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21. 发明授权

US07714987B2 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US07714987B2
公开(公告)日：2010-05-11
申请号：US11870626
申请日：2007-10-11
申请人： Kazuhiko Kajiyama , Toshihiko Tsuji
发明人： Kazuhiko Kajiyama , Toshihiko Tsuji
IPC分类号： G03B27/72
CPC分类号： G03B27/72 , G03F7/70075
摘要： An exposure apparatus includes a first optical unit configured to condense light from a light source, a catoptric integrator configured to form plural secondary light sources using light from the first optical unit, the catoptric integrator including plural cylindrical reflection surfaces having the same generatrix direction, an aperture stop arranged perpendicular to the generatrix direction, and a second optical unit configured to superpose light from each secondary light source onto an illumination surface, wherein the catoptric integrator includes plural integrator parts each having plural cylindrical reflection surfaces, and the plural integrator parts are arranged in a direction perpendicular to the generatrix direction and to an arrangement direction of the cylindrical reflection surfaces and located at an incident side of the aperture stop.
摘要翻译：曝光装置包括被配置为使来自光源的光聚光的第一光学单元，使用来自第一光学单元的光形成多个次级光源的反射积分器，该反射积分器包括具有相同母线方向的多个圆柱形反射面，孔径光阑，垂直于母线方向排列;第二光学单元，被配置为将来自每个次级光源的光叠加到照明表面上，其中，所述反射积分器包括多个具有多个圆柱形反射面的积分器部分，并且所述多个积分器部件布置在垂直于母线方向的方向和圆柱形反射表面的排列方向上并且位于孔径光阑的入射侧。

22. 发明申请

US20100053584A1 ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS 有权
标题翻译：照明光学系统和曝光装置
公开(公告)号：US20100053584A1
公开(公告)日：2010-03-04
申请号：US12552941
申请日：2009-09-02
申请人： Kazuhiko Kajiyama , Toshihiko Tsuji
发明人： Kazuhiko Kajiyama , Toshihiko Tsuji
IPC分类号： G03B27/72
CPC分类号： G03B27/72 , G03F7/70075
摘要： An illumination optical system includes first and second reflection integrators. The second reflection integrator forms a plurality of linear light sources using light from the first reflection integrator. The illumination optical system further includes a pair of flat plane mirrors that are arranged parallel to the meridional line direction on the second reflection integrator and opposite to each other so as to sandwich the plurality of linear light sources in between, a unit for changing an aperture shape of an aperture stop arranged at an exit side of the second reflection integrator in a direction perpendicular to the meridional line direction so that the aperture stop has an optical Fourier transformation relationship with the surface to be illuminated, and an adjustment unit configured to adjust an interval between the pair of flat plane mirrors as the aperture shape of the aperture stop is changed.
摘要翻译：照明光学系统包括第一和第二反射积分器。第二反射积分器使用来自第一反射积分器的光形成多个线性光源。照明光学系统还包括一对平面镜，它们平行于第二反射积分器上的子午线方向布置并且彼此相对，以将多个线性光源夹在其间，用于改变光圈的单元形状的孔径光阑，其布置在与第二反射积分器的出射侧在垂直于子午线方向的方向上，使得孔径光阑与待照射的表面具有光学傅里叶变换关系;以及调整单元，改变孔径光阑的孔径形状的一对平面镜之间的间隔。

23. 发明申请

US20070164234A1 Exposure apparatus and device manufacturing method 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070164234A1
公开(公告)日：2007-07-19
申请号：US10585001
申请日：2005-01-12
申请人： Toshihiko Tsuji , Kenichi Shiraishi , Hiroyuki Nagasaka , Katsushi Nakano
发明人： Toshihiko Tsuji , Kenichi Shiraishi , Hiroyuki Nagasaka , Katsushi Nakano
IPC分类号： G01N23/00
CPC分类号： G03F7/70725 , G03F7/70775
摘要： An exposure apparatus is provided in which, even when a projection optical system and substrate are in close proximity, collisions between the projection optical system and the substrate or the substrate stage can be easily avoided. An exposure apparatus EX having a projection optical system (30) which projects and transfers a pattern (PA) formed on a mask (R) onto a substrate (W), and a substrate stage (42), positioned below the projection optical system (30), which moves in directions substantially perpendicular to the direction of the optical axis (AX) of the projection optical system (30) while supporting the substrate (W), comprises a detector (81), positioned on the outer periphery of the projection optical system (30), and which detects the position of the substrate stage (42) or substrate W along the direction of the optical axis (AX), and a control device (70), which based on the detection results of the detector (81), stops or reverses the movement of the substrate stage (42).
摘要翻译：提供一种曝光装置，其中即使投影光学系统和基板紧密相邻，也可以容易地避免投影光学系统与基板或基板台之间的碰撞。具有将形成在掩模（R）上的图案（PA）投影并传送到基板（W）上的投影光学系统（30）的曝光装置EX以及位于投影光学系统下方的基板台（42） 30），其在支撑衬底（W）的同时基本上垂直于投影光学系统（30）的光轴（AX）的方向移动，包括位于突出部的外周上的检测器（81）光学系统（30），并且其沿着光轴（AX）的方向检测衬底台（42）或衬底W的位置;以及控制装置（70），其基于检测器的检测结果 81），停止或反转衬底台（42）的运动。

24. 发明授权

US07110084B2 Illumination optical system and exposure apparatus 失效
标题翻译：照明光学系统和曝光装置
公开(公告)号：US07110084B2
公开(公告)日：2006-09-19
申请号：US10769373
申请日：2004-01-30
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/42
CPC分类号： G03F7/702 , G21K2201/06
摘要： Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.
摘要翻译：为了提供照明光学系统和使用该照明光学系统的曝光装置，其提供了比现有技术更光亮的用于照射掩模的光的角度分布，用于照射物体表面的照明光学系统包括：光学单元，其将来自光源部分成近似平行的光，并且包括第一和第二反射镜，其中第一反射镜具有开口，第二反射镜反射的光穿过该开口。

25. 发明授权

US06903799B2 Exposure method and exposure apparatus 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US06903799B2
公开(公告)日：2005-06-07
申请号：US10603807
申请日：2003-06-26
申请人： Toshihiko Tsuji , Takaaki Kimura
发明人： Toshihiko Tsuji , Takaaki Kimura
IPC分类号： G03F7/20 , G03B27/52 , G03B27/42
CPC分类号： G03F7/70983 , G03F7/70858 , G03F7/70933
摘要： The present invention provides an exposure method and exposure apparatus that enable the effects on an apparatus main body of heat generated by a control system to be suppressed when an error occurs in an air-conditioning system or temperature control system. In the exposure apparatus of the present invention, if an error occurs in an air-conditioning system (50) that air-conditions an interior of a chamber (11 to 16) in which an exposure body section (STP) is housed or occurs in a temperature control system (52) that controls a temperature of the exposure body section (STP), a power supply of a control system (53 to 56) that controls the exposure body section (STP) is shut down.
摘要翻译：本发明提供了一种在空调系统或温度控制系统中发生错误时能够抑制由控制系统产生的热量对设备主体产生影响的曝光方法和曝光装置。在本发明的曝光装置中，如果空调系统（50）发生错误，该空调系统（50）使在其中容纳或发生曝光体部分（STP）的室（11至16）的内部进行空调控制曝光体部分（STP）的温度的温度控制系统（52），控制曝光体部分（STP）的控制系统（53〜56）的电源被关闭。

26. 发明授权

US06885432B2 Projection exposure apparatus and device manufacturing method 失效
标题翻译：投影曝光装置及装置制造方法
公开(公告)号：US06885432B2
公开(公告)日：2005-04-26
申请号：US10411834
申请日：2003-04-11
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54 , G03B27/42 , G21K5/00
CPC分类号： G03F7/70233 , G03F7/7025 , G03F7/70258 , G03F7/70283
摘要： Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask, wherein the apparatus includes a projection optical system for projecting the pattern of the reflection type mask onto the substrate, the projection optical system having a stop, wherein the stop has a first opening for defining a numerical aperture of the projection optical system, and a second opening through which light from the reflection type mask passes. This structure effective avoids unwanted physical interference among optical components of an illumination system or the projection optical system even when the size of the whole exposure apparatus is made compact to some degree.
摘要翻译：公开了一种曝光装置，用于利用来自光源的光照射反射型掩模，并且用照射反射型掩模的图案曝光基板，其中该装置包括投影光学系统，用于将反射型掩模的图案投影到所述基板，所述投影光学系统具有止动件，其中所述止动件具有用于限定所述投影光学系统的数值孔径的第一开口和来自所述反射型掩模的光通过的第二开口。这种结构有效地避免了在整个曝光装置的尺寸在某种程度上被紧凑化的情况下，照明系统的光学部件或投影光学系统的不需要的物理干扰。

27. 发明申请

US20050030509A1 Illumination optical system in exposure apparatus 有权
标题翻译：曝光装置中的照明光学系统
公开(公告)号：US20050030509A1
公开(公告)日：2005-02-10
申请号：US10933328
申请日：2004-09-03
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G02B5/32 , G02B19/00 , G03B27/54 , G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70058 , G03B27/54
摘要： An illumination system for illuminating a surface by use of light from a light source, which includes an emission angle conserving optical unit effective to emit the light from the light source at a constant divergent angle, and a diffractive optical element for producing a desired light intensity distribution on a predetermined plane. The diffractive optical element is disposed at or adjacent to a position where light from the emission angle conserving optical unit is collected.
摘要翻译：一种用于通过使用来自光源的光来照射表面的照明系统，该照明系统包括有效地以恒定的发散角发射来自光源的光的发光角保存光学单元和用于产生期望的光强度的衍射光学元件分布在预定平面上。衍射光学元件设置在收集来自发光角保存光学单元的光的位置处或邻近。

28. 发明授权

US06806477B1 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same 失效
标题翻译：位置检测装置，使用其的装置，曝光装置和使用其的装置制造方法
公开(公告)号：US06806477B1
公开(公告)日：2004-10-19
申请号：US09645434
申请日：2000-08-25
申请人： Kenji Saito , Toshihiko Tsuji , Mitsuro Sugita
发明人： Kenji Saito , Toshihiko Tsuji , Mitsuro Sugita
IPC分类号： G03F900
CPC分类号： G03F9/7088 , B82Y10/00 , G03F7/70375 , G03F9/7061
摘要： A position detection device for detecting a position of an object. The detection device includes an irradiation device for irradiating light onto an alignment mark formed on a surface of the object, a probe for detecting near-field light in the vicinity of the alignment mark upon irradiation by the irradiation device and a detector for detecting position information of the object on the basis of the near-field light detected by the probe.
摘要翻译：一种位置检测装置，用于检测物体的位置。检测装置包括：照射装置，用于将光照射到形成在物体表面上的对准标记;探测器，用于在照射装置照射时检测对准标记附近的近场光;以及探测器，用于检测位置信息基于由探针检测到的近场光。

29. 发明授权

US5861952A Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
标题翻译：包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置
公开(公告)号：US5861952A
公开(公告)日：1999-01-19
申请号：US984509
申请日：1992-12-02
申请人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
发明人： Toshihiko Tsuji , Kyoichi Miyazaki , Seiji Takeuchi , Minoru Yoshii , Noriyuki Nose
IPC分类号： G01N21/94 , G01B9/02 , G01N21/88
CPC分类号： G01N21/94
摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.
摘要翻译：具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。激光束随后被半反射镜分开。其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

30. 发明授权

US5486919A Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern 失效
标题翻译：用于在具有图案的基板上检查颗粒（如果有的话）的检查方法和装置
公开(公告)号：US5486919A
公开(公告)日：1996-01-23
申请号：US76951
申请日：1993-06-15
申请人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
发明人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
IPC分类号： G01J9/02 , G01J9/04 , G01N21/88 , G01N21/94 , G03F7/20 , G01B9/02
CPC分类号： G03F7/70616 , G01N21/88 , G01N21/94 , G03F7/7065 , G03F7/70916 , G01J2009/0261 , G01J9/04 , G01N2021/4792 , G01N21/8806
摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
摘要翻译：公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

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