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    • 24. 发明授权
    • Anti reflective coating polymers and the preparation method thereof
    • 防反射涂料聚合物及其制备方法
    • US06350818B1
    • 2002-02-26
    • US09413679
    • 1999-10-07
    • Sung-Eun HongMin-Ho JungHyeong-Soo KimKi-Ho Baik
    • Sung-Eun HongMin-Ho JungHyeong-Soo KimKi-Ho Baik
    • C08F834
    • C08F212/14C08F8/34G03F7/023G03F7/091C08F12/14C08F220/20
    • The present invention relates to organic anti-reflective coating polymers and preparation methods therefor. Anti-reflective coatings are used in a semiconductor device during photolithography processes to prevent the reflection of light from lower layers of the device, or resulting from changes in the thickness of the photoresist layer, and to eliminate the standing wave effect when ArF light is used. The present invention also relates to anti-reflective compositions and coatings containing these organic anti-reflective coating polymers, alone or in combination with certain light-absorbing compounds, and preparation methods therefor. When the polymers of the present invention are used in an anti-reflective coating in a photolithography process for forming submicro-patterns, the resultant elimination of changes in CD due to diffractive and reflective lights originating from lower layers increases the product yield in the formation of submicro-patterns during the manufacture of 64 M, 256 M, 1G, 4G and 16G DRAM semiconductor devices.
    • 本发明涉及有机抗反射涂层聚合物及其制备方法。 在光刻工艺中,抗反射涂层用于半导体器件,以防止来自器件的下层的光的反射,或由于光致抗蚀剂层的厚度的变化而导致的,并且当使用ArF光时消除驻波效应 。 本发明还涉及包含这些有机抗反射涂层聚合物的抗反射组合物和涂层,其单独或与某些光吸收化合物组合,及其制备方法。 当本发明的聚合物在用于形成亚微图案的光刻工艺中用于抗反射涂层中时,由于衍生于较低层的衍射和反射光引起的CD的变化的消除增加了在形成 在64M,256M,1G,4G和16G DRAM半导体器件的制造期间的微小图案。
    • 30. 发明授权
    • Polymeric resin from ethylenic amino, sulfonic monomers
    • 聚合树脂由乙烯基氨基,磺酸单体组成
    • US4309327A
    • 1982-01-05
    • US82585
    • 1979-10-09
    • Shinichi IshikuraRyuzo MizuguchiKeizou IshiiTamotu Yoshioka
    • Shinichi IshikuraRyuzo MizuguchiKeizou IshiiTamotu Yoshioka
    • C08F12/14C08F16/14C08L61/20C09D133/14C09D157/12C08F228/00
    • C09D157/12C08F12/14C08F16/14C09D133/14C08L61/20Y10T428/31692
    • A coating composition comprising as a main component a polymeric resin obtained by solution polymerization of at least one of polymerizable amino acid compounds of either one of the formulas: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each hydrogen, methyl or ethyl, R.sub.5 is hydrogen or C.sub.1 -C.sub.20 alkyl optionally having --SO--, --COO-- or --O-- therein, R.sub.6 is C.sub.1 -C.sub.12 alkylene optionally substituted with --OH, --SH or --SR.sub.7 (R.sub.7 being C.sub.1 -C.sub.4 alkyl) and/or optionally substituted with C.sub.1 -C.sub.4 alkyl or phenylene optionally substituted with C.sub.1 -C.sub.4 alkyl and A is --COOH or --SO.sub.3 H, and ##STR2## wherein R.sub.8, R.sub.9 and R.sub.10 are each hydrogen or C.sub.1 -C.sub.6 alkyl, R.sub.11 is hydrogen or C.sub.1 -C.sub.20 alkyl optionally having --SO--, --COO-- or --O-- therein, or a group of the formula: ##STR3## (R.sub.8, R.sub.9 and R.sub.10 being each as defined above), R.sub.12 is C.sub.2 -C.sub.12 alkylene optionally substituted with C.sub.1 -C.sub.6 alkyl or phenylene optionally substituted with C.sub.1 -C.sub.4 alkyl, and A is as defined above, with or without at least one of other polymerizable monomers.
    • 一种涂料组合物,其包含作为主要组分的聚合物树脂,该聚合物树脂通过以下任一下式的可聚合的氨基酸化合物的溶液聚合获得:其中R1,R2,R3和R4各自为氢,甲基 或乙基,R 5为氢或任选具有-SO - , - COO-或-O-的C 1 -C 20烷基,R 6为任选被-OH,-SH或-SR 7取代的C 1 -C 12亚烷基(R 7为C 1 -C 4烷基 )和/或任选被任选被C 1 -C 4烷基取代的C 1 -C 4烷基或亚苯基取代,并且A是-COOH或-SO 3 H,且其中R 8,R 9和R 10各自为氢或C 1 -C 6烷基 ,R 11为氢或任选具有-SO - , - COO-或-O-的C 1 -C 20烷基,或下式的基团:R 8,R 9和R 10各自如上所述,R 12为C 2 任选被C 1 -C 6烷基取代的-C 12亚烷基或任选被C 1 -C 4烷基取代的亚苯基,A如上所定义,具有或不具有至少一种其它可聚合单体。