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    • 28. 发明申请
    • SUBSTRATE PROCESSING UNIT, SUBSTRATE TRANSFER METHOD, SUBSTRATE CLEANSING PROCESS UNIT, AND SUBSTRATE PLATING APPARATUS
    • 基板加工单元,基板转印方法,基板清洗工艺单元和基板镀膜装置
    • US20090092469A1
    • 2009-04-09
    • US11996432
    • 2006-08-25
    • Masahiko SekimotoToshio YokoyamaTeruyuki WatanabeKenichi SuzukiKenichi KobayashiRyo Kato
    • Masahiko SekimotoToshio YokoyamaTeruyuki WatanabeKenichi SuzukiKenichi KobayashiRyo Kato
    • H01L21/677B08B7/00C25D17/06
    • H01L21/68707H01L21/6723H01L21/67742H01L21/67745H01L21/68728
    • To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit 10 includes a substrate holding mechanism 10 for holding the substrate 11 in a specified holding position, and a processing mechanism 32 for applying a specified process to the substrate held with the substrate holding mechanism in which a substrate guide mechanism 20 is provided with a guide pin 15 for guiding the substrate to vicinity of a holding position. The substrate holding mechanism has a plural number of rollers 14 on an outer periphery of the holding position of the substrate, with the plural number of rollers adapted to hold the substrate by supporting the periphery of the substrate from sides thereof in the vicinity of the holding position, and the roller has an integral structure made up of a large diameter portion and a small diameter portion formed above the large diameter portion, with an upper portion of the large diameter portion having a shoulder portion for the substrate in transfer to be temporarily placed on, and with the shoulder portion formed with a sloped surface sloping down toward its periphery.
    • 为了提供一种基板处理单元,基板转印方法,基板清洁处理单元和基板电镀设备,其使得诸如机器人臂之类的基板输入机构可以在携带该基板处理单元之后快速地释放保持在基板上 以缩短保持基板的时间并提高生产量。 基板处理单元10包括用于将基板11保持在指定的保持位置的基板保持机构10和用于对被设置有基板引导机构20的基板保持机构保持的基板进行规定处理的处理机构32 具有用于将基板引导到保持位置附近的引导销15。 基板保持机构在基板的保持位置的外周具有多个辊14,多个辊适于通过从保持基板附近的侧面支撑基板的周边来保持基板 并且所述辊具有由形成在所述大直径部分上方的大直径部分和小直径部分构成的整体结构,所述大直径部分的上部具有用于传送的基板的肩部临时放置 并且肩部形成有朝向其周边倾斜的倾斜表面。