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    • 21. 发明申请
    • NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND READ METHOD FOR THE SAME
    • 非易失性半导体存储器件及其读取方法
    • US20130148406A1
    • 2013-06-13
    • US13700329
    • 2012-07-11
    • Kazuhiko ShimakawaKiyotaka TsujiRyotaro Azuma
    • Kazuhiko ShimakawaKiyotaka TsujiRyotaro Azuma
    • G11C13/00
    • G11C13/004G11C7/14G11C11/1673G11C13/0004G11C2013/0054G11C2213/71G11C2213/72G11C2213/73G11C2213/77
    • A cross point nonvolatile memory device capable of suppressing sneak-current-caused reduction in sensitivity of detection of a resistance value of a memory element is provided. The device includes perpendicular bit and word lines; a cross-point cell array including memory cells each having a resistance value reversibly changing between at least two resistance states according to electrical signals, arranged on cross-points of the word and bit lines; an offset detection cell array including an offset detection cell having a resistance higher than that of the memory cell in a high resistance state, the word lines being shared by the offset detection cell array; a read circuit (a sense amplifier) that determines a resistance state of a selected memory cell based on a current through the selected bit line; and a current source which supplies current to the offset detection cell array in a read operation period.
    • 提供一种能够抑制潜流引起的对存储元件的电阻值的检测灵敏度的降低的交叉点非易失性存储装置。 该设备包括垂直位和字线; 交叉点单元阵列,其包括存储单元,每个存储单元具有电阻值,该电阻值根据电信号在至少两个电阻状态之间可逆地改变;布置在字和位线的交叉点上; 偏移检测单元阵列,包括在高电阻状态下具有高于存储单元的电阻的偏移检测单元,所述字线由偏移检测单元阵列共享; 读取电路(读出放大器),其基于通过所选位线的电流确定所选存储单元的电阻状态; 以及在读取操作时段中向偏移检测单元阵列提供电流的电流源。
    • 25. 发明授权
    • Cross point variable resistance nonvolatile memory device
    • 交叉点可变电阻非易失性存储器件
    • US08441839B2
    • 2013-05-14
    • US13380624
    • 2011-06-02
    • Ryotaro AzumaKazuhiko Shimakawa
    • Ryotaro AzumaKazuhiko Shimakawa
    • G11C11/00
    • H01L27/101G11C13/0007G11C13/0023G11C13/003G11C13/0069G11C2013/0073G11C2213/71G11C2213/76H01L27/0688H01L27/2418H01L27/2481H01L45/08H01L45/1233H01L45/146
    • A cross point variable resistance nonvolatile memory device includes memory cells having the same orientation for stable characteristics of all layers. Each memory cell (51) is placed at a different one of cross points of bit lines (53) in an X direction and word lines (52) in a Y direction formed in layers. In a multilayer cross point structure where vertical array planes sharing the word lines are aligned in the Y direction each for a group of bit lines aligned in a Z direction, even and odd layer bit line selection switch elements (57, 58) switch electrical connection and disconnection between a global bit line (56) and commonly-connected even layer bit lines and commonly-connected odd layer bit lines, respectively. A bidirectional current limiting circuit (92) having parallel-connected P-type current limiting element (91) and N-type current limiting element (90) is provided between the global bit line and the switch elements.
    • 交叉点可变电阻非易失性存储器件包括具有相同取向的存储单元,用于所有层的稳定特性。 每个存储单元(51)被放置在X方向上的位线(53)的交叉点的不同的一个和Y层方向上形成的字线(52)。 在多路交叉点结构中,共享字线的垂直阵列平面在Y方向上对齐,对于在Z方向上排列的一组位线,偶数和奇数位位线选择开关元件(57,58)切换电连接 以及全局位线(56)和共同连接的偶数层位线和共同连接的奇数位位线之间的断开。 在全局位线和开关元件之间提供具有并联P型限流元件(91)和N型限流元件(90)的双向限流电路(92)。
    • 26. 发明授权
    • Variable resistance nonvolatile memory device
    • 可变电阻非易失性存储器件
    • US08441837B2
    • 2013-05-14
    • US13054312
    • 2010-04-14
    • Yuuichirou IkedaKazuhiko ShimakawaYoshihiko KanzawaShunsaku MuraokaRyotaro Azuma
    • Yuuichirou IkedaKazuhiko ShimakawaYoshihiko KanzawaShunsaku MuraokaRyotaro Azuma
    • G11C11/00
    • G11C13/0007G11C13/0069G11C2013/0073G11C2213/12G11C2213/15G11C2213/34G11C2213/72H01L27/24
    • A nonvolatile resistance variable memory device (100) includes memory cells (M11, M12, . . . ) in each of which a variable resistance element (R11, R12, . . . ) including a variable resistance layer placed between and in contact with a first electrode and a second electrode, and a current steering element (D11, D12, . . . ) including a current steering layer placed between and in contact with a third electrode and a fourth electrode, are connected in series, and the device is driven by a first LR drive circuit (105a1) via a current limit circuit (105b) to decrease resistance of the variable resistance element while the device is driven by a second HR drive circuit (105a2) to increase resistance of the variable resistance element, thus using the current limit circuit (105b) to make a current for decreasing resistance of the variable resistance element lower than a current for increasing resistance of the variable resistance element.
    • 一种非易失性电阻可变存储器件(100)包括存储单元(M11,M12 ...),每个存储单元包括可变电阻元件(R11,R12 ...),该可变电阻元件(R11,R12 ...) 第一电极和第二电极,以及包括放置在第三电极和第四电极之间并与第三电极和第四电极接触的电流导向层的电流导向元件(D11,D12 ...)串联连接,并且驱动该装置 通过第一LR驱动电路(105a1)经由限流电路(105b),以在器件被第二HR驱动电路(105a2)驱动时降低可变电阻元件的电阻,以增加可变电阻元件的电阻,从而使用 电流限制电路(105b),用于使可变电阻元件的电阻降低的电流低于用于增加可变电阻元件的电阻的电流。
    • 30. 发明授权
    • Nonvolatile memory device and manufacturing method thereof
    • 非易失存储器件及其制造方法
    • US08198618B2
    • 2012-06-12
    • US12747060
    • 2008-12-02
    • Takumi MikawaKenji TominagaKazuhiko ShimakawaRyotaro Azuma
    • Takumi MikawaKenji TominagaKazuhiko ShimakawaRyotaro Azuma
    • H01L29/02
    • H01L27/101H01L27/2409H01L27/2472H01L27/2481H01L45/04H01L45/1233H01L45/146
    • A nonvolatile memory device of the present invention comprises a substrate (1), first wires (3), first filling constituents (5) filled into first through-holes (4), respectively, second wires (11) which cross the first wires (3) perpendicularly to the first wires (3), respectively, each of the second wires (11) including a plurality of layers including a resistance variable layer (6) of each of first resistance variable elements, a conductive layer (7) and a resistance variable layer (8) of each of second resistance variable elements which are stacked together in this order, second filling constituents (14) filled into second through-holes (13), respectively, and third wires (15), and the conductive layer (7) of the second wires (11) serves as the electrodes of the first resistance variable elements (9) and the electrodes of the second resistance variable elements (10).
    • 本发明的非易失性存储装置包括基板(1),第一布线(3),分别填充到第一通孔(4)中的第一填充构件(5),分别穿过第一布线 3)分别垂直于第一导线(3),每个第二导线(11)包括多个层,包括第一电阻可变元件中的每一个的电阻变化层(6),导电层(7)和 按顺序堆叠在一起的第二电阻可变元件的电阻变化层(8),分别填充到第二通孔(13)中的第二填充组分(14)和第三导线(15),以及导电层 第二电线(11)的电极(7)用作第一电阻可变元件(9)的电极和第二电阻可变元件(10)的电极。