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    • 23. 发明申请
    • Composite free layer within magnetic tunnel junction for MRAM applications
    • 用于MRAM应用的磁性隧道结内的复合自由层
    • US20120280337A1
    • 2012-11-08
    • US13068222
    • 2011-05-05
    • Wei CaoWitold Kula
    • Wei CaoWitold Kula
    • H01L29/82H01L21/8239
    • H01L43/10B82Y40/00G11C11/161H01F10/187H01F10/3254H01F10/3272H01F10/3295H01F41/303H01L43/08H01L43/12
    • A MTJ in an MRAM array is disclosed with a composite free layer having a FL1/FL2/FL3 configuration where FL1 and FL2 are crystalline magnetic layers and FL3 is an amorphous NiFeX layer for improved bit switching performance. FL1 layer is CoFe which affords a high magnetoresistive (MR) ratio when forming an interface with a MgO tunnel barrier. FL2 is Fe to improve switching performance. NiFeX thickness where X is Hf is preferably between 20 to 40 Angstroms to substantially reduce bit line switching current and number of shorted bits. Annealing at 330° C. to 360° C. provides a high MR ratio of 190%. Furthermore, low Hc and Hk are simultaneously achieved with improved bit switching performance and fewer shorts without compromising other MTJ properties such as MR ratio. As a result of high MR ratio and lower bit-to-bit resistance variation, higher reading margin is realized.
    • 公开了一种具有FL1 / FL2 / FL3配置的复合自由层的MRAM阵列,其中FL1和FL2是结晶磁性层,FL3是非晶NiFeX层,用于改善位切换性能。 FL1层是当与MgO隧道势垒形成界面时提供高磁阻(MR)比的CoFe。 FL2是Fe提高开关性能。 其中X为Hf的NiFeX厚度优选在20至40埃之间,以显着降低位线切换电流和短路位数。 在330℃至360℃退火提供190%的高MR比。 此外,低Hc和Hk同时实现,具有改进的位切换性能和更短的短路,而不会影响其他MTJ特性,例如MR比。 由于高MR比和较低的比特电阻变化,实现了更高的读取余量。