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21. 发明申请

US20050023444A1 System and method for compensating for dark current in photosensitive devices 失效
公开(公告)号：US20050023444A1
公开(公告)日：2005-02-03
申请号：US10627638
申请日：2003-07-28
申请人： Willy Sander
发明人： Willy Sander
IPC分类号： G01J1/44 , G01J1/02 , G01J1/16 , G01J1/42 , G01J3/28 , G03F7/20 , H01L21/027 , H04N5/361 , H04N5/369 , H01J40/14
CPC分类号： H04N5/361 , G01J1/1626 , G01J1/4228 , G01J3/2803 , G01J2001/444
摘要： A method is used to perform dark current compensation in a sensor (e.g., a CCD or CMOS sensor). A first and second array of devices (e.g., pixels) in the sensor are used to determine a first dark current value. The first array of pixels in the sensor receives impinging light and generates optical energy values therefrom. The second array of pixels in the sensor are used to determine a second dark current value at substantially a same time as the generating of the optical energy values. The second array of devices being non-sensitive to the impinging light. The first and second dark current values are used to compensate the optical energy values.

22. 发明申请

US20050018296A1 Diffractive optical element and method of making same 审中-公开
$Diffractive optical element and method of making same$
标题翻译：衍射光学元件及其制造方法
公开(公告)号：US20050018296A1
公开(公告)日：2005-01-27
申请号：US10625704
申请日：2003-07-24
申请人： Ronald Wilklow
发明人： Ronald Wilklow
IPC分类号： G02B5/18 , G02B27/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70158 , G02B5/1838 , G02B5/1857 , G02B27/0043 , G03F7/70316
摘要： A diffraction element can be used in a system employing very short wavelengths of light, for example light in the nanometer range (e.g., about 100 nm to about 300 nm). The diffraction element is formed using a substrate (or any optical element) having high transmission characteristics in this wavelength range. For example, calcium fluoride or barium fluoride can be used. A layer of amorphous isotropic material, such as silicon dioxide or silica, is deposited on the substrate and patterned to allow for diffraction.
摘要翻译：衍射元件可用于采用非常短波长的光的系统，例如纳米范围内的光（例如约100nm至约300nm）。使用在该波长范围内具有高透射特性的基板（或任何光学元件）形成衍射元件。例如，可以使用氟化钙或氟化钡。一层无定形各向同性材料，例如二氧化硅或二氧化硅，沉积在基片上并构图以允许衍射。

23. 发明授权

US07916391B2 Apparatus for providing a pattern of polarization 有权
标题翻译：用于提供偏振图案的装置
公开(公告)号：US07916391B2
公开(公告)日：2011-03-29
申请号：US11569001
申请日：2005-03-04
申请人： Michael Albert , Damian Fiolka
发明人： Michael Albert , Damian Fiolka
IPC分类号： G02B27/28
CPC分类号： G03F7/70566 , G02B1/02 , G02B1/06 , G02B1/08 , G02B5/3025 , G02B27/286
摘要： A polarization pattern assembly for use in an illuminator and an apparatus for providing at least one polarization pattern in a pupil of an illuminator for a lithography system are provided. A polarization pattern assembly for use in an illuminator having a pupil includes a frame (110) and at least one polarization pane (102, 102a, 102b) coupled to the frame (110), the polarization pane (102, 102a, 102b) changing a direction of polarization of light passing therethrough, whereby at least one polarization pattern is obtained across the pupil of the illuminator, and wherein the polarization pane (102, 102a, 102b) includes an optically active material.
摘要翻译：提供了一种用于照明器的偏振图案组件和用于在光刻系统的照明器的光瞳中提供至少一个偏振图案的装置。用于具有瞳孔的照明器中的偏振图案组件包括框架（110）和耦合到框架（110）的至少一个偏振窗格（102,102,102b），偏振窗格（102,102,102b）改变通过其中的光的偏振方向，由此在照明器的光瞳上获得至少一个偏振图案，并且其中偏光板（102,102,102b）包括光学活性材料。

24. 发明申请

US20090153826A1 Lithographic method and apparatus 有权
标题翻译：平版印刷方法和装置
公开(公告)号：US20090153826A1
公开(公告)日：2009-06-18
申请号：US12314612
申请日：2008-12-12
申请人： Harry Sewell , Jozef Petrus Henricus Benschop
发明人： Harry Sewell , Jozef Petrus Henricus Benschop
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/0043 , G03F7/70466
摘要： A multiple patterning process employs a phase change material, portions of which can be converted to an amorphous state and then a remaining portion is selectively removed to provide high resolution pattern features with a feature spacing smaller than, for example, a minimum spacing available in a conventional patterning layer employing a single exposure. A lithographic apparatus for use in the process may comprise an exposure tool having a single illuminator and single patterning device that is imaged through a single exposure slit onto a scanning substrate. Alternatively, the exposure tool may have multiple illuminators and/or multiple scanning complementary patterning devices optionally used with multiple exposure slits on the scanning substrate to facilitate double patterning in a single substrate pass.
摘要翻译：多重图形化工艺采用相变材料，其部分可以转换为非晶状态，然后选择性地去除剩余部分以提供高分辨率图案特征，其特征间距小于例如在采用单次曝光的常规图案层。用于该过程的光刻设备可以包括具有单个照明器和单个图案形成装置的曝光工具，其通过单个曝光狭缝成像到扫描基板上。或者，曝光工具可以具有可选地与扫描基板上的多个曝光狭缝一起使用的多个照明器和/或多个扫描互补图案形成装置，以便于在单个衬底通路中进行双重图案化。

25. 发明申请

US20080130109A1 Apparatus For Providing A Pattern Of Polarization 有权
标题翻译：提供极化图案的装置
公开(公告)号：US20080130109A1
公开(公告)日：2008-06-05
申请号：US11569001
申请日：2005-03-04
申请人： Michael Albert , Damian Fiolka
发明人： Michael Albert , Damian Fiolka
IPC分类号： G02B27/28
CPC分类号： G03F7/70566 , G02B1/02 , G02B1/06 , G02B1/08 , G02B5/3025 , G02B27/286
摘要： The present invention relates to a polarization pattern assembly for use in an illuminator and an apparatus for providing at least one polarization pattern in a pupil of an illuminator for a lithography system. A polarization pattern assembly for use in an illuminator having a pupil comprises a frame (110) and at least one polarization pane (102, 102a, 102b) coupled to said frame (110), said polarization pane (102, 102a, 102b) changing a direction of polarization of light passing therethrough, whereby at least one polarization pattern can be obtained across the pupil of the illuminator, and wherein said polarization pane (102, 102a, 102b) comprises an optically active material.
摘要翻译：本发明涉及一种用于照明器中的偏振图案组件和用于在光刻系统的照明器的光瞳中提供至少一个偏振图案的装置。一种用于具有瞳孔的照明器中的偏振图案组件包括一个框架（110）和耦合到所述框架（110）的至少一个偏振窗格（102,102a，102b），所述偏光窗格（102,102a， 102b）改变穿过其中的光的偏振方向，由此可以在照明器的瞳孔之间获得至少一个偏振图案，并且其中所述偏振面板（102,102a，102b）包括光学活性材料。

26. 发明授权

US06867846B2 Tailored reflecting diffractor for EUV lithographic system aberration measurement 有权
$Tailored reflecting diffractor for EUV lithographic system aberration measurement$
标题翻译：用于EUV光刻系统像差测量的量身定制的反射衍射器
公开(公告)号：US06867846B2
公开(公告)日：2005-03-15
申请号：US10753557
申请日：2004-01-09
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G01J9/02 , G02B5/18 , G03F7/20 , G03B27/52 , G03B27/42 , G03B27/54
CPC分类号： G03F7/706 , G01J9/0215 , G02B5/1838
摘要： A wavefront measurement system includes a source of electromagnetic radiation. An imaging system directs the electromagnetic radiation at an object plane that it uniformly illuminates. A first grating is positioned in the object plane to condition the radiation entering the input of a projection optic. A projection optical system projects an image of the first grating onto the focal plane. A second grating is positioned at the focal plane that receives a diffracted image of the source to form a shearing interferometer. A CCD detector receives the image of the first grating through the projection optical system and the second grating that forms a fringe pattern if there are aberrations in the projection optical system. Phaseshift readout of fringe pattern can be accomplished by stepping the first grating in a lateral direction and reading each frame with the CCD detector. The first grating includes a plurality of reflecting lines each formed by a plurality of reflecting dots. The first grating has a pitch that is ½ times the magnification of the projection system times the pitch of the second grating for achromatic operation.
摘要翻译：波前测量系统包括电磁辐射源。成像系统将电磁辐射引导到均匀照明的物平面。第一光栅定位在物平面中，以调节进入投影光学器件输入的辐射。投影光学系统将第一光栅的图像投影到焦平面上。第二光栅位于焦平面处，接收源的衍射图像以形成剪切干涉仪。如果在投影光学系统中存在像差，CCD检测器通过投影光学系统和第二光栅接收第一光栅的图像，其形成条纹图案。条纹图案的移相读数可以通过沿横向方向步进第一光栅并用CCD检测器读取每个帧来实现。第一光栅包括多个由多个反射点形成的反射线。第一光栅具有投影系统的倍率的1/2倍的间距乘以第二光栅的间距用于消色差操作。

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