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1. 发明授权

US10032600B2 Charged particle source 有权
公开(公告)号：US10032600B2
公开(公告)日：2018-07-24
申请号：US15404618
申请日：2017-01-12
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J3/20 , H01J37/09
摘要： This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

2. 发明授权

US09691586B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US09691586B2
公开(公告)日：2017-06-27
申请号：US15403749
申请日：2017-01-11
申请人： Hermes Microvision Inc.
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/28
CPC分类号： H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

3. 发明申请

US20160268096A1 Apparatus of Plural Charged-Particle Beams 有权
标题翻译：多次充电粒子束装置
公开(公告)号：US20160268096A1
公开(公告)日：2016-09-15
申请号：US15065342
申请日：2016-03-09
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/10 , H01J37/28 , H01J37/06
CPC分类号： H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
摘要翻译：提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。在该装置中，源转换单元将单个电子源改变为虚拟多源阵列，初级投影成像系统投射阵列以在样本上形成多个探针点，并且聚光透镜调节多个探针的电流斑点。在源转换单元中，图像形成装置在子束极限装置的上游，从而产生较少散射的电子。图像形成装置不仅形成虚拟多源阵列，而且补偿多个探测点的离轴像差。

4. 发明授权

US09437395B2 Method and compound system for inspecting and reviewing defects 有权
标题翻译：检查和检查缺陷的方法和复合系统
公开(公告)号：US09437395B2
公开(公告)日：2016-09-06
申请号：US14964316
申请日：2015-12-09
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/22 , H01J37/285 , H01J37/28 , H01J37/05
CPC分类号： H01J37/28 , H01J37/04 , H01J37/05 , H01J37/222 , H01J37/265 , H01J37/285 , H01J2237/2449 , H01J2237/2817
摘要： The present invention provides an improved electron-optical apparatus for the inspection and review of the specimen, and for the defect inspection, an inspection mode of operation is performed to generate inspection data, wherein the large beam current is formed by a magnetic immersion lens to scan the specimen, and preferably the objective lens system, a swing objective retarding immersion lens, focuses the beam current and generates the large scanning field, and for the defect review, the review mode of operation is performed to analyze the defects, wherein the large beam current is abandoned and the small beam current is adopted to examine the specimen without a large scanning field, and in order to properly select and detect signal charged particles excited from the specimen, a first Wien filter is utilized to select the acquired signal particles and a second Wien filter is used to compensate the aberrations induced when the signal particles pass through the first Wien filter.
摘要翻译：本发明提供了一种用于检查和检查样本的改进的电子光学装置，并且为了进行缺陷检查，执行检查操作模式以产生检查数据，其中大的光束电流由磁性浸没透镜形成扫描样本，优选物镜系统，摆动物镜延迟浸没透镜，聚焦光束电流并产生大扫描场，为了进行缺陷检查，执行审查操作模式以分析缺陷，其中大射束电流被放弃，采用小束电流检测样本，而没有大的扫描场，为了适当地选择和检测从样品激发的信号带电粒子，使用第一维恩滤波器来选择所获取的信号粒子，第二维恩滤波器用于补偿信号粒子通过第一维恩滤波器时所引起的像差。

5. 发明申请

US20150248990A1 Energy-discrimination detection device 有权
标题翻译：能量鉴别检测装置
公开(公告)号：US20150248990A1
公开(公告)日：2015-09-03
申请号：US14608828
申请日：2015-01-29
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/05 , H01J37/10
CPC分类号： H01J37/05 , H01J37/10 , H01J37/12 , H01J37/244 , H01J37/263 , H01J2237/057 , H01J2237/12 , H01J2237/14
摘要： This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.
摘要翻译：本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束被发现在潜在的障碍之上。该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

6. 发明授权

US09117626B1 Energy-discrimination detection device 有权
公开(公告)号：US09117626B1
公开(公告)日：2015-08-25
申请号：US14608828
申请日：2015-01-29
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/12
CPC分类号： H01J37/05 , H01J37/10 , H01J37/12 , H01J37/244 , H01J37/263 , H01J2237/057 , H01J2237/12 , H01J2237/14
摘要： This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

7. 发明授权

US09048063B1 Electron beam apparatus 有权
标题翻译：电子束装置
公开(公告)号：US09048063B1
公开(公告)日：2015-06-02
申请号：US14611854
申请日：2015-02-02
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/12
CPC分类号： H01J37/12 , H01J37/05 , H01J2237/04924 , H01J2237/0535 , H01J2237/057 , H01J2237/24485 , H01J2237/28
摘要： This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.
摘要翻译：本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束被发现在潜在的障碍之上。该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

8. 发明授权

US10109456B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US10109456B2
公开(公告)日：2018-10-23
申请号：US15633639
申请日：2017-06-26
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/28 , H01J37/147 , H01J37/12
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

9. 发明授权

US09799484B2 Charged particle source 有权
公开(公告)号：US09799484B2
公开(公告)日：2017-10-24
申请号：US14964221
申请日：2015-12-09
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J3/20 , H01J37/09
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

10. 发明授权

US09754760B2 Charged particle source 有权
公开(公告)号：US09754760B2
公开(公告)日：2017-09-05
申请号：US15404694
申请日：2017-01-12
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J37/09
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

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