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    • 27. 发明授权
    • Method for producing a Gag-Env fusion protein
    • 生产Gag-Env融合蛋白的方法
    • US5834267A
    • 1998-11-10
    • US487657
    • 1995-06-07
    • Atsushi SaitoHideo SinagawaAtsuo Nakata
    • Atsushi SaitoHideo SinagawaAtsuo Nakata
    • A61K39/00C07K14/16C12N15/49C12N15/00C12N15/09C12N15/63C12N15/70
    • C07K14/005A61K39/00C07K2319/00C07K2319/40C12N2740/16122C12N2740/16222C12N2740/16322Y10S435/974
    • Disclosed is a substantially pure HIV antigen comprising a Gag-Env fusion otein consisting of a Gag peptide fused at its C-terminus to an Env peptide, wherein the Gag peptide comprises a contiguous sequence of at least ten amino acids of the amino acid sequence represented by Gag (308-437) and the Env peptide comprises a contiguous sequence of at least a part of the amino acid sequence represented by Env (512-699), the part containing at least one epitope which is reactive to an HIV antibody. The gag-env fusion DNA corresponding to the HIV antigen of the present invention allows the production of the desired high antigenicity HIV antigen in high yield. Therefore, the HIV antigen of the present invention can be advantageously used as an active component for a diagnostic reagent, a vaccine, an antibody preparation and a therapeutic reagent for AIDS. Also disclosed is a substantially pure HIV antigen comprising a Gag protein SEQ ID No.:1 coded for by the entire gag gene.
    • 公开了一种基本上纯的HIV抗原,其包含由其C-末端融合到Env肽的Gag肽组成的Gag-Env融合蛋白,其中Gag肽包含表示的氨基酸序列的至少十个氨基酸的连续序列 通过Gag(308-437),并且Env肽包含由Env(512-699)表示的至少一部分氨基酸序列的连续序列,该部分含有至少一个对HIV抗体具有反应性的表位。 对应于本发明的HIV抗原的gag-env融合DNA允许以高产率产生所需的高抗原性HIV抗原。 因此,本发明的HIV抗原可以有利地用作诊断试剂,疫苗,抗体制剂和用于AIDS的治疗试剂的活性成分。 还公开了包含由整个gag基因编码的Gag蛋白质SEQ ID No.1的基本上纯的HIV抗原。
    • 28. 发明授权
    • Charged particle beam exposure method and charged particle beam exposure
apparatus
    • 带电粒子束曝光方法和带电粒子束曝光装置
    • US5808313A
    • 1998-09-15
    • US892976
    • 1997-07-15
    • Akio YamadaHiroshi YasudaHidefumi YabaraAtsushi Saito
    • Akio YamadaHiroshi YasudaHidefumi YabaraAtsushi Saito
    • H01L21/027H01J37/304H01J37/317H01J37/00
    • B82Y10/00B82Y40/00H01J37/304H01J37/3174
    • The object of the present invention is to ensure a correct exposure even when a single exposure apparatus is used to expose a predetermined pattern, and an exposure apparatus therefor. According to the present invention, a charged particle beam exposure method, wherein a charged particle beam having a predetermined shape is irradiated to a sample to have the surface of the sample be exposed, comprises the steps of: storing a record of a first quantity of reflected electrons or a first sample current, which is detected in accordance with the charged particle beam irradiatd to the sample when a first exposure pattern is formed in a first area of the sample; and comparing a second quantity of reflected electrons or a second sample current, which is detected in accordance with the charged particle beam irradiated to the sample when the first exposure pattern is formed in a second area of the sample, with the first quantity of the reflected electrons or the first sample current which is stored when the first area is exposed, and generating a matched or unmatched signal therefor.
    • 本发明的目的在于即使使用单一的曝光装置来曝光预定图案也能确保正确的曝光及其曝光装置。 根据本发明,一种带电粒子束曝光方法,其中对样品照射具有预定形状的带电粒子束以暴露样品的表面,包括以下步骤:将第一量的 反射电子或第一样品电流,当在样品的第一区域中形成第一曝光图案时,其根据被照射到样品的带电粒子束来检测; 并且比较第二量的反射电子或第二样品电流,其在样品的第二区域中形成第一曝光图案时根据照射到样品的带电粒子束检测到的第一数量的反射电子或第二样品电流, 电子或第一采样电流,其在第一区域被暴露时存储,并且产生匹配或不匹配的信号。