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    • 21. 发明申请
    • HIGH PRESSURE PRE-OXIDATION FOR DEPOSITION OF THERMAL BARRIER COATING
    • 用于沉积热障涂层的高压预氧化
    • US20110223354A1
    • 2011-09-15
    • US12723427
    • 2010-03-12
    • Peter F. GeroKevin W. SchlichtingJames W. Neal
    • Peter F. GeroKevin W. SchlichtingJames W. Neal
    • C23C16/46
    • C23C14/02C23C14/541
    • An apparatus for coating a work piece includes a process chamber, a coating material supply apparatus located at least partially within the process chamber for delivering a coating material to the work piece, a pre-heater assembly adjoining the process chamber, and a support for holding the work piece. The pre-heater assembly includes a housing that opens to the process chamber, a susceptor comprising a ceramic material positioned at least partially within the housing, and a pre-heater electron gun configured to configured to direct an electron beam at the susceptor such that the susceptor radiates heat toward the work piece. The support is movable to selectively move the work piece between a first position within the housing of the pre-heater assembly and a second position within the process chamber and outside the housing of the pre-heater assembly.
    • 一种用于涂覆工件的设备包括处理室,至少部分地位于处理室内的用于将涂料输送到工件的涂料供给装置,邻接处理室的预热器组件和用于保持 工件。 预热器组件包括通向处理室的壳体,包括至少部分地定位在壳体内的陶瓷材料的基座以及被配置为在基座处引导电子束的预加热器电子枪,使得 感受器向工件辐射热量。 支撑件可移动以选择性地将工件移动到预热器组件的壳体内的第一位置和处理室内的第二位置和预热器组件的壳体外部。
    • 26. 发明申请
    • DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING FILM BY USING DEPOSITION APPARATUS
    • 沉积装置和使用沉积装置制造薄膜的方法
    • US20100075036A1
    • 2010-03-25
    • US12516328
    • 2008-03-10
    • Sadayuki OKAZAKIKazuyoshi HONDATomofumi YANAGIShoichi IMASHIKU
    • Sadayuki OKAZAKIKazuyoshi HONDATomofumi YANAGIShoichi IMASHIKU
    • C23C16/00
    • C23C14/562C23C14/02C23C14/226H01M4/0421H01M4/1395H01M10/052
    • A vapor deposition device 100 for moving a sheet-like substrate 4 in a roll-to-roll system in a chamber 2 to continuously form a vapor deposition film on the substrate 4. The vapor deposition device 100 comprises an evaporation source 9 for evaporating a vapor-depositing material; a transportation section including first and second rolls 3 and 8 for holding the substrate 4 in the state of being wound therearound and a guide section for guiding the substrate 4; and a shielding section, located in a vapor deposition possible zone, for forming a shielded zone which is not reachable by the vapor-depositing material from the evaporation source 9. Vapor deposition zones 60a through 60d include a planar transportation zone for transporting the substrate 4 such that the surface of the substrate 4 to be subjected to the vapor-depositing material is planar; and the transportation section is located with respect to the evaporation source 9 such that the vapor-depositing material is not incident on the substrate 4 in a direction of the normal to the substrate in the vapor deposition possible zone excluding the shielded zone.
    • 一种气相沉积装置100,用于在室2中的辊对辊系统中移动片状基底4,以在基底4上连续地形成气相沉积膜。气相沉积装置100包括蒸发源9 气相沉积材料; 一个传送部分,包括用于将基片4保持在其周围的状态的第一和第二辊子3和8;以及用于引导衬底4的引导部分; 以及位于气相沉积可能区域中的屏蔽部分,用于形成从蒸发源9不能通过气相沉积材料到达的屏蔽区域。蒸镀区域60a至60d包括用于输送基板4的平面输送区域 使得要经历气相沉积材料的基板4的表面是平面的; 并且运送部分相对于蒸发源9定位,使得气相沉积材料在除了屏蔽区域之外的气相沉积可能区域中不与基板的法线方向入射到基板4上。