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21. 发明授权

US06867849B2 STAGE APPARATUS WHICH SUPPORTS INTERFEROMETER, STAGE POSITION MEASUREMENT METHOD, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE APPARATUS MAINTENANCE METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SEMICONDUCTOR MANUFACTURING FACTORY 失效
标题翻译：支持干扰仪的阶段装置，阶段位置测量方法，投影曝光装置，投影曝光装置维护方法，半导体装置制造方法和半导体制造厂
公开(公告)号：US06867849B2
公开(公告)日：2005-03-15
申请号：US09866600
申请日：2001-05-30
申请人： Kazunori Iwamoto , Toshiya Asano
发明人： Kazunori Iwamoto , Toshiya Asano
IPC分类号： G01B11/00 , G03F7/20 , H01L21/027 , G03B27/62 , G03B27/58
CPC分类号： G03F7/70691 , G03F7/708
摘要： A stage apparatus includes a stage movable along at least one axis, a laser head for generating a laser beam, an optical unit which is mounted on the stage and splits the laser beam into reference and measurement beams, a mirror which is arranged outside the stage and reflects the measurement beam, and a detector which is arranged outside the stage and detects an interference beam of the reference and measurement beams.
摘要翻译：舞台装置包括沿着至少一个轴可移动的舞台，用于产生激光束的激光头，安装在舞台上的光学单元并将激光束分成参考和测量光束，布置在舞台外部的镜子并且反射测量光束，以及布置在平台外部并检测参考和测量光束的干涉光束的检测器。

22. 发明授权

US06819433B2 Exposure apparatus including interferometer system 有权
标题翻译：曝光装置包括干涉仪系统
公开(公告)号：US06819433B2
公开(公告)日：2004-11-16
申请号：US10073593
申请日：2002-02-12
申请人： Ryo Takai , Kazunori Iwamoto
发明人： Ryo Takai , Kazunori Iwamoto
IPC分类号： G01B902
CPC分类号： G03F7/70691 , G01B11/028 , G01B11/245
摘要： To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage (27) are measured using as a reference a lens barrel support (35) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system (34) for projecting a pattern formed on a master onto a substrate, stages (27, 31, 40) capable of moving with respect to the projection optical system (34) while holding the substrate or master, and a lens barrel support (35) that supports the projection optical system (34), and which uses a Z measuring mirror (30) that is arranged on a Y stage (31) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer (25) arranged on the Y stage (31).
摘要翻译：为了精确地测量在曝光设备等中使用的舞台装置的位置和姿势，以独立于顶级的镜头筒支撑件（35）为基准来测量顶级（27）的Z位置和位移，在通过干涉仪系统的振动方面，包括用于将形成在母板上的图案投影到基板上的投影光学系统（34），能够相对于投影光学系统（34）移动的台（27,31,40）同时保持基板或主机，以及支撑投影光学系统（34）的镜筒支撑件（35），并且使用布置在Y台（31）上的Z测量镜（30）并具有反射表面几乎平行于XY平面，以及布置在Y平台（31）上的Z干涉仪（25）。

23. 发明授权

US06469773B1 Stage apparatus, exposure apparatus and device manufacturing method 有权
标题翻译：舞台装置，曝光装置及装置的制造方法
公开(公告)号：US06469773B1
公开(公告)日：2002-10-22
申请号：US09205171
申请日：1998-12-04
申请人： Kazunori Iwamoto
发明人： Kazunori Iwamoto
IPC分类号： G03B2742
CPC分类号： G03F7/707 , G03F7/70358 , G03F7/70716 , G03F7/70791
摘要： A stage apparatus includes a stage moving in a prescribed direction while holding a substrate and a mechanism for generating a force that changes in accordance with an acceleration when the stage moves, and for applying the force to the substrate from the direction of the acceleration so that a force applied between the stage and the substrate by the acceleration is canceled.
摘要翻译：舞台装置包括在保持基板的同时沿规定方向移动的台阶和用于产生当舞台移动时根据加速度而变化的力的机构，并且用于从加速度的方向向基板施加力，使得通过加速度施加在台架和基板之间的力被取消。

24. 发明授权

US6008885A Scanning exposure apparatus 失效
标题翻译：扫描曝光装置
公开(公告)号：US6008885A
公开(公告)日：1999-12-28
申请号：US941629
申请日：1997-09-29
申请人： Kazuhiro Takahashi , Kazunori Iwamoto
发明人： Kazuhiro Takahashi , Kazunori Iwamoto
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54 , G03B27/42
CPC分类号： G03F7/70058 , G03F7/70358 , G03F7/70691 , G03F7/70833
摘要： A scanning exposure apparatus includes a light source, an illumination optical system for forming a secondary light source with light from the light source, and for illuminating a portion of a reticle having a pattern, a projection optical system for projecting the pattern of the reticle as illuminated, onto a wafer, a reticle stage for supporting the reticle and for scanningly moving the reticle in a predetermined scan direction, relative to the projection optical system, a wafer stage for supporting the wafer and for scanningly moving the wafer relative to the projection optical system, and a base for supporting the reticle stage and being supported by dampers, wherein the illumination optical system is divided into a first portion being supported by the base and a second portion supported by a floor, independently from the base, and wherein the predetermined direction of the reticle stage is substantially or approximately parallel to an optical axis direction at a location where the illumination optical system is divided.
摘要翻译：扫描曝光装置包括光源，用于利用来自光源的光形成二次光源并照射具有图案的掩模版的一部分的照明光学系统，用于将掩模版的图案投影的投影光学系统照射到晶片上，用于支撑掩模版并且相对于投影光学系统以预定扫描方向扫描地移动掩模版的光罩台，用于支撑晶片并用于相对于投影光学器件扫描地移动晶片的晶片台系统，以及用于支撑标线台并由阻尼器支撑的基座，其中所述照明光学系统被分为由所述基座支撑的第一部分和由所述基座独立地由地板支撑的第二部分，并且其中所述预定标线片台的方向基本上或近似平行于光轴的方向照明光学系统划分。

25. 发明授权

US5909272A Stage and exposure apparatus using same 失效
标题翻译：舞台和曝光装置使用相同
公开(公告)号：US5909272A
公开(公告)日：1999-06-01
申请号：US904305
申请日：1997-07-31
申请人： Eiji Osanai , Mitsuru Inoue , Kazunori Iwamoto , Katsumi Asada , Hiroshi Ito
发明人： Eiji Osanai , Mitsuru Inoue , Kazunori Iwamoto , Katsumi Asada , Hiroshi Ito
IPC分类号： H01L21/68 , G03F7/20 , H01L21/027 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70241 , G03F7/70358 , G03F7/70716
摘要： A stage apparatus has a stationary portion, a movable portion and a linear motor for moving the movable portion in a prescribed direction by applying thrust between the stationary and movable portions. A first supporting member supports the stationary portion with a degree of freedom in the direction of movement, and a second supporting member has an axial supporting member for supporting the stationary portion rigidly in the direction of movement and flexibly in other directions. The second supporting member is isolated from the first supporting member in such a manner that vibration will not be transmitted to the first supporting member. The stage is used to scan a master plate in a scanning-type exposure apparatus, and the first supporting member is joined to a lens barrel table on which a projecting optical system is mounted.
摘要翻译：舞台装置具有静止部分，可移动部分和直线电动机，用于通过在固定部分和可移动部分之间施加推力来使可动部分沿预定方向移动。第一支撑构件在移动方向上具有自由度的支撑固定部分，并且第二支撑构件具有轴向支撑构件，用于沿着运动方向刚性地支撑静止部分并且在其它方向上灵活地支撑。第二支撑构件与第一支撑构件隔离，使得振动不会传递到第一支撑构件。该台用于在扫描式曝光装置中扫描主板，并且将第一支撑构件接合到其上安装有投影光学系统的透镜镜台。

26. 发明授权

US5226523A Conveying apparatus and method of controlling the same 失效
标题翻译：输送装置及其控制方法
公开(公告)号：US5226523A
公开(公告)日：1993-07-13
申请号：US963517
申请日：1992-10-20
申请人： Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
发明人： Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
IPC分类号： G03F7/20 , G05B19/23
CPC分类号： G03F7/70741 , G03F7/7075 , G05B19/231
摘要： A conveying apparatus includes a plurality of position limiting devices provided along the direction of conveyance and a selecting device operable to select one of or those of the plurality of position limiting devices which are effective in view of a target position, before a start of conveyance. The selecting device is further operable to select, again, one of or those of the plurality of position limiting devices which are effective in view of the current position of an article being conveyed, after a start of conveyance.
摘要翻译：传送装置包括沿着传送方向设置的多个位置限制装置，以及选择装置，可操作以在开始传送之前选择在目标位置有效的多个位置限制装置中的一个或那些位置限制装置。选择装置还可操作以在开始运送之后再次选择多个位置限制装置中的一个或那些位置限制装置中的一个或那些位置限制装置，其在待传送物品的当前位置有效。

27. 发明授权

US4854444A Precise feeding mechanism 失效
标题翻译：精准送料机构
公开(公告)号：US4854444A
公开(公告)日：1989-08-08
申请号：US271365
申请日：1988-11-14
申请人： Kazunori Iwamoto
发明人： Kazunori Iwamoto
IPC分类号： B23Q1/03 , B23Q1/28 , B23Q1/60 , B25J9/10 , B25J19/00 , H01L21/677
CPC分类号： H01L21/68 , B23Q1/28 , B23Q1/601 , B25J19/0004 , B25J9/1015
摘要： A device for feeding a stage in a direction, the device including: first driving system for relatively coarsely feeding the stage, the first driving system having a piston and a cylinder combined in an assembly; locking system for selectively inhibiting relative movement between the piston and the cylinder at least in the aforementioned direction; and second driving system for relatively finely feeding the stage with an aid of the piston and the cylinder.
摘要翻译：一种用于沿方向进给台架的装置，该装置包括：第一驱动系统，用于相对粗略地进给台，第一驱动系统具有活塞和组合在一个组件中的圆筒; 锁定系统，用于至少沿上述方向选择性地抑制活塞和气缸之间的相对运动; 以及第二驱动系统，用于借助于活塞和气缸相对精细地进给平台。

28. 发明授权

US08244156B2 Method for producing cleaning device and cleaning device 有权
标题翻译：清洗装置及清洁装置的制造方法
公开(公告)号：US08244156B2
公开(公告)日：2012-08-14
申请号：US12337174
申请日：2008-12-17
申请人： Kazunori Iwamoto , Naoki Koike , Yusuke Inoue
发明人： Kazunori Iwamoto , Naoki Koike , Yusuke Inoue
IPC分类号： G03G15/20
CPC分类号： G03G15/0817 , G03G21/00 , G03G2221/0005 , G03G2221/163
摘要： A method for manufacturing a cleaning device of the image forming apparatus, the method includes: applying a liquid material to an area outside of an edge located at an end portion of a toner accommodating portion in the longitudinal direction of a toner removing member, wherein the liquid material is applied so as to seal the toner accommodating portion.
摘要翻译：一种用于制造图像形成装置的清洁装置的方法，所述方法包括：将液体材料施加到位于调色剂容纳部分在调色剂除去构件的纵向方向上的端部的边缘外侧的区域，其中，施加液体材料以密封调色剂容纳部分。

29. 发明申请

US20050280799A1 Moving mechanism and stage system in exposure apparatus 失效
标题翻译：曝光设备中的移动机构和舞台系统
公开(公告)号：US20050280799A1
公开(公告)日：2005-12-22
申请号：US11210786
申请日：2005-08-25
申请人： Hideo Tanaka , Kazunori Iwamoto , Yukio Takabayashi
发明人： Hideo Tanaka , Kazunori Iwamoto , Yukio Takabayashi
IPC分类号： G12B5/00 , G03F7/20 , G05D3/00 , H01L21/027 , H01L21/68 , G03B27/58
CPC分类号： G03F7/70716 , G03F7/709 , H01L21/682
摘要： A moving mechanism includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator which is movable along the second guide surface. The first structural member is supported by the second structural member at three positions.
摘要翻译：移动机构包括具有第一引导表面的第一结构构件，可沿着第一引导表面移动的移动构件，具有第二引导表面的第二结构构件和具有设置在移动构件上的可移动元件的致动器和定子其可沿着第二引导表面移动。第一结构构件由第三结构构件在三个位置处支撑。

30. 发明授权

US6133982A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US6133982A
公开(公告)日：2000-10-17
申请号：US968726
申请日：1997-11-12
申请人： Mitsuru Inoue , Ryuichi Ebinuma , Kazunori Iwamoto , Hideki Nogawa
发明人： Mitsuru Inoue , Ryuichi Ebinuma , Kazunori Iwamoto , Hideki Nogawa
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70691 , G03F7/70358 , G03F7/70833 , G03F7/709
摘要： An exposure apparatus having an optical stand for supporting a projecting optical system and a reticle stage, and a base frame have a plurality of struts for supporting the optical stand via dampers. The plurality of struts of the base frame are joined at their upper ends to increase the rigidity of the base frame, thereby reducing vibration caused by acceleration and deceleration of the reticle stage.
摘要翻译：具有用于支撑投影光学系统和标线片台的光学支架的曝光装置和具有用于通过阻尼器支撑光学支架的多个支柱的基座框架。底架的多个支柱在其上端连接以增加基架的刚性，从而减少由于标线片台的加速和减速引起的振动。

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