的第一静电透镜输出的带电粒子束折射带电的光线粒子束，并且包括多个电极。因此，具有即使在通过单色仪之后，带电粒子束也具有优异的特性的优点。

23. 发明申请

US20150371811A1 MONOCHROMATOR AND CHARGED PARTICLE APPARATUS INCLUDING THE SAME 有权
标题翻译：单色器和充电粒子装置，包括它们
公开(公告)号：US20150371811A1
公开(公告)日：2015-12-24
申请号：US14696569
申请日：2015-04-27
申请人： Korea Research Institute of Standards and Science
发明人： Takashi OGAWA , Bok Lae CHO , Sang Jung AHN , In Yong PARK , Cheolsu HAN
IPC分类号： H01J37/12 , G01N23/225 , H01J49/44 , H01J37/21 , H01J37/05
CPC分类号： H01J37/05 , G01N23/2251 , H01J37/12 , H01J37/21 , H01J49/44 , H01J2237/057 , H01J2237/1516 , H01J2237/2448 , H01J2237/24485
摘要： Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.
摘要翻译：本文公开了一种单色仪和包括该单色仪的带电粒子束装置。单色仪可以包括第一静电透镜，其被配置为具有由入射在第一静电透镜上的发射体放电的带电粒子束，折射带电粒子束的射线，并且包括多个电极和与该第一静电透镜间隔开的第二静电透镜第一静电透镜以特定间隔被配置为具有与第一静电透镜的中心轴线相同设置的中心轴，由入射在第二静电透镜上的第一静电透镜输出的带电粒子束折射带电的光线粒子束，并且包括多个电极。因此，具有即使在通过单色仪之后，带电粒子束也具有优异的特性的优点。

24. 发明申请

US20150228452A1 SECONDARY ELECTRON OPTICS AND DETECTION DEVICE 审中-公开
标题翻译：二次电子光学和检测装置
公开(公告)号：US20150228452A1
公开(公告)日：2015-08-13
申请号：US14690063
申请日：2015-04-17
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH
发明人： Stefan LANIO , Jürgen FROSIEN , Gerald SCHÖNECKER , Dieter WINKLER
IPC分类号： H01J37/244 , H01J37/28 , H01J37/147
CPC分类号： H01J37/244 , H01J37/147 , H01J37/261 , H01J37/28 , H01J2237/057 , H01J2237/1516 , H01J2237/24465 , H01J2237/2449 , H01J2237/24592 , H01J2237/2806 , H01J2237/2812 , H01J2237/2814
摘要： A secondary charged particle detection system for a charged particle beam device is described. The detection system includes a beam splitter for separating a primary beam and a secondary beam formed upon impact on a specimen; a beam bender for deflecting the secondary beam; a focusing lens for focusing the secondary beam; a detection element for detecting the secondary beam particles, and three deflection elements, wherein at least a first deflector is provided between the beam bender and the focusing lens, at least a second deflector is provided between the focusing lens and the detection element, at least a third deflector is provided between the beam splitter and the detection element.
摘要翻译：描述了带电粒子束装置的二次带电粒子检测系统。检测系统包括用于分离初级束的分束器和在冲击样品上形成的次级束; 用于偏转次光束的光束弯曲机; 用于聚焦二次束的聚焦透镜; 用于检测次级束粒子的检测元件和三个偏转元件，其中至少第一偏转器设置在光束弯曲器和聚焦透镜之间，至少第二偏转器设置在聚焦透镜和检测元件之间，至少在分束器和检测元件之间提供第三偏转器。

25. 发明申请

US20140239190A1 MICRO-COLUMN WITH DOUBLE ALIGNER 有权
标题翻译：具有双重对准的微柱
公开(公告)号：US20140239190A1
公开(公告)日：2014-08-28
申请号：US14184931
申请日：2014-02-20
申请人： Industry-University Cooperation Foundation Sunmoon University
发明人： Tae Sik OH , Ho Seob KIM , Dae Wook KIM , Seung Joon AHN
IPC分类号： H01J37/10
CPC分类号： H01J37/1471 , H01J2237/1205 , H01J2237/1516
摘要： Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam.
摘要翻译：本文公开了具有双重对准器的微柱。微柱被配置成使得当限制孔的孔的轴线与粒子束的原始路径间隔开时，可以有效地补偿粒子束的路径，使得粒子束的路径通过双重对准器与限制孔径的孔径对准。微柱包括源透镜。源透镜包括补偿粒子束的路径的至少两个对准器层。

26. 发明授权

US08044369B2 Electrostatic deflection control circuit and method of electronic beam measuring apparatus 有权
标题翻译：电子偏转控制电路及电子束测量装置的方法
公开(公告)号：US08044369B2
公开(公告)日：2011-10-25
申请号：US12327274
申请日：2008-12-03
申请人： Hiroshi Sasaki
发明人： Hiroshi Sasaki
IPC分类号： G21K1/08
CPC分类号： H01J37/24 , H01J2237/1516 , H01J2237/2814
摘要： An electrostatic deflection circuit and method of an electronic beam measuring apparatus which can achieve the high precision of the electronic beam measuring and contribute to the simplification of the structure of the apparatus is provided. In an analog arithmetic circuit included in an analog operation part constituting an electrostatic deflection circuit, output voltages of multipliers are added and output by an adder. When the magnification is low, as the side of an ordinarily closed contact is closed driven by a relay driving circuit, the output of the adder is amplified by a high gain amplifier with a high amplification factor and applied to an electrostatic deflecting board. When the magnification is high, the side of an ordinarily open contact is closed and it is amplified by a low gain amplifier with a low amplification factor and applied to the electrostatic deflecting board in the same way.
摘要翻译：提供一种电子束测量装置的静电偏转电路和方法，其可以实现电子束测量的高精度并且有助于简化装置的结构。在包含在构成静电偏转电路的模拟操作部分中的模拟运算电路中，乘法器的输出电压由加法器相加并输出。当放大率低时，由于通常由闭合触点的一侧由继电器驱动电路驱动闭合，加法器的输出由具有高放大系数的高增益放大器放大并施加到静电偏转板。当放大率高时，常开触点的一侧闭合，并由具有低放大系数的低增益放大器放大，并以相同的方式施加到静电偏转板。

27. 发明申请

US20090289196A1 Deflection Signal Compensation for Charged Particle Beam 有权
标题翻译：带电粒子束的偏转信号补偿
公开(公告)号：US20090289196A1
公开(公告)日：2009-11-26
申请号：US12533939
申请日：2009-07-31
申请人： Raymond Hill , Steve Ake Rosenberg , Daniel B. Downer
发明人： Raymond Hill , Steve Ake Rosenberg , Daniel B. Downer
IPC分类号： H01J3/14
CPC分类号： H01J37/1474 , H01J37/1477 , H01J37/28 , H01J37/302 , H01J37/304 , H01J37/3056 , H01J2237/1516 , H01J2237/30461 , H01J2237/30483
摘要： Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals to the multiple stages of a deflection system, the number of misdirected particles during a pixel change is reduced.
摘要翻译：当光束重新定位时通过偏转系统运送的带电粒子没有被接收到正确的偏转力并被误导。通过将信号独立地应用于偏转系统的多个阶段，减少了像素变化期间的误导粒子的数量。

28. 发明授权

US07075078B2 Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US07075078B2
公开(公告)日：2006-07-11
申请号：US11064819
申请日：2005-02-25
申请人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
发明人： Yoichi Ose , Hideo Todokoro , Makoto Ezumi , Mitsugu Sato
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/147 , H01J37/1471 , H01J37/153 , H01J37/28 , H01J2237/12 , H01J2237/14 , H01J2237/1516 , H01J2237/244 , H01J2237/2817
摘要： A disclosed scanning electron microscope (SEM) is intended to prevent deterioration of resolution due to increase in off-axis aberration resulting from a deviation of a primary electron bean from the optical axis of the microscope. An example of the SEM has an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed, and dimensions can be measured in a high accuracy. The SEM is able to achieve precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.
摘要翻译：所公开的扫描电子显微镜（SEM）旨在防止由于一次电子束与显微镜的光轴偏离而引起的离轴像差增加而导致的分辨率的劣化。 SEM的示例具有包括分别设置在上部和下部的两个偏转器的图像偏移偏转器系统。下级的偏转器是多极静电偏转电极，并设置在物镜中。即使图像偏移的距离大，也可以形成高分辨率的图像，能够高精度地测量尺寸。当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精确检查。

29. 发明授权

US5929452A Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same 失效
标题翻译：用于带电光束光刻设备的静电偏转电极单元及其制造方法
公开(公告)号：US5929452A
公开(公告)日：1999-07-27
申请号：US42809
申请日：1998-03-17
申请人： Shusuke Yoshitake , Hiroaki Hirazawa , Shigeru Wakayama
发明人： Shusuke Yoshitake , Hiroaki Hirazawa , Shigeru Wakayama
IPC分类号： H01J9/14 , H01J37/147 , H01J37/305 , H01L21/027
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/1477 , H01J2237/1516
摘要： A method of manufacturing an electrostatic deflecting electrode unit for use in charged beam lithography apparatus comprises a first step of preparing a hollow cylindrical member made of metal, a second step of forming grooves of a predetermined width in a cylindrical member in the direction of radius thereof and along lines that equally divides the periphery of the cylindrical member into eight sections, a third step of attaching a ring-like member made of an insulating material to each of end surfaces of the cylindrical member which are opposed to each other in the direction of axis of the cylindrical member in such a way that bottom portions of the grooves are exposed, and a fourth step of dividing the cylindrical member into eight electrodes by extending the bottom portions of the grooves in the direction of radius of the cylindrical member to reach the hole of the cylindrical member with the ring-like members attached. The dimensional precision of the electrostatic deflecting electrode is determined by the precision of the cylindrical member. Thus, the deflecting electrode unit is easy to process and assemble with precision.
摘要翻译：一种制造用于带电光束光刻设备的静电偏转电极单元的方法包括：制备由金属制成的中空圆柱形构件的第一步骤，在圆柱形构件的半径方向上形成具有预定宽度的槽的第二步骤并且沿着将圆柱形构件的周边等分成八个部分的线，第三步骤是将由绝缘材料制成的环形构件连接到圆柱形构件的每个端面上，该圆柱形构件彼此相对的方向圆柱形构件的轴线以这样的方式使得凹槽的底部暴露;以及第四步骤，通过沿着圆柱形构件的半径方向延伸凹槽的底部，将圆柱形构件分成八个电极，以达到圆柱形构件的孔与所述环状构件相连。静电偏转电极的尺寸精度由圆柱形构件的精度决定。因此，偏转电极单元易于精加工和组装。

30. 发明授权

US5510617A Particle-optical instrument comprising a deflection unit for secondary electrons 失效
标题翻译：粒子光学仪器包括用于二次电子的偏转单元
公开(公告)号：US5510617A
公开(公告)日：1996-04-23
申请号：US404706
申请日：1995-03-15
申请人： Kars Z. Troost , Alexander Henstra
发明人： Kars Z. Troost , Alexander Henstra
IPC分类号： H01J37/147 , G01Q60/40 , G01Q70/00 , H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J2237/1516 , H01J2237/2448
摘要： A primary beam in a scanning electron microscope (SEM) releases secondary electrons in the specimen to be studied. These electrons move back to the focusing lens against the direction of the primary beam, detection of these electrons taking place in the vicinity of said lens. A known detector comprises a Wien filter for deflecting the electrons from the optical axis to the actual detector. In accordance with the invention a SEM detector is provided with a double electric dipole. The latter leaves the primary beam undisturbed to a high degree, but very efficiently deflects the secondary electrons to the actual detector.
摘要翻译：扫描电子显微镜（SEM）中的主光束释放待研究样品中的二次电子。这些电子相对于主光束的方向移动到聚焦透镜，这些电子在所述透镜附近发生的检测。已知的检测器包括用于将电子从光轴偏转到实际检测器的维恩滤波器。根据本发明，SEM检测器具有双电偶极子。后者将主波束高度地保持不受干扰，但是非常有效地将二次电子偏转到实际的检测器。

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